DE60120432T2 - Holographisches speichermedium, das polyfunktionelle epoxidmonomere enthält, welche zur kationischen polymerisation fähig sind - Google Patents

Holographisches speichermedium, das polyfunktionelle epoxidmonomere enthält, welche zur kationischen polymerisation fähig sind Download PDF

Info

Publication number
DE60120432T2
DE60120432T2 DE60120432T DE60120432T DE60120432T2 DE 60120432 T2 DE60120432 T2 DE 60120432T2 DE 60120432 T DE60120432 T DE 60120432T DE 60120432 T DE60120432 T DE 60120432T DE 60120432 T2 DE60120432 T2 DE 60120432T2
Authority
DE
Germany
Prior art keywords
group
substituted
unsubstituted
aryl
independently
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60120432T
Other languages
German (de)
English (en)
Other versions
DE60120432D1 (de
Inventor
Erdem A. Ashland CETIN
A. Richard Arlington MINNS
A. David Concord WALDMAN
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Forcetec Co Ltd Changwon Gyeongsangnam Kr
Original Assignee
Aprilis Inc Maynard
Aprilis Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aprilis Inc Maynard, Aprilis Inc filed Critical Aprilis Inc Maynard
Application granted granted Critical
Publication of DE60120432D1 publication Critical patent/DE60120432D1/de
Publication of DE60120432T2 publication Critical patent/DE60120432T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/32—Epoxy compounds containing three or more epoxy groups
    • C08G59/3254—Epoxy compounds containing three or more epoxy groups containing atoms other than carbon, hydrogen, oxygen or nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/50—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/2403—Layers; Shape, structure or physical properties thereof
    • G11B7/24035—Recording layers
    • G11B7/24044—Recording layers for storing optical interference patterns, e.g. holograms; for storing data in three dimensions [3D], e.g. volume storage
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
    • G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H2001/026—Recording materials or recording processes
    • G03H2001/0264—Organic recording material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Holo Graphy (AREA)
  • Epoxy Resins (AREA)
DE60120432T 2000-08-28 2001-08-28 Holographisches speichermedium, das polyfunktionelle epoxidmonomere enthält, welche zur kationischen polymerisation fähig sind Expired - Lifetime DE60120432T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US22812100P 2000-08-28 2000-08-28
US228121P 2000-08-28
PCT/US2001/026828 WO2002019040A2 (en) 2000-08-28 2001-08-28 Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization

Publications (2)

Publication Number Publication Date
DE60120432D1 DE60120432D1 (de) 2006-07-20
DE60120432T2 true DE60120432T2 (de) 2007-01-04

Family

ID=22855887

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60120432T Expired - Lifetime DE60120432T2 (de) 2000-08-28 2001-08-28 Holographisches speichermedium, das polyfunktionelle epoxidmonomere enthält, welche zur kationischen polymerisation fähig sind

Country Status (10)

Country Link
US (4) US6784300B2 (enExample)
EP (1) EP1317498B1 (enExample)
JP (1) JP2004507513A (enExample)
KR (1) KR100749304B1 (enExample)
AT (1) ATE328939T1 (enExample)
AU (1) AU2001286860A1 (enExample)
CA (1) CA2424366A1 (enExample)
DE (1) DE60120432T2 (enExample)
TW (1) TWI251000B (enExample)
WO (1) WO2002019040A2 (enExample)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2001264832A1 (en) * 2000-05-23 2001-12-03 Aprilis, Inc. Data storage medium comprising colloidal metal and preparation process thereof
AU2001286860A1 (en) * 2000-08-28 2002-03-13 Aprilis, Inc. Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization
AU2003254775A1 (en) * 2002-07-30 2004-02-16 Toagosei Co., Ltd. Composition for holography, method of curing the same, and cured article
US6859293B2 (en) 2002-10-22 2005-02-22 Zebra Imaging, Inc. Active digital hologram display
WO2004059389A2 (en) 2002-12-23 2004-07-15 Aprilis, Inc. Sensitizer dyes for photoacid generating systems
US20050187308A1 (en) * 2004-02-20 2005-08-25 Korea Advanced Institute Of Science And Technology Method of preparing photopolymer with enhanced optical quality using nanoporous membrane and photopolymer prepared by the same
US20070260089A1 (en) * 2004-03-26 2007-11-08 Albemarle Corporation Method for the Synthesis of Quaternary Ammonium Compounds and Compositions Thereof
JP4629367B2 (ja) * 2004-05-31 2011-02-09 東レ・ダウコーニング株式会社 活性エネルギー線硬化型オルガノポリシロキサン樹脂組成物、光伝送部材およびその製造方法
US7122290B2 (en) * 2004-06-15 2006-10-17 General Electric Company Holographic storage medium
US7111806B2 (en) 2004-08-05 2006-09-26 Esselte Spool for supply of image receiving medium
US7897296B2 (en) * 2004-09-30 2011-03-01 General Electric Company Method for holographic storage
US20060078802A1 (en) * 2004-10-13 2006-04-13 Chan Kwok P Holographic storage medium
US20060199081A1 (en) * 2005-03-04 2006-09-07 General Electric Company Holographic storage medium, article and method
US8034514B2 (en) * 2005-03-08 2011-10-11 Nippon Steel Chemical Co., Ltd. Photosensitive resin composition for volume phase hologram recording and optical information recording medium using the same
WO2007047840A2 (en) * 2005-10-18 2007-04-26 Dce Aprilis, Inc. Photopolymerizable medium comprising siloxane compounds that support cationic polymerization for holographic storage
US20070167407A1 (en) * 2005-12-20 2007-07-19 Albemarle Corporation Quaternary ammonium borate compositions and substrate preservative solutions containing them
EP1966224A4 (en) * 2005-12-29 2012-03-21 Univ Akron LIGHT-RESISTANT POLYMERS FOR OPHTHALMIC APPLICATIONS
WO2007102470A1 (ja) * 2006-03-09 2007-09-13 Nippon Steel Chemical Co., Ltd. 体積位相型ホログラム記録用感光性樹脂組成物及びそれを用いた光情報記録媒体
WO2007120628A2 (en) * 2006-04-11 2007-10-25 Dow Corning Corporation A composition including a siloxane and a method of forming the same
US20070248890A1 (en) * 2006-04-20 2007-10-25 Inphase Technologies, Inc. Index Contrasting-Photoactive Polymerizable Materials, and Articles and Methods Using Same
JP2008195616A (ja) 2007-02-08 2008-08-28 Fujifilm Corp 重合性化合物、光記録用組成物、ホログラフィック記録媒体および情報記録方法
RU2009141372A (ru) 2007-04-11 2011-05-20 Байер МатириальСайенс АГ (DE) Предпочтительные запоминающие среды для голографических применений
JP2010202801A (ja) * 2009-03-04 2010-09-16 Nitto Denko Corp 熱硬化性シリコーン樹脂用組成物
WO2010107784A1 (en) 2009-03-16 2010-09-23 Stx Aprilis, Inc. Methods for activation control of photopolymerization for holographic data storage using at least two wavelengths
US8323854B2 (en) * 2009-04-23 2012-12-04 Akonia Holographics, Llc Photopolymer media with enhanced dynamic range
JP2011132208A (ja) * 2009-11-25 2011-07-07 Dainichiseika Color & Chem Mfg Co Ltd ５員環環状カーボネートポリシロキサン化合物およびその製造方法
US8951933B2 (en) 2009-11-25 2015-02-10 Dainichiseika Color & Chemicals Mfg. Co., Ltd. Polysiloxane-modified polyhydroxy polyurethane resin, method for producing same, heat-sensitive recording material using the resin, imitation leather, thermoplastic polyolefin resin skin material, material for weather strip, and weather strip
KR101434764B1 (ko) 2009-11-26 2014-08-26 다이니치 세이카 고교 가부시키가이샤 폴리실록산 변성 폴리히드록시 폴리우레탄 수지 및 그 제조방법, 상기 수지를 이용한 감열 기록 재료, 인조 피혁, 열가소성 폴리올레핀 수지 표피재, 웨더스트립용 재료 및 웨더스트립
GB2476275A (en) 2009-12-17 2011-06-22 Dublin Inst Of Technology Photosensitive holographic recording medium comprising glycerol
EP2586814B1 (en) 2010-06-24 2016-01-20 Dainichiseika Color & Chemicals Mfg. Co., Ltd. Self-crosslinkable polyhydroxy polyurethane resin, resinaceous material that contains the resin, process for production of the resin, and imitation leather, surfacing material and weatherstrip material, using the resin
WO2012026338A1 (ja) 2010-08-26 2012-03-01 大日精化工業株式会社 自己架橋型ポリシロキサン変性ポリヒドロキシポリウレタン樹脂、該樹脂を含む樹脂材料、該樹脂の製造方法、該樹脂を用いてなる擬革及び熱可塑性ポリオレフィン表皮材
WO2012137726A1 (ja) 2011-04-04 2012-10-11 大日精化工業株式会社 自己架橋型ポリシロキサン変性ポリヒドロキシポリウレタン樹脂、該樹脂の製造方法、該樹脂を含む樹脂材料および該樹脂を利用した擬革
JP6628366B2 (ja) * 2014-05-30 2020-01-08 ダウ・東レ株式会社 有機ケイ素化合物、硬化性シリコーン組成物、および半導体装置
JP6784676B2 (ja) * 2014-12-19 2020-11-11 ダウ シリコーンズ コーポレーション 縮合架橋粒子の調製方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE655303A (enExample) * 1963-11-12 1965-03-01
JPS6017377B2 (ja) * 1979-07-31 1985-05-02 信越化学工業株式会社 重合性オルガノポリシロキサンの製造方法
US5037861A (en) 1989-08-09 1991-08-06 General Electric Company Novel highly reactive silicon-containing epoxides
US5075154A (en) * 1990-03-23 1991-12-24 General Electric Company UV-curable silphenylene-containing epoxy functional silicones
DE4023556A1 (de) * 1990-07-25 1992-01-30 Goldschmidt Ag Th Haertbare epoxygruppen aufweisende organopolysiloxane, verfahren zu ihrer herstellung und ihre verwendung als haertbare beschichtungsmittel mit abhaesiven eigenschaften
JP3015139B2 (ja) * 1991-04-23 2000-03-06 東レ・ダウコーニング・シリコーン株式会社 オルガノポリシロキサンおよびその製造方法
TW268969B (enExample) * 1992-10-02 1996-01-21 Minnesota Mining & Mfg
US5484950A (en) 1992-12-21 1996-01-16 Polyset Company, Inc. Process for selective monoaddition to silanes containing two silicon-hydrogen bonds and products thereof
US5292827A (en) * 1993-02-25 1994-03-08 General Electric Company Epoxy-capped branched silicones and copolymers thereof
JP3532675B2 (ja) * 1994-10-03 2004-05-31 日本ペイント株式会社 体積ホログラム記録用感光性組成物、及びそれを用いた記録媒体ならびに体積ホログラム形成方法
JP3604700B2 (ja) * 1995-10-06 2004-12-22 ポラロイド コーポレイション ホログラフィ媒体およびプロセス
US5863970A (en) * 1995-12-06 1999-01-26 Polyset Company, Inc. Epoxy resin composition with cycloaliphatic epoxy-functional siloxane
US5874187A (en) 1996-08-15 1999-02-23 Lucent Technologies Incorporated Photo recording medium
DE19648283A1 (de) * 1996-11-21 1998-05-28 Thera Ges Fuer Patente Polymerisierbare Massen auf der Basis von Epoxiden
US20030157414A1 (en) 1997-11-13 2003-08-21 Pradeep K. Dhal Holographic medium and process for use thereof
US6391999B1 (en) 1998-02-06 2002-05-21 Rensselaer Polytechnic Institute Epoxy alkoxy siloxane oligomers
AU2001264832A1 (en) * 2000-05-23 2001-12-03 Aprilis, Inc. Data storage medium comprising colloidal metal and preparation process thereof
US6852766B1 (en) * 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
AU2001286860A1 (en) * 2000-08-28 2002-03-13 Aprilis, Inc. Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization

Also Published As

Publication number Publication date
US20100280260A1 (en) 2010-11-04
WO2002019040A3 (en) 2002-05-30
KR100749304B1 (ko) 2007-08-14
AU2001286860A1 (en) 2002-03-13
KR20030045790A (ko) 2003-06-11
US7332249B2 (en) 2008-02-19
EP1317498A2 (en) 2003-06-11
TWI251000B (en) 2006-03-11
CA2424366A1 (en) 2002-03-07
US7070886B2 (en) 2006-07-04
EP1317498B1 (en) 2006-06-07
WO2002019040A2 (en) 2002-03-07
US20070293637A1 (en) 2007-12-20
US6784300B2 (en) 2004-08-31
DE60120432D1 (de) 2006-07-20
ATE328939T1 (de) 2006-06-15
US20040249181A1 (en) 2004-12-09
WO2002019040A9 (en) 2002-07-25
JP2004507513A (ja) 2004-03-11
US20020068223A1 (en) 2002-06-06

Similar Documents

Publication Publication Date Title
US6784300B2 (en) Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization
DE69900369T2 (de) Bildaufzeichnungsmaterial und Verfahren zu seiner Herstellung
DE69823860T2 (de) Holographisches aufzeichnungsmaterial und verfahren
DE69729637T2 (de) Holographisches medium und verfahren
DE69229759T2 (de) Lichtempfindliche Zusammensetzung zum Aufzeichnen von Volumen-Phasenhologrammen
DE69529359T2 (de) Fotoempfindliches Aufzeichnungsmaterial, fotoempfindliches Aufzeichnungselement und Verfahren zur Herstellung eines Hologrammes mit diesem Element
JP3504884B2 (ja) 重合誘発収縮を補償する材料及びそれから形成された記録媒体
EP3683795B1 (en) Hologram medium and optical element
US7892702B2 (en) Sensitizer dyes for photoacid generating systems
Galli et al. Cyclic allylic sulfide based photopolymer for holographic recording showing high refractive index modulation
US20210239894A1 (en) Hologram medium
EP1860504A1 (en) Photosensitive composition containing organic fine particles
DE69422939T2 (de) Styrylcoumarin Verbindung, fotoempfindliche Harzzusammenstellung und Aufzeichnungsmaterial für Hologramme
DE112006003332T5 (de) Verfahren zum Speichern holographischer Daten und Gegenstände mit einer davon abgeleiteten verbesserten Datenspeicher-Lebensdauer
CN119105235A (zh) 一种全息记录介质
WO2004017141A1 (ja) 光像記録材料、ホログラム基体、光像記録方法および光像記録材料及びホログラム基体の製造方法
KR20220101613A (ko) 홀로그램 기록용 조성물, 홀로그램 기록 매체, 홀로그램, 및 이를 사용한 광학장치, 광학부품
KR101094551B1 (ko) 광 굴절률 변조 중합체 조성물, 홀로그램 기록 재료 및굴절률 제어 방법
US5773192A (en) Organic silicon compound, resist, thermal polymerization composition and photopolymerization composition
DE112019001009T5 (de) Verbindung, polymer und organisches material
KR20190042372A (ko) 포토폴리머 조성물
US20080176146A1 (en) Photosensitive Composition Containing Organic Fine Particles
KR100680264B1 (ko) 가교 가능한 포스핀옥사이드화합물과 이를 함유한 광중합성조성물 및 이를 이용한 광중합성 막
Mete Photopolymerization in filled systems
JP5286660B2 (ja) ホログラム記録材料及びホログラム記録媒体

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FORCETEC CO., LTD., CHANGWON, GYEONGSANGNAM, KR

8328 Change in the person/name/address of the agent

Representative=s name: KROHER, STROBEL RECHTS- UND PATENTANWAELTE, 80336