TWI251000B - Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization - Google Patents

Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization Download PDF

Info

Publication number
TWI251000B
TWI251000B TW090121147A TW90121147A TWI251000B TW I251000 B TWI251000 B TW I251000B TW 090121147 A TW090121147 A TW 090121147A TW 90121147 A TW90121147 A TW 90121147A TW I251000 B TWI251000 B TW I251000B
Authority
TW
Taiwan
Prior art keywords
group
substituted
aryl
unsubstituted
alkyl
Prior art date
Application number
TW090121147A
Other languages
English (en)
Chinese (zh)
Inventor
Erdem A Cetin
Richard A Minns
David A Waldman
Original Assignee
Aprilis Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aprilis Inc filed Critical Aprilis Inc
Application granted granted Critical
Publication of TWI251000B publication Critical patent/TWI251000B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/32—Epoxy compounds containing three or more epoxy groups
    • C08G59/3254—Epoxy compounds containing three or more epoxy groups containing atoms other than carbon, hydrogen, oxygen or nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/50—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/2403—Layers; Shape, structure or physical properties thereof
    • G11B7/24035—Recording layers
    • G11B7/24044—Recording layers for storing optical interference patterns, e.g. holograms; for storing data in three dimensions [3D], e.g. volume storage
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
    • G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H2001/026—Recording materials or recording processes
    • G03H2001/0264—Organic recording material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Holo Graphy (AREA)
  • Epoxy Resins (AREA)
TW090121147A 2000-08-28 2001-08-28 Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization TWI251000B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US22812100P 2000-08-28 2000-08-28

Publications (1)

Publication Number Publication Date
TWI251000B true TWI251000B (en) 2006-03-11

Family

ID=22855887

Family Applications (1)

Application Number Title Priority Date Filing Date
TW090121147A TWI251000B (en) 2000-08-28 2001-08-28 Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization

Country Status (10)

Country Link
US (4) US6784300B2 (enExample)
EP (1) EP1317498B1 (enExample)
JP (1) JP2004507513A (enExample)
KR (1) KR100749304B1 (enExample)
AT (1) ATE328939T1 (enExample)
AU (1) AU2001286860A1 (enExample)
CA (1) CA2424366A1 (enExample)
DE (1) DE60120432T2 (enExample)
TW (1) TWI251000B (enExample)
WO (1) WO2002019040A2 (enExample)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2001264832A1 (en) * 2000-05-23 2001-12-03 Aprilis, Inc. Data storage medium comprising colloidal metal and preparation process thereof
KR100749304B1 (ko) * 2000-08-28 2007-08-14 디시이 아프릴리스, 인코포레이티드 양이온 중합반응을 수행할 수 있는 다작용성 에폭시모노머를 포함하는 홀로그래픽 기록 매체
WO2004011522A1 (ja) * 2002-07-30 2004-02-05 Toagosei Co., Ltd. ホログラム記録用組成物およびその硬化方法ならびに硬化物
AU2003298602A1 (en) 2002-10-22 2004-05-13 Zebra Imaging, Inc. Active digital hologram display
EP1578870A2 (en) * 2002-12-23 2005-09-28 Aprilis, Inc. Sensitizer dyes for photoacid generating systems
US20050187308A1 (en) * 2004-02-20 2005-08-25 Korea Advanced Institute Of Science And Technology Method of preparing photopolymer with enhanced optical quality using nanoporous membrane and photopolymer prepared by the same
US20070260089A1 (en) * 2004-03-26 2007-11-08 Albemarle Corporation Method for the Synthesis of Quaternary Ammonium Compounds and Compositions Thereof
JP4629367B2 (ja) * 2004-05-31 2011-02-09 東レ・ダウコーニング株式会社 活性エネルギー線硬化型オルガノポリシロキサン樹脂組成物、光伝送部材およびその製造方法
US7122290B2 (en) * 2004-06-15 2006-10-17 General Electric Company Holographic storage medium
US7111806B2 (en) 2004-08-05 2006-09-26 Esselte Spool for supply of image receiving medium
US7897296B2 (en) 2004-09-30 2011-03-01 General Electric Company Method for holographic storage
US20060078802A1 (en) * 2004-10-13 2006-04-13 Chan Kwok P Holographic storage medium
US20060199081A1 (en) * 2005-03-04 2006-09-07 General Electric Company Holographic storage medium, article and method
US8034514B2 (en) * 2005-03-08 2011-10-11 Nippon Steel Chemical Co., Ltd. Photosensitive resin composition for volume phase hologram recording and optical information recording medium using the same
JP2009511638A (ja) * 2005-10-18 2009-03-19 ディーシーイー アプリリス，インコーポレイテッド ホログラフィックストレージのための、カチオン重合をサポートするシロキサン化合物を含む光重合可能な媒体
US20070167407A1 (en) * 2005-12-20 2007-07-19 Albemarle Corporation Quaternary ammonium borate compositions and substrate preservative solutions containing them
WO2007079240A2 (en) * 2005-12-29 2007-07-12 The University Of Akron Photocurable polymers for ophthalmic applications
JP4976373B2 (ja) * 2006-03-09 2012-07-18 新日鐵化学株式会社 体積位相型ホログラム記録用感光性樹脂組成物及びそれを用いた光情報記録媒体
US8222364B2 (en) * 2006-04-11 2012-07-17 Dow Corning Corporation Composition including a siloxane and a method of forming the same
US20070248890A1 (en) * 2006-04-20 2007-10-25 Inphase Technologies, Inc. Index Contrasting-Photoactive Polymerizable Materials, and Articles and Methods Using Same
JP2008195616A (ja) 2007-02-08 2008-08-28 Fujifilm Corp 重合性化合物、光記録用組成物、ホログラフィック記録媒体および情報記録方法
CA2683905A1 (en) 2007-04-11 2008-10-23 Bayer Materialscience Ag Advantageous recording media for holographic applications
JP2010202801A (ja) * 2009-03-04 2010-09-16 Nitto Denko Corp 熱硬化性シリコーン樹脂用組成物
WO2010107784A1 (en) 2009-03-16 2010-09-23 Stx Aprilis, Inc. Methods for activation control of photopolymerization for holographic data storage using at least two wavelengths
US8323854B2 (en) * 2009-04-23 2012-12-04 Akonia Holographics, Llc Photopolymer media with enhanced dynamic range
JP2011132208A (ja) * 2009-11-25 2011-07-07 Dainichiseika Color & Chem Mfg Co Ltd ５員環環状カーボネートポリシロキサン化合物およびその製造方法
CN102666655B (zh) 2009-11-25 2014-07-09 大日精化工业株式会社 聚硅氧烷改性聚羟基聚氨酯树脂及其制造方法、以及其应用
EP2505600B1 (en) 2009-11-26 2018-08-22 Dainichiseika Color & Chemicals Mfg. Co., Ltd. Polysiloxane-modified polyhydroxy polyurethane resin, method for producing same, heat-sensitive recording material using the resin, imitation leather, thermoplastic polyolefin resin skin material, material for weather strip, and weather strip
GB2476275A (en) 2009-12-17 2011-06-22 Dublin Inst Of Technology Photosensitive holographic recording medium comprising glycerol
WO2011162237A1 (ja) 2010-06-24 2011-12-29 大日精化工業株式会社 自己架橋型ポリヒドロキシポリウレタン樹脂、該樹脂を含む樹脂材料、該樹脂の製造方法、該樹脂を用いてなる擬革、表皮材及びウェザーストリップ用材料
US10000609B2 (en) 2010-08-26 2018-06-19 Dainichiseika Color & Chemicals Mfg. Co., Ltd. Self-crosslinking polysiloxane-modified polyhydroxy polyurethane resin, resin material containing same, method for producing same, artificial leather comprising same, and thermoplastic polyolefin skin material comprising same
WO2012137726A1 (ja) 2011-04-04 2012-10-11 大日精化工業株式会社 自己架橋型ポリシロキサン変性ポリヒドロキシポリウレタン樹脂、該樹脂の製造方法、該樹脂を含む樹脂材料および該樹脂を利用した擬革
KR20170016392A (ko) * 2014-05-30 2017-02-13 다우 코닝 도레이 캄파니 리미티드 유기 규소 화합물, 경화성 실리콘 조성물, 및 반도체 장치
JP6784676B2 (ja) * 2014-12-19 2020-11-11 ダウ シリコーンズ コーポレーション 縮合架橋粒子の調製方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE655303A (enExample) * 1963-11-12 1965-03-01
JPS6017377B2 (ja) * 1979-07-31 1985-05-02 信越化学工業株式会社 重合性オルガノポリシロキサンの製造方法
US5037861A (en) 1989-08-09 1991-08-06 General Electric Company Novel highly reactive silicon-containing epoxides
US5075154A (en) * 1990-03-23 1991-12-24 General Electric Company UV-curable silphenylene-containing epoxy functional silicones
DE4023556A1 (de) * 1990-07-25 1992-01-30 Goldschmidt Ag Th Haertbare epoxygruppen aufweisende organopolysiloxane, verfahren zu ihrer herstellung und ihre verwendung als haertbare beschichtungsmittel mit abhaesiven eigenschaften
JP3015139B2 (ja) * 1991-04-23 2000-03-06 東レ・ダウコーニング・シリコーン株式会社 オルガノポリシロキサンおよびその製造方法
TW268969B (enExample) * 1992-10-02 1996-01-21 Minnesota Mining & Mfg
US5484950A (en) 1992-12-21 1996-01-16 Polyset Company, Inc. Process for selective monoaddition to silanes containing two silicon-hydrogen bonds and products thereof
US5292827A (en) * 1993-02-25 1994-03-08 General Electric Company Epoxy-capped branched silicones and copolymers thereof
JP3532675B2 (ja) * 1994-10-03 2004-05-31 日本ペイント株式会社 体積ホログラム記録用感光性組成物、及びそれを用いた記録媒体ならびに体積ホログラム形成方法
EP0853774B1 (en) 1995-10-06 2001-11-07 Polaroid Corporation Holographic medium and process
US5863970A (en) * 1995-12-06 1999-01-26 Polyset Company, Inc. Epoxy resin composition with cycloaliphatic epoxy-functional siloxane
US5874187A (en) 1996-08-15 1999-02-23 Lucent Technologies Incorporated Photo recording medium
DE19648283A1 (de) * 1996-11-21 1998-05-28 Thera Ges Fuer Patente Polymerisierbare Massen auf der Basis von Epoxiden
US20030157414A1 (en) * 1997-11-13 2003-08-21 Pradeep K. Dhal Holographic medium and process for use thereof
US6391999B1 (en) * 1998-02-06 2002-05-21 Rensselaer Polytechnic Institute Epoxy alkoxy siloxane oligomers
AU2001264832A1 (en) * 2000-05-23 2001-12-03 Aprilis, Inc. Data storage medium comprising colloidal metal and preparation process thereof
US6852766B1 (en) * 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
KR100749304B1 (ko) * 2000-08-28 2007-08-14 디시이 아프릴리스, 인코포레이티드 양이온 중합반응을 수행할 수 있는 다작용성 에폭시모노머를 포함하는 홀로그래픽 기록 매체

Also Published As

Publication number Publication date
KR100749304B1 (ko) 2007-08-14
WO2002019040A2 (en) 2002-03-07
US20020068223A1 (en) 2002-06-06
US20070293637A1 (en) 2007-12-20
KR20030045790A (ko) 2003-06-11
DE60120432D1 (de) 2006-07-20
AU2001286860A1 (en) 2002-03-13
US7070886B2 (en) 2006-07-04
WO2002019040A3 (en) 2002-05-30
DE60120432T2 (de) 2007-01-04
US20100280260A1 (en) 2010-11-04
EP1317498A2 (en) 2003-06-11
US6784300B2 (en) 2004-08-31
CA2424366A1 (en) 2002-03-07
US20040249181A1 (en) 2004-12-09
WO2002019040A9 (en) 2002-07-25
JP2004507513A (ja) 2004-03-11
ATE328939T1 (de) 2006-06-15
US7332249B2 (en) 2008-02-19
EP1317498B1 (en) 2006-06-07

Similar Documents

Publication Publication Date Title
US7332249B2 (en) Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization
JP3504884B2 (ja) 重合誘発収縮を補償する材料及びそれから形成された記録媒体
EP1583740B1 (en) Fluoroarylsulfonium photoacid generators
US7892702B2 (en) Sensitizer dyes for photoacid generating systems
JP2003534569A (ja) コロイド状金属を含むデータ保存媒体とその製造方法
WO2004017141A1 (ja) 光像記録材料、ホログラム基体、光像記録方法および光像記録材料及びホログラム基体の製造方法
CN101002259A (zh) 全息存储介质
WO2007047840A2 (en) Photopolymerizable medium comprising siloxane compounds that support cationic polymerization for holographic storage
WO2026051474A1 (zh) 一种全息记录介质
JP4257295B2 (ja) 光屈折率変調重合体組成物、ホログラム記録材料および屈折率制御方法
JP2005002222A (ja) 光像記録材料、その記録方法及びその製造方法
JP2005140852A (ja) 体積ホログラム記録用感光性組成物およびそれを用いる体積ホログラム記録媒体の製造方法

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees