ATE328939T1 - Holographisches speichermedium, das polyfunktionelle epoxidmonomere enthält, welche zur kationischen polymerisation fähig sind - Google Patents

Holographisches speichermedium, das polyfunktionelle epoxidmonomere enthält, welche zur kationischen polymerisation fähig sind

Info

Publication number
ATE328939T1
ATE328939T1 AT01966336T AT01966336T ATE328939T1 AT E328939 T1 ATE328939 T1 AT E328939T1 AT 01966336 T AT01966336 T AT 01966336T AT 01966336 T AT01966336 T AT 01966336T AT E328939 T1 ATE328939 T1 AT E328939T1
Authority
AT
Austria
Prior art keywords
cationic polymerization
capability
storage medium
medium containing
polyfunctional epoxy
Prior art date
Application number
AT01966336T
Other languages
German (de)
English (en)
Inventor
Erdem A Cetin
Richard A Minns
David A Waldman
Original Assignee
Aprilis Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aprilis Inc filed Critical Aprilis Inc
Application granted granted Critical
Publication of ATE328939T1 publication Critical patent/ATE328939T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/32—Epoxy compounds containing three or more epoxy groups
    • C08G59/3254—Epoxy compounds containing three or more epoxy groups containing atoms other than carbon, hydrogen, oxygen or nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/50—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/2403—Layers; Shape, structure or physical properties thereof
    • G11B7/24035—Recording layers
    • G11B7/24044—Recording layers for storing optical interference patterns, e.g. holograms; for storing data in three dimensions, e.g. volume storage
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
    • G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H2001/026—Recording materials or recording processes
    • G03H2001/0264—Organic recording material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Holo Graphy (AREA)
  • Epoxy Resins (AREA)
AT01966336T 2000-08-28 2001-08-28 Holographisches speichermedium, das polyfunktionelle epoxidmonomere enthält, welche zur kationischen polymerisation fähig sind ATE328939T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US22812100P 2000-08-28 2000-08-28

Publications (1)

Publication Number Publication Date
ATE328939T1 true ATE328939T1 (de) 2006-06-15

Family

ID=22855887

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01966336T ATE328939T1 (de) 2000-08-28 2001-08-28 Holographisches speichermedium, das polyfunktionelle epoxidmonomere enthält, welche zur kationischen polymerisation fähig sind

Country Status (10)

Country Link
US (4) US6784300B2 (enExample)
EP (1) EP1317498B1 (enExample)
JP (1) JP2004507513A (enExample)
KR (1) KR100749304B1 (enExample)
AT (1) ATE328939T1 (enExample)
AU (1) AU2001286860A1 (enExample)
CA (1) CA2424366A1 (enExample)
DE (1) DE60120432T2 (enExample)
TW (1) TWI251000B (enExample)
WO (1) WO2002019040A2 (enExample)

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JPWO2004011522A1 (ja) * 2002-07-30 2005-11-24 東亞合成株式会社 ホログラム記録用組成物およびその硬化方法ならびに硬化物
WO2004038515A2 (en) 2002-10-22 2004-05-06 Zebra Imaging, Inc. Active digital hologram display
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US20050187308A1 (en) * 2004-02-20 2005-08-25 Korea Advanced Institute Of Science And Technology Method of preparing photopolymer with enhanced optical quality using nanoporous membrane and photopolymer prepared by the same
US20070260089A1 (en) * 2004-03-26 2007-11-08 Albemarle Corporation Method for the Synthesis of Quaternary Ammonium Compounds and Compositions Thereof
JP4629367B2 (ja) * 2004-05-31 2011-02-09 東レ・ダウコーニング株式会社 活性エネルギー線硬化型オルガノポリシロキサン樹脂組成物、光伝送部材およびその製造方法
US7122290B2 (en) 2004-06-15 2006-10-17 General Electric Company Holographic storage medium
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US7897296B2 (en) 2004-09-30 2011-03-01 General Electric Company Method for holographic storage
US20060078802A1 (en) * 2004-10-13 2006-04-13 Chan Kwok P Holographic storage medium
US20060199081A1 (en) * 2005-03-04 2006-09-07 General Electric Company Holographic storage medium, article and method
US8034514B2 (en) * 2005-03-08 2011-10-11 Nippon Steel Chemical Co., Ltd. Photosensitive resin composition for volume phase hologram recording and optical information recording medium using the same
EP1937694A2 (en) * 2005-10-18 2008-07-02 DCE Aprilis, Inc. Photopolymerizable medium comprising siloxane compounds that support cationic polymerization for holographic storage
US20070167407A1 (en) * 2005-12-20 2007-07-19 Albemarle Corporation Quaternary ammonium borate compositions and substrate preservative solutions containing them
CA2634747C (en) * 2005-12-29 2014-09-09 The University Of Akron Photocurable polymers for ophthalmic applications
US8163443B2 (en) * 2006-03-09 2012-04-24 Nippon Steel Chemical Co., Ltd. Photosensitive resin composition for volume phase hologram recording and optical information recording medium using the same
WO2007120628A2 (en) * 2006-04-11 2007-10-25 Dow Corning Corporation A composition including a siloxane and a method of forming the same
US20070248890A1 (en) * 2006-04-20 2007-10-25 Inphase Technologies, Inc. Index Contrasting-Photoactive Polymerizable Materials, and Articles and Methods Using Same
JP2008195616A (ja) 2007-02-08 2008-08-28 Fujifilm Corp 重合性化合物、光記録用組成物、ホログラフィック記録媒体および情報記録方法
CA2683905A1 (en) 2007-04-11 2008-10-23 Bayer Materialscience Ag Advantageous recording media for holographic applications
JP2010202801A (ja) * 2009-03-04 2010-09-16 Nitto Denko Corp 熱硬化性シリコーン樹脂用組成物
WO2010107784A1 (en) 2009-03-16 2010-09-23 Stx Aprilis, Inc. Methods for activation control of photopolymerization for holographic data storage using at least two wavelengths
US8323854B2 (en) 2009-04-23 2012-12-04 Akonia Holographics, Llc Photopolymer media with enhanced dynamic range
JP2011132208A (ja) * 2009-11-25 2011-07-07 Dainichiseika Color & Chem Mfg Co Ltd ５員環環状カーボネートポリシロキサン化合物およびその製造方法
CN102666655B (zh) 2009-11-25 2014-07-09 大日精化工业株式会社 聚硅氧烷改性聚羟基聚氨酯树脂及其制造方法、以及其应用
CN102666654B (zh) 2009-11-26 2014-05-28 大日精化工业株式会社 聚硅氧烷改性聚羟基聚氨酯树脂及其制造方法、以及其应用
GB2476275A (en) 2009-12-17 2011-06-22 Dublin Inst Of Technology Photosensitive holographic recording medium comprising glycerol
WO2011162237A1 (ja) 2010-06-24 2011-12-29 大日精化工業株式会社 自己架橋型ポリヒドロキシポリウレタン樹脂、該樹脂を含む樹脂材料、該樹脂の製造方法、該樹脂を用いてなる擬革、表皮材及びウェザーストリップ用材料
CN103270071B (zh) 2010-08-26 2014-11-26 大日精化工业株式会社 自交联型聚硅氧烷改性多羟基聚氨酯树脂、含有该树脂的树脂材料、该树脂的制造方法、使用该树脂形成的人造革及热塑性聚烯烃表皮材料
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Also Published As

Publication number Publication date
JP2004507513A (ja) 2004-03-11
EP1317498A2 (en) 2003-06-11
US7070886B2 (en) 2006-07-04
KR100749304B1 (ko) 2007-08-14
EP1317498B1 (en) 2006-06-07
CA2424366A1 (en) 2002-03-07
US20040249181A1 (en) 2004-12-09
US6784300B2 (en) 2004-08-31
KR20030045790A (ko) 2003-06-11
US20100280260A1 (en) 2010-11-04
US20020068223A1 (en) 2002-06-06
US7332249B2 (en) 2008-02-19
US20070293637A1 (en) 2007-12-20
DE60120432T2 (de) 2007-01-04
WO2002019040A3 (en) 2002-05-30
WO2002019040A9 (en) 2002-07-25
DE60120432D1 (de) 2006-07-20
TWI251000B (en) 2006-03-11
AU2001286860A1 (en) 2002-03-13
WO2002019040A2 (en) 2002-03-07

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