AU2001286860A1 - Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization - Google Patents

Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization

Info

Publication number
AU2001286860A1
AU2001286860A1 AU2001286860A AU8686001A AU2001286860A1 AU 2001286860 A1 AU2001286860 A1 AU 2001286860A1 AU 2001286860 A AU2001286860 A AU 2001286860A AU 8686001 A AU8686001 A AU 8686001A AU 2001286860 A1 AU2001286860 A1 AU 2001286860A1
Authority
AU
Australia
Prior art keywords
cationic polymerization
storage medium
oligomer
polyfunctional epoxy
monomer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001286860A
Other languages
English (en)
Inventor
Erdem A. Cetin
Richard A. Minns
David A. Waldman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Aprilis Inc
Original Assignee
Aprilis Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aprilis Inc filed Critical Aprilis Inc
Publication of AU2001286860A1 publication Critical patent/AU2001286860A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/32—Epoxy compounds containing three or more epoxy groups
    • C08G59/3254—Epoxy compounds containing three or more epoxy groups containing atoms other than carbon, hydrogen, oxygen or nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/50—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/2403—Layers; Shape, structure or physical properties thereof
    • G11B7/24035—Recording layers
    • G11B7/24044—Recording layers for storing optical interference patterns, e.g. holograms; for storing data in three dimensions, e.g. volume storage
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
    • G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H2001/026—Recording materials or recording processes
    • G03H2001/0264—Organic recording material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Holo Graphy (AREA)
  • Epoxy Resins (AREA)
AU2001286860A 2000-08-28 2001-08-28 Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization Abandoned AU2001286860A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US22812100P 2000-08-28 2000-08-28
US60/228,121 2000-08-28
PCT/US2001/026828 WO2002019040A2 (en) 2000-08-28 2001-08-28 Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization

Publications (1)

Publication Number Publication Date
AU2001286860A1 true AU2001286860A1 (en) 2002-03-13

Family

ID=22855887

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001286860A Abandoned AU2001286860A1 (en) 2000-08-28 2001-08-28 Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization

Country Status (10)

Country Link
US (4) US6784300B2 (enExample)
EP (1) EP1317498B1 (enExample)
JP (1) JP2004507513A (enExample)
KR (1) KR100749304B1 (enExample)
AT (1) ATE328939T1 (enExample)
AU (1) AU2001286860A1 (enExample)
CA (1) CA2424366A1 (enExample)
DE (1) DE60120432T2 (enExample)
TW (1) TWI251000B (enExample)
WO (1) WO2002019040A2 (enExample)

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AU2001286860A1 (en) * 2000-08-28 2002-03-13 Aprilis, Inc. Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization
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US8163443B2 (en) * 2006-03-09 2012-04-24 Nippon Steel Chemical Co., Ltd. Photosensitive resin composition for volume phase hologram recording and optical information recording medium using the same
WO2007120628A2 (en) * 2006-04-11 2007-10-25 Dow Corning Corporation A composition including a siloxane and a method of forming the same
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JP2008195616A (ja) 2007-02-08 2008-08-28 Fujifilm Corp 重合性化合物、光記録用組成物、ホログラフィック記録媒体および情報記録方法
BRPI0810155A2 (pt) 2007-04-11 2014-12-30 Bayer Materialscience Ag Meios de gravação para aplicações holográficas.
JP2010202801A (ja) * 2009-03-04 2010-09-16 Nitto Denko Corp 熱硬化性シリコーン樹脂用組成物
WO2010107784A1 (en) 2009-03-16 2010-09-23 Stx Aprilis, Inc. Methods for activation control of photopolymerization for holographic data storage using at least two wavelengths
US8323854B2 (en) * 2009-04-23 2012-12-04 Akonia Holographics, Llc Photopolymer media with enhanced dynamic range
KR101426629B1 (ko) 2009-11-25 2014-08-05 다이니치 세이카 고교 가부시키가이샤 폴리실록산 변성 폴리히드록시 폴리우레탄 수지 및 그 제조방법, 상기 수지를 이용한 감열 기록 재료, 인조 피혁, 열가소성 폴리올레핀 수지 표피재, 웨더스트립용 재료 및 웨더스트립
JP2011132208A (ja) * 2009-11-25 2011-07-07 Dainichiseika Color & Chem Mfg Co Ltd ５員環環状カーボネートポリシロキサン化合物およびその製造方法
WO2011065433A1 (ja) 2009-11-26 2011-06-03 大日精化工業株式会社 ポリシロキサン変性ポリヒドロキシポリウレタン樹脂及びその製造方法、該樹脂を用いた感熱記録材料、擬革、熱可塑性ポリオレフィン樹脂表皮材、ウェザーストリップ用材料及びウェザーストリップ
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Also Published As

Publication number Publication date
DE60120432T2 (de) 2007-01-04
WO2002019040A9 (en) 2002-07-25
US7070886B2 (en) 2006-07-04
KR20030045790A (ko) 2003-06-11
CA2424366A1 (en) 2002-03-07
US20100280260A1 (en) 2010-11-04
EP1317498B1 (en) 2006-06-07
DE60120432D1 (de) 2006-07-20
JP2004507513A (ja) 2004-03-11
US20020068223A1 (en) 2002-06-06
EP1317498A2 (en) 2003-06-11
US20070293637A1 (en) 2007-12-20
US7332249B2 (en) 2008-02-19
KR100749304B1 (ko) 2007-08-14
WO2002019040A2 (en) 2002-03-07
TWI251000B (en) 2006-03-11
US20040249181A1 (en) 2004-12-09
US6784300B2 (en) 2004-08-31
WO2002019040A3 (en) 2002-05-30
ATE328939T1 (de) 2006-06-15

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