JP2004507513A - カチオン性重合を行いうる多官能エポキシモノマーを含むホログラフィー蓄積媒体 - Google Patents

カチオン性重合を行いうる多官能エポキシモノマーを含むホログラフィー蓄積媒体 Download PDF

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Publication number
JP2004507513A
JP2004507513A JP2002523098A JP2002523098A JP2004507513A JP 2004507513 A JP2004507513 A JP 2004507513A JP 2002523098 A JP2002523098 A JP 2002523098A JP 2002523098 A JP2002523098 A JP 2002523098A JP 2004507513 A JP2004507513 A JP 2004507513A
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JP2004507513A5 (enExample
Inventor
チェティン，アーデン，エイ．
ミンス，リチャード，エイ．
ウォルドマン，デービッド，エイ．
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アプリリス，インコーポレイテッド
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/32—Epoxy compounds containing three or more epoxy groups
    • C08G59/3254—Epoxy compounds containing three or more epoxy groups containing atoms other than carbon, hydrogen, oxygen or nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/50—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/2403—Layers; Shape, structure or physical properties thereof
    • G11B7/24035—Recording layers
    • G11B7/24044—Recording layers for storing optical interference patterns, e.g. holograms; for storing data in three dimensions, e.g. volume storage
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
    • G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H2001/026—Recording materials or recording processes
    • G03H2001/0264—Organic recording material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Holo Graphy (AREA)
  • Epoxy Resins (AREA)
JP2002523098A 2000-08-28 2001-08-28 カチオン性重合を行いうる多官能エポキシモノマーを含むホログラフィー蓄積媒体 Pending JP2004507513A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US22812100P 2000-08-28 2000-08-28
PCT/US2001/026828 WO2002019040A2 (en) 2000-08-28 2001-08-28 Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization

Publications (2)

Publication Number Publication Date
JP2004507513A true JP2004507513A (ja) 2004-03-11
JP2004507513A5 JP2004507513A5 (enExample) 2008-10-16

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JP2002523098A Pending JP2004507513A (ja) 2000-08-28 2001-08-28 カチオン性重合を行いうる多官能エポキシモノマーを含むホログラフィー蓄積媒体

Country Status (10)

Country Link
US (4) US6784300B2 (enExample)
EP (1) EP1317498B1 (enExample)
JP (1) JP2004507513A (enExample)
KR (1) KR100749304B1 (enExample)
AT (1) ATE328939T1 (enExample)
AU (1) AU2001286860A1 (enExample)
CA (1) CA2424366A1 (enExample)
DE (1) DE60120432T2 (enExample)
TW (1) TWI251000B (enExample)
WO (1) WO2002019040A2 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009511638A (ja) * 2005-10-18 2009-03-19 ディーシーイー アプリリス，インコーポレイテッド ホログラフィックストレージのための、カチオン重合をサポートするシロキサン化合物を含む光重合可能な媒体
US7977015B2 (en) 2007-02-08 2011-07-12 Fujifilm Corporation Polymerizable compound, optical recording composition, holographic recording medium and method of recording information
WO2015182143A1 (ja) * 2014-05-30 2015-12-03 東レ・ダウコーニング株式会社 有機ケイ素化合物、硬化性シリコーン組成物、および半導体装置

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003534569A (ja) * 2000-05-23 2003-11-18 アプリリス，インコーポレイテッド コロイド状金属を含むデータ保存媒体とその製造方法
AU2001286860A1 (en) * 2000-08-28 2002-03-13 Aprilis, Inc. Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization
US20060128822A1 (en) * 2002-07-30 2006-06-15 Toagosei Co., Ltd. Composition for holography, method of curing the same, and cured article
EP1554614A4 (en) 2002-10-22 2008-08-27 Zebra Imaging Inc ACTIVE DISPLAY OF DIGITAL HOLOGRAMS
WO2004059389A2 (en) 2002-12-23 2004-07-15 Aprilis, Inc. Sensitizer dyes for photoacid generating systems
US20050187308A1 (en) * 2004-02-20 2005-08-25 Korea Advanced Institute Of Science And Technology Method of preparing photopolymer with enhanced optical quality using nanoporous membrane and photopolymer prepared by the same
US20070260089A1 (en) * 2004-03-26 2007-11-08 Albemarle Corporation Method for the Synthesis of Quaternary Ammonium Compounds and Compositions Thereof
JP4629367B2 (ja) * 2004-05-31 2011-02-09 東レ・ダウコーニング株式会社 活性エネルギー線硬化型オルガノポリシロキサン樹脂組成物、光伝送部材およびその製造方法
US7122290B2 (en) * 2004-06-15 2006-10-17 General Electric Company Holographic storage medium
US7111806B2 (en) 2004-08-05 2006-09-26 Esselte Spool for supply of image receiving medium
US7897296B2 (en) * 2004-09-30 2011-03-01 General Electric Company Method for holographic storage
US20060078802A1 (en) * 2004-10-13 2006-04-13 Chan Kwok P Holographic storage medium
US20060199081A1 (en) * 2005-03-04 2006-09-07 General Electric Company Holographic storage medium, article and method
US8034514B2 (en) * 2005-03-08 2011-10-11 Nippon Steel Chemical Co., Ltd. Photosensitive resin composition for volume phase hologram recording and optical information recording medium using the same
US20070167407A1 (en) * 2005-12-20 2007-07-19 Albemarle Corporation Quaternary ammonium borate compositions and substrate preservative solutions containing them
US7964693B2 (en) * 2005-12-29 2011-06-21 The University Of Akron Photocurable polymers for ophthalmic applications
US8163443B2 (en) * 2006-03-09 2012-04-24 Nippon Steel Chemical Co., Ltd. Photosensitive resin composition for volume phase hologram recording and optical information recording medium using the same
WO2007120628A2 (en) * 2006-04-11 2007-10-25 Dow Corning Corporation A composition including a siloxane and a method of forming the same
US20070248890A1 (en) * 2006-04-20 2007-10-25 Inphase Technologies, Inc. Index Contrasting-Photoactive Polymerizable Materials, and Articles and Methods Using Same
BRPI0810155A2 (pt) 2007-04-11 2014-12-30 Bayer Materialscience Ag Meios de gravação para aplicações holográficas.
JP2010202801A (ja) * 2009-03-04 2010-09-16 Nitto Denko Corp 熱硬化性シリコーン樹脂用組成物
WO2010107784A1 (en) 2009-03-16 2010-09-23 Stx Aprilis, Inc. Methods for activation control of photopolymerization for holographic data storage using at least two wavelengths
US8323854B2 (en) * 2009-04-23 2012-12-04 Akonia Holographics, Llc Photopolymer media with enhanced dynamic range
KR101426629B1 (ko) 2009-11-25 2014-08-05 다이니치 세이카 고교 가부시키가이샤 폴리실록산 변성 폴리히드록시 폴리우레탄 수지 및 그 제조방법, 상기 수지를 이용한 감열 기록 재료, 인조 피혁, 열가소성 폴리올레핀 수지 표피재, 웨더스트립용 재료 및 웨더스트립
JP2011132208A (ja) * 2009-11-25 2011-07-07 Dainichiseika Color & Chem Mfg Co Ltd ５員環環状カーボネートポリシロキサン化合物およびその製造方法
WO2011065433A1 (ja) 2009-11-26 2011-06-03 大日精化工業株式会社 ポリシロキサン変性ポリヒドロキシポリウレタン樹脂及びその製造方法、該樹脂を用いた感熱記録材料、擬革、熱可塑性ポリオレフィン樹脂表皮材、ウェザーストリップ用材料及びウェザーストリップ
GB2476275A (en) 2009-12-17 2011-06-22 Dublin Inst Of Technology Photosensitive holographic recording medium comprising glycerol
EP2586814B1 (en) 2010-06-24 2016-01-20 Dainichiseika Color & Chemicals Mfg. Co., Ltd. Self-crosslinkable polyhydroxy polyurethane resin, resinaceous material that contains the resin, process for production of the resin, and imitation leather, surfacing material and weatherstrip material, using the resin
WO2012026338A1 (ja) 2010-08-26 2012-03-01 大日精化工業株式会社 自己架橋型ポリシロキサン変性ポリヒドロキシポリウレタン樹脂、該樹脂を含む樹脂材料、該樹脂の製造方法、該樹脂を用いてなる擬革及び熱可塑性ポリオレフィン表皮材
WO2012137726A1 (ja) 2011-04-04 2012-10-11 大日精化工業株式会社 自己架橋型ポリシロキサン変性ポリヒドロキシポリウレタン樹脂、該樹脂の製造方法、該樹脂を含む樹脂材料および該樹脂を利用した擬革
US10150842B2 (en) * 2014-12-19 2018-12-11 Dow Silicones Corporation Method of preparing condensation cross-linked particles

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE655303A (enExample) * 1963-11-12 1965-03-01
JPS5622325A (en) * 1979-07-31 1981-03-02 Shin Etsu Chem Co Ltd Production of polymerizable organopolysiloxane
JPH08160842A (ja) * 1994-10-03 1996-06-21 Nippon Paint Co Ltd 体積ホログラム記録用感光性組成物、及びそれを用いた記録媒体ならびに体積ホログラム形成方法
WO1998022521A1 (de) * 1996-11-21 1998-05-28 Thera Patent Gmbh & Co. Kg Gesellschaft Für Industrielle Schutzrechte Polymerisierbare massen auf der basis von epoxiden
WO1999026112A1 (en) * 1997-11-13 1999-05-27 Polaroid Corporation Holographic medium and process
JP2001519838A (ja) * 1997-02-04 2001-10-23 ポリセット カンパニー，インク． エポキシシロキサン及びポリエポキシ樹脂のダイス接着剤又はカプセル材
JP2003520879A (ja) * 2000-01-21 2003-07-08 レンセラール ポリテクニック インスティチュート エポキシ−アルコキシ−シロキサンオリゴマー
JP2003534569A (ja) * 2000-05-23 2003-11-18 アプリリス，インコーポレイテッド コロイド状金属を含むデータ保存媒体とその製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5037861A (en) 1989-08-09 1991-08-06 General Electric Company Novel highly reactive silicon-containing epoxides
US5075154A (en) * 1990-03-23 1991-12-24 General Electric Company UV-curable silphenylene-containing epoxy functional silicones
DE4023556A1 (de) * 1990-07-25 1992-01-30 Goldschmidt Ag Th Haertbare epoxygruppen aufweisende organopolysiloxane, verfahren zu ihrer herstellung und ihre verwendung als haertbare beschichtungsmittel mit abhaesiven eigenschaften
JP3015139B2 (ja) * 1991-04-23 2000-03-06 東レ・ダウコーニング・シリコーン株式会社 オルガノポリシロキサンおよびその製造方法
TW268969B (enExample) * 1992-10-02 1996-01-21 Minnesota Mining & Mfg
US5484950A (en) 1992-12-21 1996-01-16 Polyset Company, Inc. Process for selective monoaddition to silanes containing two silicon-hydrogen bonds and products thereof
US5292827A (en) * 1993-02-25 1994-03-08 General Electric Company Epoxy-capped branched silicones and copolymers thereof
WO1997013183A1 (en) 1995-10-06 1997-04-10 Polaroid Corporation Holographic medium and process
US5874187A (en) 1996-08-15 1999-02-23 Lucent Technologies Incorporated Photo recording medium
US6852766B1 (en) * 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
AU2001286860A1 (en) 2000-08-28 2002-03-13 Aprilis, Inc. Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE655303A (enExample) * 1963-11-12 1965-03-01
JPS5622325A (en) * 1979-07-31 1981-03-02 Shin Etsu Chem Co Ltd Production of polymerizable organopolysiloxane
JPH08160842A (ja) * 1994-10-03 1996-06-21 Nippon Paint Co Ltd 体積ホログラム記録用感光性組成物、及びそれを用いた記録媒体ならびに体積ホログラム形成方法
WO1998022521A1 (de) * 1996-11-21 1998-05-28 Thera Patent Gmbh & Co. Kg Gesellschaft Für Industrielle Schutzrechte Polymerisierbare massen auf der basis von epoxiden
JP2001519838A (ja) * 1997-02-04 2001-10-23 ポリセット カンパニー，インク． エポキシシロキサン及びポリエポキシ樹脂のダイス接着剤又はカプセル材
WO1999026112A1 (en) * 1997-11-13 1999-05-27 Polaroid Corporation Holographic medium and process
JP2003520879A (ja) * 2000-01-21 2003-07-08 レンセラール ポリテクニック インスティチュート エポキシ−アルコキシ−シロキサンオリゴマー
JP2003534569A (ja) * 2000-05-23 2003-11-18 アプリリス，インコーポレイテッド コロイド状金属を含むデータ保存媒体とその製造方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009511638A (ja) * 2005-10-18 2009-03-19 ディーシーイー アプリリス，インコーポレイテッド ホログラフィックストレージのための、カチオン重合をサポートするシロキサン化合物を含む光重合可能な媒体
US7977015B2 (en) 2007-02-08 2011-07-12 Fujifilm Corporation Polymerizable compound, optical recording composition, holographic recording medium and method of recording information
WO2015182143A1 (ja) * 2014-05-30 2015-12-03 東レ・ダウコーニング株式会社 有機ケイ素化合物、硬化性シリコーン組成物、および半導体装置
JPWO2015182143A1 (ja) * 2014-05-30 2017-04-27 東レ・ダウコーニング株式会社 有機ケイ素化合物、硬化性シリコーン組成物、および半導体装置
US10125242B2 (en) 2014-05-30 2018-11-13 Dow Corning Toray Co., Ltd. Organosilicon compound, curable silicone composition, and semiconductor device

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Publication number Publication date
AU2001286860A1 (en) 2002-03-13
DE60120432T2 (de) 2007-01-04
WO2002019040A9 (en) 2002-07-25
US7070886B2 (en) 2006-07-04
KR20030045790A (ko) 2003-06-11
CA2424366A1 (en) 2002-03-07
US20100280260A1 (en) 2010-11-04
EP1317498B1 (en) 2006-06-07
DE60120432D1 (de) 2006-07-20
US20020068223A1 (en) 2002-06-06
EP1317498A2 (en) 2003-06-11
US20070293637A1 (en) 2007-12-20
US7332249B2 (en) 2008-02-19
KR100749304B1 (ko) 2007-08-14
WO2002019040A2 (en) 2002-03-07
TWI251000B (en) 2006-03-11
US20040249181A1 (en) 2004-12-09
US6784300B2 (en) 2004-08-31
WO2002019040A3 (en) 2002-05-30
ATE328939T1 (de) 2006-06-15

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