DE60035567D1 - Lithographischer Projektionsapparat mit System zur Positionierung eines Reflektors - Google Patents
Lithographischer Projektionsapparat mit System zur Positionierung eines ReflektorsInfo
- Publication number
- DE60035567D1 DE60035567D1 DE60035567T DE60035567T DE60035567D1 DE 60035567 D1 DE60035567 D1 DE 60035567D1 DE 60035567 T DE60035567 T DE 60035567T DE 60035567 T DE60035567 T DE 60035567T DE 60035567 D1 DE60035567 D1 DE 60035567D1
- Authority
- DE
- Germany
- Prior art keywords
- reflector
- positioning
- lithographic projector
- lithographic
- projector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Toxicology (AREA)
- Atmospheric Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Public Health (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP99204043 | 1999-11-30 | ||
EP99204043 | 1999-11-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60035567D1 true DE60035567D1 (de) | 2007-08-30 |
DE60035567T2 DE60035567T2 (de) | 2008-04-17 |
Family
ID=8240939
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60035567T Expired - Lifetime DE60035567T2 (de) | 1999-11-30 | 2000-11-22 | Lithographischer Projektionsapparat mit System zur Positionierung eines Reflektors |
Country Status (5)
Country | Link |
---|---|
US (2) | US6593585B1 (de) |
JP (2) | JP3931039B2 (de) |
KR (1) | KR100700374B1 (de) |
DE (1) | DE60035567T2 (de) |
TW (1) | TW490598B (de) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW490598B (en) * | 1999-11-30 | 2002-06-11 | Asm Lithography Bv | Lithographic projection apparatus and method of manufacturing a device using a lithographic projection apparatus |
JP4521912B2 (ja) * | 1999-12-27 | 2010-08-11 | キヤノン株式会社 | 露光装置 |
US7778711B2 (en) * | 2001-08-31 | 2010-08-17 | Bio Control Medical (B.C.M.) Ltd. | Reduction of heart rate variability by parasympathetic stimulation |
EP1469348B1 (de) * | 2003-04-14 | 2012-01-18 | ASML Netherlands B.V. | Projektionssystem und Verfahren zu dessen Verwendung |
JP2004343075A (ja) * | 2003-04-14 | 2004-12-02 | Asml Netherlands Bv | 投影システム及びその使用方法 |
EP1480084A1 (de) * | 2003-04-17 | 2004-11-24 | ASML Netherlands B.V. | Lithographischer Projektionsapparat und Verfahren zur Herstellung einer Vorrichtung |
EP1469347A1 (de) * | 2003-04-17 | 2004-10-20 | ASML Netherlands B.V. | Lithographischer Projektionsapparat und Verfahren zur Herstellung einer Vorrichtung |
EP1513018A1 (de) * | 2003-09-04 | 2005-03-09 | ASML Netherlands B.V. | Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung |
CN1879046B (zh) * | 2003-09-12 | 2010-07-14 | 卡尔蔡司Smt股份公司 | 光学元件操纵仪 |
JPWO2005091343A1 (ja) * | 2004-03-23 | 2008-02-07 | 株式会社ニコン | ミラー、位置合わせ方法、光学ユニットの製造方法及び光学ユニット、並びに露光装置 |
WO2006002027A2 (en) | 2004-06-15 | 2006-01-05 | Griffin Analytical Technologies, Inc. | Portable mass spectrometer configured to perform multidimensional mass analysis |
US7256871B2 (en) * | 2004-07-27 | 2007-08-14 | Asml Netherlands B.V. | Lithographic apparatus and method for calibrating the same |
US7151591B2 (en) * | 2004-09-28 | 2006-12-19 | Asml Netherlands B.V. | Alignment system, alignment method, and lithographic apparatus |
US7474384B2 (en) * | 2004-11-22 | 2009-01-06 | Asml Holding N.V. | Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus |
US7307262B2 (en) * | 2004-12-23 | 2007-12-11 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP4752286B2 (ja) * | 2004-12-28 | 2011-08-17 | 株式会社ニコン | 位置調整装置の制御方法、位置調整装置、及び露光装置 |
US7697115B2 (en) * | 2006-06-23 | 2010-04-13 | Asml Holding N.V. | Resonant scanning mirror |
US7992424B1 (en) | 2006-09-14 | 2011-08-09 | Griffin Analytical Technologies, L.L.C. | Analytical instrumentation and sample analysis methods |
KR20080038050A (ko) | 2006-10-27 | 2008-05-02 | 캐논 가부시끼가이샤 | 광학 요소 유지장치 및 노광 장치 |
DE102009034166A1 (de) * | 2008-08-11 | 2010-02-18 | Carl Zeiss Smt Ag | Kontaminationsarme optische Anordnung |
DE102008049616B4 (de) | 2008-09-30 | 2012-03-29 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage für die Mikrolithographie zur Herstellung von Halbleiterbauelementen |
NL2006057A (en) | 2010-02-24 | 2011-08-25 | Asml Netherlands Bv | Lithographic apparatus and method for correcting a position of an stage of a lithographic apparatus. |
JP5645126B2 (ja) * | 2011-01-25 | 2014-12-24 | Nskテクノロジー株式会社 | 露光装置及び露光方法 |
DE102011080408A1 (de) * | 2011-08-04 | 2013-02-07 | Carl Zeiss Smt Gmbh | Semiaktive Kippkorrektur für feste Spiegel |
JP6121524B2 (ja) * | 2012-05-31 | 2017-04-26 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 複数の計測支持ユニットを有する光学結像装置 |
JP6371576B2 (ja) * | 2014-05-02 | 2018-08-08 | キヤノン株式会社 | 光学装置、投影光学系、露光装置、および物品の製造方法 |
US9984943B2 (en) * | 2016-05-16 | 2018-05-29 | Massachusetts Institute Of Technology | Systems and methods for aligning and coupling semiconductor structures |
BR102016020900A2 (pt) * | 2016-09-09 | 2018-03-20 | Cnpem Centro Nac De Pesquisa Em Energia E Materiais | método de controle de grau de liberdade em sistemas mecatrônicos e monocromador de duplo cristal |
EP3530175A1 (de) * | 2018-02-26 | 2019-08-28 | Nokia Technologies Oy | Vorrichtung für optische kohärenztomografie |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3015990A (en) | 1958-08-11 | 1962-01-09 | Optische Ind De Oude Delft Nv | Mounting of optical elements |
US3334959A (en) | 1963-10-17 | 1967-08-08 | Bell Telephone Labor Inc | Adjustable optical device |
US3588230A (en) | 1969-01-13 | 1971-06-28 | Us Navy | Adjustable lens mount |
US3588232A (en) | 1969-12-15 | 1971-06-28 | Us Navy | Precision adjustable assembly for an optical bench mark |
US4023891A (en) | 1975-12-15 | 1977-05-17 | Gte Sylvania Incorporated | Adjustable mirror mount assembly |
DE2903804C2 (de) | 1979-02-01 | 1984-11-22 | Fa. Carl Zeiss, 7920 Heidenheim | Randunterstützungssystem für Teleskopspiegel |
US4268123A (en) | 1979-02-26 | 1981-05-19 | Hughes Aircraft Company | Kinematic mount |
JPS5790607A (en) | 1980-11-28 | 1982-06-05 | Fujitsu Ltd | Optical glass fitting device |
FR2503387B1 (fr) | 1981-04-03 | 1986-05-23 | Reosc | Dispositif de liaison entre une piece optique et un support situe a distance de cette piece |
US4569248A (en) | 1983-10-18 | 1986-02-11 | Storage Technology Partners | Coupling arm for transmitting linear motion |
US4681408A (en) | 1986-04-28 | 1987-07-21 | The Perkin-Elmer Corporation | Adjustable mount for large mirrors |
US4726671A (en) | 1986-06-19 | 1988-02-23 | The Perkin-Elmer Corporation | High resonance adjustable mirror mount |
JP3047983B2 (ja) * | 1990-03-30 | 2000-06-05 | 株式会社日立製作所 | 微細パターン転写方法およびその装置 |
DE69225378T2 (de) * | 1991-09-30 | 1998-09-24 | Canon Kk | Röntgenbelichtungsvorrichtung und Verfahren |
JP3259373B2 (ja) * | 1992-11-27 | 2002-02-25 | 株式会社日立製作所 | 露光方法及び露光装置 |
JPH08181063A (ja) * | 1994-12-26 | 1996-07-12 | Nikon Corp | 露光装置 |
JPH08298239A (ja) | 1995-04-26 | 1996-11-12 | Canon Inc | 走査露光方法及びそれを用いた投影露光装置 |
US5684566A (en) | 1995-05-24 | 1997-11-04 | Svg Lithography Systems, Inc. | Illumination system and method employing a deformable mirror and diffractive optical elements |
US6396067B1 (en) * | 1998-05-06 | 2002-05-28 | Koninklijke Philips Electronics N.V. | Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system |
TW530189B (en) * | 1998-07-01 | 2003-05-01 | Asml Netherlands Bv | Lithographic projection apparatus for imaging of a mask pattern and method of manufacturing a device using a lithographic projection apparatus |
JP2002532895A (ja) * | 1998-12-14 | 2002-10-02 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | Euv照射システム |
US6421573B1 (en) * | 1999-05-27 | 2002-07-16 | Spectra Physics Lasers, Inc. | Quasi-continuous wave lithography apparatus and method |
JP3252834B2 (ja) | 1999-06-21 | 2002-02-04 | 株式会社ニコン | 露光装置及び露光方法 |
TW490598B (en) * | 1999-11-30 | 2002-06-11 | Asm Lithography Bv | Lithographic projection apparatus and method of manufacturing a device using a lithographic projection apparatus |
-
2000
- 2000-11-18 TW TW089124463A patent/TW490598B/zh not_active IP Right Cessation
- 2000-11-22 DE DE60035567T patent/DE60035567T2/de not_active Expired - Lifetime
- 2000-11-28 JP JP2000403605A patent/JP3931039B2/ja not_active Expired - Fee Related
- 2000-11-28 KR KR1020000071346A patent/KR100700374B1/ko not_active IP Right Cessation
- 2000-11-28 US US09/722,398 patent/US6593585B1/en not_active Expired - Lifetime
-
2003
- 2003-03-12 US US10/385,444 patent/US6765218B2/en not_active Expired - Lifetime
-
2005
- 2005-09-16 JP JP2005270205A patent/JP4741915B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US6593585B1 (en) | 2003-07-15 |
US20030168615A1 (en) | 2003-09-11 |
US6765218B2 (en) | 2004-07-20 |
DE60035567T2 (de) | 2008-04-17 |
JP2001351855A (ja) | 2001-12-21 |
JP3931039B2 (ja) | 2007-06-13 |
KR20010051996A (ko) | 2001-06-25 |
TW490598B (en) | 2002-06-11 |
JP2006041551A (ja) | 2006-02-09 |
KR100700374B1 (ko) | 2007-03-27 |
JP4741915B2 (ja) | 2011-08-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |