DE60001691D1 - Katadioptrisches optisches System und Projektionsbelichtungsvorrichtung mit einem solchen System - Google Patents
Katadioptrisches optisches System und Projektionsbelichtungsvorrichtung mit einem solchen SystemInfo
- Publication number
- DE60001691D1 DE60001691D1 DE60001691T DE60001691T DE60001691D1 DE 60001691 D1 DE60001691 D1 DE 60001691D1 DE 60001691 T DE60001691 T DE 60001691T DE 60001691 T DE60001691 T DE 60001691T DE 60001691 D1 DE60001691 D1 DE 60001691D1
- Authority
- DE
- Germany
- Prior art keywords
- exposure device
- projection exposure
- catadioptric optical
- optical system
- catadioptric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0804—Catadioptric systems using two curved mirrors
- G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19946799 | 1999-07-13 | ||
JP19946799A JP4717974B2 (ja) | 1999-07-13 | 1999-07-13 | 反射屈折光学系及び該光学系を備える投影露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60001691D1 true DE60001691D1 (de) | 2003-04-24 |
DE60001691T2 DE60001691T2 (de) | 2004-02-12 |
Family
ID=16408298
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60001691T Expired - Lifetime DE60001691T2 (de) | 1999-07-13 | 2000-07-13 | Katadioptrisches optisches System und Projektionsbelichtungsvorrichtung mit einem solchen System |
DE60026623T Expired - Lifetime DE60026623T2 (de) | 1999-07-13 | 2000-07-13 | Katadioptrisches optisches System und Belichtungsvorrichtung mit einem solchem System |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60026623T Expired - Lifetime DE60026623T2 (de) | 1999-07-13 | 2000-07-13 | Katadioptrisches optisches System und Belichtungsvorrichtung mit einem solchem System |
Country Status (4)
Country | Link |
---|---|
US (1) | US7079314B1 (de) |
EP (2) | EP1069448B1 (de) |
JP (1) | JP4717974B2 (de) |
DE (2) | DE60001691T2 (de) |
Families Citing this family (45)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100854052B1 (ko) * | 1999-12-29 | 2008-08-26 | 칼 짜이스 에스엠테 아게 | 인접한 비구면 렌즈 표면을 구비한 투사 대물 렌즈 |
TW538256B (en) | 2000-01-14 | 2003-06-21 | Zeiss Stiftung | Microlithographic reduction projection catadioptric objective |
JP2001228401A (ja) * | 2000-02-16 | 2001-08-24 | Canon Inc | 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法 |
JP4245286B2 (ja) | 2000-10-23 | 2009-03-25 | 株式会社ニコン | 反射屈折光学系および該光学系を備えた露光装置 |
JP2002217095A (ja) | 2000-11-14 | 2002-08-02 | Canon Inc | 露光装置、半導体デバイス製造方法、半導体製造工場及び露光装置の保守方法並びに位置検出装置 |
JP2004514943A (ja) | 2000-11-28 | 2004-05-20 | カール・ツアイス・エスエムテイ・アーゲー | 157nmリソグラフィ用の反射屈折投影系 |
DE10127227A1 (de) * | 2001-05-22 | 2002-12-05 | Zeiss Carl | Katadioptrisches Reduktionsobjektiv |
US6912042B2 (en) | 2002-03-28 | 2005-06-28 | Carl Zeiss Smt Ag | 6-mirror projection objective with few lenses |
JP3977214B2 (ja) | 2002-09-17 | 2007-09-19 | キヤノン株式会社 | 露光装置 |
JP3984898B2 (ja) | 2002-09-18 | 2007-10-03 | キヤノン株式会社 | 露光装置 |
JP2004205188A (ja) * | 2002-11-07 | 2004-07-22 | Tokyo Elex Kk | 廃棄物の処理方法及び処理装置 |
US7348575B2 (en) | 2003-05-06 | 2008-03-25 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
KR101273713B1 (ko) | 2003-05-06 | 2013-06-12 | 가부시키가이샤 니콘 | 투영 광학계, 노광 장치, 노광 방법 및 디바이스 제조 방법 |
US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
US7466489B2 (en) * | 2003-12-15 | 2008-12-16 | Susanne Beder | Projection objective having a high aperture and a planar end surface |
JP5102492B2 (ja) * | 2003-12-19 | 2012-12-19 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 結晶素子を有するマイクロリソグラフィー投影用対物レンズ |
US7463422B2 (en) * | 2004-01-14 | 2008-12-09 | Carl Zeiss Smt Ag | Projection exposure apparatus |
US20080151364A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
KR101288187B1 (ko) * | 2004-01-14 | 2013-07-19 | 칼 짜이스 에스엠티 게엠베하 | 반사굴절식 투영 대물렌즈 |
WO2005098504A1 (en) * | 2004-04-08 | 2005-10-20 | Carl Zeiss Smt Ag | Imaging system with mirror group |
US8107162B2 (en) | 2004-05-17 | 2012-01-31 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
DE602005008591D1 (de) | 2004-06-10 | 2008-09-11 | Zeiss Carl Smt Ag | Projektionsobjektiv für eine mikrolithographische projektionsbelichtungsvorrichtung |
EP1771771B1 (de) | 2004-07-14 | 2009-12-30 | Carl Zeiss SMT AG | Katadioptrisches projektionsobjektiv |
US7184124B2 (en) | 2004-10-28 | 2007-02-27 | Asml Holding N.V. | Lithographic apparatus having an adjustable projection system and device manufacturing method |
DE102005042005A1 (de) | 2004-12-23 | 2006-07-06 | Carl Zeiss Smt Ag | Hochaperturiges Objektiv mit obskurierter Pupille |
JP2006309220A (ja) | 2005-04-29 | 2006-11-09 | Carl Zeiss Smt Ag | 投影対物レンズ |
EP1746463A2 (de) | 2005-07-01 | 2007-01-24 | Carl Zeiss SMT AG | Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv |
KR101127346B1 (ko) | 2005-09-13 | 2012-03-29 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그라피 투영 광학 시스템, 디바이스 제작 방법 및 광학 표면을 설계하기 위한 방법 |
KR101314974B1 (ko) | 2006-02-17 | 2013-10-04 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래픽 조명 시스템 및 이를 구비한 투사 노출장치 |
DE102006014380A1 (de) | 2006-03-27 | 2007-10-11 | Carl Zeiss Smt Ag | Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille |
US7920338B2 (en) * | 2006-03-28 | 2011-04-05 | Carl Zeiss Smt Gmbh | Reduction projection objective and projection exposure apparatus including the same |
US7738188B2 (en) * | 2006-03-28 | 2010-06-15 | Carl Zeiss Smt Ag | Projection objective and projection exposure apparatus including the same |
EP1852745A1 (de) * | 2006-05-05 | 2007-11-07 | Carl Zeiss SMT AG | Projektionsobjektiv mit hoher NA |
DE102006022958A1 (de) | 2006-05-11 | 2007-11-22 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage, Projektionsbelichtungsverfahren und Verwendung eines Projektionsobjektivs |
EP1890191A1 (de) | 2006-08-14 | 2008-02-20 | Carl Zeiss SMT AG | Katadioptrisches Projektionsobjektiv mit einem Pupillenspiegel |
US20090323739A1 (en) * | 2006-12-22 | 2009-12-31 | Uv Tech Systems | Laser optical system |
DE102007023411A1 (de) | 2006-12-28 | 2008-07-03 | Carl Zeiss Smt Ag | Optisches Element, Beleuchtungsoptik für die Mikrolithographie mit mindestens einem derartigen optischen Element sowie Beleuchtungssystem mit einer derartigen Beleuchtungsoptik |
DE102007019570A1 (de) | 2007-04-25 | 2008-10-30 | Carl Zeiss Smt Ag | Spiegelanordnung, Kontaktierungsanordnung und optisches System |
US7760425B2 (en) | 2007-09-05 | 2010-07-20 | Carl Zeiss Smt Ag | Chromatically corrected catadioptric objective and projection exposure apparatus including the same |
US8345350B2 (en) | 2008-06-20 | 2013-01-01 | Carl Zeiss Smt Gmbh | Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same |
JP5360529B2 (ja) * | 2008-07-01 | 2013-12-04 | 株式会社ニコン | 投影光学系、露光装置、およびデバイス製造方法 |
JP2014194552A (ja) * | 2014-04-28 | 2014-10-09 | Nikon Corp | 反射屈折型の投影光学系、露光装置、および露光方法 |
JP6358242B2 (ja) * | 2015-11-30 | 2018-07-18 | 株式会社ニコン | 露光装置、露光方法、デバイス製造方法およびパターン形成方法 |
CN109814231B (zh) * | 2017-11-20 | 2022-05-17 | 富士胶片株式会社 | 成像光学系统、投射型显示装置及摄像装置 |
JP6525069B2 (ja) * | 2018-01-09 | 2019-06-05 | 株式会社ニコン | 露光装置、露光方法およびデバイス製造方法 |
Family Cites Families (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4293186A (en) | 1977-02-11 | 1981-10-06 | The Perkin-Elmer Corporation | Restricted off-axis field optical system |
US4241390A (en) | 1978-02-06 | 1980-12-23 | The Perkin-Elmer Corporation | System for illuminating an annular field |
US4812028A (en) | 1984-07-23 | 1989-03-14 | Nikon Corporation | Reflection type reduction projection optical system |
JPS61156737A (ja) | 1984-12-27 | 1986-07-16 | Canon Inc | 回路の製造方法及び露光装置 |
GB9020902D0 (en) * | 1990-09-26 | 1990-11-07 | Optics & Vision Ltd | Optical systems,telescopes and binoculars |
US5734496A (en) | 1991-06-03 | 1998-03-31 | Her Majesty The Queen In Right Of New Zealand | Lens system |
JP3298131B2 (ja) | 1991-10-24 | 2002-07-02 | 株式会社ニコン | 縮小投影レンズ |
US5212593A (en) | 1992-02-06 | 1993-05-18 | Svg Lithography Systems, Inc. | Broad band optical reduction system using matched multiple refractive element materials |
JP3278896B2 (ja) | 1992-03-31 | 2002-04-30 | キヤノン株式会社 | 照明装置及びそれを用いた投影露光装置 |
US5287218A (en) * | 1992-04-07 | 1994-02-15 | Hughes Aircraft Company | Re-imaging optical system including refractive and diffractive optical elements |
US5636066A (en) | 1993-03-12 | 1997-06-03 | Nikon Corporation | Optical apparatus |
US5515207A (en) | 1993-11-03 | 1996-05-07 | Nikon Precision Inc. | Multiple mirror catadioptric optical system |
DE4417489A1 (de) | 1994-05-19 | 1995-11-23 | Zeiss Carl Fa | Höchstaperturiges katadioptrisches Reduktionsobjektiv für die Miktrolithographie |
US5488229A (en) * | 1994-10-04 | 1996-01-30 | Excimer Laser Systems, Inc. | Deep ultraviolet microlithography system |
JPH08203812A (ja) | 1995-01-30 | 1996-08-09 | Nikon Corp | 反射屈折縮小投影光学系及び露光装置 |
US5815310A (en) * | 1995-12-12 | 1998-09-29 | Svg Lithography Systems, Inc. | High numerical aperture ring field optical reduction system |
US5737137A (en) | 1996-04-01 | 1998-04-07 | The Regents Of The University Of California | Critical illumination condenser for x-ray lithography |
JPH1020197A (ja) * | 1996-06-28 | 1998-01-23 | Nikon Corp | 反射屈折光学系及びその調整方法 |
US5999310A (en) * | 1996-07-22 | 1999-12-07 | Shafer; David Ross | Ultra-broadband UV microscope imaging system with wide range zoom capability |
US5717518A (en) | 1996-07-22 | 1998-02-10 | Kla Instruments Corporation | Broad spectrum ultraviolet catadioptric imaging system |
DE19639586A1 (de) | 1996-09-26 | 1998-04-02 | Zeiss Carl Fa | Katadioptrisches Mikrolithographie-Reduktionsobjektiv |
US6169627B1 (en) * | 1996-09-26 | 2001-01-02 | Carl-Zeiss-Stiftung | Catadioptric microlithographic reduction objective |
US5956192A (en) * | 1997-09-18 | 1999-09-21 | Svg Lithography Systems, Inc. | Four mirror EUV projection optics |
WO1999052004A1 (fr) | 1998-04-07 | 1999-10-14 | Nikon Corporation | Appareil et procede d'exposition a projection, et systeme optique reflechissant a refraction |
US6600608B1 (en) | 1999-11-05 | 2003-07-29 | Carl-Zeiss-Stiftung | Catadioptric objective comprising two intermediate images |
TW538256B (en) | 2000-01-14 | 2003-06-21 | Zeiss Stiftung | Microlithographic reduction projection catadioptric objective |
JP2001228401A (ja) | 2000-02-16 | 2001-08-24 | Canon Inc | 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法 |
-
1999
- 1999-07-13 JP JP19946799A patent/JP4717974B2/ja not_active Expired - Fee Related
-
2000
- 2000-07-12 US US09/615,081 patent/US7079314B1/en not_active Expired - Fee Related
- 2000-07-13 DE DE60001691T patent/DE60001691T2/de not_active Expired - Lifetime
- 2000-07-13 EP EP00305938A patent/EP1069448B1/de not_active Expired - Lifetime
- 2000-07-13 DE DE60026623T patent/DE60026623T2/de not_active Expired - Lifetime
- 2000-07-13 EP EP03000101A patent/EP1318425B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE60001691T2 (de) | 2004-02-12 |
EP1069448B1 (de) | 2003-03-19 |
EP1069448A1 (de) | 2001-01-17 |
DE60026623T2 (de) | 2007-01-04 |
EP1318425B1 (de) | 2006-03-08 |
EP1318425A3 (de) | 2003-10-29 |
EP1318425A2 (de) | 2003-06-11 |
JP2001027727A (ja) | 2001-01-30 |
US7079314B1 (en) | 2006-07-18 |
JP4717974B2 (ja) | 2011-07-06 |
DE60026623D1 (de) | 2006-05-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |