EP1191378A4 - Reflektiv-refraktives optisches system und dessen verwendung in einer projektionsbelichtungsanlage - Google Patents

Reflektiv-refraktives optisches system und dessen verwendung in einer projektionsbelichtungsanlage

Info

Publication number
EP1191378A4
EP1191378A4 EP01906249A EP01906249A EP1191378A4 EP 1191378 A4 EP1191378 A4 EP 1191378A4 EP 01906249 A EP01906249 A EP 01906249A EP 01906249 A EP01906249 A EP 01906249A EP 1191378 A4 EP1191378 A4 EP 1191378A4
Authority
EP
European Patent Office
Prior art keywords
optical system
reflection
exposure apparatus
projection exposure
refraction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP01906249A
Other languages
English (en)
French (fr)
Other versions
EP1191378A1 (de
Inventor
Yasuhiro Omura
Naomasa Shiraishi
Soichi Owa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of EP1191378A1 publication Critical patent/EP1191378A1/de
Publication of EP1191378A4 publication Critical patent/EP1191378A4/de
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
EP01906249A 2000-03-03 2001-02-22 Reflektiv-refraktives optisches system und dessen verwendung in einer projektionsbelichtungsanlage Withdrawn EP1191378A4 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2000058268 2000-03-03
JP2000058268 2000-03-03
JP2000242096 2000-08-10
JP2000242096 2000-08-10
PCT/JP2001/001350 WO2001065296A1 (fr) 2000-03-03 2001-02-22 Systeme optique de reflexion/refraction et dispositif d'exposition par projection contenant celui-ci

Publications (2)

Publication Number Publication Date
EP1191378A1 EP1191378A1 (de) 2002-03-27
EP1191378A4 true EP1191378A4 (de) 2009-11-04

Family

ID=26586690

Family Applications (1)

Application Number Title Priority Date Filing Date
EP01906249A Withdrawn EP1191378A4 (de) 2000-03-03 2001-02-22 Reflektiv-refraktives optisches system und dessen verwendung in einer projektionsbelichtungsanlage

Country Status (7)

Country Link
US (2) US7301605B2 (de)
EP (1) EP1191378A4 (de)
JP (1) JP4826695B2 (de)
KR (2) KR100823790B1 (de)
SG (1) SG142398A1 (de)
TW (1) TW503466B (de)
WO (1) WO2001065296A1 (de)

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EP1191378A1 (de) 2002-03-27
TW503466B (en) 2002-09-21
WO2001065296A1 (fr) 2001-09-07
US7301605B2 (en) 2007-11-27
US7319508B2 (en) 2008-01-15
JP4826695B2 (ja) 2011-11-30
SG142398A1 (en) 2008-05-28
US20030011755A1 (en) 2003-01-16
KR20020012203A (ko) 2002-02-15
US20070268474A1 (en) 2007-11-22
KR20070048276A (ko) 2007-05-08
KR100823790B1 (ko) 2008-04-21

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