DE602005008591D1 - Projektionsobjektiv für eine mikrolithographische projektionsbelichtungsvorrichtung - Google Patents
Projektionsobjektiv für eine mikrolithographische projektionsbelichtungsvorrichtungInfo
- Publication number
- DE602005008591D1 DE602005008591D1 DE602005008591T DE602005008591T DE602005008591D1 DE 602005008591 D1 DE602005008591 D1 DE 602005008591D1 DE 602005008591 T DE602005008591 T DE 602005008591T DE 602005008591 T DE602005008591 T DE 602005008591T DE 602005008591 D1 DE602005008591 D1 DE 602005008591D1
- Authority
- DE
- Germany
- Prior art keywords
- projection
- exposure device
- microlithographic
- objective
- projection exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/18—Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
- G03F7/706—Aberration measurement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70975—Assembly, maintenance, transport or storage of apparatus
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US57852204P | 2004-06-10 | 2004-06-10 | |
PCT/EP2005/005930 WO2005121899A1 (en) | 2004-06-10 | 2005-06-02 | Projection objective for a microlithographic projection exposure apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602005008591D1 true DE602005008591D1 (de) | 2008-09-11 |
Family
ID=34970291
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602005008591T Active DE602005008591D1 (de) | 2004-06-10 | 2005-06-02 | Projektionsobjektiv für eine mikrolithographische projektionsbelichtungsvorrichtung |
Country Status (6)
Country | Link |
---|---|
US (6) | US8064041B2 (de) |
EP (1) | EP1754110B1 (de) |
JP (2) | JP5629050B2 (de) |
KR (2) | KR101492266B1 (de) |
DE (1) | DE602005008591D1 (de) |
WO (1) | WO2005121899A1 (de) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101492266B1 (ko) | 2004-06-10 | 2015-02-11 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래피 투영 노광 장치를 위한 투영 대물렌즈 |
EP1746463A2 (de) | 2005-07-01 | 2007-01-24 | Carl Zeiss SMT AG | Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv |
WO2007144193A1 (en) | 2006-06-16 | 2007-12-21 | Carl Zeiss Smt Ag | Projection objective of a microlithographic projection exposure apparatus |
US9715214B2 (en) | 2010-09-24 | 2017-07-25 | The Arizona Board Of Regents On Behalf Of The University Of Arizona | Confocal rainbow volume holographic imaging system |
US9436158B2 (en) * | 2011-10-21 | 2016-09-06 | The Arizona Board Of Regents On Behalf Of The University Of Arizona | Volume holographic imaging system (VHIS) endoscope |
DE102012112773B4 (de) * | 2012-12-20 | 2020-04-30 | Jenoptik Optical Systems Gmbh | Verfahren zur Herstellung einer wellenfrontkorrigierten optischen Anordnung aus mindestens zwei optischen Elementen und Verwendung des Verfahrens |
EP2983027A4 (de) | 2013-04-03 | 2017-03-15 | Olympus Corporation | Bildgebungsoptik, beleuchtungsvorrichtung und beobachtungsvorrichtung |
JPWO2016052743A1 (ja) * | 2014-10-03 | 2017-07-27 | オリンパス株式会社 | 光軸方向走査型顕微鏡装置 |
Family Cites Families (38)
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FI81898C (fi) * | 1988-06-23 | 1990-12-10 | Partek Ab | Anordning foer rullning av isolermaterialskikt. |
US5117255A (en) | 1990-09-19 | 1992-05-26 | Nikon Corporation | Projection exposure apparatus |
US5148314A (en) | 1991-06-06 | 1992-09-15 | Chen Chungte W | Optical systems employing refractive and diffractive optical elements to correct for chromatic aberration |
US5592259A (en) | 1991-08-09 | 1997-01-07 | Nikon Corporation | Photomask, an exposure method and a projection exposure apparatus |
US5392119A (en) | 1993-07-13 | 1995-02-21 | Litel Instruments | Plate correction of imaging systems |
JP3341269B2 (ja) | 1993-12-22 | 2002-11-05 | 株式会社ニコン | 投影露光装置、露光方法、半導体の製造方法及び投影光学系の調整方法 |
US6333776B1 (en) | 1994-03-29 | 2001-12-25 | Nikon Corporation | Projection exposure apparatus |
JP3893626B2 (ja) | 1995-01-25 | 2007-03-14 | 株式会社ニコン | 投影光学装置の調整方法、投影光学装置、露光装置及び露光方法 |
US6545746B1 (en) * | 1996-03-04 | 2003-04-08 | Nikon Corporation | Projection exposure apparatus |
EP0824721B1 (de) | 1996-03-07 | 2000-07-26 | Koninklijke Philips Electronics N.V. | Belichtungssystem und belichtungsgerät für uv-lithographie |
US6157498A (en) | 1996-06-19 | 2000-12-05 | Nikon Corporation | Dual-imaging optical system |
DE19639586A1 (de) | 1996-09-26 | 1998-04-02 | Zeiss Carl Fa | Katadioptrisches Mikrolithographie-Reduktionsobjektiv |
JP4192279B2 (ja) | 1996-09-27 | 2008-12-10 | 株式会社ニコン | 投影光学系の製造方法、該製造方法によって製造された投影光学系、投影露光装置および方法、並びに半導体装置の製造方法 |
US6522386B1 (en) | 1997-07-24 | 2003-02-18 | Nikon Corporation | Exposure apparatus having projection optical system with aberration correction element |
JPH1145842A (ja) | 1997-07-24 | 1999-02-16 | Nikon Corp | 投影露光装置と露光方法、該露光装置の調整方法、及び回路デバイス製造方法 |
JP2000091209A (ja) | 1998-09-14 | 2000-03-31 | Nikon Corp | 露光装置の製造方法、露光装置、及びデバイス製造方法 |
US6396067B1 (en) | 1998-05-06 | 2002-05-28 | Koninklijke Philips Electronics N.V. | Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system |
DE19827603A1 (de) | 1998-06-20 | 1999-12-23 | Zeiss Carl Fa | Optisches System, insbesondere Projektions-Belichtungsanlage der Mikrolithographie |
US6867922B1 (en) * | 1999-06-14 | 2005-03-15 | Canon Kabushiki Kaisha | Projection optical system and projection exposure apparatus using the same |
JP4717974B2 (ja) | 1999-07-13 | 2011-07-06 | 株式会社ニコン | 反射屈折光学系及び該光学系を備える投影露光装置 |
US6366389B1 (en) | 1999-08-17 | 2002-04-02 | Michael Wraback | High contrast, ultrafast optically-addressed ultraviolet light modulator based upon optical anisotropy |
JP2001168000A (ja) * | 1999-12-03 | 2001-06-22 | Nikon Corp | 露光装置の製造方法、および該製造方法によって製造された露光装置を用いたマイクロデバイスの製造方法 |
TW538256B (en) | 2000-01-14 | 2003-06-21 | Zeiss Stiftung | Microlithographic reduction projection catadioptric objective |
JP2002250865A (ja) | 2000-06-14 | 2002-09-06 | Nikon Corp | 投影光学系、露光装置、およびそれらの製造方法 |
JP4245286B2 (ja) | 2000-10-23 | 2009-03-25 | 株式会社ニコン | 反射屈折光学系および該光学系を備えた露光装置 |
JP2004514943A (ja) | 2000-11-28 | 2004-05-20 | カール・ツアイス・エスエムテイ・アーゲー | 157nmリソグラフィ用の反射屈折投影系 |
JP4552337B2 (ja) | 2000-12-28 | 2010-09-29 | 株式会社ニコン | 投影光学系の製造方法及び露光装置の製造方法 |
DE10120446C2 (de) * | 2001-04-26 | 2003-04-17 | Zeiss Carl | Projektionsbelichtungsanlage sowie Verfahren zur Kompensation von Abbildungsfehlern in einer Projektionsbelichtungsanlage, insbesondere für die Mikro-Lithographie |
WO2002093231A1 (en) | 2001-05-15 | 2002-11-21 | Industrial Research Limited | Optical imaging system with aberration correcting means |
EP1306698A1 (de) * | 2001-10-26 | 2003-05-02 | Nikon Corporation | Mehrschichtige Spiegel für EUV, Verfahren zu deren Herstellung und diese enthaltende optische Systeme |
EP1369608A3 (de) | 2002-05-23 | 2005-06-01 | Nsk Ltd | Linearführung |
WO2004010164A2 (en) | 2002-07-18 | 2004-01-29 | Carl Zeiss Smt Ag | Catadioptric projection objective |
EP1532489A2 (de) * | 2002-08-23 | 2005-05-25 | Nikon Corporation | Optisches projektionssystem, photolithographische methode, belichtungsapparat und belichtungsmethode unter verwendung dieses belichtungsapparats |
DE10258715B4 (de) | 2002-12-10 | 2006-12-21 | Carl Zeiss Smt Ag | Verfahren zur Herstellung eines optischen Abbildungssystems |
KR101516141B1 (ko) | 2003-05-06 | 2015-05-04 | 가부시키가이샤 니콘 | 투영 광학계, 노광 장치 및 노광 방법 |
JP2005064310A (ja) | 2003-08-18 | 2005-03-10 | Nikon Corp | 光学系の収差調整方法、光学系、露光装置および露光方法 |
KR101492266B1 (ko) | 2004-06-10 | 2015-02-11 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래피 투영 노광 장치를 위한 투영 대물렌즈 |
EP1746463A2 (de) | 2005-07-01 | 2007-01-24 | Carl Zeiss SMT AG | Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv |
-
2005
- 2005-06-02 KR KR1020067025324A patent/KR101492266B1/ko active IP Right Grant
- 2005-06-02 KR KR1020127024577A patent/KR101500052B1/ko active IP Right Grant
- 2005-06-02 DE DE602005008591T patent/DE602005008591D1/de active Active
- 2005-06-02 EP EP05751684A patent/EP1754110B1/de not_active Expired - Fee Related
- 2005-06-02 WO PCT/EP2005/005930 patent/WO2005121899A1/en active IP Right Grant
- 2005-06-02 US US11/570,263 patent/US8064041B2/en active Active
- 2005-06-02 JP JP2007526253A patent/JP5629050B2/ja not_active Expired - Fee Related
-
2011
- 2011-10-13 US US13/272,440 patent/US8902407B2/en active Active
-
2013
- 2013-06-18 JP JP2013127604A patent/JP5681236B2/ja not_active Expired - Fee Related
-
2014
- 2014-10-06 US US14/506,992 patent/US9280058B2/en active Active
-
2016
- 2016-01-28 US US15/008,519 patent/US9588445B2/en not_active Expired - Fee Related
-
2017
- 2017-01-20 US US15/411,015 patent/US9977338B2/en not_active Expired - Fee Related
-
2018
- 2018-04-26 US US15/963,278 patent/US20180373155A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US8902407B2 (en) | 2014-12-02 |
JP2013228751A (ja) | 2013-11-07 |
KR101500052B1 (ko) | 2015-03-09 |
KR101492266B1 (ko) | 2015-02-11 |
US20160282729A1 (en) | 2016-09-29 |
US9588445B2 (en) | 2017-03-07 |
US20080123069A1 (en) | 2008-05-29 |
US20150055109A1 (en) | 2015-02-26 |
JP5681236B2 (ja) | 2015-03-04 |
US9280058B2 (en) | 2016-03-08 |
KR20120130229A (ko) | 2012-11-29 |
EP1754110A1 (de) | 2007-02-21 |
EP1754110B1 (de) | 2008-07-30 |
US9977338B2 (en) | 2018-05-22 |
KR20070020059A (ko) | 2007-02-16 |
WO2005121899A1 (en) | 2005-12-22 |
US20170227853A1 (en) | 2017-08-10 |
US20180373155A1 (en) | 2018-12-27 |
JP5629050B2 (ja) | 2014-11-19 |
US8064041B2 (en) | 2011-11-22 |
JP2008502012A (ja) | 2008-01-24 |
US20120033296A1 (en) | 2012-02-09 |
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Legal Events
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8327 | Change in the person/name/address of the patent owner |
Owner name: CARL ZEISS SMT GMBH, 73447 OBERKOCHEN, DE |