DE602004017385D1 - Optisches Projektionssystem für maskenlose Lithographie - Google Patents

Optisches Projektionssystem für maskenlose Lithographie

Info

Publication number
DE602004017385D1
DE602004017385D1 DE602004017385T DE602004017385T DE602004017385D1 DE 602004017385 D1 DE602004017385 D1 DE 602004017385D1 DE 602004017385 T DE602004017385 T DE 602004017385T DE 602004017385 T DE602004017385 T DE 602004017385T DE 602004017385 D1 DE602004017385 D1 DE 602004017385D1
Authority
DE
Germany
Prior art keywords
projection system
optical projection
maskless lithography
maskless
lithography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602004017385T
Other languages
English (en)
Inventor
Stanislav Smirnov
Mark Oskotsky
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Holding NV
Original Assignee
ASML Holding NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Holding NV filed Critical ASML Holding NV
Publication of DE602004017385D1 publication Critical patent/DE602004017385D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
DE602004017385T 2003-06-24 2004-06-22 Optisches Projektionssystem für maskenlose Lithographie Active DE602004017385D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/602,069 US7110082B2 (en) 2003-06-24 2003-06-24 Optical system for maskless lithography

Publications (1)

Publication Number Publication Date
DE602004017385D1 true DE602004017385D1 (de) 2008-12-11

Family

ID=33418617

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004017385T Active DE602004017385D1 (de) 2003-06-24 2004-06-22 Optisches Projektionssystem für maskenlose Lithographie

Country Status (7)

Country Link
US (1) US7110082B2 (de)
EP (1) EP1491958B1 (de)
JP (1) JP4130814B2 (de)
KR (1) KR100818321B1 (de)
CN (1) CN1573572A (de)
DE (1) DE602004017385D1 (de)
TW (1) TWI269121B (de)

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CN100433254C (zh) * 2004-02-12 2008-11-12 富士胶片株式会社 图案形成方法
US7469058B2 (en) * 2005-01-28 2008-12-23 Asml Holding N.V. Method and system for a maskless lithography rasterization technique based on global optimization
GB0510470D0 (en) 2005-05-23 2005-06-29 Qinetiq Ltd Coded aperture imaging system
US7283289B2 (en) * 2005-07-30 2007-10-16 Hewlett-Packard Development Company, L.P. Projection system modulator reducing distortion and field curvature effects of projection system lens
CN100349024C (zh) * 2005-11-17 2007-11-14 苏州大学 微光变图像的激光直写方法及装置
GB2434936A (en) 2006-02-06 2007-08-08 Qinetiq Ltd Imaging system having plural distinct coded aperture arrays at different mask locations
GB2434934A (en) 2006-02-06 2007-08-08 Qinetiq Ltd Processing coded aperture image data by applying weightings to aperture functions and data frames
GB2434935A (en) 2006-02-06 2007-08-08 Qinetiq Ltd Coded aperture imager using reference object to form decoding pattern
GB0602380D0 (en) 2006-02-06 2006-03-15 Qinetiq Ltd Imaging system
GB2434877A (en) 2006-02-06 2007-08-08 Qinetiq Ltd MOEMS optical modulator
GB2434937A (en) 2006-02-06 2007-08-08 Qinetiq Ltd Coded aperture imaging apparatus performing image enhancement
US7936445B2 (en) * 2006-06-19 2011-05-03 Asml Netherlands B.V. Altering pattern data based on measured optical element characteristics
GB0615040D0 (en) 2006-07-28 2006-09-06 Qinetiq Ltd Processing method for coded apperture sensor
NL2004483A (nl) * 2009-05-26 2010-11-30 Asml Holding Nv Pulse stretcher with reduced energy density on optical components.
US9411246B2 (en) 2011-06-30 2016-08-09 Nikon Corporation Full-field maskless lithography projection optics
US9638906B2 (en) 2013-11-22 2017-05-02 Nikon Corporation Catadioptric imaging systems for digital scanner
US9703085B2 (en) 2013-11-22 2017-07-11 Nikon Corporation Catadioptric imaging systems for digital scanner
KR102262216B1 (ko) 2014-05-07 2021-06-08 삼성전자주식회사 광변조기 및 이를 적용한 디지털 노광 장치
WO2016086226A1 (en) 2014-11-26 2016-06-02 Massachusetts Institute Of Technology Systems, devices, and methods for printing on three-dimensional objects
CN107797436B (zh) * 2016-09-05 2020-03-13 京东方科技集团股份有限公司 全息显示装置及其显示方法

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EP0527166B1 (de) * 1990-05-02 1995-06-14 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Belichtungsvorrichtung
US5229872A (en) * 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
US6219015B1 (en) * 1992-04-28 2001-04-17 The Board Of Directors Of The Leland Stanford, Junior University Method and apparatus for using an array of grating light valves to produce multicolor optical images
JP3224041B2 (ja) * 1992-07-29 2001-10-29 株式会社ニコン 露光方法及び装置
JPH06110213A (ja) * 1992-09-25 1994-04-22 Dainippon Screen Mfg Co Ltd 画像記録装置
US5396364A (en) * 1992-10-30 1995-03-07 Hughes Aircraft Company Continuously operated spatial light modulator apparatus and method for adaptive optics
US5729331A (en) * 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
JP3339149B2 (ja) * 1993-12-08 2002-10-28 株式会社ニコン 走査型露光装置ならびに露光方法
US5677703A (en) * 1995-01-06 1997-10-14 Texas Instruments Incorporated Data loading circuit for digital micro-mirror device
US5530482A (en) * 1995-03-21 1996-06-25 Texas Instruments Incorporated Pixel data processing for spatial light modulator having staggered pixels
EP0991959B1 (de) * 1996-02-28 2004-06-23 Kenneth C. Johnson Mikrolinsen-rastereinrichtung für mikrolithografie und für konfokale mikroskopie mit grossem aufnahmefeld
US5691541A (en) * 1996-05-14 1997-11-25 The Regents Of The University Of California Maskless, reticle-free, lithography
EP0956516B1 (de) 1997-01-29 2002-04-10 Micronic Laser Systems Ab Verfahren und gerät zur erzeugung eines musters auf einem mit fotoresist beschichteten substrat mittels fokusiertem laserstrahl
US6177980B1 (en) * 1997-02-20 2001-01-23 Kenneth C. Johnson High-throughput, maskless lithography system
SE509062C2 (sv) 1997-02-28 1998-11-30 Micronic Laser Systems Ab Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster
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US6291110B1 (en) * 1997-06-27 2001-09-18 Pixelligent Technologies Llc Methods for transferring a two-dimensional programmable exposure pattern for photolithography
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US6251550B1 (en) 1998-07-10 2001-06-26 Ball Semiconductor, Inc. Maskless photolithography system that digitally shifts mask data responsive to alignment data
JP2000056399A (ja) 1998-08-04 2000-02-25 Noritsu Koki Co Ltd 写真焼付装置
US6356340B1 (en) * 1998-11-20 2002-03-12 Advanced Micro Devices, Inc. Piezo programmable reticle for EUV lithography
US6424404B1 (en) * 1999-01-11 2002-07-23 Kenneth C. Johnson Multi-stage microlens array
TW520526B (en) * 2000-05-22 2003-02-11 Nikon Corp Exposure apparatus, method for manufacturing thereof, method for exposing and method for manufacturing micro-device
US6696008B2 (en) * 2000-05-25 2004-02-24 Westar Photonics Inc. Maskless laser beam patterning ablation of multilayered structures with continuous monitoring of ablation
US6416908B1 (en) * 2000-06-29 2002-07-09 Anvik Corporation Projection lithography on curved substrates
WO2002042825A1 (en) * 2000-11-22 2002-05-30 Ball Semiconductor, Inc. Light modulation device and system
US6624880B2 (en) * 2001-01-18 2003-09-23 Micronic Laser Systems Ab Method and apparatus for microlithography
TW529172B (en) * 2001-07-24 2003-04-21 Asml Netherlands Bv Imaging apparatus
JP3563384B2 (ja) * 2001-11-08 2004-09-08 大日本スクリーン製造株式会社 画像記録装置
US6707534B2 (en) * 2002-05-10 2004-03-16 Anvik Corporation Maskless conformable lithography
KR100545297B1 (ko) * 2002-06-12 2006-01-24 에이에스엠엘 네델란즈 비.브이. 리소그래피장치 및 디바이스 제조방법
US6870554B2 (en) * 2003-01-07 2005-03-22 Anvik Corporation Maskless lithography with multiplexed spatial light modulators
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Also Published As

Publication number Publication date
CN1573572A (zh) 2005-02-02
KR20050001385A (ko) 2005-01-06
JP2005020001A (ja) 2005-01-20
TW200508814A (en) 2005-03-01
US7110082B2 (en) 2006-09-19
JP4130814B2 (ja) 2008-08-06
TWI269121B (en) 2006-12-21
US20040263813A1 (en) 2004-12-30
EP1491958B1 (de) 2008-10-29
EP1491958A3 (de) 2006-11-02
EP1491958A2 (de) 2004-12-29
KR100818321B1 (ko) 2008-04-01

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