DE60326532D1 - Katadioptrische Projektionsanlage für die Lithographie mit einer nichtinvertierenden Strahlteileranordnung - Google Patents
Katadioptrische Projektionsanlage für die Lithographie mit einer nichtinvertierenden StrahlteileranordnungInfo
- Publication number
- DE60326532D1 DE60326532D1 DE60326532T DE60326532T DE60326532D1 DE 60326532 D1 DE60326532 D1 DE 60326532D1 DE 60326532 T DE60326532 T DE 60326532T DE 60326532 T DE60326532 T DE 60326532T DE 60326532 D1 DE60326532 D1 DE 60326532D1
- Authority
- DE
- Germany
- Prior art keywords
- lithography
- inverting
- beam splitter
- projection system
- catadioptric projection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70941—Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/307,407 US6731374B1 (en) | 2002-12-02 | 2002-12-02 | Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60326532D1 true DE60326532D1 (de) | 2009-04-23 |
Family
ID=32176250
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60326532T Expired - Fee Related DE60326532D1 (de) | 2002-12-02 | 2003-11-27 | Katadioptrische Projektionsanlage für die Lithographie mit einer nichtinvertierenden Strahlteileranordnung |
Country Status (8)
Country | Link |
---|---|
US (3) | US6731374B1 (de) |
EP (1) | EP1426825B1 (de) |
JP (1) | JP4178098B2 (de) |
KR (1) | KR100575499B1 (de) |
CN (1) | CN100458566C (de) |
DE (1) | DE60326532D1 (de) |
SG (1) | SG106162A1 (de) |
TW (1) | TW200410054A (de) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6995930B2 (en) | 1999-12-29 | 2006-02-07 | Carl Zeiss Smt Ag | Catadioptric projection objective with geometric beam splitting |
TW538256B (en) * | 2000-01-14 | 2003-06-21 | Zeiss Stiftung | Microlithographic reduction projection catadioptric objective |
US6731374B1 (en) * | 2002-12-02 | 2004-05-04 | Asml Holding N.V. | Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system |
US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
DE602005008707D1 (de) * | 2004-01-14 | 2008-09-18 | Zeiss Carl Smt Ag | Catadioptrisches projektionsobjektiv |
US20080151365A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
KR20170129271A (ko) | 2004-05-17 | 2017-11-24 | 칼 짜이스 에스엠티 게엠베하 | 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 |
US20060072207A1 (en) * | 2004-09-30 | 2006-04-06 | Williams David L | Method and apparatus for polarizing electromagnetic radiation |
KR20070102533A (ko) * | 2005-02-03 | 2007-10-18 | 칼 짜이스 에스엠테 아게 | 중간 이미지를 갖는 카타디옵트릭 투사 대물렌즈 |
US20090115986A1 (en) * | 2005-06-02 | 2009-05-07 | Carl Zeiss Smt Ag | Microlithography projection objective |
KR100714780B1 (ko) * | 2005-09-08 | 2007-05-04 | 한국기초과학지원연구원 | 노이즈 저감형 빔 라인 |
DE102007055567A1 (de) * | 2007-11-20 | 2009-05-28 | Carl Zeiss Smt Ag | Optisches System |
US20090233456A1 (en) * | 2008-03-17 | 2009-09-17 | Sony Corporation | Irradiation optical system, irradiation apparatus and fabrication method for semiconductor device |
CN104867414A (zh) * | 2015-06-01 | 2015-08-26 | 安徽禄讯电子科技有限公司 | 一种具有数字显示屏功能的分划板及其制造方法 |
JP6678253B2 (ja) * | 2016-06-03 | 2020-04-08 | エーエスエムエル ホールディング エヌ.ブイ. | アライメントシステムウェーハスタックビーム分析器 |
TWI633356B (zh) * | 2017-07-12 | 2018-08-21 | 志聖工業股份有限公司 | 全內反射鏡與套筒結合應用於曝光機光源模組 |
CN207799321U (zh) | 2018-01-26 | 2018-08-31 | 中强光电股份有限公司 | 投影装置及照明系统 |
KR20220137767A (ko) * | 2020-02-25 | 2022-10-12 | 가부시키가이샤 니콘 | 광학 지연 시스템 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5089913A (en) * | 1990-07-11 | 1992-02-18 | International Business Machines Corporation | High resolution reduction catadioptric relay lens |
JPH06181161A (ja) * | 1992-12-14 | 1994-06-28 | Canon Inc | 反射屈折型光学系及び該光学系を備える投影露光装置 |
US5592329A (en) * | 1993-02-03 | 1997-01-07 | Nikon Corporation | Catadioptric optical system |
US5636066A (en) * | 1993-03-12 | 1997-06-03 | Nikon Corporation | Optical apparatus |
JP3395801B2 (ja) * | 1994-04-28 | 2003-04-14 | 株式会社ニコン | 反射屈折投影光学系、走査型投影露光装置、及び走査投影露光方法 |
US5793473A (en) * | 1994-06-09 | 1998-08-11 | Nikon Corporation | Projection optical apparatus for projecting a mask pattern onto the surface of a target projection object and projection exposure apparatus using the same |
JPH08179216A (ja) * | 1994-12-27 | 1996-07-12 | Nikon Corp | 反射屈折光学系 |
JPH09246179A (ja) * | 1996-03-13 | 1997-09-19 | Canon Inc | 投影露光装置及びそれを用いたデバイスの製造方法 |
JPH09293676A (ja) * | 1996-04-24 | 1997-11-11 | Nikon Corp | 投影光学系及び投影露光装置 |
JPH10301058A (ja) * | 1997-04-30 | 1998-11-13 | Nikon Corp | 反射屈折投影光学系 |
JPH11326767A (ja) * | 1998-05-07 | 1999-11-26 | Nikon Corp | 反射屈折縮小光学系 |
EP1102100A3 (de) * | 1999-11-12 | 2003-12-10 | Carl Zeiss | Katadioptrisches Objektiv mit physikalischem Strahlteiler |
DE10005189A1 (de) * | 2000-02-05 | 2001-08-09 | Zeiss Carl | Projektionsbelichtungsanlage mit reflektivem Retikel |
US6480330B1 (en) * | 2000-02-24 | 2002-11-12 | Silicon Valley Group, Inc. | Ultraviolet polarization beam splitter for microlithography |
AU2001257191A1 (en) * | 2000-04-25 | 2001-11-07 | Silicon Valley Group Inc | Optical reduction system with elimination of reticle diffraction induced bias |
CN2432001Y (zh) * | 2000-06-21 | 2001-05-30 | 中国科学院光电技术研究所 | 一种激光干涉光刻系统 |
DE10117481A1 (de) * | 2001-04-07 | 2002-10-10 | Zeiss Carl | Katadioptrisches Projektionsobjektiv |
DE10127227A1 (de) * | 2001-05-22 | 2002-12-05 | Zeiss Carl | Katadioptrisches Reduktionsobjektiv |
US6757110B2 (en) | 2002-05-29 | 2004-06-29 | Asml Holding N.V. | Catadioptric lithography system and method with reticle stage orthogonal to wafer stage |
US6731374B1 (en) | 2002-12-02 | 2004-05-04 | Asml Holding N.V. | Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system |
-
2002
- 2002-12-02 US US10/307,407 patent/US6731374B1/en not_active Expired - Fee Related
-
2003
- 2003-11-26 SG SG200306876A patent/SG106162A1/en unknown
- 2003-11-27 DE DE60326532T patent/DE60326532D1/de not_active Expired - Fee Related
- 2003-11-27 EP EP03027402A patent/EP1426825B1/de not_active Expired - Fee Related
- 2003-11-27 TW TW092133408A patent/TW200410054A/zh unknown
- 2003-12-02 CN CNB2003101187498A patent/CN100458566C/zh not_active Expired - Fee Related
- 2003-12-02 JP JP2003402723A patent/JP4178098B2/ja not_active Expired - Fee Related
- 2003-12-02 KR KR1020030086788A patent/KR100575499B1/ko not_active IP Right Cessation
-
2004
- 2004-03-24 US US10/807,268 patent/US6972830B2/en not_active Expired - Fee Related
-
2005
- 2005-11-14 US US11/272,147 patent/US7199862B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR100575499B1 (ko) | 2006-05-03 |
TW200410054A (en) | 2004-06-16 |
CN100458566C (zh) | 2009-02-04 |
US20060061748A1 (en) | 2006-03-23 |
US20040174617A1 (en) | 2004-09-09 |
CN1504829A (zh) | 2004-06-16 |
US7199862B2 (en) | 2007-04-03 |
EP1426825A2 (de) | 2004-06-09 |
SG106162A1 (en) | 2004-09-30 |
US6972830B2 (en) | 2005-12-06 |
US6731374B1 (en) | 2004-05-04 |
EP1426825A3 (de) | 2006-02-22 |
EP1426825B1 (de) | 2009-03-11 |
JP2004186689A (ja) | 2004-07-02 |
JP4178098B2 (ja) | 2008-11-12 |
KR20040048359A (ko) | 2004-06-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE60326532D1 (de) | Katadioptrische Projektionsanlage für die Lithographie mit einer nichtinvertierenden Strahlteileranordnung | |
DE50208750D1 (de) | Reflektives Projektionsobjektiv für EUV-Photolithographie | |
DE60028245D1 (de) | Projektionsobjektiv für mikrolithographische reduzierung | |
DE60206908D1 (de) | Projektionssystem für die extrem-ultraviolettlithographie | |
DE59909289D1 (de) | Beleuchtungssystem insbesondere für die EUV-Lithographie | |
DE59912871D1 (de) | Ringfeld-4-Spiegelsysteme mit konvexem Primärspiegel für die EUV-Lithographie | |
DE602004017385D1 (de) | Optisches Projektionssystem für maskenlose Lithographie | |
DE60039847D1 (de) | Wärmeverwaltung für EUV-Retikel | |
DE60201622D1 (de) | Verschiebungsmechanismus für ein Projektionsobjektiv | |
DE60106966D1 (de) | Beleuchtungssystem insbesondere für microlithographie | |
DE60337026D1 (de) | Beleuchtungsanordnung für eine projektionsvorrichtung | |
DE60237515D1 (de) | Laserspektraltechnik für einen lithographischen prozess | |
DE59911798D1 (de) | Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie, mit einer optischen Halterung mit Aktuatoren | |
DE50112921D1 (de) | Projektionsbelichtungsanlage mit reflektivem Retikel | |
DE502004003257D1 (de) | Druckmittelbetriebene Bremsanlage für ein Fahrzeug | |
DE602005016768D1 (de) | Messsystem für Knotenposition | |
DE60035567D1 (de) | Lithographischer Projektionsapparat mit System zur Positionierung eines Reflektors | |
DE602004027193D1 (de) | System für die Immersionsphotolithographie mit Mikrokanaldüsen | |
ECSP088352A (es) | Derivados de indol 1,3-disustituido para su uso como moduladores de ppar | |
DE60001981T2 (de) | Erzeugung eines dichten nebels von mikrometrischen tröpfchen insbesondere für die euv- lithographie | |
DE60224122D1 (de) | Fern-Berichtsystem für ein Fahrzeug | |
EP1904818A4 (de) | Systeme und verfahren für euv-lichtquellenmetrologie | |
DE69804761D1 (de) | Dreibeinstativ, insbesondere für Photographie | |
DE60311350D1 (de) | Target-Führunggsystem für einen Tröpfchengenerator in einer EUV Plasmaquelle | |
DE60127050D1 (de) | Lithographischer Projektionsapparat |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |