DE60311350D1 - Target-Führunggsystem für einen Tröpfchengenerator in einer EUV Plasmaquelle - Google Patents

Target-Führunggsystem für einen Tröpfchengenerator in einer EUV Plasmaquelle

Info

Publication number
DE60311350D1
DE60311350D1 DE60311350T DE60311350T DE60311350D1 DE 60311350 D1 DE60311350 D1 DE 60311350D1 DE 60311350 T DE60311350 T DE 60311350T DE 60311350 T DE60311350 T DE 60311350T DE 60311350 D1 DE60311350 D1 DE 60311350D1
Authority
DE
Germany
Prior art keywords
plasma source
guidance system
droplet generator
target guidance
euv plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60311350T
Other languages
English (en)
Other versions
DE60311350T2 (de
Inventor
Michael B Petach
Steven W Fornaca
Rocco A Orsini
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of Central Florida Research Foundation Inc UCFRF
Original Assignee
University of Central Florida Research Foundation Inc UCFRF
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of Central Florida Research Foundation Inc UCFRF filed Critical University of Central Florida Research Foundation Inc UCFRF
Application granted granted Critical
Publication of DE60311350D1 publication Critical patent/DE60311350D1/de
Publication of DE60311350T2 publication Critical patent/DE60311350T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Plasma Technology (AREA)
DE60311350T 2002-05-28 2003-05-20 Target-Führunggsystem für einen Tröpfchengenerator in einer EUV Plasmaquelle Expired - Lifetime DE60311350T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US157222 2002-05-28
US10/157,222 US6792076B2 (en) 2002-05-28 2002-05-28 Target steering system for EUV droplet generators

Publications (2)

Publication Number Publication Date
DE60311350D1 true DE60311350D1 (de) 2007-03-15
DE60311350T2 DE60311350T2 (de) 2007-07-12

Family

ID=29419637

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60311350T Expired - Lifetime DE60311350T2 (de) 2002-05-28 2003-05-20 Target-Führunggsystem für einen Tröpfchengenerator in einer EUV Plasmaquelle

Country Status (4)

Country Link
US (1) US6792076B2 (de)
EP (1) EP1367867B1 (de)
JP (1) JP4340780B2 (de)
DE (1) DE60311350T2 (de)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7598509B2 (en) * 2004-11-01 2009-10-06 Cymer, Inc. Laser produced plasma EUV light source
US7897947B2 (en) 2007-07-13 2011-03-01 Cymer, Inc. Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave
US8653437B2 (en) * 2010-10-04 2014-02-18 Cymer, Llc EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
JP4174626B2 (ja) * 2002-07-19 2008-11-05 株式会社島津製作所 Ｘ線発生装置
DE10339495B4 (de) * 2002-10-08 2007-10-04 Xtreme Technologies Gmbh Anordnung zur optischen Detektion eines bewegten Targetstromes für eine gepulste energiestrahlgepumpte Strahlungserzeugung
DE10260376A1 (de) * 2002-12-13 2004-07-15 Forschungsverbund Berlin E.V. Vorrichtung und Verfahren zur Erzeugung eines Tröpfchen-Targets
JP4917014B2 (ja) * 2004-03-10 2012-04-18 サイマー インコーポレイテッド Ｅｕｖ光源
US7164144B2 (en) * 2004-03-10 2007-01-16 Cymer Inc. EUV light source
US7087914B2 (en) * 2004-03-17 2006-08-08 Cymer, Inc High repetition rate laser produced plasma EUV light source
JP4574211B2 (ja) * 2004-04-19 2010-11-04 キヤノン株式会社 光源装置、当該光源装置を有する露光装置
DE102004042501A1 (de) * 2004-08-31 2006-03-16 Xtreme Technologies Gmbh Vorrichtung zur Bereitstellung eines reproduzierbaren Targetstromes für die energiestrahlinduzierte Erzeugung kurzwelliger elektromagnetischer Strahlung
JP2006128157A (ja) * 2004-10-26 2006-05-18 Komatsu Ltd 極端紫外光源装置用ドライバレーザシステム
JP4564369B2 (ja) 2005-02-04 2010-10-20 株式会社小松製作所 極端紫外光源装置
US7718985B1 (en) 2005-11-01 2010-05-18 University Of Central Florida Research Foundation, Inc. Advanced droplet and plasma targeting system
JP5156192B2 (ja) * 2006-01-24 2013-03-06 ギガフォトン株式会社 極端紫外光源装置
JP5126806B2 (ja) * 2006-09-12 2013-01-23 一般財団法人電力中央研究所 高エネルギー粒子発生装置及び管状部材非破壊検査装置並びに高エネルギー粒子発生方法
US20080237498A1 (en) * 2007-01-29 2008-10-02 Macfarlane Joseph J High-efficiency, low-debris short-wavelength light sources
US8901521B2 (en) 2007-08-23 2014-12-02 Asml Netherlands B.V. Module and method for producing extreme ultraviolet radiation
JP5612579B2 (ja) * 2009-07-29 2014-10-22 ギガフォトン株式会社 極端紫外光源装置、極端紫外光源装置の制御方法、およびそのプログラムを記録した記録媒体
WO2011116898A1 (en) * 2010-03-25 2011-09-29 Eth Zurich Steering device for controlling the direction and/or velocity of droplets of a target material and extreme euv source with such a steering device
JP5075951B2 (ja) * 2010-07-16 2012-11-21 ギガフォトン株式会社 極端紫外光源装置及びドライバレーザシステム
US9279445B2 (en) 2011-12-16 2016-03-08 Asml Netherlands B.V. Droplet generator steering system
JP5563012B2 (ja) * 2012-04-18 2014-07-30 ギガフォトン株式会社 極端紫外光源装置
WO2014006193A1 (en) 2012-07-06 2014-01-09 ETH Zürich Method for controlling an interaction between droplet targets and a laser and apparatus for conducting said method
WO2014019803A1 (en) * 2012-08-01 2014-02-06 Asml Netherlands B.V. Method and apparatus for generating radiation
JP6058324B2 (ja) * 2012-09-11 2017-01-11 ギガフォトン株式会社 ターゲット供給装置の制御方法、および、ターゲット供給装置
WO2014161698A1 (en) 2013-04-05 2014-10-09 Asml Netherlands B.V. Source collector apparatus, lithographic apparatus and method
US10499485B2 (en) * 2017-06-20 2019-12-03 Asml Netherlands B.V. Supply system for an extreme ultraviolet light source
US11550233B2 (en) 2018-08-14 2023-01-10 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography system and operation method thereof

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3586244T2 (de) * 1984-12-26 2000-04-20 Toshiba Kawasaki Kk Vorrichtung zur Erzeugung von Weich-Röntgenstrahlen durch ein Hochenergiebündel.
US5577091A (en) * 1994-04-01 1996-11-19 University Of Central Florida Water laser plasma x-ray point sources
US5577092A (en) * 1995-01-25 1996-11-19 Kublak; Glenn D. Cluster beam targets for laser plasma extreme ultraviolet and soft x-ray sources
SE510133C2 (sv) * 1996-04-25 1999-04-19 Jettec Ab Laser-plasma röntgenkälla utnyttjande vätskor som strålmål
US6377651B1 (en) 1999-10-11 2002-04-23 University Of Central Florida Laser plasma source for extreme ultraviolet lithography using a water droplet target
US6324256B1 (en) 2000-08-23 2001-11-27 Trw Inc. Liquid sprays as the target for a laser-plasma extreme ultraviolet light source

Also Published As

Publication number Publication date
US20030223541A1 (en) 2003-12-04
JP4340780B2 (ja) 2009-10-07
DE60311350T2 (de) 2007-07-12
US6792076B2 (en) 2004-09-14
EP1367867A1 (de) 2003-12-03
EP1367867B1 (de) 2007-01-24
JP2004111907A (ja) 2004-04-08

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