DE3586244T2 - Vorrichtung zur Erzeugung von Weich-Röntgenstrahlen durch ein Hochenergiebündel. - Google Patents

Vorrichtung zur Erzeugung von Weich-Röntgenstrahlen durch ein Hochenergiebündel.

Info

Publication number
DE3586244T2
DE3586244T2 DE3586244T DE3586244T DE3586244T2 DE 3586244 T2 DE3586244 T2 DE 3586244T2 DE 3586244 T DE3586244 T DE 3586244T DE 3586244 T DE3586244 T DE 3586244T DE 3586244 T2 DE3586244 T2 DE 3586244T2
Authority
DE
Germany
Prior art keywords
rays
generating soft
energy bundle
bundle
energy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3586244T
Other languages
English (en)
Other versions
DE3586244D1 (de
Inventor
Etsuo C O Patent Division Noda
Setsuo C O Patent Divis Suzuki
Osami C O Patent Divi Morimiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP59273222A external-priority patent/JPS61153935A/ja
Priority claimed from JP59273223A external-priority patent/JPS61153936A/ja
Application filed by Toshiba Corp filed Critical Toshiba Corp
Application granted granted Critical
Publication of DE3586244D1 publication Critical patent/DE3586244D1/de
Publication of DE3586244T2 publication Critical patent/DE3586244T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21B—FUSION REACTORS
    • G21B1/00—Thermonuclear fusion reactors
    • G21B1/11—Details
    • G21B1/19—Targets for producing thermonuclear fusion reactions, e.g. pellets for irradiation by laser or charged particle beams
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/10—Nuclear fusion reactors

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE3586244T 1984-12-26 1985-12-23 Vorrichtung zur Erzeugung von Weich-Röntgenstrahlen durch ein Hochenergiebündel. Expired - Fee Related DE3586244T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP59273222A JPS61153935A (ja) 1984-12-26 1984-12-26 プラズマｘ線発生装置
JP59273223A JPS61153936A (ja) 1984-12-26 1984-12-26 プラズマｘ線発生装置

Publications (2)

Publication Number Publication Date
DE3586244D1 DE3586244D1 (de) 1992-07-23
DE3586244T2 true DE3586244T2 (de) 2000-04-20

Family

ID=26550565

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3586244T Expired - Fee Related DE3586244T2 (de) 1984-12-26 1985-12-23 Vorrichtung zur Erzeugung von Weich-Röntgenstrahlen durch ein Hochenergiebündel.

Country Status (3)

Country Link
US (1) US4723262A (de)
EP (1) EP0186491B1 (de)
DE (1) DE3586244T2 (de)

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US5577091A (en) * 1994-04-01 1996-11-19 University Of Central Florida Water laser plasma x-ray point sources
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DE19821939A1 (de) * 1998-05-15 1999-11-18 Philips Patentverwaltung Röntgenstrahler mit einem Flüssigmetall-Target
US6324255B1 (en) * 1998-08-13 2001-11-27 Nikon Technologies, Inc. X-ray irradiation apparatus and x-ray exposure apparatus
DE19905802A1 (de) * 1999-02-12 2000-08-17 Philips Corp Intellectual Pty Röntgenröhre
US6831963B2 (en) 2000-10-20 2004-12-14 University Of Central Florida EUV, XUV, and X-Ray wavelength sources created from laser plasma produced from liquid metal solutions
US7492867B1 (en) * 1999-10-11 2009-02-17 University Of Central Flordia Research Foundation, Inc. Nanoparticle seeded short-wavelength discharge lamps
FR2799667B1 (fr) * 1999-10-18 2002-03-08 Commissariat Energie Atomique Procede et dispositif de generation d'un brouillard dense de gouttelettes micrometriques et submicrometriques, application a la generation de lumiere dans l'extreme ultraviolet notamment pour la lithographie
JP2003513418A (ja) * 1999-10-27 2003-04-08 ジェイ エム エー アール リサーチ、インク マイクロターゲットを用いた方法及びラジエーション生成システム
DE19955392A1 (de) * 1999-11-18 2001-05-23 Philips Corp Intellectual Pty Monochromatische Röntgenstrahlenquelle
JP2003518252A (ja) * 1999-12-20 2003-06-03 エフ イー アイ エレクトロン オプティクス ビー ヴィ 軟ｘ線のｘ線源を有するｘ線顕微鏡
US6304630B1 (en) * 1999-12-24 2001-10-16 U.S. Philips Corporation Method of generating EUV radiation, method of manufacturing a device by means of said radiation, EUV radiation source unit, and lithographic projection apparatus provided with such a radiation source unit
US6493423B1 (en) 1999-12-24 2002-12-10 Koninklijke Philips Electronics N.V. Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit
US6320937B1 (en) * 2000-04-24 2001-11-20 Takayasu Mochizuki Method and apparatus for continuously generating laser plasma X-rays by the use of a cryogenic target
US6711233B2 (en) 2000-07-28 2004-03-23 Jettec Ab Method and apparatus for generating X-ray or EUV radiation
US6324256B1 (en) * 2000-08-23 2001-11-27 Trw Inc. Liquid sprays as the target for a laser-plasma extreme ultraviolet light source
US6693989B2 (en) * 2000-09-14 2004-02-17 The Board Of Trustees Of The University Of Illinois Ultrabright multikilovolt x-ray source: saturated amplification on noble gas transition arrays from hollow atom states
US7135146B2 (en) 2000-10-11 2006-11-14 Innovadyne Technologies, Inc. Universal non-contact dispense peripheral apparatus and method for a primary liquid handling device
US6852291B1 (en) * 2000-10-11 2005-02-08 Innovadyne Technologies, Inc. Hybrid valve apparatus and method for fluid handling
GB0111204D0 (en) * 2001-05-08 2001-06-27 Mertek Ltd High flux,high energy photon source
DE10129463A1 (de) * 2001-06-19 2003-01-02 Philips Corp Intellectual Pty Röntgenstrahler mit einem Flüssigmetall-Target
DE10149654A1 (de) * 2001-10-08 2003-04-10 Univ Schiller Jena Verfahren und Anordnung zur Synchronisation der zeitlichen Abfolgen von Targets sowie von auf diese auftreffenden Anregungsimpulsen eines Lasers bei der Anregung von Plasma zur Strahlungsemission
US8653437B2 (en) * 2010-10-04 2014-02-18 Cymer, Llc EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
JP2005516220A (ja) * 2002-01-25 2005-06-02 イノベイダイン・テクノロジーズ・インコーポレーテッド 低容量かつ非接触な液体の分注方法
JP4320999B2 (ja) * 2002-02-04 2009-08-26 株式会社ニコン Ｘ線発生装置及び露光装置
US7180981B2 (en) * 2002-04-08 2007-02-20 Nanodynamics-88, Inc. High quantum energy efficiency X-ray tube and targets
CN100366129C (zh) * 2002-05-13 2008-01-30 杰特克公司 用于产生辐射的方法和装置
US6855943B2 (en) 2002-05-28 2005-02-15 Northrop Grumman Corporation Droplet target delivery method for high pulse-rate laser-plasma extreme ultraviolet light source
US6738452B2 (en) * 2002-05-28 2004-05-18 Northrop Grumman Corporation Gasdynamically-controlled droplets as the target in a laser-plasma extreme ultraviolet light source
US6792076B2 (en) * 2002-05-28 2004-09-14 Northrop Grumman Corporation Target steering system for EUV droplet generators
SE523503C2 (sv) * 2002-07-23 2004-04-27 Jettec Ab Kapillärrör
DE10306668B4 (de) 2003-02-13 2009-12-10 Xtreme Technologies Gmbh Anordnung zur Erzeugung von intensiver kurzwelliger Strahlung auf Basis eines Plasmas
ATE476859T1 (de) 2003-03-18 2010-08-15 Koninkl Philips Electronics Nv Einrichtung und verfahren zur erzeugung von extrem-ultraviolett-und/oder weicher röntgenstrahlung mittels eines plasmas
DE10314849B3 (de) * 2003-03-28 2004-12-30 Xtreme Technologies Gmbh Anordnung zur Stabilisierung der Strahlungsemission eines Plasmas
DE10326279A1 (de) * 2003-06-11 2005-01-05 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Plasma-basierte Erzeugung von Röntgenstrahlung mit einem schichtförmigen Targetmaterial
DE102004005241B4 (de) * 2004-01-30 2006-03-02 Xtreme Technologies Gmbh Verfahren und Einrichtung zur plasmabasierten Erzeugung weicher Röntgenstrahlung
DE102004005242B4 (de) * 2004-01-30 2006-04-20 Xtreme Technologies Gmbh Verfahren und Vorrichtung zur plasmabasierten Erzeugung intensiver kurzwelliger Strahlung
US20050211910A1 (en) * 2004-03-29 2005-09-29 Jmar Research, Inc. Morphology and Spectroscopy of Nanoscale Regions using X-Rays Generated by Laser Produced Plasma
DE102004036441B4 (de) * 2004-07-23 2007-07-12 Xtreme Technologies Gmbh Vorrichtung und Verfahren zum Dosieren von Targetmaterial für die Erzeugung kurzwelliger elektromagnetischer Strahlung
US7302043B2 (en) * 2004-07-27 2007-11-27 Gatan, Inc. Rotating shutter for laser-produced plasma debris mitigation
DE102004037521B4 (de) 2004-07-30 2011-02-10 Xtreme Technologies Gmbh Vorrichtung zur Bereitstellung von Targetmaterial für die Erzeugung kurzwelliger elektromagnetischer Strahlung
US7466796B2 (en) * 2004-08-05 2008-12-16 Gatan, Inc. Condenser zone plate illumination for point X-ray sources
US7452820B2 (en) * 2004-08-05 2008-11-18 Gatan, Inc. Radiation-resistant zone plates and method of manufacturing thereof
US7319733B2 (en) * 2004-09-27 2008-01-15 General Electric Company System and method for imaging using monoenergetic X-ray sources
KR101177707B1 (ko) * 2005-02-25 2012-08-29 사이머 인코포레이티드 Ｅｕｖ 광원의 타겟 물질 핸들링을 위한 방법 및 장치
US20080317768A1 (en) 2007-06-21 2008-12-25 Boeing Company Bioconjugated nanoparticles
US8493548B2 (en) * 2007-08-06 2013-07-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
ATE528694T1 (de) * 2008-07-18 2011-10-15 Koninkl Philips Electronics Nv Vorrichtung zur erzeugung von extremer uv- strahlung mit einem kontaminationsfänger und verfahren zur reinigung von zinn in einer solchen vorrichtung
EP2694218B1 (de) 2011-04-05 2019-05-22 ETH Zurich Tröpfchenausgabevorrichtung und lichtquelle mit einer derartigen tröpfchenausgabevorrichtung
CN103209536A (zh) * 2013-03-22 2013-07-17 中国科学院上海光学精密机械研究所 产生软x射线的方法
US9693439B1 (en) * 2013-06-20 2017-06-27 Kla-Tencor Corporation High brightness liquid droplet X-ray source for semiconductor metrology
DE102014006063A1 (de) * 2014-04-25 2015-10-29 Microliquids GmbH Strahlerzeugungsvorrichtung und Verfahren zur Erzeugung eines Flüssigkeitsstrahls
JP6855570B2 (ja) * 2017-05-01 2021-04-07 ギガフォトン株式会社 ターゲット供給装置、極端紫外光生成装置、及びターゲット供給方法
WO2019180826A1 (ja) * 2018-03-20 2019-09-26 ギガフォトン株式会社 ターゲット供給装置、極端紫外光生成装置及び電子デバイスの製造方法

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US4281269A (en) * 1977-04-27 1981-07-28 Ledley Robert S Microfocus X-ray tube
JPS57145257A (en) * 1981-03-03 1982-09-08 Fujitsu Ltd Method of x-ray generation
JPS58158842A (ja) * 1982-03-16 1983-09-21 Seiko Epson Corp Ｘ線発生方法
EP0105261B1 (de) * 1982-04-14 1988-07-06 Battelle Development Corporation Röntgenstrahlenerreger

Also Published As

Publication number Publication date
EP0186491A3 (en) 1988-09-28
EP0186491B1 (de) 1992-06-17
EP0186491A2 (de) 1986-07-02
DE3586244D1 (de) 1992-07-23
US4723262A (en) 1988-02-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee