DE3678859D1 - Vorrichtung zur erzeugung weicher roentgenstrahlen. - Google Patents

Vorrichtung zur erzeugung weicher roentgenstrahlen.

Info

Publication number
DE3678859D1
DE3678859D1 DE8686300332T DE3678859T DE3678859D1 DE 3678859 D1 DE3678859 D1 DE 3678859D1 DE 8686300332 T DE8686300332 T DE 8686300332T DE 3678859 T DE3678859 T DE 3678859T DE 3678859 D1 DE3678859 D1 DE 3678859D1
Authority
DE
Germany
Prior art keywords
rays
generating soft
soft
generating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8686300332T
Other languages
English (en)
Inventor
Jay S Pearlman
Vance Irving Valencia
John Charles Riordan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Maxwell Technologies Inc
Original Assignee
Maxwell Laboratories Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Maxwell Laboratories Inc filed Critical Maxwell Laboratories Inc
Application granted granted Critical
Publication of DE3678859D1 publication Critical patent/DE3678859D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G1/00—X-ray apparatus involving X-ray tubes; Circuits therefor
    • H05G1/08—Electrical details
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G1/00—X-ray apparatus involving X-ray tubes; Circuits therefor
    • H05G1/08—Electrical details
    • H05G1/10—Power supply arrangements for feeding the X-ray tube
    • H05G1/22—Power supply arrangements for feeding the X-ray tube with single pulses
    • H05G1/24—Obtaining pulses by using energy storage devices
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/04—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using magnetic fields substantially generated by the discharge in the plasma
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/10—Nuclear fusion reactors

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE8686300332T 1985-02-27 1986-01-17 Vorrichtung zur erzeugung weicher roentgenstrahlen. Expired - Fee Related DE3678859D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/705,969 US4589123A (en) 1985-02-27 1985-02-27 System for generating soft X rays

Publications (1)

Publication Number Publication Date
DE3678859D1 true DE3678859D1 (de) 1991-05-29

Family

ID=24835678

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686300332T Expired - Fee Related DE3678859D1 (de) 1985-02-27 1986-01-17 Vorrichtung zur erzeugung weicher roentgenstrahlen.

Country Status (6)

Country Link
US (1) US4589123A (de)
EP (1) EP0195495B1 (de)
JP (1) JPH0770356B2 (de)
KR (1) KR930001322B1 (de)
CA (1) CA1233917A (de)
DE (1) DE3678859D1 (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62172648A (ja) * 1986-01-24 1987-07-29 Nippon Telegr & Teleph Corp <Ntt> Ｘ線発生装置
JPS61250948A (ja) * 1985-04-30 1986-11-08 Nippon Telegr & Teleph Corp <Ntt> Ｘ線発生装置およびｘ線露光法
CA1239486A (en) * 1985-10-03 1988-07-19 Rajendra P. Gupta Gas discharge derived annular plasma pinch x-ray source
US4663567A (en) * 1985-10-28 1987-05-05 Physics International Company Generation of stable linear plasmas
JP2532443B2 (ja) * 1987-03-02 1996-09-11 ニチコン株式会社 プラズマｘ線発生装置
DE3806901C2 (de) * 1988-03-03 1995-04-27 Kernforschungsz Karlsruhe Verfahren und Vorrichtung zur Erzeugung eines Plasmas hoher Strahlungsintensität im Röntgenbereich
US5102776A (en) * 1989-11-09 1992-04-07 Cornell Research Foundation, Inc. Method and apparatus for microlithography using x-pinch x-ray source
US5302882A (en) * 1991-09-09 1994-04-12 Sematech, Inc. Low pass filter for plasma discharge
KR930021034A (ko) * 1992-03-31 1993-10-20 다니이 아끼오 플라즈마발생방법 및 그 발생장치
US5325019A (en) * 1992-08-21 1994-06-28 Sematech, Inc. Control of plasma process by use of harmonic frequency components of voltage and current
US6586757B2 (en) * 1997-05-12 2003-07-01 Cymer, Inc. Plasma focus light source with active and buffer gas control
US5898236A (en) * 1997-06-24 1999-04-27 Sandia Corporation Magnetic switch coupling to synchronize magnetic modulators
JP3985416B2 (ja) * 2000-03-02 2007-10-03 松下電器産業株式会社 ガスレーザ発振装置
US6667484B2 (en) * 2000-07-03 2003-12-23 Asml Netherlands B.V. Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby
JP5388018B2 (ja) * 2007-05-07 2014-01-15 独立行政法人日本原子力研究開発機構 レーザー駆動の小型・高コントラスト・コヒーレントｘ線発生装置及びその発生方法
US20080317768A1 (en) 2007-06-21 2008-12-25 Boeing Company Bioconjugated nanoparticles
US7872244B2 (en) * 2007-08-08 2011-01-18 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101522426B1 (ko) * 2008-06-25 2015-05-21 하마마츠 포토닉스 가부시키가이샤 Ｘ선 조사 시스템 및 ｘ선 조사 장치
US8044594B2 (en) * 2008-07-31 2011-10-25 Advanced Energy Industries, Inc. Power supply ignition system and method
DE102008052216B3 (de) * 2008-10-17 2010-05-20 Johann Wolfgang Goethe-Universität Plasma-Induktionsschalter und Verfahren zum Schalten hoher Spannungen
US8395078B2 (en) 2008-12-05 2013-03-12 Advanced Energy Industries, Inc Arc recovery with over-voltage protection for plasma-chamber power supplies
EP2648209B1 (de) 2009-02-17 2018-01-03 Solvix GmbH Energieversorgungsvorrichtung zur Plasmaverarbeitung
US8552665B2 (en) 2010-08-20 2013-10-08 Advanced Energy Industries, Inc. Proactive arc management of a plasma load
FR2976440B1 (fr) * 2011-06-09 2014-01-17 Ecole Polytech Procede et agencement pour engendrer un jet de fluide, procede et systeme de transformation du jet en un plasma et applications de ce systeme
EP3968738A1 (de) * 2020-09-14 2022-03-16 Koninklijke Philips N.V. Schnelle kvp-schaltung mit nichtlinearer induktivität und resonantem betrieb
US20220392651A1 (en) * 2021-05-28 2022-12-08 Zap Energy, Inc. Electrode configuration for extended plasma confinement

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2700114A (en) * 1946-01-17 1955-01-18 Richard H Blythe Pulse network
US2898482A (en) * 1955-06-13 1959-08-04 Bell Telephone Labor Inc Magnetic radar pulse duration-clipper and damper
US3171030A (en) * 1961-03-06 1965-02-23 Zenith Radio Corp System for producing short pulses of x-ray energy
US3363102A (en) * 1965-01-25 1968-01-09 Field Emission Corp High voltage pulse transmission system employing field emission diodes for successively pulsing a load
US3388275A (en) * 1966-06-08 1968-06-11 Battelle Development Corp Cathode provided with ion-producing material for decreasing space charge
US3746860A (en) * 1972-02-17 1973-07-17 J Stettler Soft x-ray generator assisted by laser
US4042827A (en) * 1973-10-03 1977-08-16 Research Corporation Stimulated emission X-ray generator
US4042848A (en) * 1974-05-17 1977-08-16 Ja Hyun Lee Hypocycloidal pinch device
JPS5342695A (en) * 1976-09-30 1978-04-18 Toshiba Corp Ct scanner
US4275317A (en) * 1979-03-23 1981-06-23 Nasa Pulse switching for high energy lasers
US4494043A (en) * 1981-07-02 1985-01-15 Physics International Company Imploding plasma device
JPS58113800A (ja) * 1981-12-26 1983-07-06 富士通株式会社 エツクス線照射装置
JPS58113898A (ja) * 1981-12-28 1983-07-06 富士通株式会社 エツクス線照射装置
JPS58174849U (ja) * 1982-05-17 1983-11-22 富士通株式会社 プラズマｘ線発生装置
US4536884A (en) * 1982-09-20 1985-08-20 Eaton Corporation Plasma pinch X-ray apparatus
JPS5958748A (ja) * 1982-09-28 1984-04-04 Fujitsu Ltd エツクス線発生装置
JPS5958747A (ja) * 1982-09-28 1984-04-04 Fujitsu Ltd エツクス線発生装置
JPS607723A (ja) * 1983-06-28 1985-01-16 Nippon Telegr & Teleph Corp <Ntt> プラズマｘ線露光装置
JPS6084748A (ja) * 1983-10-14 1985-05-14 Hitachi Ltd ガスパフ形プラズマｘ線源

Also Published As

Publication number Publication date
US4589123A (en) 1986-05-13
CA1233917A (en) 1988-03-08
KR930001322B1 (ko) 1993-02-25
EP0195495A3 (en) 1988-08-17
JPH0770356B2 (ja) 1995-07-31
EP0195495A2 (de) 1986-09-24
EP0195495B1 (de) 1991-04-24
JPS61200695A (ja) 1986-09-05
KR860006911A (ko) 1986-09-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee