SG106162A1 - Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system - Google Patents

Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system

Info

Publication number
SG106162A1
SG106162A1 SG200306876A SG200306876A SG106162A1 SG 106162 A1 SG106162 A1 SG 106162A1 SG 200306876 A SG200306876 A SG 200306876A SG 200306876 A SG200306876 A SG 200306876A SG 106162 A1 SG106162 A1 SG 106162A1
Authority
SG
Singapore
Prior art keywords
unmirrored
unflipped
maintains
beam
image
Prior art date
Application number
SG200306876A
Inventor
Sewell Harry
Original Assignee
Asml Holding Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US10/307,407 priority Critical patent/US6731374B1/en
Application filed by Asml Holding Nv filed Critical Asml Holding Nv
Publication of SG106162A1 publication Critical patent/SG106162A1/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/708Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/70908Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution, removing pollutants from apparatus; electromagnetic and electrostatic-charge pollution
    • G03F7/70941Stray fields and charges, e.g. stray light, scattered light, flare, transmission loss
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08Catadioptric systems
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08Catadioptric systems
    • G02B17/0892Catadioptric systems specially adapted for the UV
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/283Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70225Catadioptric systems, i.e. documents describing optical design aspect details
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70308Optical correction elements, filters and phase plates for manipulating, e.g. intensity, wavelength, polarization, phase, image shift
SG200306876A 2002-12-02 2003-11-26 Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system SG106162A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US10/307,407 US6731374B1 (en) 2002-12-02 2002-12-02 Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system

Publications (1)

Publication Number Publication Date
SG106162A1 true SG106162A1 (en) 2004-09-30

Family

ID=32176250

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200306876A SG106162A1 (en) 2002-12-02 2003-11-26 Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system

Country Status (8)

Country Link
US (3) US6731374B1 (en)
EP (1) EP1426825B1 (en)
JP (1) JP4178098B2 (en)
KR (1) KR100575499B1 (en)
CN (1) CN100458566C (en)
DE (1) DE60326532D1 (en)
SG (1) SG106162A1 (en)
TW (1) TW200410054A (en)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6995930B2 (en) 1999-12-29 2006-02-07 Carl Zeiss Smt Ag Catadioptric projection objective with geometric beam splitting
TW538256B (en) * 2000-01-14 2003-06-21 Zeiss Stiftung Microlithographic reduction projection catadioptric objective
US6731374B1 (en) * 2002-12-02 2004-05-04 Asml Holding N.V. Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system
US20080151365A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
DE602005008707D1 (en) * 2004-01-14 2008-09-18 Zeiss Carl Smt Ag Catadiopric projection lens
KR101639964B1 (en) 2004-05-17 2016-07-14 칼 짜이스 에스엠티 게엠베하 Projection exposure system comprising a catadioptric projection objective with intermediate images
US20060072207A1 (en) * 2004-09-30 2006-04-06 Williams David L Method and apparatus for polarizing electromagnetic radiation
US7271874B2 (en) 2004-11-02 2007-09-18 Asml Holding N.V. Method and apparatus for variable polarization control in a lithography system
EP1844365A1 (en) * 2005-02-03 2007-10-17 Carl Zeiss SMT AG Catadioptric projection objective with intermediate image
KR101653514B1 (en) * 2005-06-02 2016-09-01 칼 짜이스 에스엠티 게엠베하 Microlithography projection objective
KR100714780B1 (en) * 2005-09-08 2007-05-04 한국기초과학지원연구원 Beam line with several insertions for reducing noise effect
DE102007055567A1 (en) * 2007-11-20 2009-05-28 Carl Zeiss Smt Ag Optical system
US20090233456A1 (en) 2008-03-17 2009-09-17 Sony Corporation Irradiation optical system, irradiation apparatus and fabrication method for semiconductor device
CN104867414A (en) * 2015-06-01 2015-08-26 安徽禄讯电子科技有限公司 Reticle having functions of digital display screen and manufacturing method thereof
CN109313402A (en) 2016-06-03 2019-02-05 Asml控股股份有限公司 It is directed at System on chip and stacks beam analysis device
TWI633356B (en) * 2017-07-12 2018-08-21 志聖工業股份有限公司 A light source module of a exposure machine with a total internal reflection lens and a sleeve
CN207799321U (en) 2018-01-26 2018-08-31 中强光电股份有限公司 Projection arrangement and lighting system

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5089913A (en) * 1990-07-11 1992-02-18 International Business Machines Corporation High resolution reduction catadioptric relay lens
US5636066A (en) * 1993-03-12 1997-06-03 Nikon Corporation Optical apparatus
US6081382A (en) * 1998-05-07 2000-06-27 Nikon Corporation Catadioptric reduction projection optical system
US6480330B1 (en) * 2000-02-24 2002-11-12 Silicon Valley Group, Inc. Ultraviolet polarization beam splitter for microlithography
US20020167734A1 (en) * 2001-04-07 2002-11-14 Carl Zeiss Semiconductor Manfacturing Technologies Ag Catadioptric projection objective
US6590718B2 (en) * 2000-02-05 2003-07-08 Carl-Zeiss-Stiftung Projection exposure system having a reflective reticle

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JPH06181161A (en) * 1992-12-14 1994-06-28 Canon Inc Reflective/refractive optical system and projection aligner employing it
US5592329A (en) * 1993-02-03 1997-01-07 Nikon Corporation Catadioptric optical system
JP3395801B2 (en) * 1994-04-28 2003-04-14 株式会社ニコン Catadioptric projection optical system, scanning projection exposure apparatus, and scanning projection exposure method
US5793473A (en) * 1994-06-09 1998-08-11 Nikon Corporation Projection optical apparatus for projecting a mask pattern onto the surface of a target projection object and projection exposure apparatus using the same
JPH08179216A (en) * 1994-12-27 1996-07-12 Nikon Corp Cata-dioptric system
JPH09246179A (en) * 1996-03-13 1997-09-19 Canon Inc Projection exposure apparatus and manufacture of device using the aligner
JPH09293676A (en) * 1996-04-24 1997-11-11 Nikon Corp Projection optical system and projection aligner
JPH10301058A (en) * 1997-04-30 1998-11-13 Nikon Corp Reflection refraction type projecting optical system
EP1102100A3 (en) * 1999-11-12 2003-12-10 Carl Zeiss Catadioptric objective with beamsplitter
US6522483B2 (en) * 2000-04-25 2003-02-18 Silicon Valley Group, Inc. Optical reduction system with elimination of reticle diffraction induced bias
CN2432001Y (en) * 2000-06-21 2001-05-30 中国科学院光电技术研究所 Laser interference photoetching system
DE10127227A1 (en) * 2001-05-22 2002-12-05 Zeiss Carl Catadioptric reduction lens
US6757110B2 (en) * 2002-05-29 2004-06-29 Asml Holding N.V. Catadioptric lithography system and method with reticle stage orthogonal to wafer stage
US6731374B1 (en) * 2002-12-02 2004-05-04 Asml Holding N.V. Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5089913A (en) * 1990-07-11 1992-02-18 International Business Machines Corporation High resolution reduction catadioptric relay lens
US5636066A (en) * 1993-03-12 1997-06-03 Nikon Corporation Optical apparatus
US6081382A (en) * 1998-05-07 2000-06-27 Nikon Corporation Catadioptric reduction projection optical system
US6590718B2 (en) * 2000-02-05 2003-07-08 Carl-Zeiss-Stiftung Projection exposure system having a reflective reticle
US6480330B1 (en) * 2000-02-24 2002-11-12 Silicon Valley Group, Inc. Ultraviolet polarization beam splitter for microlithography
US20020167734A1 (en) * 2001-04-07 2002-11-14 Carl Zeiss Semiconductor Manfacturing Technologies Ag Catadioptric projection objective

Also Published As

Publication number Publication date
US6972830B2 (en) 2005-12-06
EP1426825A3 (en) 2006-02-22
JP2004186689A (en) 2004-07-02
EP1426825A2 (en) 2004-06-09
TW200410054A (en) 2004-06-16
JP4178098B2 (en) 2008-11-12
EP1426825B1 (en) 2009-03-11
CN1504829A (en) 2004-06-16
CN100458566C (en) 2009-02-04
US20060061748A1 (en) 2006-03-23
KR100575499B1 (en) 2006-05-03
DE60326532D1 (en) 2009-04-23
US20040174617A1 (en) 2004-09-09
KR20040048359A (en) 2004-06-09
US6731374B1 (en) 2004-05-04
US7199862B2 (en) 2007-04-03

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