DE69630548D1 - Belichtungsvorrichtung - Google Patents

Belichtungsvorrichtung

Info

Publication number
DE69630548D1
DE69630548D1 DE69630548T DE69630548T DE69630548D1 DE 69630548 D1 DE69630548 D1 DE 69630548D1 DE 69630548 T DE69630548 T DE 69630548T DE 69630548 T DE69630548 T DE 69630548T DE 69630548 D1 DE69630548 D1 DE 69630548D1
Authority
DE
Germany
Prior art keywords
exposure device
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69630548T
Other languages
English (en)
Other versions
DE69630548T2 (de
Inventor
Masato Kumazawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of DE69630548D1 publication Critical patent/DE69630548D1/de
Application granted granted Critical
Publication of DE69630548T2 publication Critical patent/DE69630548T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/002—Arrays of reflective systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/008—Systems specially adapted to form image relays or chained systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69630548T 1995-01-18 1996-01-18 Belichtungsvorrichtung Expired - Lifetime DE69630548T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP583595 1995-01-18
JP583595 1995-01-18
JP13677995A JP3724517B2 (ja) 1995-01-18 1995-06-02 露光装置
JP13677995 1995-06-02

Publications (2)

Publication Number Publication Date
DE69630548D1 true DE69630548D1 (de) 2003-12-11
DE69630548T2 DE69630548T2 (de) 2004-09-23

Family

ID=26339846

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69630548T Expired - Lifetime DE69630548T2 (de) 1995-01-18 1996-01-18 Belichtungsvorrichtung

Country Status (4)

Country Link
EP (1) EP0723173B1 (de)
JP (1) JP3724517B2 (de)
KR (1) KR100385813B1 (de)
DE (1) DE69630548T2 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5585972A (en) * 1995-02-15 1996-12-17 Ultratech Stepper, Inc. Arbitrarily wide lens array with an image field to span the width of a substrate
JPH09293676A (ja) * 1996-04-24 1997-11-11 Nikon Corp 投影光学系及び投影露光装置
JP3757536B2 (ja) * 1996-10-01 2006-03-22 株式会社ニコン 投影光学系及びそれを備えた露光装置並びにデバイス製造方法
DE19757074A1 (de) 1997-12-20 1999-06-24 Zeiss Carl Fa Projektionsbelichtungsanlage und Belichtungsverfahren
JP3708845B2 (ja) * 2001-06-19 2005-10-19 株式会社ミツトヨ 両テレセントリック対物レンズ
JP2004354909A (ja) * 2003-05-30 2004-12-16 Orc Mfg Co Ltd 投影露光装置および投影露光方法
CN100388056C (zh) * 2006-06-02 2008-05-14 上海微电子装备有限公司 一种投影物镜光学系统
JP5782336B2 (ja) * 2011-08-24 2015-09-24 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
CN107255858B (zh) * 2011-12-20 2020-05-29 株式会社尼康 基底处理装置
CN110045580B (zh) * 2013-06-14 2021-07-23 株式会社尼康 扫描曝光装置
JP2016080870A (ja) * 2014-10-17 2016-05-16 財団法人國家實驗研究院 共役共通光路リソグラフィレンズ
JP2022022911A (ja) 2020-07-10 2022-02-07 キヤノン株式会社 結像光学系、露光装置、および物品製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4171871A (en) * 1977-06-30 1979-10-23 International Business Machines Corporation Achromatic unit magnification optical system
US4769680A (en) * 1987-10-22 1988-09-06 Mrs Technology, Inc. Apparatus and method for making large area electronic devices, such as flat panel displays and the like, using correlated, aligned dual optical systems
US5298939A (en) * 1991-11-04 1994-03-29 Swanson Paul A Method and apparatus for transfer of a reticle pattern onto a substrate by scanning
JPH06118341A (ja) * 1991-11-11 1994-04-28 Topcon Corp 走査型投影装置
JP3385718B2 (ja) * 1994-05-30 2003-03-10 株式会社ニコン 露光装置及び方法
US5585972A (en) * 1995-02-15 1996-12-17 Ultratech Stepper, Inc. Arbitrarily wide lens array with an image field to span the width of a substrate

Also Published As

Publication number Publication date
EP0723173A2 (de) 1996-07-24
KR960029907A (ko) 1996-08-17
EP0723173B1 (de) 2003-11-05
KR100385813B1 (ko) 2004-06-14
JP3724517B2 (ja) 2005-12-07
JPH08255746A (ja) 1996-10-01
DE69630548T2 (de) 2004-09-23
EP0723173A3 (de) 1997-10-08

Similar Documents

Publication Publication Date Title
DE69626202T2 (de) Projektionsvorrichtung
DE69628523D1 (de) Projektionsgerät
DE69522422D1 (de) Belichtungsvorrichtung
BR9606198A (pt) Aparelho
KR960008429A (ko) 노광 장치
DE69630548D1 (de) Belichtungsvorrichtung
DE69528047T2 (de) Positionsbestimmungsgerät
BR9611186A (pt) Aparelho moedor-misturador
DE69621660D1 (de) Photographisches Belichtungsgerät
IT1279616B1 (it) Dispositivo gommatore
DE69614894T2 (de) Photographisches Behandlungsgerät
DE19681578T1 (de) Positioniervorrichtung
IT1279619B1 (it) Dispositivo gommatore
BR9603137A (pt) Aparelho
KR970000276A (ko) 뇌파유도장치
DE69507357T2 (de) Belichtungsgerät
DE69620941D1 (de) Photographisches Belichtungsgerät
SE9301036D0 (sv) Exponeringsanordning
IT1279608B1 (it) Dispositivo gommatore
KR970028058U (ko) 도막제거장치
ITUD950061A1 (it) Dispositivo svita-tappi
KR970025196U (ko) 볼-마우스 장치
KR960006191U (ko) 노광장치
KR970045360U (ko) 마스크장치
KR970050136U (ko) 노광장치

Legal Events

Date Code Title Description
8364 No opposition during term of opposition