DE69629277D1 - Optisches Projektionssystem und damit ausgerüstetes Belichtungsgerät - Google Patents

Optisches Projektionssystem und damit ausgerüstetes Belichtungsgerät

Info

Publication number
DE69629277D1
DE69629277D1 DE69629277T DE69629277T DE69629277D1 DE 69629277 D1 DE69629277 D1 DE 69629277D1 DE 69629277 T DE69629277 T DE 69629277T DE 69629277 T DE69629277 T DE 69629277T DE 69629277 D1 DE69629277 D1 DE 69629277D1
Authority
DE
Germany
Prior art keywords
projection system
exposure device
device equipped
optical projection
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Revoked
Application number
DE69629277T
Other languages
English (en)
Other versions
DE69629277T2 (de
Inventor
Hitoshi Matsuzawa
Yutaka Suenaga
Misako Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=14414829&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69629277(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nikon Corp filed Critical Nikon Corp
Application granted granted Critical
Publication of DE69629277D1 publication Critical patent/DE69629277D1/de
Publication of DE69629277T2 publication Critical patent/DE69629277T2/de
Anticipated expiration legal-status Critical
Revoked legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems
DE69629277T 1996-04-25 1996-05-31 Optisches Projektionssystem und damit ausgerüstetes Belichtungsgerät Revoked DE69629277T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP10570796 1996-04-25
JP10570796A JP3750123B2 (ja) 1996-04-25 1996-04-25 投影光学系

Publications (2)

Publication Number Publication Date
DE69629277D1 true DE69629277D1 (de) 2003-09-04
DE69629277T2 DE69629277T2 (de) 2004-05-13

Family

ID=14414829

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69629277T Revoked DE69629277T2 (de) 1996-04-25 1996-05-31 Optisches Projektionssystem und damit ausgerüstetes Belichtungsgerät

Country Status (5)

Country Link
US (1) US5781278A (de)
EP (1) EP0803755B1 (de)
JP (1) JP3750123B2 (de)
KR (1) KR100446130B1 (de)
DE (1) DE69629277T2 (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3500745B2 (ja) * 1994-12-14 2004-02-23 株式会社ニコン 投影光学系、投影露光装置及び投影露光方法
USRE38465E1 (en) 1994-12-14 2004-03-16 Nikon Corporation Exposure apparatus
JPH116957A (ja) * 1997-04-25 1999-01-12 Nikon Corp 投影光学系および投影露光装置並びに投影露光方法
JP3925576B2 (ja) 1997-07-24 2007-06-06 株式会社ニコン 投影光学系、該光学系を備えた露光装置、及び該装置を用いたデバイスの製造方法
JPH1195095A (ja) 1997-09-22 1999-04-09 Nikon Corp 投影光学系
JPH11214293A (ja) 1998-01-22 1999-08-06 Nikon Corp 投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法
US6700645B1 (en) 1998-01-22 2004-03-02 Nikon Corporation Projection optical system and exposure apparatus and method
US6198576B1 (en) * 1998-07-16 2001-03-06 Nikon Corporation Projection optical system and exposure apparatus
DE19855108A1 (de) 1998-11-30 2000-05-31 Zeiss Carl Fa Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren
EP1141781B1 (de) * 1998-11-30 2006-02-08 Carl Zeiss SMT AG Hochaperturiges projektionsobjektiv mit minimalem blendenfehler
DE19855157A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Projektionsobjektiv
DE19901756B4 (de) * 1999-01-18 2004-02-05 Siemens Ag Verfahren zum Betrieb einer eine Teilnehmeranschlußleitung teilnehmerseitig oder vermittungsseitig abschließenden Einrichtung in einem Datenübertragungsnetz
JP2001051193A (en) * 1999-06-03 2001-02-23 Nikon Corp Projection optical system projection exposing device provided with the system and manufacture of device
US6600550B1 (en) * 1999-06-03 2003-07-29 Nikon Corporation Exposure apparatus, a photolithography method, and a device manufactured by the same
WO2001023933A1 (fr) * 1999-09-29 2001-04-05 Nikon Corporation Systeme optique de projection
EP1139138A4 (de) 1999-09-29 2006-03-08 Nikon Corp Projektionsbelichtungsverfahren, vorrichtung und optisches projektionssystem
KR100866818B1 (ko) * 2000-12-11 2008-11-04 가부시키가이샤 니콘 투영광학계 및 이 투영광학계를 구비한 노광장치
DE10064685A1 (de) * 2000-12-22 2002-07-04 Zeiss Carl Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft
JP2002244034A (ja) 2001-02-21 2002-08-28 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2002323652A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
US8107162B2 (en) 2004-05-17 2012-01-31 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
US7511798B2 (en) 2004-07-30 2009-03-31 Asml Holding N.V. Off-axis catadioptric projection optical system for lithography
US20080019574A1 (en) * 2006-07-20 2008-01-24 Anthony Scalise Machine-controlled image cropping with default
KR101407076B1 (ko) 2012-05-24 2014-06-13 주식회사 비엘시스템 근적외선을 이용한 인쇄판 프린터용 고해상도 노광장치
CN116736494B (zh) * 2023-08-14 2023-11-03 武汉高明兰光电科技有限公司 微光夜视镜头

Family Cites Families (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US354961A (en) † 1886-12-28 Michael hoffman wilson
US3391974A (en) † 1965-01-15 1968-07-09 Bausch & Lomb Progressively powered singlets for aplanatic optical objective for spherical interferometers
US3897138A (en) † 1971-11-24 1975-07-29 Canon Kk Projection lens for mask pattern printing
US3737215A (en) † 1972-04-06 1973-06-05 Eastman Kodak Co Six element unit magnification lens
JPS5336326B2 (de) † 1972-12-26 1978-10-02
JPS5416410B2 (de) † 1974-03-07 1979-06-22
JPS5820402B2 (ja) † 1975-10-14 1983-04-22 オリンパス光学工業株式会社 チヨウコウカイゾウリヨクシユクシヨウレンズ
JPS58147708A (ja) † 1982-02-26 1983-09-02 Nippon Kogaku Kk <Nikon> 照明用光学装置
JPS59149312A (ja) * 1983-02-16 1984-08-27 Asahi Optical Co Ltd 大口径比写真レンズ
US4666273A (en) † 1983-10-05 1987-05-19 Nippon Kogaku K. K. Automatic magnification correcting system in a projection optical apparatus
GB2153543B (en) † 1983-12-28 1988-09-01 Canon Kk A projection exposure apparatus
US4811055A (en) † 1984-02-27 1989-03-07 Canon Kabushiki Kaisha Projection exposure apparatus
JPS60188917A (ja) * 1984-03-07 1985-09-26 Asahi Optical Co Ltd 近距離撮影用レンズ系
US4772107A (en) † 1986-11-05 1988-09-20 The Perkin-Elmer Corporation Wide angle lens with improved flat field characteristics
JPH0812329B2 (ja) * 1986-11-06 1996-02-07 株式会社シグマ 投影レンズ
US4770477A (en) † 1986-12-04 1988-09-13 The Perkin-Elmer Corporation Lens usable in the ultraviolet
US5105075A (en) † 1988-09-19 1992-04-14 Canon Kabushiki Kaisha Projection exposure apparatus
US5253110A (en) † 1988-12-22 1993-10-12 Nikon Corporation Illumination optical arrangement
SU1659955A1 (ru) † 1989-07-31 1991-06-30 Конструкторское бюро точного электронного машиностроения Проекционный объектив с увеличением - 1/5 @
JPH03288112A (ja) † 1990-04-04 1991-12-18 Dainippon Screen Mfg Co Ltd 色消しレンズ系
JPH0442208A (ja) * 1990-06-08 1992-02-12 Dainippon Screen Mfg Co Ltd テレセントリック投影レンズ
JP3126028B2 (ja) † 1990-07-06 2001-01-22 オリンパス光学工業株式会社 高倍率対物レンズ
US5052763A (en) † 1990-08-28 1991-10-01 International Business Machines Corporation Optical system with two subsystems separately correcting odd aberrations and together correcting even aberrations
JP3041939B2 (ja) * 1990-10-22 2000-05-15 株式会社ニコン 投影レンズ系
JP3353902B2 (ja) † 1990-12-12 2002-12-09 オリンパス光学工業株式会社 投影レンズ系
US5172275A (en) † 1990-12-14 1992-12-15 Eastman Kodak Company Apochromatic relay lens systems suitable for use in a high definition telecine apparatus
JP2830492B2 (ja) † 1991-03-06 1998-12-02 株式会社ニコン 投影露光装置及び投影露光方法
US5097291A (en) † 1991-04-22 1992-03-17 Nikon Corporation Energy amount control device
JPH04369209A (ja) † 1991-06-17 1992-12-22 Nikon Corp 露光用照明装置
WO1993004391A1 (en) † 1991-08-23 1993-03-04 Eastman Kodak Company High aperture lens system and printer using the lens system
US5572364A (en) * 1991-09-13 1996-11-05 Mitsubishi Denki Kabushiki Kaisha Projection lens system
JP3298131B2 (ja) * 1991-10-24 2002-07-02 株式会社ニコン 縮小投影レンズ
US5333035A (en) † 1992-05-15 1994-07-26 Nikon Corporation Exposing method
JPH06300965A (ja) * 1993-04-13 1994-10-28 Nikon Corp 広角レンズ
US5589988A (en) * 1993-04-26 1996-12-31 Nikon Corporation Retrofocus-type wide angle lens system having a fixed front lens group and a movable rear lens group
JPH06313845A (ja) † 1993-04-28 1994-11-08 Olympus Optical Co Ltd 投影レンズ系
JP3255490B2 (ja) * 1993-06-08 2002-02-12 富士写真光機株式会社 レトロフォーカス型大口径レンズ
US5557472A (en) * 1993-06-16 1996-09-17 Asahi Kogaku Kogyo Kabushiki Kaisha Fast aspherical lens system
US5404247A (en) * 1993-08-02 1995-04-04 International Business Machines Corporation Telecentric and achromatic f-theta scan lens system and method of use
JP3396935B2 (ja) † 1993-11-15 2003-04-14 株式会社ニコン 投影光学系及び投影露光装置
JP3360387B2 (ja) † 1993-11-15 2002-12-24 株式会社ニコン 投影光学系及び投影露光装置
JPH08179204A (ja) † 1994-11-10 1996-07-12 Nikon Corp 投影光学系及び投影露光装置
JP3500745B2 (ja) † 1994-12-14 2004-02-23 株式会社ニコン 投影光学系、投影露光装置及び投影露光方法
JP3624973B2 (ja) † 1995-10-12 2005-03-02 株式会社ニコン 投影光学系

Also Published As

Publication number Publication date
EP0803755A2 (de) 1997-10-29
KR100446130B1 (ko) 2005-07-04
EP0803755A3 (de) 2000-03-08
KR970071147A (ko) 1997-11-07
JP3750123B2 (ja) 2006-03-01
JPH09292568A (ja) 1997-11-11
EP0803755B1 (de) 2003-07-30
DE69629277T2 (de) 2004-05-13
US5781278A (en) 1998-07-14

Similar Documents

Publication Publication Date Title
DE69629277D1 (de) Optisches Projektionssystem und damit ausgerüstetes Belichtungsgerät
DE69736023D1 (de) Lichtquelleneinheit, Lichtquellengerät und Projektionsanzeigengerät
DE69532660D1 (de) Polarisations-Beleuchtungsvorrichtung und diese verwendender Projektor
DE69837358D1 (de) Beleuchtungssystem und Belichtungsapparat
DE69836459D1 (de) Optisches Element und damit versehenes optisches System
DE69624858T2 (de) Positionierungsvorrichtung und hiermit versehenes Bearbeitungssystem
DE59707065D1 (de) Lithographie-belichtungseinrichtung
DE69531153D1 (de) Optisches Projektionssystem mit Belichtungsgerät
DE69820132D1 (de) Optisches System und Bildaufnahmevorrichtung
DE69522422D1 (de) Belichtungsvorrichtung
DE69731341D1 (de) Optisches Bauelement und optisches System mit diesem
BR9704568A (pt) Aparelho e filme de fixação
KR960008429A (ko) 노광 장치
DE69726660D1 (de) Projektionsvorrichtung
DE69535447D1 (de) Drehbares Fixierteil und Fixiergerät
DE69714192T2 (de) Lichtstrahlabtastgerät und Bilderzeugungsgerät
DE69807147T2 (de) Optischer Abtaster und optisches Plattengerät
DE69738440D1 (de) Projektionsvorrichtung und optisches Beleuchtungssystem dafür
KR960008369A (ko) 투영렌즈 및 투영장치
DE69724333D1 (de) Beleuchtungssystem und Belichtungsapparat
DE69521961T2 (de) Lichtblockiervorrichtung
DE69733999D1 (de) Beleuchtungssystem und damit versehene abbildevorrichtung
DE69501923D1 (de) Blockiervorrichtung
DE69629632D1 (de) Fixierteil und Fixiergerät hiermit
BR9503272A (pt) Dispositivo e sistema de comunicações óticas

Legal Events

Date Code Title Description
8363 Opposition against the patent
8331 Complete revocation