DE4236324C1 - - Google Patents

Info

Publication number
DE4236324C1
DE4236324C1 DE4236324A DE4236324A DE4236324C1 DE 4236324 C1 DE4236324 C1 DE 4236324C1 DE 4236324 A DE4236324 A DE 4236324A DE 4236324 A DE4236324 A DE 4236324A DE 4236324 C1 DE4236324 C1 DE 4236324C1
Authority
DE
Germany
Prior art keywords
coating
buffer
gas
reservoir
mass flow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE4236324A
Other languages
German (de)
English (en)
Inventor
Hans Joachim 6507 Ingelheim De Bittner
Thomas 3353 Bad Gandersheim De Kuepper
Hans-Juergen 3353 Bad Gandersheim De Klein
Ewald 6082 Moerfelden De Moersen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Schott AG
Original Assignee
Schott Glaswerke AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Schott Glaswerke AG filed Critical Schott Glaswerke AG
Priority to DE4236324A priority Critical patent/DE4236324C1/de
Application granted granted Critical
Publication of DE4236324C1 publication Critical patent/DE4236324C1/de
Priority to CA002106734A priority patent/CA2106734C/en
Priority to DE59301634T priority patent/DE59301634D1/de
Priority to EP93116937A priority patent/EP0595175B1/de
Priority to US08/141,363 priority patent/US5480488A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
DE4236324A 1992-10-28 1992-10-28 Expired - Lifetime DE4236324C1 (sv)

Priority Applications (5)

Application Number Priority Date Filing Date Title
DE4236324A DE4236324C1 (sv) 1992-10-28 1992-10-28
CA002106734A CA2106734C (en) 1992-10-28 1993-09-22 Apparatus for supplying cvd coating devices
DE59301634T DE59301634D1 (de) 1992-10-28 1993-10-20 Vorrichtung zur Versorgung von CVD-Beschichtungseinrichtungen
EP93116937A EP0595175B1 (de) 1992-10-28 1993-10-20 Vorrichtung zur Versorgung von CVD-Beschichtungseinrichtungen
US08/141,363 US5480488A (en) 1992-10-28 1993-10-28 Apparatus for supplying CVD coating devices

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4236324A DE4236324C1 (sv) 1992-10-28 1992-10-28

Publications (1)

Publication Number Publication Date
DE4236324C1 true DE4236324C1 (sv) 1993-09-02

Family

ID=6471513

Family Applications (2)

Application Number Title Priority Date Filing Date
DE4236324A Expired - Lifetime DE4236324C1 (sv) 1992-10-28 1992-10-28
DE59301634T Expired - Lifetime DE59301634D1 (de) 1992-10-28 1993-10-20 Vorrichtung zur Versorgung von CVD-Beschichtungseinrichtungen

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE59301634T Expired - Lifetime DE59301634D1 (de) 1992-10-28 1993-10-20 Vorrichtung zur Versorgung von CVD-Beschichtungseinrichtungen

Country Status (4)

Country Link
US (1) US5480488A (sv)
EP (1) EP0595175B1 (sv)
CA (1) CA2106734C (sv)
DE (2) DE4236324C1 (sv)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10005820C1 (de) * 2000-02-10 2001-08-02 Schott Glas Gasversorungsvorrichtung für Precursoren geringen Dampfdrucks
WO2007032826A2 (en) * 2005-09-09 2007-03-22 Mks Instruments, Inc. Precursor gas delivery with carrier gas mixing
US20160208382A1 (en) * 2015-01-21 2016-07-21 Kabushiki Kaisha Toshiba Semiconductor manufacturing apparatus

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* Cited by examiner, † Cited by third party
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KR100419416B1 (ko) * 2001-11-21 2004-02-19 삼성전자주식회사 변형 화학기상 증착 공정의 원료물질 제어장치
KR100450974B1 (ko) * 2001-12-06 2004-10-02 삼성전자주식회사 변형 화학기상 증착 공정의 원료물질 기화량 유지장치
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US7638167B2 (en) * 2004-06-04 2009-12-29 Applied Microstructures, Inc. Controlled deposition of silicon-containing coatings adhered by an oxide layer
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JP2005082880A (ja) * 2003-09-11 2005-03-31 Shoka Kagi Kofun Yugenkoshi 有機ｅｌ発光装置の成膜設備
KR100589053B1 (ko) * 2003-10-15 2006-06-12 삼성전자주식회사 소스 공급 장치, 소스 공급 방법 및 이를 이용한 원자층증착 방법
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US8900695B2 (en) * 2007-02-23 2014-12-02 Applied Microstructures, Inc. Durable conformal wear-resistant carbon-doped metal oxide-comprising coating
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KR102111020B1 (ko) * 2013-05-02 2020-05-15 삼성디스플레이 주식회사 증착 장치
JP5859586B2 (ja) * 2013-12-27 2016-02-10 株式会社日立国際電気 基板処理システム、半導体装置の製造方法および記録媒体
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US11453943B2 (en) 2016-05-25 2022-09-27 Asm Ip Holding B.V. Method for forming carbon-containing silicon/metal oxide or nitride film by ALD using silicon precursor and hydrocarbon precursor
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US9887082B1 (en) 2016-07-28 2018-02-06 Asm Ip Holding B.V. Method and apparatus for filling a gap
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US11532757B2 (en) 2016-10-27 2022-12-20 Asm Ip Holding B.V. Deposition of charge trapping layers
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CA2106734C (en) 2001-07-24
US5480488A (en) 1996-01-02
EP0595175B1 (de) 1996-02-14
CA2106734A1 (en) 1994-04-29
EP0595175A1 (de) 1994-05-04

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