DE3750127D1 - Verfahren zur Herstellung eines dünnen Filmes durch Aufstäuben und Aufstäubvorrichtung vom Typ eines gegenüberliegenden Targets. - Google Patents
Verfahren zur Herstellung eines dünnen Filmes durch Aufstäuben und Aufstäubvorrichtung vom Typ eines gegenüberliegenden Targets.Info
- Publication number
- DE3750127D1 DE3750127D1 DE3750127T DE3750127T DE3750127D1 DE 3750127 D1 DE3750127 D1 DE 3750127D1 DE 3750127 T DE3750127 T DE 3750127T DE 3750127 T DE3750127 T DE 3750127T DE 3750127 D1 DE3750127 D1 DE 3750127D1
- Authority
- DE
- Germany
- Prior art keywords
- sputtering
- producing
- thin film
- target type
- opposing target
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30851786 | 1986-12-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3750127D1 true DE3750127D1 (de) | 1994-07-28 |
DE3750127T2 DE3750127T2 (de) | 1994-10-13 |
Family
ID=17981976
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE3750127T Expired - Fee Related DE3750127T2 (de) | 1986-12-26 | 1987-12-22 | Verfahren zur Herstellung eines dünnen Filmes durch Aufstäuben und Aufstäubvorrichtung vom Typ eines gegenüberliegenden Targets. |
Country Status (5)
Country | Link |
---|---|
US (1) | US4784739A (de) |
EP (1) | EP0273685B1 (de) |
JP (1) | JPS63270461A (de) |
CA (1) | CA1325792C (de) |
DE (1) | DE3750127T2 (de) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2673807B2 (ja) * | 1987-10-30 | 1997-11-05 | パイオニア株式会社 | 光磁気記録媒体の製造方法 |
US4911810A (en) * | 1988-06-21 | 1990-03-27 | Brown University | Modular sputtering apparatus |
KR970002340B1 (ko) * | 1988-07-15 | 1997-03-03 | 미쓰비시 가세이 가부시끼가이샤 | 자기 기록 매체의 제조방법 |
JPH02217467A (ja) * | 1989-02-17 | 1990-08-30 | Pioneer Electron Corp | 対向ターゲット型スパッタリング装置 |
JP2535410B2 (ja) * | 1989-06-16 | 1996-09-18 | 帝人株式会社 | 磁気記録媒体及びその製造方法 |
JP2613294B2 (ja) * | 1989-07-24 | 1997-05-21 | 帝人株式会社 | 薄膜形成方法 |
ATE140040T1 (de) * | 1991-04-12 | 1996-07-15 | Nissin Electric Co Ltd | Verfahren zur erzeugung eines metallfilms sowie durch einen aluminiumfilm beschichtetes erzeugnis |
TW271490B (de) * | 1993-05-05 | 1996-03-01 | Varian Associates | |
US6068742A (en) * | 1996-07-22 | 2000-05-30 | Balzers Aktiengesellschaft | Target arrangement with a circular plate, magnetron for mounting the target arrangement, and process for coating a series of circular disc-shaped workpieces by means of said magnetron source |
JP3886209B2 (ja) * | 1997-06-02 | 2007-02-28 | 貞夫 門倉 | 対向ターゲット式スパッタ装置 |
US6545580B2 (en) | 1998-09-09 | 2003-04-08 | Veeco Instruments, Inc. | Electromagnetic field generator and method of operation |
US7041204B1 (en) * | 2000-10-27 | 2006-05-09 | Honeywell International Inc. | Physical vapor deposition components and methods of formation |
JP4097893B2 (ja) | 2000-12-05 | 2008-06-11 | 株式会社エフ・ティ・エスコーポレーション | 対向ターゲット式スパッタ方法及び導電性膜の形成方法 |
US7294283B2 (en) * | 2001-04-20 | 2007-11-13 | Applied Process Technologies, Inc. | Penning discharge plasma source |
WO2002086185A1 (en) | 2001-04-20 | 2002-10-31 | Applied Process Technologies | Penning discharge plasma source |
JP3955744B2 (ja) | 2001-05-14 | 2007-08-08 | 淳二 城戸 | 有機薄膜素子の製造方法 |
JP4563629B2 (ja) | 2001-11-19 | 2010-10-13 | 株式会社エフ・ティ・エスコーポレーション | 対向ターゲット式スパッタ装置 |
US20040129559A1 (en) * | 2002-04-12 | 2004-07-08 | Misner Josh W. | Diffusion bonded assemblies and fabrication methods |
US7625633B2 (en) * | 2003-03-25 | 2009-12-01 | Shin-Etsu Polymer., Ltd. | Electromagnetic noise suppressor, article with electromagnetic noise suppressing function, and their manufacturing methods |
JP3897724B2 (ja) * | 2003-03-31 | 2007-03-28 | 独立行政法人科学技術振興機構 | 超小型製品用の微小、高性能焼結希土類磁石の製造方法 |
JP3965479B2 (ja) * | 2003-07-28 | 2007-08-29 | 株式会社エフ・ティ・エスコーポレーション | 箱型対向ターゲット式スパッタ装置及び化合物薄膜の製造方法 |
WO2005028697A1 (en) * | 2003-09-12 | 2005-03-31 | Applied Process Technologies, Inc. | Magnetic mirror plasma source and method using same |
US7625640B2 (en) * | 2004-02-24 | 2009-12-01 | Shin-Etsu Polymer Co., Ltd. | Electromagnetic noise suppressor, structure with electromagnetic noise suppressing function, and method of manufacturing the same |
US7112803B2 (en) * | 2004-07-23 | 2006-09-26 | Applied Materials, Israel, Ltd. | Beam directing system and method for use in a charged particle beam column |
KR100883588B1 (ko) * | 2007-03-30 | 2009-02-18 | 지 . 텍 (주) | 롤-투-롤 스퍼터 장치 |
JP6579796B2 (ja) * | 2015-05-18 | 2019-09-25 | 長州産業株式会社 | ミラートロンスパッタ装置 |
JP2020200519A (ja) * | 2019-06-12 | 2020-12-17 | 株式会社アルバック | 成膜装置 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57100627A (en) * | 1980-12-12 | 1982-06-22 | Teijin Ltd | Manufacture of vertical magnetic recording medium |
US4395323A (en) * | 1981-04-17 | 1983-07-26 | Denton Vacuum Inc. | Apparatus for improving a sputtering process |
JPS58100680A (ja) * | 1981-12-10 | 1983-06-15 | Fujitsu Ltd | スパツタリング装置 |
JPS58141433A (ja) * | 1982-02-16 | 1983-08-22 | Teijin Ltd | 磁気記録媒体とその製造方法 |
JPS5953680A (ja) * | 1982-09-21 | 1984-03-28 | Teijin Ltd | スパツタ装置 |
JPS5987039A (ja) * | 1982-11-12 | 1984-05-19 | Hitachi Ltd | 薄膜形成装置 |
JPS59116376A (ja) * | 1982-12-22 | 1984-07-05 | Teijin Ltd | 対向タ−ゲツト式スパツタ装置 |
JPS59193528A (ja) * | 1983-04-18 | 1984-11-02 | Teijin Ltd | 磁気記録媒体の製造法 |
JPS6046369A (ja) * | 1983-08-23 | 1985-03-13 | Osaka Shinku Kiki Seisakusho:Kk | 対向タ−ゲツト式スパツタ装置 |
JPS6046370A (ja) * | 1983-08-23 | 1985-03-13 | Osaka Shinku Kiki Seisakusho:Kk | 対向タ−ゲット式スパッタ装置 |
JPS60101721A (ja) * | 1983-11-05 | 1985-06-05 | Konishiroku Photo Ind Co Ltd | バリウムフエライト層の形成方法 |
JPS60106966A (ja) * | 1983-11-12 | 1985-06-12 | Konishiroku Photo Ind Co Ltd | 対向タ−ゲツト式スパツタ装置 |
JPH0245701B2 (ja) * | 1984-05-09 | 1990-10-11 | Teijin Ltd | Taikotaagetsutoshikisupatsutasochi |
JPS6134176A (ja) * | 1984-07-26 | 1986-02-18 | Teijin Ltd | 対向タ−ゲツト式スパツタ装置 |
JPS6134175A (ja) * | 1984-07-26 | 1986-02-18 | Teijin Ltd | スパツタリング装置 |
JPS61183466A (ja) * | 1985-02-12 | 1986-08-16 | Teijin Ltd | 対向タ−ゲツト式スパツタ装置 |
JPS61272374A (ja) * | 1985-05-28 | 1986-12-02 | Nec Corp | スパツタ装置 |
-
1987
- 1987-11-24 JP JP62293980A patent/JPS63270461A/ja active Granted
- 1987-12-22 EP EP87311301A patent/EP0273685B1/de not_active Expired - Lifetime
- 1987-12-22 US US07/136,866 patent/US4784739A/en not_active Expired - Lifetime
- 1987-12-22 DE DE3750127T patent/DE3750127T2/de not_active Expired - Fee Related
- 1987-12-24 CA CA000555436A patent/CA1325792C/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0273685A1 (de) | 1988-07-06 |
DE3750127T2 (de) | 1994-10-13 |
JPS63270461A (ja) | 1988-11-08 |
JPH0575827B2 (de) | 1993-10-21 |
EP0273685B1 (de) | 1994-06-22 |
US4784739A (en) | 1988-11-15 |
CA1325792C (en) | 1994-01-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |