ATE140040T1 - Verfahren zur erzeugung eines metallfilms sowie durch einen aluminiumfilm beschichtetes erzeugnis - Google Patents
Verfahren zur erzeugung eines metallfilms sowie durch einen aluminiumfilm beschichtetes erzeugnisInfo
- Publication number
- ATE140040T1 ATE140040T1 AT92106293T AT92106293T ATE140040T1 AT E140040 T1 ATE140040 T1 AT E140040T1 AT 92106293 T AT92106293 T AT 92106293T AT 92106293 T AT92106293 T AT 92106293T AT E140040 T1 ATE140040 T1 AT E140040T1
- Authority
- AT
- Austria
- Prior art keywords
- film
- ray
- slit
- aluminum
- diffraction
- Prior art date
Links
- 229910052782 aluminium Inorganic materials 0.000 title abstract 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title abstract 7
- 229910052751 metal Inorganic materials 0.000 title abstract 4
- 239000002184 metal Substances 0.000 title abstract 4
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000013078 crystal Substances 0.000 abstract 4
- 239000000758 substrate Substances 0.000 abstract 4
- 238000000034 method Methods 0.000 abstract 2
- 229920003002 synthetic resin Polymers 0.000 abstract 2
- 239000000057 synthetic resin Substances 0.000 abstract 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- 238000002441 X-ray diffraction Methods 0.000 abstract 1
- 238000002083 X-ray spectrum Methods 0.000 abstract 1
- 230000005260 alpha ray Effects 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 238000002050 diffraction method Methods 0.000 abstract 1
- 229910002804 graphite Inorganic materials 0.000 abstract 1
- 239000010439 graphite Substances 0.000 abstract 1
- 239000011261 inert gas Substances 0.000 abstract 1
- 238000010884 ion-beam technique Methods 0.000 abstract 1
- 238000005259 measurement Methods 0.000 abstract 1
- 238000002310 reflectometry Methods 0.000 abstract 1
- 238000004544 sputter deposition Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/913—Material designed to be responsive to temperature, light, moisture
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
- Y10T428/31692—Next to addition polymer from unsaturated monomers
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
- Chemically Coating (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10878591A JPH04314860A (ja) | 1991-04-12 | 1991-04-12 | 金属膜の形成方法 |
| JP02611592A JP3255682B2 (ja) | 1992-01-16 | 1992-01-16 | アルミニウム膜被着物 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE140040T1 true ATE140040T1 (de) | 1996-07-15 |
Family
ID=26363851
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT92106293T ATE140040T1 (de) | 1991-04-12 | 1992-04-10 | Verfahren zur erzeugung eines metallfilms sowie durch einen aluminiumfilm beschichtetes erzeugnis |
Country Status (9)
| Country | Link |
|---|---|
| US (2) | US5283095A (de) |
| EP (1) | EP0508478B1 (de) |
| KR (1) | KR100237085B1 (de) |
| AT (1) | ATE140040T1 (de) |
| AU (3) | AU652039B2 (de) |
| CA (1) | CA2065833C (de) |
| DE (1) | DE69211885T2 (de) |
| SG (1) | SG44529A1 (de) |
| TW (1) | TW198069B (de) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6330261B1 (en) | 1997-07-18 | 2001-12-11 | Cymer, Inc. | Reliable, modular, production quality narrow-band high rep rate ArF excimer laser |
| US6162495A (en) * | 1997-09-29 | 2000-12-19 | Cymer, Inc. | Protective overcoat for replicated diffraction gratings |
| US6511703B2 (en) * | 1997-09-29 | 2003-01-28 | Cymer, Inc. | Protective overcoat for replicated diffraction gratings |
| US6121134A (en) * | 1998-04-21 | 2000-09-19 | Micron Technology, Inc. | High aspect ratio metallization structures and processes for fabricating the same |
| US6320261B1 (en) | 1998-04-21 | 2001-11-20 | Micron Technology, Inc. | High aspect ratio metallization structures for shallow junction devices, and methods of forming the same |
| US6524674B1 (en) * | 2000-02-24 | 2003-02-25 | Glass Unlimited Of High Point, Inc. | Glass panel with simulated metal strip |
| TW493171B (en) * | 2000-03-29 | 2002-07-01 | Tdk Corp | Optical recording medium and process for manufacturing the same |
| KR100425453B1 (ko) * | 2001-07-06 | 2004-03-30 | 삼성전자주식회사 | 고밀도 플라즈마용 자석과 그 제조방법 및 이를 이용한고밀도 플라즈마용 반도체 제조장치 |
| US20040055871A1 (en) * | 2002-09-25 | 2004-03-25 | The Regents Of The University Of California | Use of ion beams for protecting substrates from particulate defect contamination in ultra-low-defect coating processes |
| US20050150758A1 (en) | 2004-01-09 | 2005-07-14 | Yakshin Andrey E. | Processes and device for the deposition of films on substrates |
| US20070269670A1 (en) * | 2006-05-17 | 2007-11-22 | Ronald Wilmer | Multilayered structures and their use as optical storage media |
| US7700167B2 (en) * | 2006-08-31 | 2010-04-20 | Honeywell International Inc. | Erosion-protective coatings on polymer-matrix composites and components incorporating such coated composites |
| US8691064B2 (en) * | 2007-07-09 | 2014-04-08 | Raytheon Canada Limited | Sputter-enhanced evaporative deposition apparatus and method |
| CN106282955A (zh) * | 2016-08-31 | 2017-01-04 | 北京埃德万斯离子束技术研究所股份有限公司 | 一种在柔性基底薄膜上制备功能性图形薄膜的方法 |
| CN115542952B (zh) * | 2022-11-30 | 2023-03-03 | 昆明理工大学 | 一种面向无人机集群智能协同系统的优化方法 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4426275A (en) * | 1981-11-27 | 1984-01-17 | Deposition Technology, Inc. | Sputtering device adaptable for coating heat-sensitive substrates |
| JPS59116376A (ja) * | 1982-12-22 | 1984-07-05 | Teijin Ltd | 対向タ−ゲツト式スパツタ装置 |
| JPS59116374A (ja) * | 1982-12-23 | 1984-07-05 | Sony Corp | 蒸着装置 |
| JPS59203994A (ja) * | 1983-05-06 | 1984-11-19 | 株式会社日立製作所 | 沸騰水型原子炉の水位計測装置 |
| US4692402A (en) * | 1986-02-20 | 1987-09-08 | Drexler Technology Corporation | Ultrathin optical recording medium with moisture barrier |
| US4767661A (en) * | 1986-09-15 | 1988-08-30 | Psi Star | Copper etching process and product |
| JPS63137158A (ja) * | 1986-11-27 | 1988-06-09 | Nissin Electric Co Ltd | アルミ薄膜の作製方法 |
| JPS63270461A (ja) * | 1986-12-26 | 1988-11-08 | Teijin Ltd | 対向ターゲット式スパッタ装置 |
| JPS63166963A (ja) * | 1986-12-27 | 1988-07-11 | Nissin Electric Co Ltd | 薄膜の製造方法 |
| DE3885937T2 (de) * | 1987-05-30 | 1994-06-01 | Kuraray Co | Medium für optische Aufzeichnung und das Medium verwendendes Aufzeichnungsverfahren. |
| JP2610133B2 (ja) * | 1987-07-23 | 1997-05-14 | 国際電信電話株式会社 | 双方向光増幅器を用いた多地点間光増幅中継装置 |
| JPH01232549A (ja) * | 1987-11-11 | 1989-09-18 | Toshiba Corp | 光ディスク及びその製造方法 |
| DE68928852T2 (de) * | 1988-09-28 | 1999-05-20 | Toray Industries, Inc., Tokio/Tokyo | Aluminium-vakuumverdämpfungsfilm und verfahren zur herstellung |
| US5064520A (en) * | 1989-02-15 | 1991-11-12 | Hitachi, Ltd. | Method and apparatus for forming a film |
| JPH02217467A (ja) * | 1989-02-17 | 1990-08-30 | Pioneer Electron Corp | 対向ターゲット型スパッタリング装置 |
| US5075145A (en) * | 1989-04-07 | 1991-12-24 | Fuji Photo Film Co., Ltd. | Optical recording medium |
| DE3934092A1 (de) * | 1989-10-12 | 1991-04-18 | Leybold Ag | Vorrichtung zum beschichten eines kunststoffsubstrats, vorzugsweise eines polymethylmethacrylat-substrats mit aluminium |
-
1992
- 1992-04-10 AT AT92106293T patent/ATE140040T1/de not_active IP Right Cessation
- 1992-04-10 AU AU14857/92A patent/AU652039B2/en not_active Ceased
- 1992-04-10 KR KR1019920005941A patent/KR100237085B1/ko not_active Expired - Fee Related
- 1992-04-10 SG SG1996001567A patent/SG44529A1/en unknown
- 1992-04-10 CA CA 2065833 patent/CA2065833C/en not_active Expired - Fee Related
- 1992-04-10 EP EP19920106293 patent/EP0508478B1/de not_active Expired - Lifetime
- 1992-04-10 DE DE69211885T patent/DE69211885T2/de not_active Expired - Fee Related
- 1992-04-10 US US07/866,358 patent/US5283095A/en not_active Expired - Lifetime
- 1992-04-11 TW TW81102874A patent/TW198069B/zh active
-
1993
- 1993-11-05 US US08/130,199 patent/US5431794A/en not_active Expired - Lifetime
-
1994
- 1994-04-19 AU AU60569/94A patent/AU6056994A/en not_active Abandoned
- 1994-04-19 AU AU60570/94A patent/AU659594B2/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| AU1485792A (en) | 1992-10-15 |
| EP0508478A1 (de) | 1992-10-14 |
| KR920019964A (ko) | 1992-11-20 |
| TW198069B (de) | 1993-01-11 |
| EP0508478B1 (de) | 1996-07-03 |
| KR100237085B1 (ko) | 2000-01-15 |
| AU659594B2 (en) | 1995-05-18 |
| CA2065833C (en) | 1997-12-30 |
| AU652039B2 (en) | 1994-08-11 |
| CA2065833A1 (en) | 1992-10-13 |
| AU6056994A (en) | 1994-06-16 |
| DE69211885D1 (de) | 1996-08-08 |
| SG44529A1 (en) | 1997-12-19 |
| AU6057094A (en) | 1994-06-23 |
| US5431794A (en) | 1995-07-11 |
| US5283095A (en) | 1994-02-01 |
| DE69211885T2 (de) | 1996-10-31 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ATE140040T1 (de) | Verfahren zur erzeugung eines metallfilms sowie durch einen aluminiumfilm beschichtetes erzeugnis | |
| Blackett | Further measurements of the cosmic-ray energy spectrum | |
| JPS5766996A (en) | Information recording member and method of preparing thereof | |
| Boettinger et al. | Asymmetric crystal topographic camera | |
| CA1262836A (en) | Laue camera | |
| Hashizume et al. | Backreflection x‐ray standing waves and crystal truncation rods as structure probe for epilayer–substrate systems | |
| JPH0377442B2 (de) | ||
| CA2199424A1 (en) | Process for Forming Metal Film on Surface of Synthetic Resin Substrate | |
| Humphreys et al. | Additional image peaks in the high resolution imaging of dislocations | |
| JPS5720919A (en) | Magnetic recording medium and its manufacture | |
| Watson et al. | Coherent bremsstrahlung and channeling radiation from MeV electrons in silicon and gold | |
| HK93787A (en) | Polarizing film and method of making same | |
| Martens et al. | The anomalous dispersion of the refractive index and the extended X-ray absorption fine structure at the K edge of Cu | |
| JPS55121441A (en) | Mask for far ultraviolet exposure | |
| Noggle et al. | Effect of Channeling on Damage Rates Associated with Heavy‐Ion Irradiation of Gold | |
| JPS56130742A (en) | Novel recording material | |
| Abeles et al. | Electronic structure of amorphous semiconductor heterojunctions by photoemission and photoabsorption spectroscopy | |
| JPS54866A (en) | Molecular beam crystal growing device | |
| Van Brug et al. | Si L-edge structures in the soft x-ray reflectivity of laser-annealed Si surfaces (with Ni overlayers) | |
| JPS61276222A (ja) | Ｘ線露光アライメント方法 | |
| Priggemeyer et al. | Crater formation in oxidic materials generated by using ion-and laser beams | |
| JPS58130522A (ja) | 電子ビ−ム露光装置 | |
| US6051115A (en) | Adhesive strength increasing method for metal thin film | |
| JPS57208630A (en) | Vertical magnetic recording medium | |
| Craven et al. | Small angle electron scattering in a Si and a Si: H films |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| UEP | Publication of translation of european patent specification | ||
| REN | Ceased due to non-payment of the annual fee |