DE3242899C2 - Wäßrige Entmetallisierungszusammensetzung zur Entfernung von Zinn und Zinn-Blei-Legierungen von einem Metallsubstrat - Google Patents
Wäßrige Entmetallisierungszusammensetzung zur Entfernung von Zinn und Zinn-Blei-Legierungen von einem MetallsubstratInfo
- Publication number
- DE3242899C2 DE3242899C2 DE3242899A DE3242899A DE3242899C2 DE 3242899 C2 DE3242899 C2 DE 3242899C2 DE 3242899 A DE3242899 A DE 3242899A DE 3242899 A DE3242899 A DE 3242899A DE 3242899 C2 DE3242899 C2 DE 3242899C2
- Authority
- DE
- Germany
- Prior art keywords
- component
- tin
- copper
- hydrogen peroxide
- udf54
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 24
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 title claims abstract description 18
- 239000002184 metal Substances 0.000 title claims abstract description 17
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 17
- 229910001174 tin-lead alloy Inorganic materials 0.000 title claims abstract description 11
- 229910001128 Sn alloy Inorganic materials 0.000 title claims abstract description 9
- 239000000203 mixture Substances 0.000 title claims description 52
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims abstract description 100
- LDDQLRUQCUTJBB-UHFFFAOYSA-O azanium;hydrofluoride Chemical compound [NH4+].F LDDQLRUQCUTJBB-UHFFFAOYSA-O 0.000 claims abstract description 22
- 239000005725 8-Hydroxyquinoline Substances 0.000 claims abstract description 21
- 229960003540 oxyquinoline Drugs 0.000 claims abstract description 21
- 239000002253 acid Substances 0.000 claims abstract description 14
- -1 8-hydroxyquinoline compound Chemical class 0.000 claims description 10
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical group C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 abstract description 17
- 239000008139 complexing agent Substances 0.000 abstract description 14
- 239000000126 substance Substances 0.000 abstract description 7
- 150000004325 8-hydroxyquinolines Chemical class 0.000 abstract description 5
- 229960002163 hydrogen peroxide Drugs 0.000 description 39
- 239000000243 solution Substances 0.000 description 39
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 38
- 229910052802 copper Inorganic materials 0.000 description 38
- 239000010949 copper Substances 0.000 description 38
- 229910000679 solder Inorganic materials 0.000 description 30
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 27
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 15
- 239000003381 stabilizer Substances 0.000 description 10
- 239000001117 sulphuric acid Substances 0.000 description 9
- 235000011149 sulphuric acid Nutrition 0.000 description 9
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical group N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 6
- 238000000354 decomposition reaction Methods 0.000 description 5
- 238000007598 dipping method Methods 0.000 description 5
- 239000007921 spray Substances 0.000 description 5
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 229910001431 copper ion Inorganic materials 0.000 description 4
- 238000009472 formulation Methods 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- YXLXNENXOJSQEI-UHFFFAOYSA-L Oxine-copper Chemical compound [Cu+2].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 YXLXNENXOJSQEI-UHFFFAOYSA-L 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
- SMWDFEZZVXVKRB-UHFFFAOYSA-N anhydrous quinoline Natural products N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 3
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000005554 pickling Methods 0.000 description 3
- 239000010970 precious metal Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- SLINHMUFWFWBMU-UHFFFAOYSA-N Triisopropanolamine Chemical compound CC(O)CN(CC(C)O)CC(C)O SLINHMUFWFWBMU-UHFFFAOYSA-N 0.000 description 2
- LDDQLRUQCUTJBB-UHFFFAOYSA-N ammonium fluoride Chemical compound [NH4+].[F-] LDDQLRUQCUTJBB-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000005189 flocculation Methods 0.000 description 2
- 230000016615 flocculation Effects 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 2
- 238000003760 magnetic stirring Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000007800 oxidant agent Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229920002401 polyacrylamide Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- 239000011550 stock solution Substances 0.000 description 2
- 238000009736 wetting Methods 0.000 description 2
- GOEKBPHGLUYFOX-UHFFFAOYSA-N 2-hydroxybenzoic acid;quinolin-8-ol Chemical compound OC(=O)C1=CC=CC=C1O.C1=CN=C2C(O)=CC=CC2=C1 GOEKBPHGLUYFOX-UHFFFAOYSA-N 0.000 description 1
- XSZAFFNTZZCCAX-UHFFFAOYSA-N 8-hydroxy-6-methylquinoline-5-sulfonic acid Chemical compound N1=CC=CC2=C(S(O)(=O)=O)C(C)=CC(O)=C21 XSZAFFNTZZCCAX-UHFFFAOYSA-N 0.000 description 1
- 239000005569 Iron sulphate Substances 0.000 description 1
- 229910017665 NH4HF2 Inorganic materials 0.000 description 1
- CWRVKFFCRWGWCS-UHFFFAOYSA-N Pentrazole Chemical compound C1CCCCC2=NN=NN21 CWRVKFFCRWGWCS-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000005840 aryl radicals Chemical class 0.000 description 1
- 238000004061 bleaching Methods 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- 238000007324 demetalation reaction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011152 fibreglass Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 235000011007 phosphoric acid Nutrition 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- 229960001106 phthalylsulfathiazole Drugs 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000000256 polyoxyethylene sorbitan monolaurate Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 150000003248 quinolines Chemical class 0.000 description 1
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 1
- 229940081974 saccharin Drugs 0.000 description 1
- 235000019204 saccharin Nutrition 0.000 description 1
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
- B23K35/3601—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest with inorganic compounds as principal constituents
- B23K35/3603—Halide salts
- B23K35/3605—Fluorides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/44—Compositions for etching metallic material from a metallic material substrate of different composition
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/067—Etchants
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB8135327 | 1981-11-24 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3242899A1 DE3242899A1 (de) | 1983-06-01 |
| DE3242899C2 true DE3242899C2 (de) | 1987-03-19 |
Family
ID=10526092
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE3242899A Expired DE3242899C2 (de) | 1981-11-24 | 1982-11-20 | Wäßrige Entmetallisierungszusammensetzung zur Entfernung von Zinn und Zinn-Blei-Legierungen von einem Metallsubstrat |
Country Status (15)
| Country | Link |
|---|---|
| US (1) | US4410396A ( ) |
| JP (1) | JPS6043436B2 ( ) |
| AU (1) | AU557227B2 ( ) |
| BE (1) | BE895126A ( ) |
| BR (1) | BR8206783A ( ) |
| CA (1) | CA1196560A ( ) |
| CH (1) | CH654597A5 ( ) |
| DE (1) | DE3242899C2 ( ) |
| DK (1) | DK521882A ( ) |
| ES (1) | ES8404421A1 ( ) |
| FR (1) | FR2516930B1 ( ) |
| HK (1) | HK57988A ( ) |
| IT (1) | IT1197435B ( ) |
| NL (1) | NL8204579A ( ) |
| SE (1) | SE8206447L ( ) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4536322A (en) * | 1983-10-28 | 1985-08-20 | Union Carbide Corporation | Fluorescent corrosive fluoride solution |
| AT380493B (de) * | 1984-06-18 | 1986-05-26 | Kapsch Ag | Mittel zur chemischen oberflaechenbehandlung von metallen |
| DE3623504A1 (de) * | 1986-07-09 | 1988-01-21 | Schering Ag | Kupferaetzloesungen |
| CH674851A5 ( ) * | 1987-12-01 | 1990-07-31 | Bbc Brown Boveri & Cie | |
| JPH0260682U ( ) * | 1988-10-27 | 1990-05-07 | ||
| US5232619A (en) * | 1990-10-19 | 1993-08-03 | Praxair S.T. Technology, Inc. | Stripping solution for stripping compounds of titanium from base metals |
| US5219484A (en) * | 1991-04-25 | 1993-06-15 | Applied Electroless Concepts Inc. | Solder and tin stripper compositions |
| US5211807A (en) * | 1991-07-02 | 1993-05-18 | Microelectronics Computer & Technology | Titanium-tungsten etching solutions |
| US5421906A (en) * | 1993-04-05 | 1995-06-06 | Enclean Environmental Services Group, Inc. | Methods for removal of contaminants from surfaces |
| US5728660A (en) * | 1993-04-05 | 1998-03-17 | Eet, Inc. | Extraction fluids for removal of contaminants from surfaces |
| US5961736A (en) * | 1993-04-05 | 1999-10-05 | Active Environmental Technologies, Inc. | Method for removal of contaminants from surfaces |
| US5741432A (en) * | 1995-01-17 | 1998-04-21 | The Dexter Corporation | Stabilized nitric acid compositions |
| US5512201A (en) * | 1995-02-13 | 1996-04-30 | Applied Chemical Technologies, Inc. | Solder and tin stripper composition |
| US6248704B1 (en) | 1999-05-03 | 2001-06-19 | Ekc Technology, Inc. | Compositions for cleaning organic and plasma etched residues for semiconductors devices |
| US6394114B1 (en) | 1999-11-22 | 2002-05-28 | Chartered Semiconductor Manufacturing Ltd. | Method for stripping copper in damascene interconnects |
| JP2002114993A (ja) * | 2000-10-10 | 2002-04-16 | Tokyo Electron Ltd | 洗浄剤及び洗浄方法 |
| JP2002113431A (ja) * | 2000-10-10 | 2002-04-16 | Tokyo Electron Ltd | 洗浄方法 |
| US7405189B2 (en) * | 2001-07-25 | 2008-07-29 | Cheon Young Chemical Co., Ltd. | Surface treatment composition and method for removing Si component and reduced metal salt produced on the aluminum die cast material in etching process |
| KR100464858B1 (ko) * | 2002-08-23 | 2005-01-05 | 삼성전자주식회사 | 유기 스트리핑 조성물 및 이를 사용한 산화물 식각 방법 |
| US6960370B2 (en) | 2003-03-27 | 2005-11-01 | Scimed Life Systems, Inc. | Methods of forming medical devices |
| US7867404B2 (en) * | 2005-11-15 | 2011-01-11 | Joel Allen Deutsch | Method for converting electrical components |
| CN102234513A (zh) * | 2010-04-20 | 2011-11-09 | 深圳富泰宏精密工业有限公司 | 含钛膜层的退镀液及其使用方法 |
| WO2012048079A2 (en) | 2010-10-06 | 2012-04-12 | Advanced Technology Materials, Inc. | Composition and process for selectively etching metal nitrides |
| CN113984465A (zh) * | 2021-10-12 | 2022-01-28 | 江西洪都航空工业集团有限责任公司 | 一种用于溶解钎锡焊料的溶解液及溶解方法 |
| CN114622211B (zh) * | 2022-03-23 | 2023-08-15 | 金盟科技（深圳）有限公司 | 基于拉白工艺的铝环保漂白处理剂复配物制备方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3597290A (en) * | 1968-03-25 | 1971-08-03 | Mitsubishi Edogawa Kagaku Kk | Method for chemically dissolving metal |
| US3986970A (en) * | 1973-05-02 | 1976-10-19 | The Furukawa Electric Co., Ltd. | Solution for chemical dissolution treatment of tin or alloys thereof |
| US3990982A (en) * | 1974-12-18 | 1976-11-09 | Rbp Chemical Corporation | Composition for stripping lead-tin solder |
| FR2297906A1 (fr) * | 1975-01-14 | 1976-08-13 | Ugine Kuhlmann | Stabilisation du peroxyde d'hydrogene dans les bains acides pour le decapage des metaux |
| US4306933A (en) * | 1980-02-11 | 1981-12-22 | Chemline Industries | Tin/tin-lead stripping solutions |
-
1982
- 1982-11-12 CA CA000415427A patent/CA1196560A/en not_active Expired
- 1982-11-12 SE SE8206447A patent/SE8206447L/ not_active Application Discontinuation
- 1982-11-20 DE DE3242899A patent/DE3242899C2/de not_active Expired
- 1982-11-22 IT IT49544/82A patent/IT1197435B/it active
- 1982-11-23 US US06/443,977 patent/US4410396A/en not_active Expired - Fee Related
- 1982-11-23 ES ES517620A patent/ES8404421A1/es not_active Expired
- 1982-11-23 DK DK521882A patent/DK521882A/da unknown
- 1982-11-23 FR FR8219601A patent/FR2516930B1/fr not_active Expired
- 1982-11-23 BR BR8206783A patent/BR8206783A/pt not_active IP Right Cessation
- 1982-11-24 BE BE0/209557A patent/BE895126A/fr not_active IP Right Cessation
- 1982-11-24 CH CH6855/82A patent/CH654597A5/de not_active IP Right Cessation
- 1982-11-24 AU AU90864/82A patent/AU557227B2/en not_active Ceased
- 1982-11-24 JP JP57205916A patent/JPS6043436B2/ja not_active Expired
- 1982-11-24 NL NL8204579A patent/NL8204579A/nl unknown
-
1988
- 1988-07-28 HK HK579/88A patent/HK57988A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| HK57988A (en) | 1988-08-05 |
| DE3242899A1 (de) | 1983-06-01 |
| ES517620A0 (es) | 1984-04-16 |
| AU9086482A (en) | 1983-06-02 |
| BR8206783A (pt) | 1983-10-04 |
| SE8206447L (sv) | 1983-05-25 |
| CA1196560A (en) | 1985-11-12 |
| JPS6043436B2 (ja) | 1985-09-27 |
| FR2516930B1 (fr) | 1985-10-04 |
| SE8206447D0 (sv) | 1982-11-12 |
| ES8404421A1 (es) | 1984-04-16 |
| DK521882A (da) | 1983-05-25 |
| FR2516930A1 (fr) | 1983-05-27 |
| NL8204579A (nl) | 1983-06-16 |
| US4410396A (en) | 1983-10-18 |
| IT1197435B (it) | 1988-11-30 |
| JPS5896878A (ja) | 1983-06-09 |
| AU557227B2 (en) | 1986-12-11 |
| CH654597A5 (de) | 1986-02-28 |
| BE895126A (fr) | 1983-05-24 |
| IT8249544A0 (it) | 1982-11-22 |
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