DE2919086C2 - Verfahren zur kontinuierlichen Herstellung von hochreinem Silizium durch thermische Zersetzung von Tribromsilan - Google Patents
Verfahren zur kontinuierlichen Herstellung von hochreinem Silizium durch thermische Zersetzung von TribromsilanInfo
- Publication number
- DE2919086C2 DE2919086C2 DE2919086A DE2919086A DE2919086C2 DE 2919086 C2 DE2919086 C2 DE 2919086C2 DE 2919086 A DE2919086 A DE 2919086A DE 2919086 A DE2919086 A DE 2919086A DE 2919086 C2 DE2919086 C2 DE 2919086C2
- Authority
- DE
- Germany
- Prior art keywords
- silicon
- tribromosilane
- thermal decomposition
- reaction vessel
- continuous production
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052710 silicon Inorganic materials 0.000 title claims description 21
- 239000010703 silicon Substances 0.000 title claims description 21
- IBOKZQNMFSHYNQ-UHFFFAOYSA-N tribromosilane Chemical group Br[SiH](Br)Br IBOKZQNMFSHYNQ-UHFFFAOYSA-N 0.000 title claims description 16
- 238000000034 method Methods 0.000 title claims description 14
- 238000005979 thermal decomposition reaction Methods 0.000 title claims description 7
- 238000010924 continuous production Methods 0.000 title claims description 5
- 238000006243 chemical reaction Methods 0.000 claims description 24
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 18
- 230000008021 deposition Effects 0.000 claims description 8
- 239000002245 particle Substances 0.000 claims description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 239000006227 byproduct Substances 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 238000000354 decomposition reaction Methods 0.000 description 4
- 239000011856 silicon-based particle Substances 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- -1 silicon halides Chemical class 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- 230000009969 flowable effect Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229910003691 SiBr Inorganic materials 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 231100001261 hazardous Toxicity 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 230000004584 weight gain Effects 0.000 description 1
- 235000019786 weight gain Nutrition 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US93500978A | 1978-08-18 | 1978-08-18 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE2919086A1 DE2919086A1 (de) | 1980-03-06 |
| DE2919086C2 true DE2919086C2 (de) | 1986-10-16 |
Family
ID=25466438
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2919086A Expired DE2919086C2 (de) | 1978-08-18 | 1979-05-11 | Verfahren zur kontinuierlichen Herstellung von hochreinem Silizium durch thermische Zersetzung von Tribromsilan |
| DE2954368A Expired DE2954368C2 (de) | 1978-08-18 | 1979-05-11 | Verfahren zur kontinuierlichen Herstellung von hochreinem Silizium durch thermische Zersetzung von Tribromsilan |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2954368A Expired DE2954368C2 (de) | 1978-08-18 | 1979-05-11 | Verfahren zur kontinuierlichen Herstellung von hochreinem Silizium durch thermische Zersetzung von Tribromsilan |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS5527890A (ja) |
| CA (1) | CA1145117A (ja) |
| DE (2) | DE2919086C2 (ja) |
| FR (1) | FR2433479B1 (ja) |
| GB (1) | GB2028289B (ja) |
| IT (1) | IT1193203B (ja) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4676967A (en) * | 1978-08-23 | 1987-06-30 | Union Carbide Corporation | High purity silane and silicon production |
| US4374182A (en) * | 1980-07-07 | 1983-02-15 | Dow Corning Corporation | Preparation of silicon metal through polymer degradation |
| US4390510A (en) | 1982-02-16 | 1983-06-28 | General Electric Company | Process for treating spent silicon-containing reaction masses to produce halosilanes |
| JPS61101410A (ja) * | 1984-10-24 | 1986-05-20 | Hiroshi Ishizuka | 多結晶珪素の製造法及びそのための装置 |
| US4696834A (en) * | 1986-02-28 | 1987-09-29 | Dow Corning Corporation | Silicon-containing coatings and a method for their preparation |
| US4743344A (en) * | 1986-03-26 | 1988-05-10 | Union Carbide Corporation | Treatment of wastes from high purity silicon process |
| US4871524A (en) * | 1987-09-03 | 1989-10-03 | Ethyl Corporation | Hydrogen purification process |
| EP1786730A2 (en) * | 2004-07-16 | 2007-05-23 | Institutt For Energiteknikk | Method and reactor for continuous production of semiconductor grade silicon |
| US7780938B2 (en) | 2006-04-13 | 2010-08-24 | Cabot Corporation | Production of silicon through a closed-loop process |
| US7935327B2 (en) * | 2006-08-30 | 2011-05-03 | Hemlock Semiconductor Corporation | Silicon production with a fluidized bed reactor integrated into a siemens-type process |
| US7656661B2 (en) * | 2007-07-31 | 2010-02-02 | Donald Shaum | Electronic apparatus with multiple data input modes |
| DE102008017304A1 (de) * | 2008-03-31 | 2009-10-01 | Schmid Silicon Technology Gmbh | Verfahren und Anlage zur Herstellung von Reinstsilizium |
| DE102009032833A1 (de) | 2009-07-08 | 2011-01-13 | Schmid Silicon Technology Gmbh | Verfahren und Anlage zur Herstellung von Monosilan |
| DE102009037155B3 (de) | 2009-08-04 | 2010-11-04 | Schmid Silicon Technology Gmbh | Verfahren und Anlage zur Herstellung von Trichlorsilan |
| DE102009037154B3 (de) | 2009-08-04 | 2010-12-09 | Schmid Silicon Technology Gmbh | Verfahren zur Herstellung von Monosilan |
| DE102010000981A1 (de) | 2010-01-18 | 2011-07-21 | Evonik Degussa GmbH, 45128 | Closed loop-Verfahren zur Herstellung von Trichlorsilan aus metallurgischem Silicium |
| DE102010034469A1 (de) | 2010-08-06 | 2012-02-09 | Schmid Silicon Technology Gmbh | Anlage zur Herstellung von Monosilan |
| US8449848B2 (en) | 2010-10-22 | 2013-05-28 | Memc Electronic Materials, Inc. | Production of polycrystalline silicon in substantially closed-loop systems |
| US20120100061A1 (en) | 2010-10-22 | 2012-04-26 | Memc Electronic Materials, Inc. | Production of Polycrystalline Silicon in Substantially Closed-loop Processes |
| CN103153855A (zh) * | 2010-10-22 | 2013-06-12 | Memc电子材料有限公司 | 在基本闭环的方法和系统中制备多晶硅 |
| DE102011089695A1 (de) | 2011-12-22 | 2013-06-27 | Schmid Silicon Technology Gmbh | Reaktor und Verfahren zur Herstellung von Reinstsilizium |
| DE102015203618A1 (de) | 2015-02-27 | 2016-09-01 | Schmid Silicon Technology Gmbh | Kolonne und Verfahren zur Disproportionierung von Chlorsilanen zu Monosilan und Tetrachlorsilan sowie Anlage zur Gewinnung von Monosilan |
| DE102015209008A1 (de) | 2015-05-15 | 2016-11-17 | Schmid Silicon Technology Gmbh | Verfahren und Anlage zur Zersetzung von Monosilan |
| JPWO2017183487A1 (ja) * | 2016-04-21 | 2019-03-07 | 株式会社トクヤマ | 金属粉末の製造方法 |
| DE102019209898A1 (de) | 2019-07-04 | 2021-01-07 | Schmid Silicon Technology Gmbh | Vorrichtung und Verfahren zur Bildung von flüssigem Silizium |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2595620A (en) * | 1948-11-27 | 1952-05-06 | Union Carbide & Carbon Corp | Hydrogenation of halogenosilanes |
| DE1054436B (de) * | 1956-02-11 | 1959-04-09 | Pechiney Prod Chimiques Sa | Verfahren zur Herstellung von kompaktem Silicium hohen Reinheitsgrades |
| BE571013A (ja) * | 1957-09-07 | |||
| US3012861A (en) * | 1960-01-15 | 1961-12-12 | Du Pont | Production of silicon |
| GB1498266A (en) * | 1974-05-13 | 1978-01-18 | Texas Instruments Inc | Method of silicon production |
| DE2620739A1 (de) * | 1976-05-11 | 1977-12-01 | Wacker Chemitronic | Verfahren zur herstellung von hochreinem silicium |
| US4117094A (en) * | 1977-06-13 | 1978-09-26 | Texas Instruments Incorporated | Process for silicon and trichlorosilane production |
-
1979
- 1979-05-04 GB GB7915583A patent/GB2028289B/en not_active Expired
- 1979-05-11 DE DE2919086A patent/DE2919086C2/de not_active Expired
- 1979-05-11 DE DE2954368A patent/DE2954368C2/de not_active Expired
- 1979-05-15 CA CA000327660A patent/CA1145117A/en not_active Expired
- 1979-05-16 FR FR7912469A patent/FR2433479B1/fr not_active Expired
- 1979-05-17 IT IT22753/79A patent/IT1193203B/it active
- 1979-05-17 JP JP5980079A patent/JPS5527890A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5527890A (en) | 1980-02-28 |
| DE2954368C2 (de) | 1986-10-16 |
| DE2919086A1 (de) | 1980-03-06 |
| DE2954368A1 (ja) | 1984-07-12 |
| GB2028289B (en) | 1982-09-02 |
| FR2433479A1 (fr) | 1980-03-14 |
| IT1193203B (it) | 1988-06-15 |
| IT7922753A0 (it) | 1979-05-17 |
| JPS6228083B2 (ja) | 1987-06-18 |
| FR2433479B1 (fr) | 1985-10-18 |
| GB2028289A (en) | 1980-03-05 |
| CA1145117A (en) | 1983-04-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OD | Request for examination | ||
| 8125 | Change of the main classification |
Ipc: C09K 11/02 |
|
| 8172 | Supplementary division/partition in: |
Ref country code: DE Ref document number: 2954368 Format of ref document f/p: P |
|
| Q171 | Divided out to: |
Ref country code: DE Ref document number: 2954368 |
|
| AH | Division in |
Ref country code: DE Ref document number: 2954368 Format of ref document f/p: P |
|
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |