JPS5527890A - Manufacture of highly pure silicon - Google Patents

Manufacture of highly pure silicon

Info

Publication number
JPS5527890A
JPS5527890A JP5980079A JP5980079A JPS5527890A JP S5527890 A JPS5527890 A JP S5527890A JP 5980079 A JP5980079 A JP 5980079A JP 5980079 A JP5980079 A JP 5980079A JP S5527890 A JPS5527890 A JP S5527890A
Authority
JP
Japan
Prior art keywords
manufacture
highly pure
pure silicon
silicon
highly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5980079A
Other languages
English (en)
Other versions
JPS6228083B2 (ja
Inventor
Emu Uoonaa Ruroido
Bii Moore Edowaado
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JIEE SHII SHIYUMATSUCHIYAA CO
Original Assignee
JIEE SHII SHIYUMATSUCHIYAA CO
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JIEE SHII SHIYUMATSUCHIYAA CO filed Critical JIEE SHII SHIYUMATSUCHIYAA CO
Publication of JPS5527890A publication Critical patent/JPS5527890A/ja
Publication of JPS6228083B2 publication Critical patent/JPS6228083B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
JP5980079A 1978-08-18 1979-05-17 Manufacture of highly pure silicon Granted JPS5527890A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US93500978A 1978-08-18 1978-08-18

Publications (2)

Publication Number Publication Date
JPS5527890A true JPS5527890A (en) 1980-02-28
JPS6228083B2 JPS6228083B2 (ja) 1987-06-18

Family

ID=25466438

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5980079A Granted JPS5527890A (en) 1978-08-18 1979-05-17 Manufacture of highly pure silicon

Country Status (6)

Country Link
JP (1) JPS5527890A (ja)
CA (1) CA1145117A (ja)
DE (2) DE2919086C2 (ja)
FR (1) FR2433479B1 (ja)
GB (1) GB2028289B (ja)
IT (1) IT1193203B (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008506621A (ja) * 2004-07-16 2008-03-06 インスティチュート フォー エネルギーテックニック 半導体級（ｓｅｇ）シリコンを連続生産するための方法およびリアクタ
JP2010502542A (ja) * 2006-08-30 2010-01-28 ヘムロック・セミコンダクター・コーポレーション シーメンスタイププロセスに組み込まれた流動床反応器によるシリコンの製造
JP2013500927A (ja) * 2009-08-04 2013-01-10 シュミット シリコン テクノロジー ゲゼルシャフト ミット ベシュレンクテル ハフツング モノシランを製造するための設備および方法
JP2013540095A (ja) * 2010-10-22 2013-10-31 エムイーエムシー・エレクトロニック・マテリアルズ・インコーポレイテッド 実質的に閉ループの方法およびシステムにおける多結晶シリコンの製造
CN108883942A (zh) * 2016-04-21 2018-11-23 株式会社德山 金属粉末的制造方法

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4676967A (en) * 1978-08-23 1987-06-30 Union Carbide Corporation High purity silane and silicon production
US4374182A (en) * 1980-07-07 1983-02-15 Dow Corning Corporation Preparation of silicon metal through polymer degradation
US4390510A (en) 1982-02-16 1983-06-28 General Electric Company Process for treating spent silicon-containing reaction masses to produce halosilanes
JPS61101410A (ja) * 1984-10-24 1986-05-20 Hiroshi Ishizuka 多結晶珪素の製造法及びそのための装置
US4696834A (en) * 1986-02-28 1987-09-29 Dow Corning Corporation Silicon-containing coatings and a method for their preparation
US4743344A (en) * 1986-03-26 1988-05-10 Union Carbide Corporation Treatment of wastes from high purity silicon process
US4871524A (en) * 1987-09-03 1989-10-03 Ethyl Corporation Hydrogen purification process
WO2007120871A2 (en) * 2006-04-13 2007-10-25 Cabot Corporation Production of silicon through a closed-loop process
US7656661B2 (en) * 2007-07-31 2010-02-02 Donald Shaum Electronic apparatus with multiple data input modes
DE102008017304A1 (de) 2008-03-31 2009-10-01 Schmid Silicon Technology Gmbh Verfahren und Anlage zur Herstellung von Reinstsilizium
DE102009032833A1 (de) 2009-07-08 2011-01-13 Schmid Silicon Technology Gmbh Verfahren und Anlage zur Herstellung von Monosilan
DE102009037155B3 (de) 2009-08-04 2010-11-04 Schmid Silicon Technology Gmbh Verfahren und Anlage zur Herstellung von Trichlorsilan
DE102010000981A1 (de) 2010-01-18 2011-07-21 Evonik Degussa GmbH, 45128 Closed loop-Verfahren zur Herstellung von Trichlorsilan aus metallurgischem Silicium
DE102010034469A1 (de) 2010-08-06 2012-02-09 Schmid Silicon Technology Gmbh Anlage zur Herstellung von Monosilan
US20120100061A1 (en) 2010-10-22 2012-04-26 Memc Electronic Materials, Inc. Production of Polycrystalline Silicon in Substantially Closed-loop Processes
US8449848B2 (en) 2010-10-22 2013-05-28 Memc Electronic Materials, Inc. Production of polycrystalline silicon in substantially closed-loop systems
DE102011089695A1 (de) 2011-12-22 2013-06-27 Schmid Silicon Technology Gmbh Reaktor und Verfahren zur Herstellung von Reinstsilizium
DE102015203618A1 (de) 2015-02-27 2016-09-01 Schmid Silicon Technology Gmbh Kolonne und Verfahren zur Disproportionierung von Chlorsilanen zu Monosilan und Tetrachlorsilan sowie Anlage zur Gewinnung von Monosilan
DE102015209008A1 (de) 2015-05-15 2016-11-17 Schmid Silicon Technology Gmbh Verfahren und Anlage zur Zersetzung von Monosilan
DE102019209898A1 (de) 2019-07-04 2021-01-07 Schmid Silicon Technology Gmbh Vorrichtung und Verfahren zur Bildung von flüssigem Silizium

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2943918A (en) * 1956-02-11 1960-07-05 Pechiney Prod Chimiques Sa Process for manufacturing dense, extra pure silicon
JPS50155423A (ja) * 1974-05-13 1975-12-15
JPS52136831A (en) * 1976-05-11 1977-11-15 Wacker Chemitronic Producing method of high purity silicon

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2595620A (en) * 1948-11-27 1952-05-06 Union Carbide & Carbon Corp Hydrogenation of halogenosilanes
NL231067A (ja) * 1957-09-07
US3012861A (en) * 1960-01-15 1961-12-12 Du Pont Production of silicon
US4117094A (en) * 1977-06-13 1978-09-26 Texas Instruments Incorporated Process for silicon and trichlorosilane production

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2943918A (en) * 1956-02-11 1960-07-05 Pechiney Prod Chimiques Sa Process for manufacturing dense, extra pure silicon
JPS50155423A (ja) * 1974-05-13 1975-12-15
JPS52136831A (en) * 1976-05-11 1977-11-15 Wacker Chemitronic Producing method of high purity silicon

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008506621A (ja) * 2004-07-16 2008-03-06 インスティチュート フォー エネルギーテックニック 半導体級（ｓｅｇ）シリコンを連続生産するための方法およびリアクタ
JP2010502542A (ja) * 2006-08-30 2010-01-28 ヘムロック・セミコンダクター・コーポレーション シーメンスタイププロセスに組み込まれた流動床反応器によるシリコンの製造
JP2013500927A (ja) * 2009-08-04 2013-01-10 シュミット シリコン テクノロジー ゲゼルシャフト ミット ベシュレンクテル ハフツング モノシランを製造するための設備および方法
JP2013540095A (ja) * 2010-10-22 2013-10-31 エムイーエムシー・エレクトロニック・マテリアルズ・インコーポレイテッド 実質的に閉ループの方法およびシステムにおける多結晶シリコンの製造
CN108883942A (zh) * 2016-04-21 2018-11-23 株式会社德山 金属粉末的制造方法

Also Published As

Publication number Publication date
GB2028289B (en) 1982-09-02
FR2433479A1 (fr) 1980-03-14
CA1145117A (en) 1983-04-26
IT1193203B (it) 1988-06-15
DE2954368A1 (ja) 1984-07-12
FR2433479B1 (fr) 1985-10-18
DE2919086A1 (de) 1980-03-06
DE2954368C2 (de) 1986-10-16
GB2028289A (en) 1980-03-05
IT7922753A0 (it) 1979-05-17
DE2919086C2 (de) 1986-10-16
JPS6228083B2 (ja) 1987-06-18

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