DE2649687A1 - Maskenfotouebertrager - Google Patents

Maskenfotouebertrager

Info

Publication number
DE2649687A1
DE2649687A1 DE19762649687 DE2649687A DE2649687A1 DE 2649687 A1 DE2649687 A1 DE 2649687A1 DE 19762649687 DE19762649687 DE 19762649687 DE 2649687 A DE2649687 A DE 2649687A DE 2649687 A1 DE2649687 A1 DE 2649687A1
Authority
DE
Germany
Prior art keywords
lens
slide
sample
photo transmitter
transmitter according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19762649687
Other languages
German (de)
English (en)
Inventor
Georges Pircher
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Publication of DE2649687A1 publication Critical patent/DE2649687A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE19762649687 1975-10-31 1976-10-29 Maskenfotouebertrager Withdrawn DE2649687A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7533464A FR2330030A1 (fr) 1975-10-31 1975-10-31 Nouvel appareil photorepeteur de masques de haute precision

Publications (1)

Publication Number Publication Date
DE2649687A1 true DE2649687A1 (de) 1977-05-05

Family

ID=9161914

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19762649687 Withdrawn DE2649687A1 (de) 1975-10-31 1976-10-29 Maskenfotouebertrager

Country Status (6)

Country Link
US (1) US4084903A (enExample)
JP (1) JPS5255472A (enExample)
DE (1) DE2649687A1 (enExample)
FR (1) FR2330030A1 (enExample)
GB (1) GB1556028A (enExample)
NL (1) NL7612028A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3441621A1 (de) * 1983-11-14 1985-05-23 Canon K.K., Tokio/Tokyo Ausfluchtvorrichtung
DE4102746C2 (de) * 1990-01-31 2002-11-21 Applied Materials Inc Luft-Meß-Fokussystem

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2429447A1 (fr) * 1978-06-23 1980-01-18 Thomson Csf Systeme optique de projection muni d'un positionneur de plaque
GB2035610B (en) 1978-10-20 1983-03-23 Hitachi Ltd Wafer projection aligner
US4198159A (en) * 1978-12-29 1980-04-15 International Business Machines Corporation Optical alignment system in projection printing
US4540278A (en) * 1979-04-02 1985-09-10 Optimetrix Corporation Optical focusing system
EP0017044B1 (en) * 1979-04-02 1985-07-03 Eaton-Optimetrix Inc. A system for positioning a utilization device
DE2915313A1 (de) * 1979-04-14 1980-10-23 Ibm Deutschland Piezoelektrische antriebsanordnung, insbesondere fuer fokussiersysteme
DE3110341C2 (de) * 1980-03-19 1983-11-17 Hitachi, Ltd., Tokyo Verfahren und Vorrichtung zum Ausrichten eines dünnen Substrats in der Bildebene eines Kopiergerätes
US4344160A (en) * 1980-05-02 1982-08-10 The Perkin-Elmer Corporation Automatic wafer focusing and flattening system
US4391494A (en) * 1981-05-15 1983-07-05 General Signal Corporation Apparatus for projecting a series of images onto dies of a semiconductor wafer
US4425037A (en) 1981-05-15 1984-01-10 General Signal Corporation Apparatus for projecting a series of images onto dies of a semiconductor wafer
DE3249685C2 (enExample) * 1981-05-15 1987-09-24 General Signal Corp., Stamford, Conn., Us
JPS5830128A (ja) * 1981-08-17 1983-02-22 Hitachi Ltd ウエハのチヤツク装置
US4431304A (en) * 1981-11-25 1984-02-14 Mayer Herbert E Apparatus for the projection copying of mask patterns on a workpiece
JPS5885338U (ja) * 1981-12-07 1983-06-09 株式会社日立製作所 自動焦点装置
JPS58156937A (ja) * 1982-03-12 1983-09-19 Hitachi Ltd 露光装置
JPS58179834A (ja) * 1982-04-14 1983-10-21 Canon Inc 投影露光装置及び方法
US4444492A (en) * 1982-05-15 1984-04-24 General Signal Corporation Apparatus for projecting a series of images onto dies of a semiconductor wafer
US4504144A (en) * 1982-07-06 1985-03-12 The Perkin-Elmer Corporation Simple electromechanical tilt and focus device
JPS5975625A (ja) * 1982-10-22 1984-04-28 Fujitsu Ltd 基板支持方法
US4441808A (en) * 1982-11-15 1984-04-10 Tre Semiconductor Equipment Corp. Focusing device for photo-exposure system
JPS59154023A (ja) * 1983-02-22 1984-09-03 Nippon Kogaku Kk <Nikon> 板状体の姿勢制御装置
JPS59155919A (ja) * 1983-02-25 1984-09-05 Hitachi Ltd 自動焦点合せ方法およびその装置
JPS59169134A (ja) * 1983-03-16 1984-09-25 Hitachi Ltd 縮小投影露光装置
JPS6018918A (ja) * 1983-07-13 1985-01-31 Canon Inc ステージ装置
JPS60105232A (ja) * 1983-11-14 1985-06-10 Canon Inc 自動焦点合わせ装置
JP2516194B2 (ja) * 1984-06-11 1996-07-10 株式会社日立製作所 投影露光方法
US4708467A (en) * 1984-09-21 1987-11-24 Cameronics Technology Corporation, Ltd. Camera
DE3447488A1 (de) * 1984-10-19 1986-05-07 Canon K.K., Tokio/Tokyo Projektionseinrichtung
JPH0618168B2 (ja) * 1985-02-27 1994-03-09 株式会社日立製作所 原画パターンを半導体ウエハ上面に露光する露光方法
US4714331A (en) * 1985-03-25 1987-12-22 Canon Kabushiki Kaisha Method and apparatus for automatic focusing
US4624553A (en) * 1985-05-28 1986-11-25 Harvey Alwood E Photographic enlarger apparatus with critical focusing platform for photosensitive medium
JPS61278141A (ja) * 1985-05-31 1986-12-09 Canon Inc 投影倍率調整方法
US4669868A (en) * 1986-04-18 1987-06-02 Ovonic Imaging Systems, Inc. Step and repeat exposure apparatus and method
JPS63172148A (ja) * 1987-01-12 1988-07-15 Hitachi Ltd 基板表面変形装置
WO1989006376A1 (en) * 1987-12-30 1989-07-13 Hampshire Instruments, Inc. Positioning subassembly for a lithography machine
JPH02228658A (ja) * 1989-03-01 1990-09-11 Nec Kyushu Ltd 縮小投影型露光装置
JP3401769B2 (ja) * 1993-12-28 2003-04-28 株式会社ニコン 露光方法、ステージ装置、及び露光装置
KR19980019031A (ko) 1996-08-27 1998-06-05 고노 시게오 스테이지 장치(a stage apparatus)
JPH10270535A (ja) * 1997-03-25 1998-10-09 Nikon Corp 移動ステージ装置、及び該ステージ装置を用いた回路デバイス製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2030468A5 (enExample) * 1969-01-29 1970-11-13 Thomson Brandt Csf
US3704946A (en) * 1969-02-20 1972-12-05 Opt Omechanisms Inc Microcircuit art generating means
DE2025280A1 (de) * 1970-05-23 1971-12-09 Licentia Patent Verwaltungs GmbH, 6000 Frankfurt Halterung fur ein Objektiv
US3704657A (en) * 1971-05-05 1972-12-05 Computervision Corp Adaptive optical focusing system
FR2223865B1 (enExample) * 1973-03-27 1978-10-20 Thomson Csf
SU497551A1 (ru) * 1973-06-26 1975-12-30 Московский институт электронной техники Устройство дл ориентации
DE2413551C2 (de) * 1974-03-21 1985-03-21 Western Electric Co., Inc., New York, N.Y. Einrichtung zum Korrigieren der Lage einer lichtempfindlichen Fläche in einer Masken-Projektionsvorrichtung

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3441621A1 (de) * 1983-11-14 1985-05-23 Canon K.K., Tokio/Tokyo Ausfluchtvorrichtung
DE4102746C2 (de) * 1990-01-31 2002-11-21 Applied Materials Inc Luft-Meß-Fokussystem

Also Published As

Publication number Publication date
US4084903A (en) 1978-04-18
GB1556028A (en) 1979-11-14
JPS5255472A (en) 1977-05-06
NL7612028A (nl) 1977-05-03
FR2330030A1 (fr) 1977-05-27
FR2330030B1 (enExample) 1979-05-04

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Legal Events

Date Code Title Description
8141 Disposal/no request for examination