FR2330030A1 - Nouvel appareil photorepeteur de masques de haute precision - Google Patents

Nouvel appareil photorepeteur de masques de haute precision

Info

Publication number
FR2330030A1
FR2330030A1 FR7533464A FR7533464A FR2330030A1 FR 2330030 A1 FR2330030 A1 FR 2330030A1 FR 7533464 A FR7533464 A FR 7533464A FR 7533464 A FR7533464 A FR 7533464A FR 2330030 A1 FR2330030 A1 FR 2330030A1
Authority
FR
France
Prior art keywords
photorepeater
new high
precision mask
mask
precision
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7533464A
Other languages
English (en)
Other versions
FR2330030B1 (fr
Inventor
Georges Pircher
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Priority to FR7533464A priority Critical patent/FR2330030A1/fr
Priority to US05/735,890 priority patent/US4084903A/en
Priority to NL7612028A priority patent/NL7612028A/xx
Priority to DE19762649687 priority patent/DE2649687A1/de
Priority to GB45178/76A priority patent/GB1556028A/en
Priority to JP13114776A priority patent/JPS5255472A/ja
Publication of FR2330030A1 publication Critical patent/FR2330030A1/fr
Application granted granted Critical
Publication of FR2330030B1 publication Critical patent/FR2330030B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
FR7533464A 1975-10-31 1975-10-31 Nouvel appareil photorepeteur de masques de haute precision Granted FR2330030A1 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
FR7533464A FR2330030A1 (fr) 1975-10-31 1975-10-31 Nouvel appareil photorepeteur de masques de haute precision
US05/735,890 US4084903A (en) 1975-10-31 1976-10-26 High-precision mask photorepeater
NL7612028A NL7612028A (nl) 1975-10-31 1976-10-29 Inrichting voor het fotografisch aanbrengen van een masker.
DE19762649687 DE2649687A1 (de) 1975-10-31 1976-10-29 Maskenfotouebertrager
GB45178/76A GB1556028A (en) 1975-10-31 1976-10-29 High precision mask photorepeater
JP13114776A JPS5255472A (en) 1975-10-31 1976-10-30 Mask photo repeater

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7533464A FR2330030A1 (fr) 1975-10-31 1975-10-31 Nouvel appareil photorepeteur de masques de haute precision

Publications (2)

Publication Number Publication Date
FR2330030A1 true FR2330030A1 (fr) 1977-05-27
FR2330030B1 FR2330030B1 (fr) 1979-05-04

Family

ID=9161914

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7533464A Granted FR2330030A1 (fr) 1975-10-31 1975-10-31 Nouvel appareil photorepeteur de masques de haute precision

Country Status (6)

Country Link
US (1) US4084903A (fr)
JP (1) JPS5255472A (fr)
DE (1) DE2649687A1 (fr)
FR (1) FR2330030A1 (fr)
GB (1) GB1556028A (fr)
NL (1) NL7612028A (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0012911A2 (fr) * 1978-12-29 1980-07-09 International Business Machines Corporation Dispositif pour l'alignement précis de pièces planes, par exemple de pastilles semiconductrices
EP0017921A1 (fr) * 1979-04-14 1980-10-29 Discovision Associates Dispositif d'entraînement piézoélectrique, spécialement pour systèmes de mise au point
DE3110341A1 (de) * 1980-03-19 1982-02-11 Hitachi, Ltd., Tokyo Belichtungseinrichtung und -verfahren zum belichten einer belichtungsflaeche eines substrats und kopieren eines vorbestimmten musters auf diese
EP0097380A2 (fr) * 1979-04-02 1984-01-04 Eaton-Optimetrix Inc. Système pour le positionnement d'un dispositif d'utilisation
US4540278A (en) * 1979-04-02 1985-09-10 Optimetrix Corporation Optical focusing system

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2429447A1 (fr) * 1978-06-23 1980-01-18 Thomson Csf Systeme optique de projection muni d'un positionneur de plaque
GB2035610B (en) * 1978-10-20 1983-03-23 Hitachi Ltd Wafer projection aligner
US4344160A (en) * 1980-05-02 1982-08-10 The Perkin-Elmer Corporation Automatic wafer focusing and flattening system
GB2121552B (en) * 1981-05-15 1985-12-18 Gen Signal Corp Apparatus for projecting a series of images onto dies of a semiconductor wafer
US4391494A (en) * 1981-05-15 1983-07-05 General Signal Corporation Apparatus for projecting a series of images onto dies of a semiconductor wafer
US4425037A (en) 1981-05-15 1984-01-10 General Signal Corporation Apparatus for projecting a series of images onto dies of a semiconductor wafer
JPS5830128A (ja) * 1981-08-17 1983-02-22 Hitachi Ltd ウエハのチヤツク装置
US4431304A (en) * 1981-11-25 1984-02-14 Mayer Herbert E Apparatus for the projection copying of mask patterns on a workpiece
JPS5885338U (ja) * 1981-12-07 1983-06-09 株式会社日立製作所 自動焦点装置
JPS58156937A (ja) * 1982-03-12 1983-09-19 Hitachi Ltd 露光装置
JPS58179834A (ja) * 1982-04-14 1983-10-21 Canon Inc 投影露光装置及び方法
US4444492A (en) * 1982-05-15 1984-04-24 General Signal Corporation Apparatus for projecting a series of images onto dies of a semiconductor wafer
US4504144A (en) * 1982-07-06 1985-03-12 The Perkin-Elmer Corporation Simple electromechanical tilt and focus device
JPS5975625A (ja) * 1982-10-22 1984-04-28 Fujitsu Ltd 基板支持方法
US4441808A (en) * 1982-11-15 1984-04-10 Tre Semiconductor Equipment Corp. Focusing device for photo-exposure system
JPS59154023A (ja) * 1983-02-22 1984-09-03 Nippon Kogaku Kk <Nikon> 板状体の姿勢制御装置
JPS59155919A (ja) * 1983-02-25 1984-09-05 Hitachi Ltd 自動焦点合せ方法およびその装置
JPS59169134A (ja) * 1983-03-16 1984-09-25 Hitachi Ltd 縮小投影露光装置
JPS6018918A (ja) * 1983-07-13 1985-01-31 Canon Inc ステージ装置
JPS60105232A (ja) * 1983-11-14 1985-06-10 Canon Inc 自動焦点合わせ装置
US4600282A (en) * 1983-11-14 1986-07-15 Canon Kabushiki Kaisha Alignment apparatus
JP2516194B2 (ja) * 1984-06-11 1996-07-10 株式会社日立製作所 投影露光方法
US4708467A (en) * 1984-09-21 1987-11-24 Cameronics Technology Corporation, Ltd. Camera
DE3447488A1 (de) * 1984-10-19 1986-05-07 Canon K.K., Tokio/Tokyo Projektionseinrichtung
JPH0618168B2 (ja) * 1985-02-27 1994-03-09 株式会社日立製作所 原画パターンを半導体ウエハ上面に露光する露光方法
US4714331A (en) * 1985-03-25 1987-12-22 Canon Kabushiki Kaisha Method and apparatus for automatic focusing
US4624553A (en) * 1985-05-28 1986-11-25 Harvey Alwood E Photographic enlarger apparatus with critical focusing platform for photosensitive medium
JPS61278141A (ja) * 1985-05-31 1986-12-09 Canon Inc 投影倍率調整方法
US4669868A (en) * 1986-04-18 1987-06-02 Ovonic Imaging Systems, Inc. Step and repeat exposure apparatus and method
JPS63172148A (ja) * 1987-01-12 1988-07-15 Hitachi Ltd 基板表面変形装置
WO1989006376A1 (fr) * 1987-12-30 1989-07-13 Hampshire Instruments, Inc. Sous-ensemble de positionnement pour machine de lithographie
JPH02228658A (ja) * 1989-03-01 1990-09-11 Nec Kyushu Ltd 縮小投影型露光装置
US5087927A (en) * 1990-01-31 1992-02-11 Ateo Corporation On-axis air gage focus system
JP3401769B2 (ja) * 1993-12-28 2003-04-28 株式会社ニコン 露光方法、ステージ装置、及び露光装置
KR19980019031A (ko) 1996-08-27 1998-06-05 고노 시게오 스테이지 장치(a stage apparatus)
JPH10270535A (ja) 1997-03-25 1998-10-09 Nikon Corp 移動ステージ装置、及び該ステージ装置を用いた回路デバイス製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2025280A1 (de) * 1970-05-23 1971-12-09 Licentia Patent Verwaltungs GmbH, 6000 Frankfurt Halterung fur ein Objektiv
FR2223865A1 (fr) * 1973-03-27 1974-10-25 Thomson Csf
FR2235416A1 (fr) * 1973-06-26 1975-01-24 Mo I Elektronnoi
DE2413551A1 (de) * 1974-03-21 1975-09-25 Western Electric Co Projektionsdruckanordnung

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2030468A5 (fr) * 1969-01-29 1970-11-13 Thomson Brandt Csf
US3704946A (en) * 1969-02-20 1972-12-05 Opt Omechanisms Inc Microcircuit art generating means
US3704657A (en) * 1971-05-05 1972-12-05 Computervision Corp Adaptive optical focusing system

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2025280A1 (de) * 1970-05-23 1971-12-09 Licentia Patent Verwaltungs GmbH, 6000 Frankfurt Halterung fur ein Objektiv
FR2223865A1 (fr) * 1973-03-27 1974-10-25 Thomson Csf
FR2235416A1 (fr) * 1973-06-26 1975-01-24 Mo I Elektronnoi
DE2413551A1 (de) * 1974-03-21 1975-09-25 Western Electric Co Projektionsdruckanordnung

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0012911A2 (fr) * 1978-12-29 1980-07-09 International Business Machines Corporation Dispositif pour l'alignement précis de pièces planes, par exemple de pastilles semiconductrices
EP0012911A3 (en) * 1978-12-29 1980-10-15 International Business Machines Corporation Device for the precise alignment of planar workpieces, e.g. semiconductor wafers
EP0097380A2 (fr) * 1979-04-02 1984-01-04 Eaton-Optimetrix Inc. Système pour le positionnement d'un dispositif d'utilisation
EP0097380A3 (fr) * 1979-04-02 1984-08-29 Eaton-Optimetrix Inc. Système pour le positionnement d'un dispositif d'utilisation
US4540278A (en) * 1979-04-02 1985-09-10 Optimetrix Corporation Optical focusing system
EP0017921A1 (fr) * 1979-04-14 1980-10-29 Discovision Associates Dispositif d'entraînement piézoélectrique, spécialement pour systèmes de mise au point
DE3110341A1 (de) * 1980-03-19 1982-02-11 Hitachi, Ltd., Tokyo Belichtungseinrichtung und -verfahren zum belichten einer belichtungsflaeche eines substrats und kopieren eines vorbestimmten musters auf diese

Also Published As

Publication number Publication date
FR2330030B1 (fr) 1979-05-04
US4084903A (en) 1978-04-18
GB1556028A (en) 1979-11-14
DE2649687A1 (de) 1977-05-05
NL7612028A (nl) 1977-05-03
JPS5255472A (en) 1977-05-06

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