JPS5885338U - 自動焦点装置 - Google Patents

自動焦点装置

Info

Publication number
JPS5885338U
JPS5885338U JP1981181162U JP18116281U JPS5885338U JP S5885338 U JPS5885338 U JP S5885338U JP 1981181162 U JP1981181162 U JP 1981181162U JP 18116281 U JP18116281 U JP 18116281U JP S5885338 U JPS5885338 U JP S5885338U
Authority
JP
Japan
Prior art keywords
sample
circuit
distance
detector
drive system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1981181162U
Other languages
English (en)
Inventor
河村　喜雄
高梨　明紘
利栄 黒崎
伸治 国吉
純男 保坂
恒男 寺澤
Original Assignee
株式会社日立製作所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社日立製作所 filed Critical 株式会社日立製作所
Priority to JP1981181162U priority Critical patent/JPS5885338U/ja
Priority to US06/445,079 priority patent/US4477183A/en
Priority to EP82111316A priority patent/EP0081233B1/en
Priority to DE8282111316T priority patent/DE3270308D1/de
Publication of JPS5885338U publication Critical patent/JPS5885338U/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/28—Systems for automatic generation of focusing signals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
    • G03F9/7057—Gas flow, e.g. for focusing, leveling or gap setting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。

Description

【図面の簡単な説明】
第１図は従来の自動焦点装置の概略図、第２図は本考案
による自動焦点装置の一実施例の概略図である。゛ ２、　３．　４・・・・・・絞り弁、５．　４０２・・
・・・・検出器、６・・・・・・噴出孔、？、　　８．
２０．　４０３．　４０４゜４０８・・・・・・配管、
１０．４１２・・・・・・試料、１１゜４２１・・・・
・・圧力変換器、１２．４０９・・・・・・圧力調′整
弁、１３．４２３・・・・・・増幅回路、１４，４２４
・・・・・・駆動用モータ、１５・・・・・・加算回路
、１６・・・・・・　　　。 零調回路、１７・・・・・−ＣＰＵ（中央演算処理回路
）、１９・・・・・・電圧発生回路、２１．４１３・・
・・・・試料台、２２．２３．２４・・・・・・スイッ
チ回路、４０１・・・・・・レンズ鏡筒、４０６・・・
・・・参照器、４１８・・・・・・参照板。

Claims (1)

    【実用新案登録請求の範囲】
  1. 試料の位置を一定に位置決め制御させるために基準とな
    る距離を設定する参照器と上記試料との距離を測長する
    検出器とから構成され、距離検出用媒体を上記参照器と
    上記検出器とに通して得られる信号の差が零となるよう
    に上記試料を駆動系によって移動させ、上記試料の位置
    を一定に保つ自動焦点装置において、上記駆動系に任意
    の電圧−を付加する回路と上記電圧付加回路を開閉する
    回路とを具備せしめて、上記試料の位置を基準の距離よ
    りも偏よらせて微動するように構成してなることを特徴
    とする自動焦点装置。
JP1981181162U 1981-12-07 1981-12-07 自動焦点装置 Pending JPS5885338U (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP1981181162U JPS5885338U (ja) 1981-12-07 1981-12-07 自動焦点装置
US06/445,079 US4477183A (en) 1981-12-07 1982-11-29 Automatic focusing apparatus
EP82111316A EP0081233B1 (en) 1981-12-07 1982-12-07 Automatic focusing apparatus
DE8282111316T DE3270308D1 (en) 1981-12-07 1982-12-07 Automatic focusing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1981181162U JPS5885338U (ja) 1981-12-07 1981-12-07 自動焦点装置

Publications (1)

Publication Number Publication Date
JPS5885338U true JPS5885338U (ja) 1983-06-09

Family

ID=16095966

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1981181162U Pending JPS5885338U (ja) 1981-12-07 1981-12-07 自動焦点装置

Country Status (4)

Country Link
US (1) US4477183A (ja)
EP (1) EP0081233B1 (ja)
JP (1) JPS5885338U (ja)
DE (1) DE3270308D1 (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59154023A (ja) * 1983-02-22 1984-09-03 Nippon Kogaku Kk <Nikon> 板状体の姿勢制御装置
JPS6032050A (ja) * 1983-08-02 1985-02-19 Canon Inc 露光装置
US4600282A (en) * 1983-11-14 1986-07-15 Canon Kabushiki Kaisha Alignment apparatus
US4616908A (en) * 1984-07-19 1986-10-14 Gca Corporation Microlithographic system
DE3447488A1 (de) * 1984-10-19 1986-05-07 Canon K.K., Tokio/Tokyo Projektionseinrichtung
JPS61160934A (ja) * 1985-01-10 1986-07-21 Canon Inc 投影光学装置
JPS61278141A (ja) * 1985-05-31 1986-12-09 Canon Inc 投影倍率調整方法
US6970228B1 (en) * 1999-07-16 2005-11-29 Nikon Corporation Exposure method and system
CN101398635B (zh) * 2006-11-17 2011-05-11 上海微电子装备有限公司 自适应调焦调平传感器系统中自动增益环节的闭环反馈控制方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3984678A (en) * 1974-04-05 1976-10-05 Nippon Jido Seigyo Ltd. Apparatus for automatically adjusting a microscope in focus
DE2453720A1 (de) * 1974-11-13 1976-05-20 Hartmann & Braun Ag Vorrichtung zur selbsttaetigen driftkorrektur eines messgeraetes
US3917930A (en) * 1974-11-25 1975-11-04 Cincinnati Milacron Inc Method and apparatus for adaptively positioning a machine element
DE2458917C3 (de) * 1974-12-12 1981-12-03 Thomson-Brandt, 75008 Paris Regelanordnung für die Fokussierung eines Leselichtbündels
FR2330030A1 (fr) * 1975-10-31 1977-05-27 Thomson Csf Nouvel appareil photorepeteur de masques de haute precision
JPS52119927A (en) * 1976-04-02 1977-10-07 Hitachi Ltd Device for automatic focus control
GB2035610B (en) * 1978-10-20 1983-03-23 Hitachi Ltd Wafer projection aligner
US4300696A (en) * 1979-05-18 1981-11-17 Bryce Ian R Litter bin

Also Published As

Publication number Publication date
DE3270308D1 (en) 1986-05-07
US4477183A (en) 1984-10-16
EP0081233A1 (en) 1983-06-15
EP0081233B1 (en) 1986-04-02

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