DE2263808A1 - Lichtempfindliches silberhalogenidmaterial - Google Patents

Lichtempfindliches silberhalogenidmaterial

Info

Publication number
DE2263808A1
DE2263808A1 DE2263808A DE2263808A DE2263808A1 DE 2263808 A1 DE2263808 A1 DE 2263808A1 DE 2263808 A DE2263808 A DE 2263808A DE 2263808 A DE2263808 A DE 2263808A DE 2263808 A1 DE2263808 A1 DE 2263808A1
Authority
DE
Germany
Prior art keywords
silver halide
thione
group
material according
halide material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE2263808A
Other languages
German (de)
English (en)
Other versions
DE2263808C2 (de
Inventor
Seiiti Kubodera
Reiichi Ohi
Takeo Sakai
Keisuke Shiba
Tadao Shishido
Nobuo Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE2263808A1 publication Critical patent/DE2263808A1/de
Application granted granted Critical
Publication of DE2263808C2 publication Critical patent/DE2263808C2/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D213/00—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members
    • C07D213/02—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members
    • C07D213/04—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D213/60—Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members having three double bonds between ring members or between ring members and non-ring members having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D213/62—Oxygen or sulfur atoms
    • C07D213/70—Sulfur atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D215/00—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems
    • C07D215/02—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom
    • C07D215/16—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D215/36—Sulfur atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D235/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings
    • C07D235/02—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings condensed with carbocyclic rings or ring systems
    • C07D235/04—Benzimidazoles; Hydrogenated benzimidazoles
    • C07D235/24—Benzimidazoles; Hydrogenated benzimidazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 2
    • C07D235/28—Sulfur atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D263/00—Heterocyclic compounds containing 1,3-oxazole or hydrogenated 1,3-oxazole rings
    • C07D263/52—Heterocyclic compounds containing 1,3-oxazole or hydrogenated 1,3-oxazole rings condensed with carbocyclic rings or ring systems
    • C07D263/54—Benzoxazoles; Hydrogenated benzoxazoles
    • C07D263/58—Benzoxazoles; Hydrogenated benzoxazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 2
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D263/00—Heterocyclic compounds containing 1,3-oxazole or hydrogenated 1,3-oxazole rings
    • C07D263/52—Heterocyclic compounds containing 1,3-oxazole or hydrogenated 1,3-oxazole rings condensed with carbocyclic rings or ring systems
    • C07D263/60—Naphthoxazoles; Hydrogenated naphthoxazoles
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
    • C07D277/02—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings
    • C07D277/08—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
    • C07D277/12—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D277/16—Sulfur atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
    • C07D277/60—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings condensed with carbocyclic rings or ring systems
    • C07D277/62—Benzothiazoles
    • C07D277/68—Benzothiazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 2
    • C07D277/70—Sulfur atoms
    • C07D277/72—2-Mercaptobenzothiazole
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D285/00—Heterocyclic compounds containing rings having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by groups C07D275/00 - C07D283/00
    • C07D285/01—Five-membered rings
    • C07D285/02—Thiadiazoles; Hydrogenated thiadiazoles
    • C07D285/04—Thiadiazoles; Hydrogenated thiadiazoles not condensed with other rings
    • C07D285/12—1,3,4-Thiadiazoles; Hydrogenated 1,3,4-thiadiazoles
    • C07D285/125—1,3,4-Thiadiazoles; Hydrogenated 1,3,4-thiadiazoles with oxygen, sulfur or nitrogen atoms, directly attached to ring carbon atoms, the nitrogen atoms not forming part of a nitro radical
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D293/00—Heterocyclic compounds containing rings having nitrogen and selenium or nitrogen and tellurium, with or without oxygen or sulfur atoms, as the ring hetero atoms
    • C07D293/10—Heterocyclic compounds containing rings having nitrogen and selenium or nitrogen and tellurium, with or without oxygen or sulfur atoms, as the ring hetero atoms condensed with carbocyclic rings or ring systems
    • C07D293/12—Selenazoles; Hydrogenated selenazoles
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/04—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with macromolecular additives; with layer-forming substances
    • G03C1/043—Polyalkylene oxides; Polyalkylene sulfides; Polyalkylene selenides; Polyalkylene tellurides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
    • G03C1/08—Sensitivity-increasing substances
    • G03C1/09—Noble metals or mercury; Salts or compounds thereof; Sulfur, selenium or tellurium, or compounds thereof, e.g. for chemical sensitising
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
    • G03C1/08—Sensitivity-increasing substances
    • G03C1/10—Organic substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
    • G03C1/34—Fog-inhibitors; Stabilisers; Agents inhibiting latent image regression
    • G03C1/346—Organic derivatives of bivalent sulfur, selenium or tellurium

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Quinoline Compounds (AREA)
  • Thiazole And Isothizaole Compounds (AREA)
  • Nitrogen- Or Sulfur-Containing Heterocyclic Ring Compounds With Rings Of Six Or More Members (AREA)
  • Pyridine Compounds (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
DE2263808A 1971-12-28 1972-12-28 Photographisches lichtempfindliches Aufzeichnungsmaterial vom Lith-Typ Expired DE2263808C2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP303772A JPS576092B2 (ja) 1971-12-28 1971-12-28

Publications (2)

Publication Number Publication Date
DE2263808A1 true DE2263808A1 (de) 1973-07-05
DE2263808C2 DE2263808C2 (de) 1987-04-16

Family

ID=11546099

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2263808A Expired DE2263808C2 (de) 1971-12-28 1972-12-28 Photographisches lichtempfindliches Aufzeichnungsmaterial vom Lith-Typ

Country Status (5)

Country Link
US (1) US3895948A (ja)
JP (1) JPS576092B2 (ja)
DE (1) DE2263808C2 (ja)
FR (1) FR2166144B1 (ja)
GB (1) GB1415010A (ja)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4001020A (en) * 1971-03-04 1977-01-04 Fuji Photo Film Co., Ltd. Developing a silver ha1ide emulsion in contact with a heterocyclic thione and a polyalkylene oxide
US4001021A (en) * 1972-06-30 1977-01-04 Konishiroku Photo Industry Co., Ltd. Lithographic development of a lith-type silver halide emulsions containing a benzimidazole
JPS56765B2 (ja) * 1974-06-06 1981-01-09
US4121935A (en) * 1974-09-17 1978-10-24 Konishiroku Photo Industry Co., Ltd. Lith-type silver halide photographic light-sensitive material
US4097284A (en) * 1974-11-26 1978-06-27 Fuji Photo Film Co., Ltd. Method for supersensitizing silver halide photographic emulsions
JPS588503B2 (ja) * 1974-12-27 1983-02-16 富士写真フイルム株式会社 カラ−シヤシンカンコウザイリヨウ
JPS5312380B2 (ja) * 1975-02-28 1978-04-28
US4207108A (en) * 1976-11-04 1980-06-10 Eastman Kodak Company Silver halide photothermographic element, composition and process
JPS5364514A (en) * 1976-11-22 1978-06-09 Konishiroku Photo Ind Co Ltd Silver halide photographic material
US4221863A (en) * 1978-03-31 1980-09-09 E. I. Du Pont De Nemours And Company Formation of silver halide grains in the presence of thioureas
JPS60242453A (ja) * 1984-04-12 1985-12-02 Dainippon Ink & Chem Inc リス型ハロゲン化銀写真感光材料
JPS62113138A (ja) * 1985-11-12 1987-05-25 Konishiroku Photo Ind Co Ltd ハロゲン化銀写真感光材料
JPS62210458A (ja) * 1986-03-11 1987-09-16 Fuji Photo Film Co Ltd 画像形成方法
JPH0272350A (ja) * 1988-09-07 1990-03-12 Konica Corp カラー画像形成方法
JP2961850B2 (ja) * 1990-09-19 1999-10-12 大日本インキ化学工業株式会社 超硬調ネガ画像の形成方法
US5955249A (en) * 1998-03-09 1999-09-21 Eastman Kodak Company Radiographic elements exhibiting increased speed and covering power
US6326134B1 (en) 2000-08-24 2001-12-04 Eastman Kodak Company Process for manufacture of photographic emulsion
US6303284B1 (en) 2000-08-24 2001-10-16 Eastman Kodak Company Process for manufacture of photographic emulsion

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3026201A (en) * 1959-02-02 1962-03-20 Gen Aniline & Film Corp Antifoggants and stabilizers for photographic silver halide emulsions
US3081170A (en) * 1958-10-06 1963-03-12 Gen Aniline & Film Corp Fog reduction in photographic silver halide emulsions
US3161520A (en) * 1962-12-11 1964-12-15 Gen Aniline & Film Corp Fog reduction in photographic silver halide emulsions
DE1522432A1 (de) * 1967-03-11 1969-07-24 Agfa Gevaert Ag Spektral sensibilisiertes photographisches Material
US3567458A (en) * 1967-11-15 1971-03-02 Eastman Kodak Co Photographic emulsion containing a water-soluble alkylene oxide block copolymer and a merocyanine dye
US3598598A (en) * 1968-10-01 1971-08-10 Eastman Kodak Co Fog stabilizers for photographic emulsions

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US30172A (en) * 1860-09-25 whitwell
BE543978A (ja) * 1955-01-03
BE553031A (ja) * 1955-12-01
BE570978A (ja) * 1957-09-09
DE1070029B (ja) * 1958-03-31 1959-11-26
BE595325A (ja) * 1960-09-23
US3345175A (en) * 1963-05-17 1967-10-03 Fuji Photo Film Co Ltd High edge-gradient photosensitive material
US3294540A (en) * 1963-12-17 1966-12-27 Eastman Kodak Co Lith-type emulsions with block co-polymers
GB1086657A (en) * 1964-11-13 1967-10-11 Fuji Photo Film Co Ltd Photographic silver halide light sensitive materials
US3397987A (en) * 1965-05-24 1968-08-20 Eastman Kodak Co Photographic emulsion containing mercapto development anti-foggants
US3518085A (en) * 1965-09-23 1970-06-30 Eastman Kodak Co Lith-type emulsions containing a polyalkyleneoxy polymer and a 3-pyrazolidone developing agent
DE1962605C2 (de) * 1969-12-13 1983-09-08 Agfa-Gevaert Ag, 5090 Leverkusen Photographisches Aufzeichnungsmaterial
US3708303A (en) * 1971-01-12 1973-01-02 Eastman Kodak Co Photographic elements and processes lithographic silver halide element containing a 1-(amidophenyl)-5-mercaptotetrazole sensitizing agent and development process of using same

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3081170A (en) * 1958-10-06 1963-03-12 Gen Aniline & Film Corp Fog reduction in photographic silver halide emulsions
US3026201A (en) * 1959-02-02 1962-03-20 Gen Aniline & Film Corp Antifoggants and stabilizers for photographic silver halide emulsions
US3161520A (en) * 1962-12-11 1964-12-15 Gen Aniline & Film Corp Fog reduction in photographic silver halide emulsions
DE1522432A1 (de) * 1967-03-11 1969-07-24 Agfa Gevaert Ag Spektral sensibilisiertes photographisches Material
US3567458A (en) * 1967-11-15 1971-03-02 Eastman Kodak Co Photographic emulsion containing a water-soluble alkylene oxide block copolymer and a merocyanine dye
US3598598A (en) * 1968-10-01 1971-08-10 Eastman Kodak Co Fog stabilizers for photographic emulsions

Also Published As

Publication number Publication date
JPS576092B2 (ja) 1982-02-03
US3895948A (en) 1975-07-22
FR2166144A1 (ja) 1973-08-10
FR2166144B1 (ja) 1976-10-29
GB1415010A (en) 1975-11-26
DE2263808C2 (de) 1987-04-16
JPS4873135A (ja) 1973-10-02

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Legal Events

Date Code Title Description
OD Request for examination
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Representative=s name: SOLF, A., DR.-ING., 8000 MUENCHEN ZAPF, C., DIPL.-

D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee