DE19800922B4 - Galvanisierverfahren unter Anwendung eines Nickel- oder Nickellegierungs-Galvanisierbads - Google Patents

Galvanisierverfahren unter Anwendung eines Nickel- oder Nickellegierungs-Galvanisierbads Download PDF

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Publication number
DE19800922B4
DE19800922B4 DE19800922A DE19800922A DE19800922B4 DE 19800922 B4 DE19800922 B4 DE 19800922B4 DE 19800922 A DE19800922 A DE 19800922A DE 19800922 A DE19800922 A DE 19800922A DE 19800922 B4 DE19800922 B4 DE 19800922B4
Authority
DE
Germany
Prior art keywords
nickel
ion
resist layer
plating bath
salt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE19800922A
Other languages
German (de)
English (en)
Other versions
DE19800922A1 (de
Inventor
Toshihisa Yoda
Toru Negishi
Toru Hirakata Murakami
Tomomi Hirakata Yaji
Taichi Hirakata Nakamura
Tsutomu Sekiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinko Electric Industries Co Ltd
C Uyemura and Co Ltd
Original Assignee
Shinko Electric Industries Co Ltd
C Uyemura and Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinko Electric Industries Co Ltd, C Uyemura and Co Ltd filed Critical Shinko Electric Industries Co Ltd
Publication of DE19800922A1 publication Critical patent/DE19800922A1/de
Application granted granted Critical
Publication of DE19800922B4 publication Critical patent/DE19800922B4/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C25D5/022—Electroplating of selected surface areas using masking means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/04—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing the conductive pattern
    • H05K3/243—Reinforcing the conductive pattern characterised by selective plating, e.g. for finish plating of pads
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing the conductive pattern
    • H05K3/244—Finish plating of conductors, especially of copper conductors, e.g. for pads or lands
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3452—Solder masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Mechanical Engineering (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
DE19800922A 1997-01-29 1998-01-13 Galvanisierverfahren unter Anwendung eines Nickel- oder Nickellegierungs-Galvanisierbads Expired - Lifetime DE19800922B4 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP02960397A JP3223829B2 (ja) 1997-01-29 1997-01-29 電気ニッケルめっき浴又は電気ニッケル合金めっき浴及びそれを用いためっき方法
JP9-029603 1997-01-29

Publications (2)

Publication Number Publication Date
DE19800922A1 DE19800922A1 (de) 1998-07-30
DE19800922B4 true DE19800922B4 (de) 2009-12-03

Family

ID=12280652

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19800922A Expired - Lifetime DE19800922B4 (de) 1997-01-29 1998-01-13 Galvanisierverfahren unter Anwendung eines Nickel- oder Nickellegierungs-Galvanisierbads

Country Status (6)

Country Link
US (1) US5985124A (ja)
JP (1) JP3223829B2 (ja)
KR (1) KR100312840B1 (ja)
DE (1) DE19800922B4 (ja)
GB (1) GB2321647B (ja)
TW (1) TW419530B (ja)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100360098B1 (ko) * 1998-12-04 2002-12-18 주식회사 포스코 전기아연도금강판용 크로메이트 전처리용액
JP4737790B2 (ja) * 1999-10-01 2011-08-03 株式会社シミズ ほう酸を含まないニッケルめっき浴
DE60041713D1 (de) 1999-11-30 2009-04-16 Scott Schenter Verfahren zur erzeugung von actinium-225 und töchtern
US6815126B2 (en) 2002-04-09 2004-11-09 International Business Machines Corporation Printed wiring board with conformally plated circuit traces
JP3954958B2 (ja) * 2002-11-26 2007-08-08 古河テクノリサーチ株式会社 抵抗層付き銅箔及び抵抗層付き回路基板材料
KR100654737B1 (ko) * 2004-07-16 2006-12-08 일진소재산업주식회사 미세회로기판용 표면처리동박의 제조방법 및 그 동박
JP5291353B2 (ja) * 2007-02-08 2013-09-18 株式会社ボンマーク メタルマスク及びその製造方法
US8425751B1 (en) 2011-02-03 2013-04-23 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Systems and methods for the electrodeposition of a nickel-cobalt alloy
JP2012162786A (ja) * 2011-02-09 2012-08-30 Kanto Gakuin 電気ニッケルめっき浴、電気ニッケルめっき方法及び電気ニッケルめっき製品
JP6024714B2 (ja) * 2013-10-03 2016-11-16 トヨタ自動車株式会社 成膜用ニッケル溶液およびこれを用いた成膜方法
JP6422658B2 (ja) * 2014-02-27 2018-11-14 新光電気工業株式会社 電気めっき浴及び電気めっき方法
JP6760166B2 (ja) * 2017-03-23 2020-09-23 トヨタ自動車株式会社 ニッケル皮膜の形成方法及び当該方法に使用するためのニッケル溶液
US10718059B2 (en) 2017-07-10 2020-07-21 Rohm And Haas Electronic Materials Llc Nickel electroplating compositions with cationic polymers and methods of electroplating nickel
US10711360B2 (en) 2017-07-14 2020-07-14 Rohm And Haas Electronic Materials Llc Nickel electroplating compositions with copolymers of arginine and bisepoxides and methods of electroplating nickel
JP7376396B2 (ja) * 2020-03-10 2023-11-08 トヨタ自動車株式会社 全固体電池の製造方法
CN112609173A (zh) * 2020-12-10 2021-04-06 安徽环瑞电热器材有限公司 一种抗腐蚀材料及制作方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2191813A (en) * 1939-12-01 1940-02-27 Udylite Corp Electrodeposition of nickel from an acid bath
US4224115A (en) * 1975-12-03 1980-09-23 Mitsubishi Denki Kabushiki Kaisha Process for forming electrode on semiconductor device

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4190474A (en) * 1977-12-22 1980-02-26 Gould Inc. Method of making a printed circuit board having mutually etchable copper and nickel layers
JPS55145194A (en) * 1979-04-27 1980-11-12 Nippon Steel Corp Manufacture of material for vessel
US4290858A (en) * 1980-09-23 1981-09-22 The United States Of America As Represented By The United States Department Of Energy Process for forming a nickel foil with controlled and predetermined permeability to hydrogen
AU8386982A (en) * 1981-06-01 1982-12-09 Wiggin Alloys Ltd. Increasing absorptance of porous film on cr containing iron alloy
WO1985000045A1 (en) * 1983-06-17 1985-01-03 Kawasaki Steel Corporation Zn-ni alloy plating solution based on chloride bath
JPS6052592A (ja) * 1983-09-02 1985-03-25 Nisshin Steel Co Ltd Ｚｎ−Ｎｉ系合金電気めっき鋼板の製造方法
DE3414048A1 (de) * 1984-04-13 1985-10-17 Nisshin Steel Co., Ltd., Tokio/Tokyo Verfahren zum herstellen von mit einer zink-nickel-legierung galvanisierten stahlteilen
IT1206252B (it) * 1986-03-03 1989-04-14 Omi Int Corp Elettrolita per l'elettrodeposizione di leghe di zinco
FR2626873B1 (fr) * 1988-02-08 1992-12-24 Lafarge Fondu Int Procede et composition pour accelerer la prise des ciments et supprimer les efflorescences
JP2700027B2 (ja) * 1988-07-11 1998-01-19 長田 武志 コンクリート劣化抑止組成物
JPH0244911A (ja) * 1988-08-05 1990-02-14 Hitachi Ltd トランジスタの電流抑制回路
US4891480A (en) * 1989-02-01 1990-01-02 American Telephone And Telegraph Company, At&T Bell Laboratories Apparatus including electrical contacts
US4892628A (en) * 1989-04-14 1990-01-09 The United States Department Of Energy Electrodeposition of amorphous ternary nickel-chromium-phosphorus alloy
JPH0319309A (ja) * 1989-06-16 1991-01-28 Fujitsu Ltd 位置合わせ方法
JPH0319308A (ja) * 1989-06-16 1991-01-28 Hitachi Lighting Ltd 放電灯用安定器
JPH0637711B2 (ja) * 1989-06-22 1994-05-18 新日本製鐵株式会社 黒色表面処理鋼板の製造方法
JPH03153896A (ja) * 1989-11-09 1991-07-01 Kanto Kasei Kogyo Kk ニッケルめっき液、そのめっき液を用いた耐食性に優れた銅‐ニッケル‐クロム光沢電気めっき方法並びにそれにより得られためっき皮膜
DE69220519T2 (de) * 1991-03-04 1998-02-19 Toda Kogyo Corp Verfahren zur Plattierung eines Verbundmagneten sowie Verbundmagnet mit einem Metallüberzug

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2191813A (en) * 1939-12-01 1940-02-27 Udylite Corp Electrodeposition of nickel from an acid bath
US4224115A (en) * 1975-12-03 1980-09-23 Mitsubishi Denki Kabushiki Kaisha Process for forming electrode on semiconductor device

Also Published As

Publication number Publication date
GB9724284D0 (en) 1998-01-14
GB2321647A (en) 1998-08-05
KR19980070173A (ko) 1998-10-26
TW419530B (en) 2001-01-21
KR100312840B1 (ko) 2002-02-04
JP3223829B2 (ja) 2001-10-29
DE19800922A1 (de) 1998-07-30
JPH10212591A (ja) 1998-08-11
GB2321647B (en) 2001-10-24
US5985124A (en) 1999-11-16

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R071 Expiry of right