DE1224111B - Saure galvanische Kupfer- und Nickelbaeder und Verfahren zum Abscheiden der UEberzuege - Google Patents
Saure galvanische Kupfer- und Nickelbaeder und Verfahren zum Abscheiden der UEberzuegeInfo
- Publication number
- DE1224111B DE1224111B DED36777A DED0036777A DE1224111B DE 1224111 B DE1224111 B DE 1224111B DE D36777 A DED36777 A DE D36777A DE D0036777 A DED0036777 A DE D0036777A DE 1224111 B DE1224111 B DE 1224111B
- Authority
- DE
- Germany
- Prior art keywords
- bath
- concentration
- additives
- saturation concentration
- baths
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims description 20
- 239000010949 copper Substances 0.000 title claims description 20
- 229910052802 copper Inorganic materials 0.000 title claims description 19
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims description 14
- 238000000034 method Methods 0.000 title claims description 8
- 239000002253 acid Substances 0.000 title claims description 7
- 238000000576 coating method Methods 0.000 title claims description 7
- 229910052759 nickel Inorganic materials 0.000 title claims description 7
- 230000008569 process Effects 0.000 title description 5
- 238000000151 deposition Methods 0.000 title description 3
- 239000000654 additive Substances 0.000 claims description 23
- 239000000203 mixture Substances 0.000 claims description 12
- 230000000996 additive effect Effects 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 5
- 238000009713 electroplating Methods 0.000 claims description 5
- 125000005842 heteroatom Chemical group 0.000 claims description 5
- DKVNPHBNOWQYFE-UHFFFAOYSA-N carbamodithioic acid Chemical group NC(S)=S DKVNPHBNOWQYFE-UHFFFAOYSA-N 0.000 claims description 3
- 150000001875 compounds Chemical class 0.000 claims description 3
- 150000002894 organic compounds Chemical class 0.000 claims description 3
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea group Chemical group NC(=S)N UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims description 3
- 230000000737 periodic effect Effects 0.000 claims description 2
- 238000005086 pumping Methods 0.000 claims description 2
- 239000006259 organic additive Substances 0.000 claims 2
- 238000004070 electrodeposition Methods 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 description 15
- 230000002378 acidificating effect Effects 0.000 description 6
- 238000007792 addition Methods 0.000 description 6
- 239000003792 electrolyte Substances 0.000 description 6
- 238000012544 monitoring process Methods 0.000 description 6
- 239000000080 wetting agent Substances 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000002689 soil Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical group C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 1
- KSAPYRIVHFAQGR-UHFFFAOYSA-N 1-sulfanylbenzimidazole Chemical group C1=CC=C2N(S)C=NC2=C1 KSAPYRIVHFAQGR-UHFFFAOYSA-N 0.000 description 1
- ZMPAPJBFYQSNFM-UHFFFAOYSA-N 1-sulfanylimidazole Chemical compound SN1C=CN=C1 ZMPAPJBFYQSNFM-UHFFFAOYSA-N 0.000 description 1
- IHPYMWDTONKSCO-UHFFFAOYSA-N 2,2'-piperazine-1,4-diylbisethanesulfonic acid Chemical compound OS(=O)(=O)CCN1CCN(CCS(O)(=O)=O)CC1 IHPYMWDTONKSCO-UHFFFAOYSA-N 0.000 description 1
- OCVLSHAVSIYKLI-UHFFFAOYSA-N 3h-1,3-thiazole-2-thione Chemical compound SC1=NC=CS1 OCVLSHAVSIYKLI-UHFFFAOYSA-N 0.000 description 1
- 235000013162 Cocos nucifera Nutrition 0.000 description 1
- 244000060011 Cocos nucifera Species 0.000 description 1
- 206010061217 Infestation Diseases 0.000 description 1
- FULZLIGZKMKICU-UHFFFAOYSA-N N-phenylthiourea Chemical compound NC(=S)NC1=CC=CC=C1 FULZLIGZKMKICU-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 241000080590 Niso Species 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- HIZCIEIDIFGZSS-UHFFFAOYSA-N carbonotrithioic acid Chemical group SC(S)=S HIZCIEIDIFGZSS-UHFFFAOYSA-N 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 235000019864 coconut oil Nutrition 0.000 description 1
- 239000003240 coconut oil Substances 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- CSMFSDCPJHNZRY-UHFFFAOYSA-M decyl sulfate Chemical compound CCCCCCCCCCOS([O-])(=O)=O CSMFSDCPJHNZRY-UHFFFAOYSA-M 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N dimethylmethane Natural products CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 1
- ZOOODBUHSVUZEM-UHFFFAOYSA-N ethoxymethanedithioic acid Chemical group CCOC(S)=S ZOOODBUHSVUZEM-UHFFFAOYSA-N 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 150000002191 fatty alcohols Chemical class 0.000 description 1
- 238000005246 galvanizing Methods 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- ZBGWAJQUDSCDPB-UHFFFAOYSA-N n-(benzenesulfonyl)benzamide Chemical compound C=1C=CC=CC=1C(=O)NS(=O)(=O)C1=CC=CC=C1 ZBGWAJQUDSCDPB-UHFFFAOYSA-N 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000013049 sediment Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- CSMFSDCPJHNZRY-UHFFFAOYSA-N sulfuric acid monodecyl ester Natural products CCCCCCCCCCOS(O)(=O)=O CSMFSDCPJHNZRY-UHFFFAOYSA-N 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/16—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms
- C07D295/20—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms by radicals derived from carbonic acid, or sulfur or nitrogen analogues thereof
- C07D295/21—Radicals derived from sulfur analogues of carbonic acid
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
- C07D233/04—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
- C07D233/28—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D233/30—Oxygen or sulfur atoms
- C07D233/42—Sulfur atoms
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
- C25D21/14—Controlled addition of electrolyte components
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Automation & Control Theory (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Filtering Materials (AREA)
- Chemically Coating (AREA)
Priority Applications (11)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| BE621297D BE621297A (OSRAM) | 1961-08-10 | ||
| NL281922D NL281922A (OSRAM) | 1961-08-10 | ||
| DED36777A DE1224111B (de) | 1961-08-10 | 1961-08-10 | Saure galvanische Kupfer- und Nickelbaeder und Verfahren zum Abscheiden der UEberzuege |
| CH355962A CH429356A (de) | 1961-08-10 | 1962-03-24 | Selbstregulierendes saures galvanisches Metallbad |
| GB26837/62A GB941823A (en) | 1961-08-10 | 1962-07-12 | Improvements in or relating to electroplating |
| DE19621421977 DE1421977B2 (de) | 1961-08-10 | 1962-08-01 | Saure galvanische Metallbäder |
| US214490A US3257294A (en) | 1961-08-10 | 1962-08-03 | Acid metal electroplating process and baths |
| FR906316A FR1330617A (fr) | 1961-08-10 | 1962-08-07 | Bains métalliques galvaniques acides |
| US298424A US3245886A (en) | 1961-08-10 | 1963-07-29 | Electroplating process and self-regulating electroplating baths therefor |
| FR943199A FR84087E (fr) | 1961-08-10 | 1963-07-30 | Bains métalliques galvaniques acides |
| GB30313/63A GB1055243A (en) | 1961-08-10 | 1963-07-31 | Improvements in or relating to electroplating |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DED36777A DE1224111B (de) | 1961-08-10 | 1961-08-10 | Saure galvanische Kupfer- und Nickelbaeder und Verfahren zum Abscheiden der UEberzuege |
| DED0039520 | 1962-08-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE1224111B true DE1224111B (de) | 1966-09-01 |
Family
ID=25971309
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DED36777A Pending DE1224111B (de) | 1961-08-10 | 1961-08-10 | Saure galvanische Kupfer- und Nickelbaeder und Verfahren zum Abscheiden der UEberzuege |
| DE19621421977 Pending DE1421977B2 (de) | 1961-08-10 | 1962-08-01 | Saure galvanische Metallbäder |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19621421977 Pending DE1421977B2 (de) | 1961-08-10 | 1962-08-01 | Saure galvanische Metallbäder |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US3257294A (OSRAM) |
| BE (1) | BE621297A (OSRAM) |
| CH (1) | CH429356A (OSRAM) |
| DE (2) | DE1224111B (OSRAM) |
| GB (2) | GB941823A (OSRAM) |
| NL (1) | NL281922A (OSRAM) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH494824A (de) * | 1969-07-10 | 1970-08-15 | Fluehmann Werner | Verfahren zur elektrolytischen Abscheidung von Kupfer hoher Duktilität |
| US3669853A (en) * | 1969-07-15 | 1972-06-13 | Chemetron Corp | Coumarin-carrier addition agent for nickel baths |
| US3518171A (en) * | 1969-07-24 | 1970-06-30 | Metalux Corp The | Purification of nickel electroplating solutions |
| US4014761A (en) * | 1975-01-06 | 1977-03-29 | M & T Chemicals Inc. | Bright acid zinc plating |
| CA1128458A (en) * | 1977-06-06 | 1982-07-27 | Tokuyama Soda Kabushiki Kaisha | Electrolysis with cathode of iron or nickel with electroplate from s/n nickel bath |
| DE2921241A1 (de) * | 1979-04-19 | 1980-10-23 | Alusuisse | Saurer zinn-ii-haltiger elektrolyt |
| US4376685A (en) * | 1981-06-24 | 1983-03-15 | M&T Chemicals Inc. | Acid copper electroplating baths containing brightening and leveling additives |
| US4614568A (en) * | 1983-06-14 | 1986-09-30 | Nihon Kogyo Kabushiki Kaisha | High-speed silver plating and baths therefor |
| GB8522046D0 (en) * | 1985-09-05 | 1985-10-09 | Interox Chemicals Ltd | Stabilisation |
| ES2624637T3 (es) * | 2008-05-30 | 2017-07-17 | Atotech Deutschland Gmbh | Aditivo de electrogalvanoplastia para la deposición de una aleación de un metal del grupo IB/binaria o ternaria del grupo IB-grupo IIIA/ternaria, cuaternaria o quinaria del grupo IB, el grupo IIIA-grupo VIA |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AT172066B (de) * | 1950-03-27 | 1952-08-11 | H C Dr Wilhelm Dipl Pfanhauser | Verfahren zur Herstellung harter, glänzender Kupferniederschläge durch elektrolytische Abscheidung |
| FR1097123A (fr) * | 1953-09-19 | 1955-06-29 | Dehydag | Procédé d'obtention de revêtements métalliques galvaniques |
| DE1008542B (de) * | 1956-01-27 | 1957-05-16 | W Kampschulte & Cie Dr | Chromsaeureelektrolyt |
| US2799634A (en) * | 1954-02-26 | 1957-07-16 | Westinghouse Electric Corp | Combined addition agents for acid copper plating |
| DE1037801B (de) | 1954-03-22 | 1958-08-28 | Dehydag Gmbh | Bad zur galvanischen Herstellung von Metallueberzuegen |
| FR1181721A (fr) * | 1957-03-16 | 1959-06-18 | Riedel & Co | Perfectionnements apportés aux bains acides pour la fabrication de revêtements en cuivre |
| DE1071438B (de) * | 1959-12-17 | Deutsche Gold- und Silber-Scheideanstalt vormals Roessler, Frankfurt/M | Anode für galvanische Bäder und Verfahren zu ihrer Herstellung |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1003092A (en) * | 1907-04-11 | 1911-09-12 | Ontario Nickel Company Ltd | Method of electrolyzing nickel-sulfate solutions. |
| US1371414A (en) * | 1919-06-17 | 1921-03-15 | Thomas A Edison | Nickel-plating |
| US2248092A (en) * | 1934-10-26 | 1941-07-08 | Sherka Chemical Co Inc | Method for treating electroplating baths |
| US2449422A (en) * | 1944-04-15 | 1948-09-14 | Harshaw Chem Corp | Electrodeposition of nickel |
| BE517665A (OSRAM) * | 1949-11-23 | |||
| US2879211A (en) * | 1956-11-16 | 1959-03-24 | Hanson Van Winkle Munning Co | Electroplating duplex nickel coatings |
| US2885399A (en) * | 1957-03-04 | 1959-05-05 | Univ Ohio State Res Found | Hydrazinium hexafluorophosphate salts |
-
0
- BE BE621297D patent/BE621297A/xx unknown
- NL NL281922D patent/NL281922A/xx unknown
-
1961
- 1961-08-10 DE DED36777A patent/DE1224111B/de active Pending
-
1962
- 1962-03-24 CH CH355962A patent/CH429356A/de unknown
- 1962-07-12 GB GB26837/62A patent/GB941823A/en not_active Expired
- 1962-08-01 DE DE19621421977 patent/DE1421977B2/de active Pending
- 1962-08-03 US US214490A patent/US3257294A/en not_active Expired - Lifetime
-
1963
- 1963-07-29 US US298424A patent/US3245886A/en not_active Expired - Lifetime
- 1963-07-31 GB GB30313/63A patent/GB1055243A/en not_active Expired
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1071438B (de) * | 1959-12-17 | Deutsche Gold- und Silber-Scheideanstalt vormals Roessler, Frankfurt/M | Anode für galvanische Bäder und Verfahren zu ihrer Herstellung | |
| AT172066B (de) * | 1950-03-27 | 1952-08-11 | H C Dr Wilhelm Dipl Pfanhauser | Verfahren zur Herstellung harter, glänzender Kupferniederschläge durch elektrolytische Abscheidung |
| FR1097123A (fr) * | 1953-09-19 | 1955-06-29 | Dehydag | Procédé d'obtention de revêtements métalliques galvaniques |
| US2799634A (en) * | 1954-02-26 | 1957-07-16 | Westinghouse Electric Corp | Combined addition agents for acid copper plating |
| DE1037801B (de) | 1954-03-22 | 1958-08-28 | Dehydag Gmbh | Bad zur galvanischen Herstellung von Metallueberzuegen |
| DE1008542B (de) * | 1956-01-27 | 1957-05-16 | W Kampschulte & Cie Dr | Chromsaeureelektrolyt |
| FR1181721A (fr) * | 1957-03-16 | 1959-06-18 | Riedel & Co | Perfectionnements apportés aux bains acides pour la fabrication de revêtements en cuivre |
Also Published As
| Publication number | Publication date |
|---|---|
| GB941823A (en) | 1963-11-13 |
| CH429356A (de) | 1967-01-31 |
| US3245886A (en) | 1966-04-12 |
| DE1421977A1 (de) | 1968-11-07 |
| DE1421977B2 (de) | 1970-02-19 |
| BE621297A (OSRAM) | |
| NL281922A (OSRAM) | |
| GB1055243A (en) | 1967-01-18 |
| US3257294A (en) | 1966-06-21 |
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