CN1729430A - 阻质层涂覆方法、粘性材料的使用、粘性材料及阻质层 - Google Patents

阻质层涂覆方法、粘性材料的使用、粘性材料及阻质层 Download PDF

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Publication number
CN1729430A
CN1729430A CNA2003801068270A CN200380106827A CN1729430A CN 1729430 A CN1729430 A CN 1729430A CN A2003801068270 A CNA2003801068270 A CN A2003801068270A CN 200380106827 A CN200380106827 A CN 200380106827A CN 1729430 A CN1729430 A CN 1729430A
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CN
China
Prior art keywords
layer
matter layer
resistance matter
viscous
resistance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2003801068270A
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English (en)
Chinese (zh)
Inventor
W·科宁格
M·施尼干斯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Infineon Technologies AG
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Infineon Technologies AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Infineon Technologies AG filed Critical Infineon Technologies AG
Publication of CN1729430A publication Critical patent/CN1729430A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/161—Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Adhesive Tapes (AREA)
CNA2003801068270A 2002-12-20 2003-12-18 阻质层涂覆方法、粘性材料的使用、粘性材料及阻质层 Pending CN1729430A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10260235.2 2002-12-20
DE10260235A DE10260235B4 (de) 2002-12-20 2002-12-20 Verfahren zum Strukturieren einer Resistschicht und Negativ-Resistschicht

Publications (1)

Publication Number Publication Date
CN1729430A true CN1729430A (zh) 2006-02-01

Family

ID=32519239

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2003801068270A Pending CN1729430A (zh) 2002-12-20 2003-12-18 阻质层涂覆方法、粘性材料的使用、粘性材料及阻质层

Country Status (8)

Country Link
US (4) US7351514B2 (de)
EP (1) EP1573400A2 (de)
JP (1) JP2006510064A (de)
CN (1) CN1729430A (de)
AU (1) AU2003292253A1 (de)
DE (1) DE10260235B4 (de)
TW (1) TWI233540B (de)
WO (1) WO2004059393A2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107645854A (zh) * 2017-09-21 2018-01-30 台州学院 一种多层柔性电路板形成过孔连接的方法

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JP4175662B2 (ja) 1996-01-08 2008-11-05 インパルス ダイナミクス エヌ．ヴイ． 電気的筋肉制御装置
US9289618B1 (en) 1996-01-08 2016-03-22 Impulse Dynamics Nv Electrical muscle controller
US9713723B2 (en) 1996-01-11 2017-07-25 Impulse Dynamics Nv Signal delivery through the right ventricular septum
WO2006073671A1 (en) 2004-12-09 2006-07-13 Impulse Dynamics Nv Protein activity modification
DE10260235B4 (de) * 2002-12-20 2010-10-28 Infineon Technologies Ag Verfahren zum Strukturieren einer Resistschicht und Negativ-Resistschicht
US11439815B2 (en) 2003-03-10 2022-09-13 Impulse Dynamics Nv Protein activity modification
US11779768B2 (en) 2004-03-10 2023-10-10 Impulse Dynamics Nv Protein activity modification
WO2006119467A2 (en) 2005-05-04 2006-11-09 Impulse Dynamics Nv Protein activity modification
KR101318517B1 (ko) * 2008-05-30 2013-10-16 코오롱인더스트리 주식회사 필름형 광분해성 전사재료
US8934975B2 (en) 2010-02-01 2015-01-13 Metacure Limited Gastrointestinal electrical therapy
KR101084811B1 (ko) 2010-08-20 2011-11-21 삼성전기주식회사 인쇄회로기판 및 그 제조방법

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107645854A (zh) * 2017-09-21 2018-01-30 台州学院 一种多层柔性电路板形成过孔连接的方法

Also Published As

Publication number Publication date
US8003292B2 (en) 2011-08-23
US8415080B2 (en) 2013-04-09
AU2003292253A1 (en) 2004-07-22
TWI233540B (en) 2005-06-01
TW200413857A (en) 2004-08-01
USRE42980E1 (en) 2011-11-29
WO2004059393A3 (de) 2005-04-07
US20080305428A1 (en) 2008-12-11
US20110269073A1 (en) 2011-11-03
US7351514B2 (en) 2008-04-01
AU2003292253A8 (en) 2004-07-22
EP1573400A2 (de) 2005-09-14
WO2004059393A2 (de) 2004-07-15
DE10260235A1 (de) 2004-07-22
US20050266353A1 (en) 2005-12-01
JP2006510064A (ja) 2006-03-23
DE10260235B4 (de) 2010-10-28

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SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication