WO2004059393A3 - Verfahren zum aufbringen einer resistschicht, verwendungen von klebematerialien sowie klebematerialien und resistschicht - Google Patents

Verfahren zum aufbringen einer resistschicht, verwendungen von klebematerialien sowie klebematerialien und resistschicht Download PDF

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Publication number
WO2004059393A3
WO2004059393A3 PCT/EP2003/014460 EP0314460W WO2004059393A3 WO 2004059393 A3 WO2004059393 A3 WO 2004059393A3 EP 0314460 W EP0314460 W EP 0314460W WO 2004059393 A3 WO2004059393 A3 WO 2004059393A3
Authority
WO
WIPO (PCT)
Prior art keywords
resist layer
adhesive materials
applying
adhesive
layer
Prior art date
Application number
PCT/EP2003/014460
Other languages
English (en)
French (fr)
Other versions
WO2004059393A2 (de
Inventor
Werner Kroeninger
Manfred Schneegans
Original Assignee
Infineon Technologies Ag
Werner Kroeninger
Manfred Schneegans
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Infineon Technologies Ag, Werner Kroeninger, Manfred Schneegans filed Critical Infineon Technologies Ag
Priority to EP03767816A priority Critical patent/EP1573400A2/de
Priority to AU2003292253A priority patent/AU2003292253A1/en
Priority to JP2004562781A priority patent/JP2006510064A/ja
Publication of WO2004059393A2 publication Critical patent/WO2004059393A2/de
Publication of WO2004059393A3 publication Critical patent/WO2004059393A3/de
Priority to US11/156,405 priority patent/US7351514B2/en
Priority to US11/943,145 priority patent/US8003292B2/en
Priority to US12/798,150 priority patent/USRE42980E1/en
Priority to US13/178,710 priority patent/US8415080B2/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/161—Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Adhesive Tapes (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

Erläutert wird unter anderem ein Verfahren, bei dem auf eine Grundschicht (24) eine Resistschicht (12) aufgebracht wird. Die Resistschicht (12) besteht aus einem klebenden Material, dessen Klebekraft sich bei der Bestrahlung verringert oder erhöht. Insbesondere das Lösen von Resten der Resistschicht (12) wird durch dieses Verfahren erleichtert.
PCT/EP2003/014460 2002-12-20 2003-12-18 Verfahren zum aufbringen einer resistschicht, verwendungen von klebematerialien sowie klebematerialien und resistschicht WO2004059393A2 (de)

Priority Applications (7)

Application Number Priority Date Filing Date Title
EP03767816A EP1573400A2 (de) 2002-12-20 2003-12-18 Verfahren zum aufbringen einer resistschicht, verwendungen von klebematerialien sowie klebematerialien und resistschicht
AU2003292253A AU2003292253A1 (en) 2002-12-20 2003-12-18 Method for applying a resist layer, uses of adhesive materials, and adhesive materials and a resist layer
JP2004562781A JP2006510064A (ja) 2002-12-20 2003-12-18 レジスト層の塗布方法、接着剤の使用、接着剤およびレジスト層
US11/156,405 US7351514B2 (en) 2002-12-20 2005-06-20 Method for applying a resist layer, uses of adhesive materials, and adhesive materials and resist layer
US11/943,145 US8003292B2 (en) 2002-12-20 2007-11-20 Method for applying a resist layer, uses of adhesive materials, and adhesive materials and resist layer
US12/798,150 USRE42980E1 (en) 2002-12-20 2010-03-29 Method for applying a resist layer, uses of adhesive materials, and adhesive materials and resist layer
US13/178,710 US8415080B2 (en) 2002-12-20 2011-07-08 Method for applying a resist layer, uses of adhesive materials, and adhesive materials and resist layer

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10260235.2 2002-12-20
DE10260235A DE10260235B4 (de) 2002-12-20 2002-12-20 Verfahren zum Strukturieren einer Resistschicht und Negativ-Resistschicht

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US11/156,405 Continuation US7351514B2 (en) 2002-12-20 2005-06-20 Method for applying a resist layer, uses of adhesive materials, and adhesive materials and resist layer

Publications (2)

Publication Number Publication Date
WO2004059393A2 WO2004059393A2 (de) 2004-07-15
WO2004059393A3 true WO2004059393A3 (de) 2005-04-07

Family

ID=32519239

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2003/014460 WO2004059393A2 (de) 2002-12-20 2003-12-18 Verfahren zum aufbringen einer resistschicht, verwendungen von klebematerialien sowie klebematerialien und resistschicht

Country Status (8)

Country Link
US (4) US7351514B2 (de)
EP (1) EP1573400A2 (de)
JP (1) JP2006510064A (de)
CN (1) CN1729430A (de)
AU (1) AU2003292253A1 (de)
DE (1) DE10260235B4 (de)
TW (1) TWI233540B (de)
WO (1) WO2004059393A2 (de)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8934975B2 (en) 2010-02-01 2015-01-13 Metacure Limited Gastrointestinal electrical therapy
US8958872B2 (en) 1996-01-08 2015-02-17 Impulse Dynamics, N.V. Electrical muscle controller
US8977353B2 (en) 2004-03-10 2015-03-10 Impulse Dynamics Nv Protein activity modification
US9289618B1 (en) 1996-01-08 2016-03-22 Impulse Dynamics Nv Electrical muscle controller

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9713723B2 (en) 1996-01-11 2017-07-25 Impulse Dynamics Nv Signal delivery through the right ventricular septum
DE10260235B4 (de) * 2002-12-20 2010-10-28 Infineon Technologies Ag Verfahren zum Strukturieren einer Resistschicht und Negativ-Resistschicht
US11439815B2 (en) 2003-03-10 2022-09-13 Impulse Dynamics Nv Protein activity modification
US11779768B2 (en) 2004-03-10 2023-10-10 Impulse Dynamics Nv Protein activity modification
EP1827571B1 (de) 2004-12-09 2016-09-07 Impulse Dynamics NV Proteinaktivitätsmodifizierung
KR101318517B1 (ko) * 2008-05-30 2013-10-16 코오롱인더스트리 주식회사 필름형 광분해성 전사재료
KR101084811B1 (ko) 2010-08-20 2011-11-21 삼성전기주식회사 인쇄회로기판 및 그 제조방법
CN107645854A (zh) * 2017-09-21 2018-01-30 台州学院 一种多层柔性电路板形成过孔连接的方法

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US5015059A (en) * 1988-01-15 1991-05-14 E. I. Du Pont De Nemours And Company Optical fiber connector assemblies and methods of making the assemblies
EP0553638A1 (de) * 1992-01-29 1993-08-04 E.I. Du Pont De Nemours And Company Übertragungsverfahren unter Verwendung von Ultraviolett-härtbaren Tonern ohne verlängerte Klebrigkeit
EP0559248A1 (de) * 1992-02-29 1993-09-08 Agfa-Gevaert N.V. Bildaufzeichnungselement, als photoempfindliches Element eine photopolymerisierbare Zusammensetzung enthaltend
US5959011A (en) * 1993-06-02 1999-09-28 Nitto Denko Corporation Resist removing method, and curable pressure-sensitive adhesive, adhesive sheets and apparatus used for the method
US6100006A (en) * 1999-08-19 2000-08-08 E. I. Du Pont De Nemours And Company Peel-apart photosensitive elements and their process of use

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JPS6032173B2 (ja) * 1974-12-28 1985-07-26 富士写真フイルム株式会社 画像形成法
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KR101318517B1 (ko) * 2008-05-30 2013-10-16 코오롱인더스트리 주식회사 필름형 광분해성 전사재료

Patent Citations (9)

* Cited by examiner, † Cited by third party
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US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists
US4289841A (en) * 1978-02-26 1981-09-15 E. I. Du Pont De Nemours And Company Dry-developing photosensitive dry film resist
US4649100A (en) * 1983-11-26 1987-03-10 Basf Aktiengesellschaft Production of resist images, and a suitable dry film resist
US4826705A (en) * 1986-07-02 1989-05-02 Loctite Corporation Radiation curable temporary solder mask
US5015059A (en) * 1988-01-15 1991-05-14 E. I. Du Pont De Nemours And Company Optical fiber connector assemblies and methods of making the assemblies
EP0553638A1 (de) * 1992-01-29 1993-08-04 E.I. Du Pont De Nemours And Company Übertragungsverfahren unter Verwendung von Ultraviolett-härtbaren Tonern ohne verlängerte Klebrigkeit
EP0559248A1 (de) * 1992-02-29 1993-09-08 Agfa-Gevaert N.V. Bildaufzeichnungselement, als photoempfindliches Element eine photopolymerisierbare Zusammensetzung enthaltend
US5959011A (en) * 1993-06-02 1999-09-28 Nitto Denko Corporation Resist removing method, and curable pressure-sensitive adhesive, adhesive sheets and apparatus used for the method
US6100006A (en) * 1999-08-19 2000-08-08 E. I. Du Pont De Nemours And Company Peel-apart photosensitive elements and their process of use

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8958872B2 (en) 1996-01-08 2015-02-17 Impulse Dynamics, N.V. Electrical muscle controller
US9186514B2 (en) 1996-01-08 2015-11-17 Impulse Dynamics Nv Electrical muscle controller
US9289618B1 (en) 1996-01-08 2016-03-22 Impulse Dynamics Nv Electrical muscle controller
US8977353B2 (en) 2004-03-10 2015-03-10 Impulse Dynamics Nv Protein activity modification
US9440080B2 (en) 2004-03-10 2016-09-13 Impulse Dynamics Nv Protein activity modification
US8934975B2 (en) 2010-02-01 2015-01-13 Metacure Limited Gastrointestinal electrical therapy

Also Published As

Publication number Publication date
EP1573400A2 (de) 2005-09-14
US8003292B2 (en) 2011-08-23
TWI233540B (en) 2005-06-01
US8415080B2 (en) 2013-04-09
TW200413857A (en) 2004-08-01
US20110269073A1 (en) 2011-11-03
WO2004059393A2 (de) 2004-07-15
US7351514B2 (en) 2008-04-01
AU2003292253A8 (en) 2004-07-22
USRE42980E1 (en) 2011-11-29
JP2006510064A (ja) 2006-03-23
CN1729430A (zh) 2006-02-01
DE10260235B4 (de) 2010-10-28
DE10260235A1 (de) 2004-07-22
US20080305428A1 (en) 2008-12-11
US20050266353A1 (en) 2005-12-01
AU2003292253A1 (en) 2004-07-22

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