CN1293235C - 铜电解液以及由其制造的电解铜箔 - Google Patents
铜电解液以及由其制造的电解铜箔 Download PDFInfo
- Publication number
- CN1293235C CN1293235C CNB038005557A CN03800555A CN1293235C CN 1293235 C CN1293235 C CN 1293235C CN B038005557 A CNB038005557 A CN B038005557A CN 03800555 A CN03800555 A CN 03800555A CN 1293235 C CN1293235 C CN 1293235C
- Authority
- CN
- China
- Prior art keywords
- group
- copper foil
- compound
- electrolytic copper
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 66
- 239000011889 copper foil Substances 0.000 title claims abstract description 38
- -1 amine compound Chemical class 0.000 title claims abstract description 36
- 239000010949 copper Substances 0.000 title claims abstract description 28
- 229910052802 copper Inorganic materials 0.000 title claims abstract description 27
- 150000002898 organic sulfur compounds Chemical class 0.000 title claims abstract description 14
- 239000003792 electrolyte Substances 0.000 title claims description 18
- 239000000654 additive Substances 0.000 claims abstract description 15
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 13
- 125000003118 aryl group Chemical group 0.000 claims abstract description 13
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims abstract description 7
- 230000000996 additive effect Effects 0.000 claims description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 11
- 239000002585 base Substances 0.000 claims description 9
- 239000011734 sodium Substances 0.000 claims description 8
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 6
- 125000004417 unsaturated alkyl group Chemical group 0.000 claims description 6
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 5
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 2
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical group OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical group [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 2
- 239000005864 Sulphur Substances 0.000 claims description 2
- 239000003513 alkali Substances 0.000 claims description 2
- 125000001118 alkylidene group Chemical group 0.000 claims description 2
- 150000003863 ammonium salts Chemical class 0.000 claims description 2
- 229910052728 basic metal Inorganic materials 0.000 claims description 2
- 150000003818 basic metals Chemical class 0.000 claims description 2
- 229910052698 phosphorus Chemical group 0.000 claims description 2
- 239000011574 phosphorus Chemical group 0.000 claims description 2
- 229910052700 potassium Inorganic materials 0.000 claims description 2
- 239000011591 potassium Substances 0.000 claims description 2
- 229910052708 sodium Inorganic materials 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 abstract description 20
- 239000008151 electrolyte solution Substances 0.000 abstract description 12
- 239000004593 Epoxy Substances 0.000 abstract description 10
- 238000004519 manufacturing process Methods 0.000 abstract description 9
- 125000003700 epoxy group Chemical group 0.000 abstract description 5
- 238000007259 addition reaction Methods 0.000 abstract description 4
- 125000001033 ether group Chemical group 0.000 abstract description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 abstract 1
- 230000003746 surface roughness Effects 0.000 abstract 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 abstract 1
- 230000000052 comparative effect Effects 0.000 description 13
- ROSDSFDQCJNGOL-UHFFFAOYSA-N protonated dimethyl amine Natural products CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 10
- 238000000059 patterning Methods 0.000 description 8
- 239000003607 modifier Substances 0.000 description 6
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 4
- 238000009434 installation Methods 0.000 description 4
- BWLUMTFWVZZZND-UHFFFAOYSA-N Dibenzylamine Chemical compound C=1C=CC=CC=1CNCC1=CC=CC=C1 BWLUMTFWVZZZND-UHFFFAOYSA-N 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- 108010010803 Gelatin Proteins 0.000 description 2
- 238000001460 carbon-13 nuclear magnetic resonance spectrum Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 2
- 238000004070 electrodeposition Methods 0.000 description 2
- 238000005868 electrolysis reaction Methods 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- 229920000159 gelatin Polymers 0.000 description 2
- 239000008273 gelatin Substances 0.000 description 2
- 235000019322 gelatine Nutrition 0.000 description 2
- 235000011852 gelatine desserts Nutrition 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- DYUWTXWIYMHBQS-UHFFFAOYSA-N n-prop-2-enylprop-2-en-1-amine Chemical compound C=CCNCC=C DYUWTXWIYMHBQS-UHFFFAOYSA-N 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- 125000006017 1-propenyl group Chemical group 0.000 description 1
- VEPOHXYIFQMVHW-XOZOLZJESA-N 2,3-dihydroxybutanedioic acid (2S,3S)-3,4-dimethyl-2-phenylmorpholine Chemical compound OC(C(O)C(O)=O)C(O)=O.C[C@H]1[C@@H](OCCN1C)c1ccccc1 VEPOHXYIFQMVHW-XOZOLZJESA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- QXNVGIXVLWOKEQ-UHFFFAOYSA-N Disodium Chemical compound [Na][Na] QXNVGIXVLWOKEQ-UHFFFAOYSA-N 0.000 description 1
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 1
- 238000001157 Fourier transform infrared spectrum Methods 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- PCNDJXKNXGMECE-UHFFFAOYSA-N Phenazine Natural products C1=CC=CC2=NC3=CC=CC=C3N=C21 PCNDJXKNXGMECE-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 125000002592 cumenyl group Chemical group C1(=C(C=CC=C1)*)C(C)C 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N methyl alcohol Substances OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000002927 oxygen compounds Chemical group 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- FTCLAXOKVVLHEG-UHFFFAOYSA-N sodium;3-sulfanylpropane-1-sulfonic acid Chemical compound [Na].OS(=O)(=O)CCCS FTCLAXOKVVLHEG-UHFFFAOYSA-N 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000013517 stratification Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/04—Wires; Strips; Foils
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12903—Cu-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12993—Surface feature [e.g., rough, mirror]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Laminated Bodies (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
Abstract
Description
添加剂A(ppm) | 添加剂B(ppm) | 添加剂C(ppm) | Rz(μm) | 常温伸长率(%) | 常温抗张强度(kgf/mm2) | 高温伸长率(%) | 高温抗张强度(kgf/mm2) | ||||||
C1 | C2 | C3 | C4 | C5 | C6 | ||||||||
实施例1 | 50 | 0 | 50 | 0 | 0 | 0 | 0 | 0 | 1.02 | 8.10 | 32.2 | 13.9 | 21.7 |
实施例2 | 50 | 0 | 0 | 50 | 0 | 0 | 0 | 0 | 1.00 | 6.62 | 30.5 | 16.2 | 21.0 |
实施例3 | 50 | 0 | 0 | 0 | 50 | 0 | 0 | 0 | 0.90 | 8.71 | 31.0 | 18.2 | 20.6 |
实施例4 | 50 | 0 | 0 | 0 | 0 | 50 | 0 | 0 | 1.13 | 8.90 | 37.9 | 12.6 | 20.7 |
实施例5 | 50 | 0 | 0 | 0 | 0 | 0 | 50 | 0 | 1.15 | 7.12 | 34.2 | 12.1 | 20.1 |
实施例6 | 50 | 0 | 0 | 0 | 0 | 0 | 0 | 50 | 0.97 | 6.75 | 31.5 | 16.9 | 21.1 |
实施例7 | 0 | 50 | 50 | 0 | 0 | 0 | 0 | 0 | 1.10 | 8.23 | 32.9 | 14.2 | 20.8 |
实施例8 | 0 | 50 | 0 | 50 | 0 | 0 | 0 | 0 | 1.02 | 6.69 | 31.2 | 17.0 | 22.3 |
实施例9 | 0 | 50 | 0 | 0 | 50 | 0 | 0 | 0 | 0.92 | 8.90 | 33.0 | 17.3 | 22.2 |
实施例10 | 0 | 50 | 0 | 0 | 0 | 50 | 0 | 0 | 1.16 | 8.70 | 36.6 | 12.3 | 21.0 |
实施例11 | 0 | 50 | 0 | 0 | 0 | 0 | 50 | 0 | 1.20 | 7.23 | 34.9 | 12.4 | 20.3 |
实施例12 | 0 | 50 | 0 | 0 | 0 | 0 | 0 | 50 | 0.98 | 6.83 | 31.9 | 16.5 | 21.4 |
比较例1 | 0 | 0 | 0 | 0 | 0 | 0 | 0 | 0 | 5.8 | 8.90 | 37.9 | 12.6 | 20.7 |
比较例2 | 100 | 0 | 0 | 0 | 0 | 0 | 0 | 0 | 5.3 | 0.2 | 10.3 | 1.0 | 15.3 |
比较例3 | 0 | 100 | 0 | 0 | 0 | 0 | 0 | 0 | 6.1 | 0.2 | 11.2 | 1.2 | 14.9 |
比较例4 | 0 | 0 | 100 | 0 | 0 | 0 | 0 | 0 | 5.3 | 0.3 | 10.9 | 1.1 | 16.0 |
比较例5 | 0 | 0 | 0 | 100 | 0 | 0 | 0 | 0 | 5.8 | 0.1 | 11.1 | 1.0 | 15.8 |
比较例6 | 0 | 0 | 0 | 0 | 100 | 0 | 0 | 0 | 5.3 | 0.2 | 12.3 | 1.3 | 15.3 |
比较例7 | 0 | 0 | 0 | 0 | 0 | 100 | 0 | 0 | 5.8 | 0.2 | 13.0 | 1.2 | 14.9 |
比较例8 | 0 | 0 | 0 | 0 | 0 | 0 | 100 | 0 | 5.2 | 0.2 | 12.2 | 1.1 | 15.9 |
比较例9 | 0 | 0 | 0 | 0 | 0 | 0 | 0 | 100 | 4.9 | 0.2 | 10.3 | 2.7 | 12.8 |
Claims (3)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002213889 | 2002-07-23 | ||
JP213889/2002 | 2002-07-23 | ||
JP2002291403A JP3789107B2 (ja) | 2002-07-23 | 2002-10-03 | 特定骨格を有するアミン化合物及び有機硫黄化合物を添加剤として含む銅電解液並びにそれにより製造される電解銅箔 |
JP291403/2002 | 2002-10-03 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1522316A CN1522316A (zh) | 2004-08-18 |
CN1293235C true CN1293235C (zh) | 2007-01-03 |
Family
ID=30772236
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB038005557A Expired - Lifetime CN1293235C (zh) | 2002-07-23 | 2003-05-21 | 铜电解液以及由其制造的电解铜箔 |
Country Status (10)
Country | Link |
---|---|
US (3) | US7005055B2 (zh) |
EP (1) | EP1524335B8 (zh) |
JP (1) | JP3789107B2 (zh) |
KR (1) | KR100588176B1 (zh) |
CN (1) | CN1293235C (zh) |
ES (1) | ES2497090T3 (zh) |
HK (1) | HK1064713A1 (zh) |
MY (1) | MY146397A (zh) |
TW (1) | TWI250225B (zh) |
WO (1) | WO2004009876A1 (zh) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100389061B1 (ko) * | 2002-11-14 | 2003-06-25 | 일진소재산업주식회사 | 전해 동박 제조용 전해액 및 이를 이용한 전해 동박 제조방법 |
WO2006080148A1 (ja) * | 2005-01-25 | 2006-08-03 | Nippon Mining & Metals Co., Ltd. | 特定骨格を有する化合物を添加剤として含む銅電解液並びにそれにより製造される電解銅箔 |
DE102005041925A1 (de) * | 2005-09-03 | 2007-04-26 | Bayer Materialscience Ag | 2K PUR-Systeme enthaltend OH-funktionelle Polydimethylsiloxane |
DE102005041951A1 (de) * | 2005-09-03 | 2007-03-08 | Bayer Materialscience Ag | Wässrige 2K-PUR Systeme enthaltend hydroxy-funktionelle Polydimethylsiloxane |
KR20070044774A (ko) * | 2005-10-25 | 2007-04-30 | 미쓰이 긴조꾸 고교 가부시키가이샤 | 2층 플렉시블 프린트 배선판 및 그 2층 플렉시블 프린트배선판의 제조 방법 |
JP2007146289A (ja) * | 2005-10-31 | 2007-06-14 | Mitsui Mining & Smelting Co Ltd | 電解銅箔の製造方法、該製造方法で得られる電解銅箔、該電解銅箔を用いて得られる表面処理銅箔及び該電解銅箔又は該表面処理銅箔を用いて得られる銅張積層板 |
KR100723391B1 (ko) * | 2006-01-13 | 2007-05-30 | 삼성에스디아이 주식회사 | 고분자 전해질막 및 이를 구비한 연료전지 |
TWI414638B (zh) * | 2006-06-07 | 2013-11-11 | Furukawa Electric Co Ltd | A method for manufacturing a surface-treated electrolytic copper foil, and a circuit board |
US20080142249A1 (en) * | 2006-12-13 | 2008-06-19 | International Business Machines Corporation | Selective surface roughness for high speed signaling |
US7872297B2 (en) * | 2007-04-17 | 2011-01-18 | Snu R&Db Foundation | Flash memory device and fabricating method thereof comprising a body recess region |
JP5236745B2 (ja) * | 2008-11-25 | 2013-07-17 | Jx日鉱日石金属株式会社 | 銅箔又は銅張り積層板の巻取り方法 |
US8262895B2 (en) * | 2010-03-15 | 2012-09-11 | Rohm And Haas Electronic Materials Llc | Plating bath and method |
US8268157B2 (en) * | 2010-03-15 | 2012-09-18 | Rohm And Haas Electronic Materials Llc | Plating bath and method |
JP4999126B2 (ja) * | 2010-06-15 | 2012-08-15 | 古河電気工業株式会社 | 回路部品 |
JP5352542B2 (ja) | 2010-07-15 | 2013-11-27 | エル エス エムトロン リミテッド | リチウム二次電池の集電体用銅箔 |
JP5312412B2 (ja) | 2010-08-06 | 2013-10-09 | 三洋電機株式会社 | コンテンツ再生装置 |
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KR20190131579A (ko) * | 2017-05-09 | 2019-11-26 | 제이엑스금속주식회사 | 전해 구리박 및 그 제조 방법, 동장 적층판, 프린트 배선판 및 그 제조 방법, 그리고 전자 기기 및 그 제조 방법 |
WO2018207785A1 (ja) * | 2017-05-09 | 2018-11-15 | Jx金属株式会社 | 電解銅箔及びその製造方法、銅張積層板、プリント配線板及びその製造方法、並びに電子機器及びその製造方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4490220A (en) * | 1982-09-30 | 1984-12-25 | Learonal, Inc. | Electrolytic copper plating solutions |
CN1111567A (zh) * | 1993-12-28 | 1995-11-15 | 日本电解株式会社 | 敷铜箔层压板,多层印刷电路板及其处理方法 |
CN1193360A (zh) * | 1996-05-13 | 1998-09-16 | 三井金属矿业株式会社 | 高抗张强度电解铜箔及其制造方法 |
EP1069211A2 (en) * | 1999-07-15 | 2001-01-17 | The Boc Group, Inc. | Electroplating solutions |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3902951A (en) * | 1969-12-28 | 1975-09-02 | Matsushita Electric Works Ltd | Copper-clad laminate and production thereof |
US4384930A (en) * | 1981-08-21 | 1983-05-24 | Mcgean-Rohco, Inc. | Electroplating baths, additives therefor and methods for the electrodeposition of metals |
US4529486A (en) * | 1984-01-06 | 1985-07-16 | Olin Corporation | Anode for continuous electroforming of metal foil |
JPH0649958B2 (ja) | 1987-06-15 | 1994-06-29 | 日本電解株式会社 | 電解銅箔の製造方法 |
JP2993968B2 (ja) | 1989-01-10 | 1999-12-27 | 古河サーキットフォイル株式会社 | 電解銅箔の製造方法 |
US5403465A (en) * | 1990-05-30 | 1995-04-04 | Gould Inc. | Electrodeposited copper foil and process for making same using electrolyte solutions having controlled additions of chloride ions and organic additives |
JPH0853789A (ja) | 1994-08-09 | 1996-02-27 | Furukawa Circuit Foil Kk | 電解銅箔の製造方法 |
JP3313277B2 (ja) * | 1995-09-22 | 2002-08-12 | 古河サーキットフォイル株式会社 | ファインパターン用電解銅箔とその製造方法 |
JPH10330983A (ja) | 1997-05-30 | 1998-12-15 | Fukuda Metal Foil & Powder Co Ltd | 電解銅箔及びその製造方法 |
DE19758121C2 (de) | 1997-12-17 | 2000-04-06 | Atotech Deutschland Gmbh | Wäßriges Bad und Verfahren zum elektrolytischen Abscheiden von Kupferschichten |
TWI255871B (en) | 2000-12-20 | 2006-06-01 | Learonal Japan Inc | Electrolytic copper plating solution and process for electrolytic plating using the same |
JP4392168B2 (ja) * | 2001-05-09 | 2009-12-24 | 荏原ユージライト株式会社 | 銅めっき浴およびこれを用いる基板のめっき方法 |
EP1264918B1 (en) * | 2001-06-07 | 2011-11-23 | Shipley Co. L.L.C. | Electrolytic copper plating method |
-
2002
- 2002-10-03 JP JP2002291403A patent/JP3789107B2/ja not_active Expired - Lifetime
-
2003
- 2003-05-21 ES ES03730553.9T patent/ES2497090T3/es not_active Expired - Lifetime
- 2003-05-21 WO PCT/JP2003/006363 patent/WO2004009876A1/ja active Application Filing
- 2003-05-21 EP EP03730553.9A patent/EP1524335B8/en not_active Expired - Lifetime
- 2003-05-21 KR KR1020037016792A patent/KR100588176B1/ko active IP Right Grant
- 2003-05-21 CN CNB038005557A patent/CN1293235C/zh not_active Expired - Lifetime
- 2003-05-21 US US10/479,896 patent/US7005055B2/en not_active Expired - Lifetime
- 2003-07-04 TW TW092118287A patent/TWI250225B/zh not_active IP Right Cessation
- 2003-07-10 MY MYPI20032589A patent/MY146397A/en unknown
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- 2007-10-03 US US11/906,663 patent/US8449751B2/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4490220A (en) * | 1982-09-30 | 1984-12-25 | Learonal, Inc. | Electrolytic copper plating solutions |
CN1111567A (zh) * | 1993-12-28 | 1995-11-15 | 日本电解株式会社 | 敷铜箔层压板,多层印刷电路板及其处理方法 |
CN1193360A (zh) * | 1996-05-13 | 1998-09-16 | 三井金属矿业株式会社 | 高抗张强度电解铜箔及其制造方法 |
EP1069211A2 (en) * | 1999-07-15 | 2001-01-17 | The Boc Group, Inc. | Electroplating solutions |
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EP1524335B8 (en) | 2014-11-19 |
US20040149583A1 (en) | 2004-08-05 |
JP2004107786A (ja) | 2004-04-08 |
TWI250225B (en) | 2006-03-01 |
JP3789107B2 (ja) | 2006-06-21 |
US7378160B2 (en) | 2008-05-27 |
MY146397A (en) | 2012-08-15 |
KR20040028792A (ko) | 2004-04-03 |
EP1524335B1 (en) | 2014-06-04 |
EP1524335A4 (en) | 2006-03-29 |
US20050252778A1 (en) | 2005-11-17 |
US7005055B2 (en) | 2006-02-28 |
TW200402482A (en) | 2004-02-16 |
EP1524335A1 (en) | 2005-04-20 |
KR100588176B1 (ko) | 2006-06-08 |
US8449751B2 (en) | 2013-05-28 |
ES2497090T3 (es) | 2014-09-22 |
CN1522316A (zh) | 2004-08-18 |
WO2004009876A1 (ja) | 2004-01-29 |
HK1064713A1 (en) | 2005-02-04 |
US20080073219A1 (en) | 2008-03-27 |
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