CN1246858C - X射线荧光(xrf)光谱测定系统和方法 - Google Patents

X射线荧光(xrf)光谱测定系统和方法 Download PDF

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Publication number
CN1246858C
CN1246858C CNB028161939A CN02816193A CN1246858C CN 1246858 C CN1246858 C CN 1246858C CN B028161939 A CNB028161939 A CN B028161939A CN 02816193 A CN02816193 A CN 02816193A CN 1246858 C CN1246858 C CN 1246858C
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hyperbolic
optic
xrf
sample
xrf spectrometry
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CN1543653A (zh
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陈泽武
戴维·M·吉布森
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X Ray Optical Systems Inc
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X Ray Optical Systems Inc
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    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KHANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062Devices having a multilayer structure
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KHANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/07Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076X-ray fluorescence
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KHANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00Arrangements for handling radiation or particles
    • G21K2201/06Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Nanotechnology (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
CNB028161939A 2001-06-19 2002-06-18 X射线荧光(xrf)光谱测定系统和方法 Expired - Lifetime CN1246858C (zh)

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US29937101P 2001-06-19 2001-06-19
US60/299,371 2001-06-19

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CN1543653A CN1543653A (zh) 2004-11-03
CN1246858C true CN1246858C (zh) 2006-03-22

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US (1) US6934359B2 (https=)
EP (1) EP1402541B1 (https=)
JP (3) JP2005512020A (https=)
CN (1) CN1246858C (https=)
AT (1) ATE336789T1 (https=)
AU (1) AU2002315331A1 (https=)
CA (1) CA2489646C (https=)
DE (1) DE60213994T2 (https=)
ES (1) ES2271277T3 (https=)
RU (1) RU2339974C2 (https=)
WO (1) WO2002103710A2 (https=)

Families Citing this family (103)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080220441A1 (en) * 2001-05-16 2008-09-11 Birnbaum Eva R Advanced drug development and manufacturing
WO2003043498A2 (en) * 2001-11-17 2003-05-30 Council For The Central Laboratory Of The Research Councils Method and apparatus for obtaining simultaneously absorption and refraction images by use of a monochromator with integrated radiation detector
EP1468428B1 (fr) 2002-06-19 2006-09-27 Xenocs Ensemble optique et procede associe
FR2850171B1 (fr) * 2003-01-21 2005-04-08 Xenocs Dispositif optique pour applications rayons x
DE10254026C5 (de) * 2002-11-20 2009-01-29 Incoatec Gmbh Reflektor für Röntgenstrahlung
US7763820B1 (en) 2003-01-27 2010-07-27 Spectramet, Llc Sorting pieces of material based on photonic emissions resulting from multiple sources of stimuli
US20060153332A1 (en) * 2003-03-27 2006-07-13 Hisayuki Kohno X-ray fluorescence analyzer
US7006596B1 (en) * 2003-05-09 2006-02-28 Kla-Tencor Technologies Corporation Light element measurement
WO2007016484A2 (en) * 2005-08-01 2007-02-08 The Research Foundation Of State University Of New York X-ray imaging systems employing point-focusing, curved monochromating optics
WO2007019053A1 (en) * 2005-08-04 2007-02-15 X-Ray Optical Systems, Inc. Monochromatic x-ray micro beam for trace element mapping
JP5159068B2 (ja) * 2005-09-01 2013-03-06 独立行政法人科学技術振興機構 全反射蛍光x線分析装置
US7519153B1 (en) * 2006-03-24 2009-04-14 Kla-Tencor Technologies Corporation X-ray metrology with diffractors
JP3950156B1 (ja) * 2006-04-11 2007-07-25 理学電機工業株式会社 蛍光x線分析装置
US7634052B2 (en) * 2006-10-24 2009-12-15 Thermo Niton Analyzers Llc Two-stage x-ray concentrator
US7412131B2 (en) * 2007-01-02 2008-08-12 General Electric Company Multilayer optic device and system and method for making same
JP5039971B2 (ja) * 2007-01-25 2012-10-03 国立大学法人東北大学 非走査型波長分散型x線分析装置及びそれを用いた測定方法
EP1953537A1 (de) * 2007-01-30 2008-08-06 KEMMER, Josef, Dr. Vorrichtung zur Erfassung und/oder Leitung von Röntgenstrahlung unter Verwendung einer Röntgenoptik
CN101883980B (zh) * 2007-03-15 2013-06-12 X射线光学系统公司 用于确定样品价态的x射线荧光方法
US7366374B1 (en) 2007-05-22 2008-04-29 General Electric Company Multilayer optic device and an imaging system and method using same
US20090041198A1 (en) * 2007-08-07 2009-02-12 General Electric Company Highly collimated and temporally variable x-ray beams
US7508911B1 (en) * 2007-09-19 2009-03-24 General Electric Company X-ray imaging system and methods of using and forming an array of optic devices therein
US7801272B2 (en) * 2007-09-28 2010-09-21 Rigaku Corporation X-ray diffraction apparatus and X-ray diffraction method
CN101918821B (zh) * 2007-11-30 2012-05-09 X射线光学系统公司 用于x射线分析仪的预膜精确试样单元
US7742566B2 (en) * 2007-12-07 2010-06-22 General Electric Company Multi-energy imaging system and method using optic devices
MX2010009713A (es) * 2008-03-05 2011-03-29 X Ray Optical Sys Inc Sistema xrf teniendo bandas de energia de excitacion multiples en un paquete altamente alineado.
US7933383B2 (en) * 2008-04-11 2011-04-26 Rigaku Innovative Technologies, Inc. X-ray generator with polycapillary optic
CN101581680A (zh) * 2008-12-25 2009-11-18 中国建筑材料检验认证中心 一种双曲晶体x荧光光谱分析仪及其工作方法
US20100310041A1 (en) * 2009-06-03 2010-12-09 Adams William L X-Ray System and Methods with Detector Interior to Focusing Element
US8058621B2 (en) * 2009-10-26 2011-11-15 General Electric Company Elemental composition detection system and method
US8208602B2 (en) * 2010-02-22 2012-06-26 General Electric Company High flux photon beams using optic devices
US8311184B2 (en) 2010-08-30 2012-11-13 General Electric Company Fan-shaped X-ray beam imaging systems employing graded multilayer optic devices
US8744048B2 (en) 2010-12-28 2014-06-03 General Electric Company Integrated X-ray source having a multilayer total internal reflection optic device
EP2721396B1 (en) * 2011-06-20 2018-04-04 X-Ray Optical Systems, Inc. Online monitoring of contaminants in crude and heavy fuels, and refinery applications thereof
US8761346B2 (en) 2011-07-29 2014-06-24 General Electric Company Multilayer total internal reflection optic devices and methods of making and using the same
CA2843850C (en) 2011-08-06 2016-10-04 Rigaku Innovative Technologies, Inc. Nanotube based device for guiding x-ray photons and neutrons
EP2745101B1 (en) 2011-08-15 2019-11-06 X-Ray Optical Systems, Inc. X-ray analysis apparatus
CN103946693B (zh) 2011-10-06 2017-05-03 X射线光学系统公司 可移除式x‑射线分析仪用的可移动型运输及屏蔽装置
CN107731337B (zh) * 2011-10-26 2019-11-19 X射线光学系统公司 X射线分析引擎和分析仪的支撑结构及高度对准的单色x射线光学器件
JP5990734B2 (ja) * 2011-11-30 2016-09-14 株式会社リガク 蛍光x線分析装置
JP5907375B2 (ja) 2011-12-28 2016-04-26 株式会社テクノエックス 蛍光x線分析装置及び蛍光x線分析方法
CN104272424A (zh) * 2012-02-28 2015-01-07 X射线光学系统公司 具有使用多材料x 射线管阳极和单色光学装置产生的多激励能带的x射线分析器
CN103018266A (zh) * 2012-12-14 2013-04-03 上海出入境检验检疫局工业品与原材料检测技术中心 全反射x射线荧光光谱法测定润滑油中微量元素的方法
CN103076352B (zh) * 2012-12-28 2015-02-25 中国科学院高能物理研究所 一种获得高品质薄膜样品x射线吸收谱的方法
JP6082634B2 (ja) * 2013-03-27 2017-02-15 株式会社日立ハイテクサイエンス 蛍光x線分析装置
WO2015027225A1 (en) 2013-08-23 2015-02-26 The Schepens Eye Research Institute, Inc. Spatial modeling of visual fields
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
CN103985942B (zh) * 2014-05-15 2016-03-30 南京航空航天大学 一种矩形波导到多米诺等离子波导转换器
JP6397690B2 (ja) * 2014-08-11 2018-09-26 株式会社日立ハイテクノロジーズ X線透過検査装置及び異物検出方法
WO2016103834A1 (ja) * 2014-12-25 2016-06-30 株式会社リガク 斜入射蛍光x線分析装置および方法
JP6069609B2 (ja) * 2015-03-26 2017-02-01 株式会社リガク 二重湾曲x線集光素子およびその構成体、二重湾曲x線分光素子およびその構成体の製造方法
US12109593B2 (en) 2015-07-16 2024-10-08 Sortera Technologies, Inc. Classification and sorting with single-board computers
US12017255B2 (en) 2015-07-16 2024-06-25 Sortera Technologies, Inc. Sorting based on chemical composition
US11969764B2 (en) 2016-07-18 2024-04-30 Sortera Technologies, Inc. Sorting of plastics
US12280403B2 (en) 2015-07-16 2025-04-22 Sortera Technologies, Inc. Sorting based on chemical composition
US10722922B2 (en) 2015-07-16 2020-07-28 UHV Technologies, Inc. Sorting cast and wrought aluminum
US12194506B2 (en) 2015-07-16 2025-01-14 Sortera Technologies, Inc. Sorting of contaminants
US12208421B2 (en) 2015-07-16 2025-01-28 Sortera Technologies, Inc. Metal separation in a scrap yard
US12290842B2 (en) 2015-07-16 2025-05-06 Sortera Technologies, Inc. Sorting of dark colored and black plastics
US12103045B2 (en) 2015-07-16 2024-10-01 Sortera Technologies, Inc. Removing airbag modules from automotive scrap
CN108136445B (zh) 2015-07-16 2020-11-20 索特拉合金有限公司 材料分拣系统
US12551931B2 (en) 2015-07-16 2026-02-17 Sortera Technologies, Inc. Classifying of materials with contaminants
US11964304B2 (en) 2015-07-16 2024-04-23 Sortera Technologies, Inc. Sorting between metal alloys
US11278937B2 (en) 2015-07-16 2022-03-22 Sortera Alloys, Inc. Multiple stage sorting
US10625304B2 (en) 2017-04-26 2020-04-21 UHV Technologies, Inc. Recycling coins from scrap
US10823687B2 (en) 2015-08-03 2020-11-03 UHV Technologies, Inc. Metal analysis during pharmaceutical manufacturing
US10677744B1 (en) * 2016-06-03 2020-06-09 U.S. Department Of Energy Multi-cone x-ray imaging Bragg crystal spectrometer
CN106248706A (zh) * 2016-07-13 2016-12-21 北京师范大学 一种微型毛细管x光透镜聚焦同位素放射源的x射线荧光谱仪
JP7418208B2 (ja) 2016-09-15 2024-01-19 ユニバーシティ オブ ワシントン X線分光計及びその使用方法
WO2018200866A1 (en) 2017-04-26 2018-11-01 UHV Technologies, Inc. Material sorting using a vision system
CN108802081B (zh) * 2017-04-27 2021-07-30 北京安科慧生科技有限公司 X射线荧光(xrf)光谱分析系统和方法
US11815480B2 (en) * 2018-04-20 2023-11-14 Outotec (Finland) Oy X-ray fluorescence analyzer and a method for performing an x-ray fluorescence analysis
US10845491B2 (en) 2018-06-04 2020-11-24 Sigray, Inc. Energy-resolving x-ray detection system
JP7394464B2 (ja) * 2018-07-04 2023-12-08 株式会社リガク 蛍光x線分析装置
GB2591630B (en) 2018-07-26 2023-05-24 Sigray Inc High brightness x-ray reflection source
WO2020051061A1 (en) 2018-09-04 2020-03-12 Sigray, Inc. System and method for x-ray fluorescence with filtering
WO2020051221A2 (en) 2018-09-07 2020-03-12 Sigray, Inc. System and method for depth-selectable x-ray analysis
CN109030529B (zh) * 2018-10-30 2021-12-21 上海爱斯特电子有限公司 单色激发x射线荧光光谱仪
DE112020004169T5 (de) 2019-09-03 2022-05-25 Sigray, Inc. System und verfahren zur computergestützten laminografieröntgenfluoreszenz-bildgebung
US11175243B1 (en) 2020-02-06 2021-11-16 Sigray, Inc. X-ray dark-field in-line inspection for semiconductor samples
US11217357B2 (en) 2020-02-10 2022-01-04 Sigray, Inc. X-ray mirror optics with multiple hyperboloidal/hyperbolic surface profiles
JP7395775B2 (ja) 2020-05-18 2023-12-11 シグレイ、インコーポレイテッド 結晶解析装置及び複数の検出器素子を使用するx線吸収分光法のためのシステム及び方法
JP7380421B2 (ja) * 2020-05-27 2023-11-15 株式会社島津製作所 X線分析装置およびx線分析方法
CN111834029B (zh) * 2020-08-19 2025-09-02 北京市辐射中心 一种组合式x射线单色会聚系统
WO2022061347A1 (en) 2020-09-17 2022-03-24 Sigray, Inc. System and method using x-rays for depth-resolving metrology and analysis
JP7100910B2 (ja) * 2020-12-01 2022-07-14 株式会社リガク 全反射蛍光x線分析装置
KR20260030946A (ko) 2020-12-07 2026-03-06 시그레이, 아이엔씨. 투과 x-선 소스를 이용한 고처리량 3D x-선 이미징 시스템
US12480892B2 (en) 2020-12-07 2025-11-25 Sigray, Inc. High throughput 3D x-ray imaging system using a transmission x-ray source
CN113218975A (zh) * 2021-04-25 2021-08-06 中科合成油技术有限公司 一种表面x射线吸收谱测量装置
WO2023168204A1 (en) 2022-03-02 2023-09-07 Sigray, Inc. X-ray fluorescence system and x-ray source with electrically insulative target material
WO2023177981A1 (en) 2022-03-15 2023-09-21 Sigray, Inc. System and method for compact laminography utilizing microfocus transmission x-ray source and variable magnification x-ray detector
US12607582B2 (en) * 2022-04-19 2026-04-21 Thermo Electron Scientific Instruments Llc Optical extraction probe for electron microscope and other vacuum chambers
CN119173759A (zh) 2022-05-02 2024-12-20 斯格瑞公司 X射线顺序阵列波长色散光谱仪
US12247934B2 (en) 2022-07-29 2025-03-11 X-Ray Optical Systems, Inc. Polarized, energy dispersive x-ray fluorescence system and method
WO2024123241A2 (en) * 2022-12-05 2024-06-13 Nanyang Technological University Method and system for generating x-ray emission in the water window regime
CN121013975A (zh) 2023-02-16 2025-11-25 斯格瑞公司 具有至少两个堆叠的平面布拉格衍射器的x射线探测器系统
IL301287B2 (en) * 2023-03-09 2026-01-01 Rigaku Semiconductor Instr Ltd Dual-head testing system
US12181423B1 (en) 2023-09-07 2024-12-31 Sigray, Inc. Secondary image removal using high resolution x-ray transmission sources
US12429437B2 (en) 2023-11-07 2025-09-30 Sigray, Inc. System and method for x-ray absorption spectroscopy using spectral information from two orthogonal planes
US12429436B2 (en) 2024-01-08 2025-09-30 Sigray, Inc. X-ray analysis system with focused x-ray beam and non-x-ray microscope
WO2025155719A1 (en) 2024-01-18 2025-07-24 Sigray, Inc. Sequential array of x-ray imaging detectors
WO2025174966A1 (en) 2024-02-15 2025-08-21 Sigray, Inc. System and method for generating a focused x‑ray beam
CN119688754B (zh) * 2025-02-26 2025-06-20 浙江沃乐科技股份有限公司 一种泛半导体产业含氟污泥的快速检测设备和方法

Family Cites Families (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU320195A1 (ru) * 1970-04-13 1982-12-30 Anisovich K V Флуоресцентный рентгеновский спектрометр
DE3125803A1 (de) * 1981-06-30 1983-01-13 Siemens AG, 1000 Berlin und 8000 München Kristall-roentgen-sequenzspektrometer
SU1117505A1 (ru) * 1983-05-12 1984-10-07 Ленинградское научно-производственное объединение "Буревестник" Способ рентгеноспектрального анализа (его варианты)
NL8302263A (nl) * 1983-06-27 1985-01-16 Philips Nv Roentgen analyse apparaat met dubbel gebogen monochromator kristal.
US4599741A (en) * 1983-11-04 1986-07-08 USC--Dept. of Materials Science System for local X-ray excitation by monochromatic X-rays
JP2742415B2 (ja) * 1987-11-27 1998-04-22 株式会社日立製作所 X線分析装置
NL8801019A (nl) * 1988-04-20 1989-11-16 Philips Nv Roentgen spectrometer met dubbel gebogen kristal.
JPH04120500A (ja) * 1990-09-11 1992-04-21 Shimadzu Corp X線単色化集光装置
US5497008A (en) * 1990-10-31 1996-03-05 X-Ray Optical Systems, Inc. Use of a Kumakhov lens in analytic instruments
US5175755A (en) * 1990-10-31 1992-12-29 X-Ray Optical System, Inc. Use of a kumakhov lens for x-ray lithography
US5192869A (en) * 1990-10-31 1993-03-09 X-Ray Optical Systems, Inc. Device for controlling beams of particles, X-ray and gamma quanta
JP3090471B2 (ja) * 1990-10-31 2000-09-18 エックス−レイ オプティカル システムズ,インコーポレイテッド 粒子、x線およびガンマ線量子のビーム制御装置
JPH04190148A (ja) * 1990-11-26 1992-07-08 Hitachi Ltd 表面分析方法および装置
GB2266040B (en) * 1992-04-09 1996-03-13 Rigaku Ind Corp X-ray analysis apparatus
RU2089105C1 (ru) * 1993-05-27 1997-09-10 Виктор Натанович Ингал Рентгеновская диагностическая установка
JP2796067B2 (ja) * 1994-02-08 1998-09-10 理学電機工業株式会社 蛍光x線分析に使用する試料の調製法
JP2728627B2 (ja) * 1994-04-13 1998-03-18 株式会社神戸製鋼所 波長分散型x線分光装置
EP0723272B1 (en) * 1994-07-08 2001-04-25 Muradin Abubekirovich Kumakhov Method of guiding beams of neutral and charged particles and a device for implementing said method
US5570408A (en) * 1995-02-28 1996-10-29 X-Ray Optical Systems, Inc. High intensity, small diameter x-ray beam, capillary optic system
US5604353A (en) * 1995-06-12 1997-02-18 X-Ray Optical Systems, Inc. Multiple-channel, total-reflection optic with controllable divergence
US5745547A (en) * 1995-08-04 1998-04-28 X-Ray Optical Systems, Inc. Multiple channel optic
US5982847A (en) * 1996-10-28 1999-11-09 Utah State University Compact X-ray fluorescence spectrometer for real-time wear metal analysis of lubrucating oils
JPH10227749A (ja) * 1997-02-14 1998-08-25 Matsushita Electric Ind Co Ltd X線検査装置及びx線検査方法
RU2158918C2 (ru) * 1997-05-07 2000-11-10 Петербургский институт ядерной физики им. Б.П.Константинова РАН Устройство для рентгенофлуоресцентного анализа
EP0884736B1 (en) * 1997-06-11 2004-01-28 Istituto Nazionale Di Fisica Nucleare Multi-stepped diffractor constructed with constant step width angle (multi-stepped monochromator)
US5892809A (en) * 1997-09-10 1999-04-06 Wittry; David B. Simplified system for local excitation by monochromatic x-rays
JP3604265B2 (ja) * 1997-10-27 2004-12-22 独立行政法人科学技術振興機構 X線回折要素及びその製造方法
JP2000155102A (ja) * 1998-11-19 2000-06-06 Rigaku Corp X線測定装置およびその方法
US6285506B1 (en) * 1999-01-21 2001-09-04 X-Ray Optical Systems, Inc. Curved optical device and method of fabrication
DE69933286T2 (de) * 1999-07-21 2007-04-05 Lucent Technologies Inc. Telekommunikationssystem
US6381303B1 (en) * 1999-09-29 2002-04-30 Jordan Valley Applied Radiation Ltd. X-ray microanalyzer for thin films
JP2001124711A (ja) * 1999-10-27 2001-05-11 Fujitsu Ltd 蛍光x線分析方法及び試料構造の評価方法
US6317483B1 (en) * 1999-11-29 2001-11-13 X-Ray Optical Systems, Inc. Doubly curved optical device with graded atomic planes
US6697454B1 (en) * 2000-06-29 2004-02-24 X-Ray Optical Systems, Inc. X-ray analytical techniques applied to combinatorial library screening
US6829327B1 (en) * 2000-09-22 2004-12-07 X-Ray Optical Systems, Inc. Total-reflection x-ray fluorescence apparatus and method using a doubly-curved optic

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JP2005512020A (ja) 2005-04-28
JP2008032749A (ja) 2008-02-14
CN1543653A (zh) 2004-11-03
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JP5489401B2 (ja) 2014-05-14
JP2014066731A (ja) 2014-04-17
RU2339974C2 (ru) 2008-11-27
CA2489646C (en) 2010-02-09
US6934359B2 (en) 2005-08-23
EP1402541B1 (en) 2006-08-16
CA2489646A1 (en) 2002-12-27
WO2002103710A2 (en) 2002-12-27
DE60213994D1 (de) 2006-09-28
RU2004101401A (ru) 2005-02-27
EP1402541A2 (en) 2004-03-31
DE60213994T2 (de) 2006-12-07
ES2271277T3 (es) 2007-04-16
HK1070984A1 (en) 2005-06-30
US20040131146A1 (en) 2004-07-08
WO2002103710A3 (en) 2003-05-01

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