JP2014066731A - 蛍光x線分光システム及び蛍光x線分光方法 - Google Patents
蛍光x線分光システム及び蛍光x線分光方法 Download PDFInfo
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/062—Devices having a multilayer structure
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/076—X-ray fluorescence
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
Abstract
【解決手段】蛍光X線分光システム100には、X線放射源110と、サンプルの少なくとも1つの分析物を刺激して蛍光発光させるために、線源からX線放射を収集して、X線放射をサンプルの上の焦点に集束させるための、X線放射源110とサンプル130との間に配置された励起光学部品120とが備えられ、さらに、蛍光X線検出器150と、サンプルの上の焦点から蛍光X線を収集して、蛍光X線を蛍光X線検出器に向けて集束させるための、サンプルと蛍光X線検出器との間に配置された二重湾曲回折光学部品を備える収集光学部品140とが備えられている。
【選択図】図1
Description
Claims (2)
- 少なくとも1つのX線放射源(110/210)と、
少なくとも1つのX線検出器(150/250)と、
サンプルの上の焦点から蛍光X線を収集して、所定の分析物の特徴的なエネルギーの前記蛍光X線を前記X線検出器に向けるための、前記サンプル(130/230)と前記X線検出器との間に配置された少なくとも1つの二重湾曲回折光学部品を有する少なくとも1つの単色収集光学部品(140/240)と、
前記サンプルの分析物を刺激して蛍光を発生させるために、前記X線放射源からX線放射を収集して、該X線放射を前記サンプルの上の前記焦点に集束させるための、前記X線放射源と前記サンプルとの間に配置された少なくとも1つの励起光学部品(120/220)と
を備えたことを特徴とする蛍光X線分光システム。 - 少なくとも1つのX線放射源(110/210)を提供し、
少なくとも1つのX線検出器(150/250)を提供し、
前記サンプルの上の前記焦点から蛍光X線を収集して、所定の分析物の特徴的なエネルギーの前記蛍光X線を前記少なくとも1つのX線検出器に向けるための、少なくとも1つの二重湾曲回折光学部品を備える少なくとも1つの単色収集光学部品(140/240)を前記サンプル(130/230)と前記X線検出器との間に配置し、
前記サンプルの分析物を刺激して蛍光発光させるために、前記X線放射源からX線放射を収集して、該X線放射を前記サンプルの上の前記焦点に集束させるための、前記X線放射源と分析されるサンプルとの間に配置された少なくとも1つの励起光学部品(120/220)を提供する
ことを特徴とする蛍光X線分光方法。
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US29937101P | 2001-06-19 | 2001-06-19 | |
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JP2003505939A Pending JP2005512020A (ja) | 2001-06-19 | 2002-06-18 | X線蛍光分光システム及びx線蛍光分光方法 |
JP2007271638A Expired - Lifetime JP5489401B2 (ja) | 2001-06-19 | 2007-10-18 | 蛍光x線分光システム及び蛍光x線分光方法 |
JP2013258597A Pending JP2014066731A (ja) | 2001-06-19 | 2013-12-13 | 蛍光x線分光システム及び蛍光x線分光方法 |
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JP2007271638A Expired - Lifetime JP5489401B2 (ja) | 2001-06-19 | 2007-10-18 | 蛍光x線分光システム及び蛍光x線分光方法 |
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EP (1) | EP1402541B1 (ja) |
JP (3) | JP2005512020A (ja) |
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AT (1) | ATE336789T1 (ja) |
AU (1) | AU2002315331A1 (ja) |
CA (1) | CA2489646C (ja) |
DE (1) | DE60213994T2 (ja) |
ES (1) | ES2271277T3 (ja) |
HK (1) | HK1070984A1 (ja) |
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Families Citing this family (79)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080220441A1 (en) * | 2001-05-16 | 2008-09-11 | Birnbaum Eva R | Advanced drug development and manufacturing |
WO2003043498A2 (en) * | 2001-11-17 | 2003-05-30 | Council For The Central Laboratory Of The Research Councils | Method and apparatus for obtaining simultaneously absorption and refraction images by use of a monochromator with integrated radiation detector |
FR2850171B1 (fr) * | 2003-01-21 | 2005-04-08 | Xenocs | Dispositif optique pour applications rayons x |
JP2005530170A (ja) | 2002-06-19 | 2005-10-06 | グズノク | 光学アセンブリ及びその製造方法 |
DE10254026C5 (de) * | 2002-11-20 | 2009-01-29 | Incoatec Gmbh | Reflektor für Röntgenstrahlung |
US7763820B1 (en) | 2003-01-27 | 2010-07-27 | Spectramet, Llc | Sorting pieces of material based on photonic emissions resulting from multiple sources of stimuli |
JP3729203B2 (ja) * | 2003-03-27 | 2005-12-21 | 理学電機工業株式会社 | 蛍光x線分析装置 |
US7006596B1 (en) * | 2003-05-09 | 2006-02-28 | Kla-Tencor Technologies Corporation | Light element measurement |
JP4994375B2 (ja) * | 2005-08-01 | 2012-08-08 | ザ リサーチ ファウンデーション オブ ステート ユニバーシティ オブ ニューヨーク | 点焦点湾曲モノクロメータ光学体を使用するx線結像系 |
WO2007019053A1 (en) * | 2005-08-04 | 2007-02-15 | X-Ray Optical Systems, Inc. | Monochromatic x-ray micro beam for trace element mapping |
JP5159068B2 (ja) * | 2005-09-01 | 2013-03-06 | 独立行政法人科学技術振興機構 | 全反射蛍光x線分析装置 |
US7519153B1 (en) * | 2006-03-24 | 2009-04-14 | Kla-Tencor Technologies Corporation | X-ray metrology with diffractors |
JP3950156B1 (ja) * | 2006-04-11 | 2007-07-25 | 理学電機工業株式会社 | 蛍光x線分析装置 |
US7634052B2 (en) * | 2006-10-24 | 2009-12-15 | Thermo Niton Analyzers Llc | Two-stage x-ray concentrator |
US7412131B2 (en) * | 2007-01-02 | 2008-08-12 | General Electric Company | Multilayer optic device and system and method for making same |
JP5039971B2 (ja) * | 2007-01-25 | 2012-10-03 | 国立大学法人東北大学 | 非走査型波長分散型x線分析装置及びそれを用いた測定方法 |
EP1953537A1 (de) * | 2007-01-30 | 2008-08-06 | KEMMER, Josef, Dr. | Vorrichtung zur Erfassung und/oder Leitung von Röntgenstrahlung unter Verwendung einer Röntgenoptik |
EP2162732A1 (en) * | 2007-03-15 | 2010-03-17 | X-ray Optical Systems, INC. | Small spot and high energy resolution xrf system for valence state determination |
US7366374B1 (en) | 2007-05-22 | 2008-04-29 | General Electric Company | Multilayer optic device and an imaging system and method using same |
US20090041198A1 (en) * | 2007-08-07 | 2009-02-12 | General Electric Company | Highly collimated and temporally variable x-ray beams |
US7508911B1 (en) * | 2007-09-19 | 2009-03-24 | General Electric Company | X-ray imaging system and methods of using and forming an array of optic devices therein |
US7801272B2 (en) * | 2007-09-28 | 2010-09-21 | Rigaku Corporation | X-ray diffraction apparatus and X-ray diffraction method |
EP2223091A1 (en) * | 2007-11-30 | 2010-09-01 | X-ray Optical Systems, INC. | Pre-filmed precision sample cell for x-ray analyzer |
US7742566B2 (en) * | 2007-12-07 | 2010-06-22 | General Electric Company | Multi-energy imaging system and method using optic devices |
US8559597B2 (en) * | 2008-03-05 | 2013-10-15 | X-Ray Optical Systems, Inc. | XRF system having multiple excitation energy bands in highly aligned package |
JP5531009B2 (ja) * | 2008-04-11 | 2014-06-25 | リガク イノベイティブ テクノロジーズ インコーポレイテッド | ポリキャピラリ光学系を有するx線発生装置 |
CN101581680A (zh) * | 2008-12-25 | 2009-11-18 | 中国建筑材料检验认证中心 | 一种双曲晶体x荧光光谱分析仪及其工作方法 |
CN102460135A (zh) * | 2009-06-03 | 2012-05-16 | 特莫尼托恩分析仪器股份有限公司 | 检测器位于聚焦元件内部的x射线系统和方法 |
US8058621B2 (en) * | 2009-10-26 | 2011-11-15 | General Electric Company | Elemental composition detection system and method |
US8208602B2 (en) * | 2010-02-22 | 2012-06-26 | General Electric Company | High flux photon beams using optic devices |
US8311184B2 (en) | 2010-08-30 | 2012-11-13 | General Electric Company | Fan-shaped X-ray beam imaging systems employing graded multilayer optic devices |
US8744048B2 (en) | 2010-12-28 | 2014-06-03 | General Electric Company | Integrated X-ray source having a multilayer total internal reflection optic device |
CN110006936A (zh) * | 2011-06-20 | 2019-07-12 | X射线光学系统公司 | 原油和重质燃料中污染物的在线监控及其精炼厂应用 |
US8761346B2 (en) | 2011-07-29 | 2014-06-24 | General Electric Company | Multilayer total internal reflection optic devices and methods of making and using the same |
JP6175436B2 (ja) | 2011-08-06 | 2017-08-02 | リガク イノベイティブ テクノロジーズ インコーポレイテッド | X線光子及び中性子を導くナノチューブ素材の装置 |
WO2013025682A2 (en) | 2011-08-15 | 2013-02-21 | X-Ray Optical Systems, Inc. | Sample viscosity and flow control for heavy samples, and x-ray analysis applications thereof |
WO2013052556A2 (en) | 2011-10-06 | 2013-04-11 | X-Ray Optical Systems, Inc. | Mobile transport and shielding apparatus for removable x-ray analyzer |
CN103765201B (zh) | 2011-10-26 | 2017-11-07 | X射线光学系统公司 | X射线分析引擎和分析仪的支撑结构及高度对准的单色x射线光学器件 |
JP5990734B2 (ja) * | 2011-11-30 | 2016-09-14 | 株式会社リガク | 蛍光x線分析装置 |
JP5907375B2 (ja) * | 2011-12-28 | 2016-04-26 | 株式会社テクノエックス | 蛍光x線分析装置及び蛍光x線分析方法 |
CN107424889A (zh) * | 2012-02-28 | 2017-12-01 | X射线光学系统公司 | 具有使用多材料x射线管阳极和单色光学装置产生的多激励能带的x射线分析器 |
CN103018266A (zh) * | 2012-12-14 | 2013-04-03 | 上海出入境检验检疫局工业品与原材料检测技术中心 | 全反射x射线荧光光谱法测定润滑油中微量元素的方法 |
CN103076352B (zh) * | 2012-12-28 | 2015-02-25 | 中国科学院高能物理研究所 | 一种获得高品质薄膜样品x射线吸收谱的方法 |
JP6082634B2 (ja) * | 2013-03-27 | 2017-02-15 | 株式会社日立ハイテクサイエンス | 蛍光x線分析装置 |
WO2015027225A1 (en) | 2013-08-23 | 2015-02-26 | The Schepens Eye Research Institute, Inc. | Spatial modeling of visual fields |
US10295485B2 (en) | 2013-12-05 | 2019-05-21 | Sigray, Inc. | X-ray transmission spectrometer system |
USRE48612E1 (en) | 2013-10-31 | 2021-06-29 | Sigray, Inc. | X-ray interferometric imaging system |
CN103985942B (zh) * | 2014-05-15 | 2016-03-30 | 南京航空航天大学 | 一种矩形波导到多米诺等离子波导转换器 |
JP6397690B2 (ja) * | 2014-08-11 | 2018-09-26 | 株式会社日立ハイテクノロジーズ | X線透過検査装置及び異物検出方法 |
WO2016103834A1 (ja) * | 2014-12-25 | 2016-06-30 | 株式会社リガク | 斜入射蛍光x線分析装置および方法 |
JP6069609B2 (ja) * | 2015-03-26 | 2017-02-01 | 株式会社リガク | 二重湾曲x線集光素子およびその構成体、二重湾曲x線分光素子およびその構成体の製造方法 |
US10625304B2 (en) | 2017-04-26 | 2020-04-21 | UHV Technologies, Inc. | Recycling coins from scrap |
EP3322544B1 (en) | 2015-07-16 | 2022-06-08 | Sortera Alloys, Inc. | Material sorting system |
US11278937B2 (en) | 2015-07-16 | 2022-03-22 | Sortera Alloys, Inc. | Multiple stage sorting |
US10722922B2 (en) | 2015-07-16 | 2020-07-28 | UHV Technologies, Inc. | Sorting cast and wrought aluminum |
US10823687B2 (en) | 2015-08-03 | 2020-11-03 | UHV Technologies, Inc. | Metal analysis during pharmaceutical manufacturing |
US10677744B1 (en) * | 2016-06-03 | 2020-06-09 | U.S. Department Of Energy | Multi-cone x-ray imaging Bragg crystal spectrometer |
CN106248706A (zh) * | 2016-07-13 | 2016-12-21 | 北京师范大学 | 一种微型毛细管x光透镜聚焦同位素放射源的x射线荧光谱仪 |
CN109716115B (zh) | 2016-09-15 | 2023-01-06 | 华盛顿大学 | X射线光谱仪及使用方法 |
WO2018200866A1 (en) | 2017-04-26 | 2018-11-01 | UHV Technologies, Inc. | Material sorting using a vision system |
CN108802081B (zh) * | 2017-04-27 | 2021-07-30 | 北京安科慧生科技有限公司 | X射线荧光(xrf)光谱分析系统和方法 |
AU2018419251B2 (en) * | 2018-04-20 | 2022-02-17 | Outotec (Finland) Oy | X-ray fluorescence analyser, and a method for performing X-ray fluorescence analysis |
WO2019236384A1 (en) * | 2018-06-04 | 2019-12-12 | Sigray, Inc. | Wavelength dispersive x-ray spectrometer |
JP7394464B2 (ja) * | 2018-07-04 | 2023-12-08 | 株式会社リガク | 蛍光x線分析装置 |
US10658145B2 (en) | 2018-07-26 | 2020-05-19 | Sigray, Inc. | High brightness x-ray reflection source |
DE112019004433T5 (de) | 2018-09-04 | 2021-05-20 | Sigray, Inc. | System und verfahren für röntgenstrahlfluoreszenz mit filterung |
CN112823280A (zh) | 2018-09-07 | 2021-05-18 | 斯格瑞公司 | 用于深度可选x射线分析的系统和方法 |
CN109030529B (zh) * | 2018-10-30 | 2021-12-21 | 上海爱斯特电子有限公司 | 单色激发x射线荧光光谱仪 |
JP7182749B2 (ja) | 2019-09-03 | 2022-12-02 | シグレイ、インコーポレイテッド | コンピュータ断層撮影蛍光x線撮像のためのシステムおよび方法 |
US11175243B1 (en) | 2020-02-06 | 2021-11-16 | Sigray, Inc. | X-ray dark-field in-line inspection for semiconductor samples |
WO2021162947A1 (en) | 2020-02-10 | 2021-08-19 | Sigray, Inc. | X-ray mirror optics with multiple hyperboloidal / hyperbolic surface profiles |
CN115667896A (zh) | 2020-05-18 | 2023-01-31 | 斯格瑞公司 | 使用晶体分析器和多个检测器元件的x射线吸收光谱的系统和方法 |
JP7380421B2 (ja) * | 2020-05-27 | 2023-11-15 | 株式会社島津製作所 | X線分析装置およびx線分析方法 |
US11549895B2 (en) | 2020-09-17 | 2023-01-10 | Sigray, Inc. | System and method using x-rays for depth-resolving metrology and analysis |
JP7100910B2 (ja) * | 2020-12-01 | 2022-07-14 | 株式会社リガク | 全反射蛍光x線分析装置 |
KR20230109735A (ko) | 2020-12-07 | 2023-07-20 | 시그레이, 아이엔씨. | 투과 x-선 소스를 이용한 고처리량 3D x-선 이미징 시스템 |
CN113218975A (zh) * | 2021-04-25 | 2021-08-06 | 中科合成油技术有限公司 | 一种表面x射线吸收谱测量装置 |
US11885755B2 (en) | 2022-05-02 | 2024-01-30 | Sigray, Inc. | X-ray sequential array wavelength dispersive spectrometer |
US20240035990A1 (en) | 2022-07-29 | 2024-02-01 | X-Ray Optical Systems, Inc. | Polarized, energy dispersive x-ray fluorescence system and method |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2001023873A1 (en) * | 1999-09-29 | 2001-04-05 | Jordan Valley Applied Radiation Ltd. | X-ray microanalyzer for thin films |
US6233096B1 (en) * | 1997-06-11 | 2001-05-15 | Istituto Nazionale Di Fisica Nucleare | Pseudo-spherical stepped diffractor constructed under constant step width conditions (multi-stepped monochromator) |
Family Cites Families (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3125803A1 (de) * | 1981-06-30 | 1983-01-13 | Siemens AG, 1000 Berlin und 8000 München | Kristall-roentgen-sequenzspektrometer |
NL8302263A (nl) * | 1983-06-27 | 1985-01-16 | Philips Nv | Roentgen analyse apparaat met dubbel gebogen monochromator kristal. |
US4599741A (en) * | 1983-11-04 | 1986-07-08 | USC--Dept. of Materials Science | System for local X-ray excitation by monochromatic X-rays |
JP2742415B2 (ja) * | 1987-11-27 | 1998-04-22 | 株式会社日立製作所 | X線分析装置 |
NL8801019A (nl) * | 1988-04-20 | 1989-11-16 | Philips Nv | Roentgen spectrometer met dubbel gebogen kristal. |
JPH04120500A (ja) * | 1990-09-11 | 1992-04-21 | Shimadzu Corp | X線単色化集光装置 |
US5497008A (en) * | 1990-10-31 | 1996-03-05 | X-Ray Optical Systems, Inc. | Use of a Kumakhov lens in analytic instruments |
DE9117302U1 (de) * | 1990-10-31 | 1999-10-21 | X Ray Optical Sys Inc | Vorrichtung zum Steuern von Strahlen von Teilchen, Röntgen- und Gammastrahlen und Anwendungen davon |
US5175755A (en) * | 1990-10-31 | 1992-12-29 | X-Ray Optical System, Inc. | Use of a kumakhov lens for x-ray lithography |
US5192869A (en) * | 1990-10-31 | 1993-03-09 | X-Ray Optical Systems, Inc. | Device for controlling beams of particles, X-ray and gamma quanta |
JPH04190148A (ja) * | 1990-11-26 | 1992-07-08 | Hitachi Ltd | 表面分析方法および装置 |
GB2266040B (en) * | 1992-04-09 | 1996-03-13 | Rigaku Ind Corp | X-ray analysis apparatus |
JP2796067B2 (ja) * | 1994-02-08 | 1998-09-10 | 理学電機工業株式会社 | 蛍光x線分析に使用する試料の調製法 |
JP2728627B2 (ja) * | 1994-04-13 | 1998-03-18 | 株式会社神戸製鋼所 | 波長分散型x線分光装置 |
EP0723272B1 (en) * | 1994-07-08 | 2001-04-25 | Muradin Abubekirovich Kumakhov | Method of guiding beams of neutral and charged particles and a device for implementing said method |
US5570408A (en) * | 1995-02-28 | 1996-10-29 | X-Ray Optical Systems, Inc. | High intensity, small diameter x-ray beam, capillary optic system |
US5604353A (en) * | 1995-06-12 | 1997-02-18 | X-Ray Optical Systems, Inc. | Multiple-channel, total-reflection optic with controllable divergence |
US5745547A (en) * | 1995-08-04 | 1998-04-28 | X-Ray Optical Systems, Inc. | Multiple channel optic |
US5982847A (en) * | 1996-10-28 | 1999-11-09 | Utah State University | Compact X-ray fluorescence spectrometer for real-time wear metal analysis of lubrucating oils |
JPH10227749A (ja) * | 1997-02-14 | 1998-08-25 | Matsushita Electric Ind Co Ltd | X線検査装置及びx線検査方法 |
US5892809A (en) * | 1997-09-10 | 1999-04-06 | Wittry; David B. | Simplified system for local excitation by monochromatic x-rays |
JP3604265B2 (ja) * | 1997-10-27 | 2004-12-22 | 独立行政法人科学技術振興機構 | X線回折要素及びその製造方法 |
JP2000155102A (ja) * | 1998-11-19 | 2000-06-06 | Rigaku Corp | X線測定装置およびその方法 |
US6285506B1 (en) * | 1999-01-21 | 2001-09-04 | X-Ray Optical Systems, Inc. | Curved optical device and method of fabrication |
EP1071268B1 (en) * | 1999-07-21 | 2006-09-20 | Lucent Technologies Inc. | Telecommunication system |
JP2001124711A (ja) * | 1999-10-27 | 2001-05-11 | Fujitsu Ltd | 蛍光x線分析方法及び試料構造の評価方法 |
US6317483B1 (en) * | 1999-11-29 | 2001-11-13 | X-Ray Optical Systems, Inc. | Doubly curved optical device with graded atomic planes |
US6697454B1 (en) * | 2000-06-29 | 2004-02-24 | X-Ray Optical Systems, Inc. | X-ray analytical techniques applied to combinatorial library screening |
US6829327B1 (en) * | 2000-09-22 | 2004-12-07 | X-Ray Optical Systems, Inc. | Total-reflection x-ray fluorescence apparatus and method using a doubly-curved optic |
-
2002
- 2002-06-18 CN CNB028161939A patent/CN1246858C/zh not_active Expired - Lifetime
- 2002-06-18 RU RU2004101401/28A patent/RU2339974C2/ru active
- 2002-06-18 JP JP2003505939A patent/JP2005512020A/ja active Pending
- 2002-06-18 AU AU2002315331A patent/AU2002315331A1/en not_active Abandoned
- 2002-06-18 CA CA2489646A patent/CA2489646C/en not_active Expired - Lifetime
- 2002-06-18 DE DE60213994T patent/DE60213994T2/de not_active Expired - Lifetime
- 2002-06-18 EP EP02742177A patent/EP1402541B1/en not_active Expired - Lifetime
- 2002-06-18 WO PCT/US2002/019272 patent/WO2002103710A2/en active IP Right Grant
- 2002-06-18 AT AT02742177T patent/ATE336789T1/de active
- 2002-06-18 ES ES02742177T patent/ES2271277T3/es not_active Expired - Lifetime
-
2003
- 2003-12-19 US US10/742,414 patent/US6934359B2/en not_active Expired - Lifetime
-
2005
- 2005-05-03 HK HK05103722A patent/HK1070984A1/xx not_active IP Right Cessation
-
2007
- 2007-10-18 JP JP2007271638A patent/JP5489401B2/ja not_active Expired - Lifetime
-
2013
- 2013-12-13 JP JP2013258597A patent/JP2014066731A/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6233096B1 (en) * | 1997-06-11 | 2001-05-15 | Istituto Nazionale Di Fisica Nucleare | Pseudo-spherical stepped diffractor constructed under constant step width conditions (multi-stepped monochromator) |
WO2001023873A1 (en) * | 1999-09-29 | 2001-04-05 | Jordan Valley Applied Radiation Ltd. | X-ray microanalyzer for thin films |
Non-Patent Citations (1)
Title |
---|
JPN7014001081; CALIEBE,W.A. 他: '"X-ray fluorescence analysis with high energy resolution"' Review of Scientific Instruments Volume 67, Issue 9, 199609, 4 Pages * |
Also Published As
Publication number | Publication date |
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HK1070984A1 (en) | 2005-06-30 |
CN1543653A (zh) | 2004-11-03 |
EP1402541B1 (en) | 2006-08-16 |
CA2489646A1 (en) | 2002-12-27 |
CN1246858C (zh) | 2006-03-22 |
DE60213994T2 (de) | 2006-12-07 |
CA2489646C (en) | 2010-02-09 |
EP1402541A2 (en) | 2004-03-31 |
ATE336789T1 (de) | 2006-09-15 |
DE60213994D1 (de) | 2006-09-28 |
AU2002315331A1 (en) | 2003-01-02 |
US20040131146A1 (en) | 2004-07-08 |
ES2271277T3 (es) | 2007-04-16 |
WO2002103710A3 (en) | 2003-05-01 |
JP2008032749A (ja) | 2008-02-14 |
WO2002103710A2 (en) | 2002-12-27 |
RU2339974C2 (ru) | 2008-11-27 |
JP5489401B2 (ja) | 2014-05-14 |
JP2005512020A (ja) | 2005-04-28 |
RU2004101401A (ru) | 2005-02-27 |
US6934359B2 (en) | 2005-08-23 |
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