CN1217388C - 等离子体处理装置及排气环 - Google Patents

等离子体处理装置及排气环 Download PDF

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Publication number
CN1217388C
CN1217388C CN018160131A CN01816013A CN1217388C CN 1217388 C CN1217388 C CN 1217388C CN 018160131 A CN018160131 A CN 018160131A CN 01816013 A CN01816013 A CN 01816013A CN 1217388 C CN1217388 C CN 1217388C
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CN
China
Prior art keywords
exhaust ring
plasma processing
exhaust
holes
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN018160131A
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English (en)
Chinese (zh)
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CN1461494A (zh
Inventor
小笠原正宏
加藤和也
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Publication of CN1461494A publication Critical patent/CN1461494A/zh
Application granted granted Critical
Publication of CN1217388C publication Critical patent/CN1217388C/zh
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Expired - Fee Related legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32834—Exhausting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
CN018160131A 2000-11-10 2001-11-02 等离子体处理装置及排气环 Expired - Fee Related CN1217388C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP343178/2000 2000-11-10
JP2000343178A JP4602532B2 (ja) 2000-11-10 2000-11-10 プラズマ処理装置

Publications (2)

Publication Number Publication Date
CN1461494A CN1461494A (zh) 2003-12-10
CN1217388C true CN1217388C (zh) 2005-08-31

Family

ID=18817585

Family Applications (1)

Application Number Title Priority Date Filing Date
CN018160131A Expired - Fee Related CN1217388C (zh) 2000-11-10 2001-11-02 等离子体处理装置及排气环

Country Status (7)

Country Link
US (2) US6878234B2 (enExample)
JP (1) JP4602532B2 (enExample)
KR (1) KR100890654B1 (enExample)
CN (1) CN1217388C (enExample)
AU (1) AU2002212705A1 (enExample)
TW (1) TW508697B (enExample)
WO (1) WO2002039493A1 (enExample)

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Also Published As

Publication number Publication date
AU2002212705A1 (en) 2002-05-21
US7255773B2 (en) 2007-08-14
KR20030057551A (ko) 2003-07-04
JP2002151471A (ja) 2002-05-24
KR100890654B1 (ko) 2009-03-26
CN1461494A (zh) 2003-12-10
JP4602532B2 (ja) 2010-12-22
WO2002039493A1 (en) 2002-05-16
US6878234B2 (en) 2005-04-12
TW508697B (en) 2002-11-01
US20040025788A1 (en) 2004-02-12
US20050126488A1 (en) 2005-06-16

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