AU2002212705A1 - Plasma processing device and exhaust ring - Google Patents

Plasma processing device and exhaust ring

Info

Publication number
AU2002212705A1
AU2002212705A1 AU2002212705A AU1270502A AU2002212705A1 AU 2002212705 A1 AU2002212705 A1 AU 2002212705A1 AU 2002212705 A AU2002212705 A AU 2002212705A AU 1270502 A AU1270502 A AU 1270502A AU 2002212705 A1 AU2002212705 A1 AU 2002212705A1
Authority
AU
Australia
Prior art keywords
processing device
plasma processing
exhaust ring
exhaust
ring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002212705A
Other languages
English (en)
Inventor
Kazuya Kato
Masahiro Ogasawara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of AU2002212705A1 publication Critical patent/AU2002212705A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816—Pressure
    • H01J37/32834—Exhausting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
AU2002212705A 2000-11-10 2001-11-02 Plasma processing device and exhaust ring Abandoned AU2002212705A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000-343178 2000-11-10
JP2000343178A JP4602532B2 (ja) 2000-11-10 2000-11-10 プラズマ処理装置
PCT/JP2001/009634 WO2002039493A1 (en) 2000-11-10 2001-11-02 Plasma processing device and exhaust ring

Publications (1)

Publication Number Publication Date
AU2002212705A1 true AU2002212705A1 (en) 2002-05-21

Family

ID=18817585

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002212705A Abandoned AU2002212705A1 (en) 2000-11-10 2001-11-02 Plasma processing device and exhaust ring

Country Status (7)

Country Link
US (2) US6878234B2 (enExample)
JP (1) JP4602532B2 (enExample)
KR (1) KR100890654B1 (enExample)
CN (1) CN1217388C (enExample)
AU (1) AU2002212705A1 (enExample)
TW (1) TW508697B (enExample)
WO (1) WO2002039493A1 (enExample)

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Also Published As

Publication number Publication date
US7255773B2 (en) 2007-08-14
CN1217388C (zh) 2005-08-31
KR20030057551A (ko) 2003-07-04
JP2002151471A (ja) 2002-05-24
KR100890654B1 (ko) 2009-03-26
CN1461494A (zh) 2003-12-10
JP4602532B2 (ja) 2010-12-22
WO2002039493A1 (en) 2002-05-16
US6878234B2 (en) 2005-04-12
TW508697B (en) 2002-11-01
US20040025788A1 (en) 2004-02-12
US20050126488A1 (en) 2005-06-16

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