AU2001276725A1 - Radial antenna and plasma device using it - Google Patents
Radial antenna and plasma device using itInfo
- Publication number
- AU2001276725A1 AU2001276725A1 AU2001276725A AU7672501A AU2001276725A1 AU 2001276725 A1 AU2001276725 A1 AU 2001276725A1 AU 2001276725 A AU2001276725 A AU 2001276725A AU 7672501 A AU7672501 A AU 7672501A AU 2001276725 A1 AU2001276725 A1 AU 2001276725A1
- Authority
- AU
- Australia
- Prior art keywords
- plasma device
- radial antenna
- antenna
- radial
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32211—Means for coupling power to the plasma
- H01J37/3222—Antennas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Drying Of Semiconductors (AREA)
- Waveguide Aerials (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000236716A JP4598247B2 (en) | 2000-08-04 | 2000-08-04 | Radial antenna and plasma apparatus using the same |
JP2000-236716 | 2000-08-04 | ||
PCT/JP2001/006698 WO2002013250A1 (en) | 2000-08-04 | 2001-08-03 | Radial antenna and plasma device using it |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001276725A1 true AU2001276725A1 (en) | 2002-02-18 |
Family
ID=18728717
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001276725A Abandoned AU2001276725A1 (en) | 2000-08-04 | 2001-08-03 | Radial antenna and plasma device using it |
Country Status (5)
Country | Link |
---|---|
US (1) | US7296533B2 (en) |
JP (1) | JP4598247B2 (en) |
AU (1) | AU2001276725A1 (en) |
TW (1) | TWI281365B (en) |
WO (1) | WO2002013250A1 (en) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3914071B2 (en) * | 2002-03-12 | 2007-05-16 | 東京エレクトロン株式会社 | Plasma processing equipment |
US7445690B2 (en) | 2002-10-07 | 2008-11-04 | Tokyo Electron Limited | Plasma processing apparatus |
JP4159845B2 (en) * | 2002-10-07 | 2008-10-01 | 東京エレクトロン株式会社 | Plasma processing equipment |
US6998565B2 (en) | 2003-01-30 | 2006-02-14 | Rohm Co., Ltd. | Plasma processing apparatus |
JP3974553B2 (en) * | 2003-05-07 | 2007-09-12 | 東京エレクトロン株式会社 | Plasma processing apparatus, antenna for plasma processing apparatus, and plasma processing method |
US7493869B1 (en) | 2005-12-16 | 2009-02-24 | The United States Of America As Represented By The Administration Of Nasa | Very large area/volume microwave ECR plasma and ion source |
JP4997826B2 (en) * | 2006-05-22 | 2012-08-08 | 東京エレクトロン株式会社 | Planar antenna member and plasma processing apparatus using the same |
JP4486068B2 (en) * | 2006-08-10 | 2010-06-23 | 東京エレクトロン株式会社 | Plasma generation method |
JP2008059991A (en) * | 2006-09-01 | 2008-03-13 | Canon Inc | Plasma processing apparatus and plasma processing method |
JP5249547B2 (en) * | 2007-09-28 | 2013-07-31 | 東京エレクトロン株式会社 | Plasma processing apparatus and gas exhaust method thereof |
JP2009224455A (en) * | 2008-03-14 | 2009-10-01 | Tokyo Electron Ltd | Flat antenna member and plasma processing device with the same |
DE102008057947A1 (en) * | 2008-11-19 | 2010-05-20 | Mitec Automotive Ag | Balance shaft for a reciprocating engine |
GB201021855D0 (en) | 2010-12-23 | 2011-02-02 | Element Six Ltd | Microwave power delivery system for plasma reactors |
GB201021860D0 (en) * | 2010-12-23 | 2011-02-02 | Element Six Ltd | A microwave plasma reactor for diamond synthesis |
GB201021853D0 (en) | 2010-12-23 | 2011-02-02 | Element Six Ltd | A microwave plasma reactor for manufacturing synthetic diamond material |
GB201021913D0 (en) | 2010-12-23 | 2011-02-02 | Element Six Ltd | Microwave plasma reactors and substrates for synthetic diamond manufacture |
JP5913362B2 (en) | 2010-12-23 | 2016-04-27 | エレメント シックス リミテッド | Controlling the doping of synthetic diamond materials |
GB201021865D0 (en) | 2010-12-23 | 2011-02-02 | Element Six Ltd | A microwave plasma reactor for manufacturing synthetic diamond material |
GB201021870D0 (en) | 2010-12-23 | 2011-02-02 | Element Six Ltd | A microwave plasma reactor for manufacturing synthetic diamond material |
WO2013098795A1 (en) * | 2011-12-29 | 2013-07-04 | Selex Galileo S.P.A. | Slotted waveguide antenna for near-field focalization of electromagnetic radiation |
JP5728565B2 (en) * | 2013-12-24 | 2015-06-03 | 東京エレクトロン株式会社 | Plasma processing apparatus and slow wave plate used therefor |
NL2017575B1 (en) * | 2016-10-04 | 2018-04-13 | Draka Comteq Bv | A method and an apparatus for performing a plasma chemical vapour deposition process and a method |
KR102619949B1 (en) * | 2016-05-16 | 2024-01-03 | 삼성전자주식회사 | antenna, microwave plasma source including the same, and plasma processing apparatus |
JP6288624B2 (en) * | 2016-06-20 | 2018-03-07 | 東京エレクトロン株式会社 | Microwave supply apparatus, plasma processing apparatus, and plasma processing method |
CN107611580B (en) * | 2017-08-17 | 2018-09-07 | 北京遥感设备研究所 | A kind of polarization reconfigurable antenna based on solid state plasma |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5698036A (en) * | 1995-05-26 | 1997-12-16 | Tokyo Electron Limited | Plasma processing apparatus |
JP3233575B2 (en) * | 1995-05-26 | 2001-11-26 | 東京エレクトロン株式会社 | Plasma processing equipment |
JPH1167492A (en) * | 1997-05-29 | 1999-03-09 | Sumitomo Metal Ind Ltd | Plasma treatment equipment and plasma treatment method |
JP3539613B2 (en) * | 1997-12-03 | 2004-07-07 | 株式会社日立製作所 | Array summary analysis method for loops containing loop jump statements |
JP3840821B2 (en) * | 1998-11-30 | 2006-11-01 | 株式会社日立製作所 | Plasma processing equipment |
-
2000
- 2000-08-04 JP JP2000236716A patent/JP4598247B2/en not_active Expired - Fee Related
-
2001
- 2001-08-02 TW TW090118910A patent/TWI281365B/en not_active IP Right Cessation
- 2001-08-03 US US10/343,221 patent/US7296533B2/en not_active Expired - Fee Related
- 2001-08-03 AU AU2001276725A patent/AU2001276725A1/en not_active Abandoned
- 2001-08-03 WO PCT/JP2001/006698 patent/WO2002013250A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
TWI281365B (en) | 2007-05-11 |
US20040045674A1 (en) | 2004-03-11 |
JP2002050615A (en) | 2002-02-15 |
US7296533B2 (en) | 2007-11-20 |
JP4598247B2 (en) | 2010-12-15 |
WO2002013250A1 (en) | 2002-02-14 |
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