AU2001276725A1 - Radial antenna and plasma device using it - Google Patents

Radial antenna and plasma device using it

Info

Publication number
AU2001276725A1
AU2001276725A1 AU2001276725A AU7672501A AU2001276725A1 AU 2001276725 A1 AU2001276725 A1 AU 2001276725A1 AU 2001276725 A AU2001276725 A AU 2001276725A AU 7672501 A AU7672501 A AU 7672501A AU 2001276725 A1 AU2001276725 A1 AU 2001276725A1
Authority
AU
Australia
Prior art keywords
plasma device
radial antenna
antenna
radial
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001276725A
Inventor
Nobuo Ishii
Kibatsu Shinohara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of AU2001276725A1 publication Critical patent/AU2001276725A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192Microwave generated discharge
    • H01J37/32211Means for coupling power to the plasma
    • H01J37/3222Antennas
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192Microwave generated discharge

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Drying Of Semiconductors (AREA)
  • Waveguide Aerials (AREA)
AU2001276725A 2000-08-04 2001-08-03 Radial antenna and plasma device using it Abandoned AU2001276725A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000236716A JP4598247B2 (en) 2000-08-04 2000-08-04 Radial antenna and plasma apparatus using the same
JP2000-236716 2000-08-04
PCT/JP2001/006698 WO2002013250A1 (en) 2000-08-04 2001-08-03 Radial antenna and plasma device using it

Publications (1)

Publication Number Publication Date
AU2001276725A1 true AU2001276725A1 (en) 2002-02-18

Family

ID=18728717

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001276725A Abandoned AU2001276725A1 (en) 2000-08-04 2001-08-03 Radial antenna and plasma device using it

Country Status (5)

Country Link
US (1) US7296533B2 (en)
JP (1) JP4598247B2 (en)
AU (1) AU2001276725A1 (en)
TW (1) TWI281365B (en)
WO (1) WO2002013250A1 (en)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3914071B2 (en) * 2002-03-12 2007-05-16 東京エレクトロン株式会社 Plasma processing equipment
US7445690B2 (en) 2002-10-07 2008-11-04 Tokyo Electron Limited Plasma processing apparatus
JP4159845B2 (en) * 2002-10-07 2008-10-01 東京エレクトロン株式会社 Plasma processing equipment
US6998565B2 (en) 2003-01-30 2006-02-14 Rohm Co., Ltd. Plasma processing apparatus
JP3974553B2 (en) * 2003-05-07 2007-09-12 東京エレクトロン株式会社 Plasma processing apparatus, antenna for plasma processing apparatus, and plasma processing method
US7493869B1 (en) 2005-12-16 2009-02-24 The United States Of America As Represented By The Administration Of Nasa Very large area/volume microwave ECR plasma and ion source
JP4997826B2 (en) * 2006-05-22 2012-08-08 東京エレクトロン株式会社 Planar antenna member and plasma processing apparatus using the same
JP4486068B2 (en) * 2006-08-10 2010-06-23 東京エレクトロン株式会社 Plasma generation method
JP2008059991A (en) * 2006-09-01 2008-03-13 Canon Inc Plasma processing apparatus and plasma processing method
JP5249547B2 (en) * 2007-09-28 2013-07-31 東京エレクトロン株式会社 Plasma processing apparatus and gas exhaust method thereof
JP2009224455A (en) * 2008-03-14 2009-10-01 Tokyo Electron Ltd Flat antenna member and plasma processing device with the same
DE102008057947A1 (en) * 2008-11-19 2010-05-20 Mitec Automotive Ag Balance shaft for a reciprocating engine
GB201021855D0 (en) 2010-12-23 2011-02-02 Element Six Ltd Microwave power delivery system for plasma reactors
GB201021860D0 (en) * 2010-12-23 2011-02-02 Element Six Ltd A microwave plasma reactor for diamond synthesis
GB201021853D0 (en) 2010-12-23 2011-02-02 Element Six Ltd A microwave plasma reactor for manufacturing synthetic diamond material
GB201021913D0 (en) 2010-12-23 2011-02-02 Element Six Ltd Microwave plasma reactors and substrates for synthetic diamond manufacture
JP5913362B2 (en) 2010-12-23 2016-04-27 エレメント シックス リミテッド Controlling the doping of synthetic diamond materials
GB201021865D0 (en) 2010-12-23 2011-02-02 Element Six Ltd A microwave plasma reactor for manufacturing synthetic diamond material
GB201021870D0 (en) 2010-12-23 2011-02-02 Element Six Ltd A microwave plasma reactor for manufacturing synthetic diamond material
WO2013098795A1 (en) * 2011-12-29 2013-07-04 Selex Galileo S.P.A. Slotted waveguide antenna for near-field focalization of electromagnetic radiation
JP5728565B2 (en) * 2013-12-24 2015-06-03 東京エレクトロン株式会社 Plasma processing apparatus and slow wave plate used therefor
NL2017575B1 (en) * 2016-10-04 2018-04-13 Draka Comteq Bv A method and an apparatus for performing a plasma chemical vapour deposition process and a method
KR102619949B1 (en) * 2016-05-16 2024-01-03 삼성전자주식회사 antenna, microwave plasma source including the same, and plasma processing apparatus
JP6288624B2 (en) * 2016-06-20 2018-03-07 東京エレクトロン株式会社 Microwave supply apparatus, plasma processing apparatus, and plasma processing method
CN107611580B (en) * 2017-08-17 2018-09-07 北京遥感设备研究所 A kind of polarization reconfigurable antenna based on solid state plasma

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5698036A (en) * 1995-05-26 1997-12-16 Tokyo Electron Limited Plasma processing apparatus
JP3233575B2 (en) * 1995-05-26 2001-11-26 東京エレクトロン株式会社 Plasma processing equipment
JPH1167492A (en) * 1997-05-29 1999-03-09 Sumitomo Metal Ind Ltd Plasma treatment equipment and plasma treatment method
JP3539613B2 (en) * 1997-12-03 2004-07-07 株式会社日立製作所 Array summary analysis method for loops containing loop jump statements
JP3840821B2 (en) * 1998-11-30 2006-11-01 株式会社日立製作所 Plasma processing equipment

Also Published As

Publication number Publication date
TWI281365B (en) 2007-05-11
US20040045674A1 (en) 2004-03-11
JP2002050615A (en) 2002-02-15
US7296533B2 (en) 2007-11-20
JP4598247B2 (en) 2010-12-15
WO2002013250A1 (en) 2002-02-14

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