AU2001277700A1 - Radial antenna and plasma processing apparatus comprising the same - Google Patents
Radial antenna and plasma processing apparatus comprising the sameInfo
- Publication number
- AU2001277700A1 AU2001277700A1 AU2001277700A AU7770001A AU2001277700A1 AU 2001277700 A1 AU2001277700 A1 AU 2001277700A1 AU 2001277700 A AU2001277700 A AU 2001277700A AU 7770001 A AU7770001 A AU 7770001A AU 2001277700 A1 AU2001277700 A1 AU 2001277700A1
- Authority
- AU
- Australia
- Prior art keywords
- same
- processing apparatus
- plasma processing
- radial antenna
- antenna
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32211—Means for coupling power to the plasma
- H01J37/3222—Antennas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000-234497 | 2000-08-02 | ||
JP2000234497A JP4593741B2 (en) | 2000-08-02 | 2000-08-02 | Radial antenna and plasma processing apparatus using the same |
PCT/JP2001/006658 WO2002013249A1 (en) | 2000-08-02 | 2001-08-02 | Radial antenna and plasma processing apparatus comprising the same |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001277700A1 true AU2001277700A1 (en) | 2002-02-18 |
Family
ID=18726855
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001277700A Abandoned AU2001277700A1 (en) | 2000-08-02 | 2001-08-02 | Radial antenna and plasma processing apparatus comprising the same |
Country Status (7)
Country | Link |
---|---|
US (1) | US7807019B2 (en) |
EP (1) | EP1315201A4 (en) |
JP (1) | JP4593741B2 (en) |
KR (1) | KR100479794B1 (en) |
AU (1) | AU2001277700A1 (en) |
TW (1) | TW520620B (en) |
WO (1) | WO2002013249A1 (en) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4680400B2 (en) * | 2001-02-16 | 2011-05-11 | 東京エレクトロン株式会社 | Plasma device and manufacturing method thereof |
JP4141764B2 (en) * | 2002-08-20 | 2008-08-27 | 東京エレクトロン株式会社 | Plasma processing equipment |
US8244971B2 (en) * | 2006-07-31 | 2012-08-14 | Google Inc. | Memory circuit system and method |
JP4873405B2 (en) * | 2006-03-24 | 2012-02-08 | 東京エレクトロン株式会社 | Plasma processing apparatus and method |
JP4593652B2 (en) * | 2008-06-06 | 2010-12-08 | 東京エレクトロン株式会社 | Microwave plasma processing equipment |
KR101069384B1 (en) * | 2008-11-14 | 2011-09-30 | 세메스 주식회사 | Inductively coupled plasma antenna and plasma process apparatus including the same |
WO2013098795A1 (en) * | 2011-12-29 | 2013-07-04 | Selex Galileo S.P.A. | Slotted waveguide antenna for near-field focalization of electromagnetic radiation |
JP5882777B2 (en) * | 2012-02-14 | 2016-03-09 | 東京エレクトロン株式会社 | Deposition equipment |
US9928993B2 (en) * | 2015-01-07 | 2018-03-27 | Applied Materials, Inc. | Workpiece processing chamber having a rotary microwave plasma antenna with slotted spiral waveguide |
JP6486207B2 (en) * | 2015-06-04 | 2019-03-20 | 東京エレクトロン株式会社 | Plasma processing equipment |
JP6843087B2 (en) * | 2018-03-12 | 2021-03-17 | 株式会社Kokusai Electric | Semiconductor device manufacturing methods, substrate processing devices and programs |
CN112691297B (en) * | 2020-11-19 | 2022-03-04 | 成都恒波医疗器械有限公司 | Saddle-shaped microwave irradiator |
US11948776B2 (en) * | 2021-01-21 | 2024-04-02 | Hitachi High-Tech Corporation | Plasma processing apparatus |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2641450B2 (en) * | 1987-05-27 | 1997-08-13 | 株式会社日立製作所 | Plasma processing equipment |
JP3123175B2 (en) | 1992-01-21 | 2001-01-09 | 株式会社日立製作所 | Plasma processing equipment |
EP0725164A3 (en) * | 1992-01-30 | 1996-10-09 | Hitachi Ltd | Method and apparatus for generating plasma, and semiconductor processing methods |
JPH07263187A (en) * | 1994-03-18 | 1995-10-13 | Hitachi Ltd | Plasma treatment device |
JPH097998A (en) | 1995-06-20 | 1997-01-10 | Hitachi Ltd | Plasma ashing apparatus |
JP3491190B2 (en) * | 1997-07-28 | 2004-01-26 | 東京エレクトロン株式会社 | Plasma processing equipment |
JP3813741B2 (en) * | 1998-06-04 | 2006-08-23 | 尚久 後藤 | Plasma processing equipment |
KR100745495B1 (en) * | 1999-03-10 | 2007-08-03 | 동경 엘렉트론 주식회사 | Semiconductor fabrication method and semiconductor fabrication equipment |
-
2000
- 2000-08-02 JP JP2000234497A patent/JP4593741B2/en not_active Expired - Fee Related
-
2001
- 2001-08-02 KR KR10-2002-7012361A patent/KR100479794B1/en not_active IP Right Cessation
- 2001-08-02 US US10/343,201 patent/US7807019B2/en not_active Expired - Fee Related
- 2001-08-02 EP EP01955560A patent/EP1315201A4/en not_active Withdrawn
- 2001-08-02 WO PCT/JP2001/006658 patent/WO2002013249A1/en active IP Right Grant
- 2001-08-02 TW TW090118925A patent/TW520620B/en not_active IP Right Cessation
- 2001-08-02 AU AU2001277700A patent/AU2001277700A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
KR20030012851A (en) | 2003-02-12 |
EP1315201A1 (en) | 2003-05-28 |
EP1315201A4 (en) | 2006-04-26 |
KR100479794B1 (en) | 2005-03-31 |
JP2002050613A (en) | 2002-02-15 |
JP4593741B2 (en) | 2010-12-08 |
US7807019B2 (en) | 2010-10-05 |
TW520620B (en) | 2003-02-11 |
US20040027302A1 (en) | 2004-02-12 |
WO2002013249A1 (en) | 2002-02-14 |
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