CN113296366A - 振动控制装置、曝光装置以及物品制造方法 - Google Patents

振动控制装置、曝光装置以及物品制造方法 Download PDF

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Publication number
CN113296366A
CN113296366A CN202110140238.4A CN202110140238A CN113296366A CN 113296366 A CN113296366 A CN 113296366A CN 202110140238 A CN202110140238 A CN 202110140238A CN 113296366 A CN113296366 A CN 113296366A
Authority
CN
China
Prior art keywords
vibration
optical system
projection optical
substrate
noise
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202110140238.4A
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English (en)
Chinese (zh)
Inventor
朝仓康伸
畑智康
森川宽
伊藤正裕
诸冈祐平
猪股裕也
石井祐二
桥本拓海
有井俊郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN113296366A publication Critical patent/CN113296366A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R1/00—Details of transducers, loudspeakers or microphones
    • H04R1/20—Arrangements for obtaining desired frequency or directional characteristics
    • H04R1/22—Arrangements for obtaining desired frequency or directional characteristics for obtaining desired frequency characteristic only 
    • H04R1/28—Transducer mountings or enclosures modified by provision of mechanical or acoustic impedances, e.g. resonator, damping means
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R5/00—Stereophonic arrangements
    • H04R5/027—Spatial or constructional arrangements of microphones, e.g. in dummy heads

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  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Toxicology (AREA)
  • General Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Acoustics & Sound (AREA)
  • Signal Processing (AREA)
  • Otolaryngology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Vibration Prevention Devices (AREA)
  • Soundproofing, Sound Blocking, And Sound Damping (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN202110140238.4A 2020-02-05 2021-02-02 振动控制装置、曝光装置以及物品制造方法 Pending CN113296366A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020018206A JP7431597B2 (ja) 2020-02-05 2020-02-05 振動制御装置、露光装置、および物品製造方法
JP2020-018206 2020-02-05

Publications (1)

Publication Number Publication Date
CN113296366A true CN113296366A (zh) 2021-08-24

Family

ID=77313641

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202110140238.4A Pending CN113296366A (zh) 2020-02-05 2021-02-02 振动控制装置、曝光装置以及物品制造方法

Country Status (3)

Country Link
JP (1) JP7431597B2 (ja)
KR (1) KR20210100012A (ja)
CN (1) CN113296366A (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230296879A1 (en) * 2022-03-15 2023-09-21 Google Llc Active acoustic ripple cancellation for mems mirrors

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08261277A (ja) * 1995-03-27 1996-10-08 Mazda Motor Corp 車両の振動低減装置
JPH09260279A (ja) * 1996-03-26 1997-10-03 Nikon Corp 露光装置
JPH09265137A (ja) * 1996-03-28 1997-10-07 Nikon Corp 露光装置の環境制御方法及び装置
US6002987A (en) * 1996-03-26 1999-12-14 Nikon Corporation Methods to control the environment and exposure apparatus
JP2001023881A (ja) * 1999-07-07 2001-01-26 Canon Inc 露光装置
JP2013102066A (ja) * 2011-11-09 2013-05-23 Canon Inc リソグラフィー装置、それを用いたデバイスの製造方法
CN104678715A (zh) * 2003-02-26 2015-06-03 株式会社尼康 曝光方法以及器件制造方法
JP2016118253A (ja) * 2014-12-22 2016-06-30 中外炉工業株式会社 振動防止装置及び連続熱処理設備
CN109073990A (zh) * 2016-04-20 2018-12-21 Asml荷兰有限公司 衬底支撑件、光刻设备和装载方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003130128A (ja) 2001-10-30 2003-05-08 Canon Inc 能動除振装置
JP2004100953A (ja) 2002-08-23 2004-04-02 Nikon Corp 制振装置及び露光装置
JP2006107252A (ja) 2004-10-07 2006-04-20 Canon Inc フィルタ装置およびそれを用いた共振抑制方法
JP2011096930A (ja) 2009-10-30 2011-05-12 Nikon Corp 駆動装置、光学系、露光装置及びデバイスの製造方法

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08261277A (ja) * 1995-03-27 1996-10-08 Mazda Motor Corp 車両の振動低減装置
JPH09260279A (ja) * 1996-03-26 1997-10-03 Nikon Corp 露光装置
US6002987A (en) * 1996-03-26 1999-12-14 Nikon Corporation Methods to control the environment and exposure apparatus
JPH09265137A (ja) * 1996-03-28 1997-10-07 Nikon Corp 露光装置の環境制御方法及び装置
JP2001023881A (ja) * 1999-07-07 2001-01-26 Canon Inc 露光装置
CN104678715A (zh) * 2003-02-26 2015-06-03 株式会社尼康 曝光方法以及器件制造方法
JP2013102066A (ja) * 2011-11-09 2013-05-23 Canon Inc リソグラフィー装置、それを用いたデバイスの製造方法
JP2016118253A (ja) * 2014-12-22 2016-06-30 中外炉工業株式会社 振動防止装置及び連続熱処理設備
CN109073990A (zh) * 2016-04-20 2018-12-21 Asml荷兰有限公司 衬底支撑件、光刻设备和装载方法

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Publication number Publication date
KR20210100012A (ko) 2021-08-13
JP7431597B2 (ja) 2024-02-15
JP2021124611A (ja) 2021-08-30

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