CN1122115C - 在玻璃上形成氧化锡涂层的方法 - Google Patents
在玻璃上形成氧化锡涂层的方法 Download PDFInfo
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- CN1122115C CN1122115C CN97190763A CN97190763A CN1122115C CN 1122115 C CN1122115 C CN 1122115C CN 97190763 A CN97190763 A CN 97190763A CN 97190763 A CN97190763 A CN 97190763A CN 1122115 C CN1122115 C CN 1122115C
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- 239000011521 glass Substances 0.000 title claims abstract description 102
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 title claims abstract description 63
- 238000000576 coating method Methods 0.000 title claims abstract description 60
- 229910001887 tin oxide Inorganic materials 0.000 title claims abstract description 53
- 238000000034 method Methods 0.000 title claims description 61
- 239000011248 coating agent Substances 0.000 title abstract description 14
- 239000000376 reactant Substances 0.000 claims abstract description 51
- 239000000203 mixture Substances 0.000 claims abstract description 49
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 40
- 239000011737 fluorine Substances 0.000 claims abstract description 40
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 39
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 25
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 19
- 239000001301 oxygen Substances 0.000 claims abstract description 19
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 19
- 150000001875 compounds Chemical class 0.000 claims abstract description 12
- 239000000758 substrate Substances 0.000 claims description 51
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 38
- 238000002309 gasification Methods 0.000 claims description 34
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 31
- 239000007789 gas Substances 0.000 claims description 23
- 230000008569 process Effects 0.000 claims description 18
- 238000005229 chemical vapour deposition Methods 0.000 claims description 16
- 239000000377 silicon dioxide Substances 0.000 claims description 15
- 235000012239 silicon dioxide Nutrition 0.000 claims description 15
- 238000000151 deposition Methods 0.000 claims description 13
- 230000008021 deposition Effects 0.000 claims description 11
- 239000001307 helium Substances 0.000 claims description 11
- 229910052734 helium Inorganic materials 0.000 claims description 11
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 10
- CZRDZAGTSCUWNG-UHFFFAOYSA-M chloro(dimethyl)tin Chemical compound C[Sn](C)Cl CZRDZAGTSCUWNG-UHFFFAOYSA-M 0.000 claims description 8
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 6
- 238000009792 diffusion process Methods 0.000 claims description 6
- 229910052708 sodium Inorganic materials 0.000 claims description 6
- 239000011734 sodium Substances 0.000 claims description 6
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- 230000004888 barrier function Effects 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 4
- 229910052786 argon Inorganic materials 0.000 claims description 3
- 239000005368 silicate glass Substances 0.000 claims description 3
- PLOURCGNBMFHHN-UHFFFAOYSA-N C(C)OC(=O)[Sn]CC Chemical compound C(C)OC(=O)[Sn]CC PLOURCGNBMFHHN-UHFFFAOYSA-N 0.000 claims description 2
- JJLKTTCRRLHVGL-UHFFFAOYSA-L [acetyloxy(dibutyl)stannyl] acetate Chemical compound CC([O-])=O.CC([O-])=O.CCCC[Sn+2]CCCC JJLKTTCRRLHVGL-UHFFFAOYSA-L 0.000 claims description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 2
- HRMIYSNVJKPYGX-UHFFFAOYSA-K butan-2-yl(trichloro)stannane Chemical compound CCC(C)[Sn](Cl)(Cl)Cl HRMIYSNVJKPYGX-UHFFFAOYSA-K 0.000 claims description 2
- YMLFYGFCXGNERH-UHFFFAOYSA-K butyltin trichloride Chemical group CCCC[Sn](Cl)(Cl)Cl YMLFYGFCXGNERH-UHFFFAOYSA-K 0.000 claims description 2
- ZQTPGKOMJRUNDY-UHFFFAOYSA-M chloro(ethyl)tin Chemical compound CC[Sn]Cl ZQTPGKOMJRUNDY-UHFFFAOYSA-M 0.000 claims description 2
- KWTSZCJMWHGPOS-UHFFFAOYSA-M chloro(trimethyl)stannane Chemical compound C[Sn](C)(C)Cl KWTSZCJMWHGPOS-UHFFFAOYSA-M 0.000 claims description 2
- SYAXPJDYXAPBDK-UHFFFAOYSA-L dichloro(ethyl)tin Chemical compound CC[Sn](Cl)Cl SYAXPJDYXAPBDK-UHFFFAOYSA-L 0.000 claims description 2
- 239000005350 fused silica glass Substances 0.000 claims description 2
- 239000004571 lime Substances 0.000 claims description 2
- UBOGEXSQACVGEC-UHFFFAOYSA-K phenyltin(3+);trichloride Chemical compound Cl[Sn](Cl)(Cl)C1=CC=CC=C1 UBOGEXSQACVGEC-UHFFFAOYSA-K 0.000 claims description 2
- 239000005365 phosphate glass Substances 0.000 claims description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 2
- MEBRQLCKPRKBOH-UHFFFAOYSA-K trichloro(ethyl)stannane Chemical compound CC[Sn](Cl)(Cl)Cl MEBRQLCKPRKBOH-UHFFFAOYSA-K 0.000 claims description 2
- YFRLQYJXUZRYDN-UHFFFAOYSA-K trichloro(methyl)stannane Chemical compound C[Sn](Cl)(Cl)Cl YFRLQYJXUZRYDN-UHFFFAOYSA-K 0.000 claims description 2
- YSCVYRUCAPMZFG-UHFFFAOYSA-K trichlorotin Chemical compound Cl[Sn](Cl)Cl YSCVYRUCAPMZFG-UHFFFAOYSA-K 0.000 claims description 2
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 claims 2
- VEUACKUBDLVUAC-UHFFFAOYSA-N [Na].[Ca] Chemical compound [Na].[Ca] VEUACKUBDLVUAC-UHFFFAOYSA-N 0.000 claims 2
- 239000005388 borosilicate glass Substances 0.000 claims 1
- 239000001272 nitrous oxide Substances 0.000 claims 1
- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 23
- 239000010409 thin film Substances 0.000 description 15
- 239000012159 carrier gas Substances 0.000 description 14
- 238000006243 chemical reaction Methods 0.000 description 12
- 239000010408 film Substances 0.000 description 11
- 238000005516 engineering process Methods 0.000 description 10
- 229960001866 silicon dioxide Drugs 0.000 description 10
- 150000003606 tin compounds Chemical class 0.000 description 8
- 239000007788 liquid Substances 0.000 description 7
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 6
- 239000008246 gaseous mixture Substances 0.000 description 6
- 238000000137 annealing Methods 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 4
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000005329 float glass Substances 0.000 description 3
- 238000004062 sedimentation Methods 0.000 description 3
- 241001012508 Carpiodes cyprinus Species 0.000 description 2
- 238000006124 Pilkington process Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000000197 pyrolysis Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 239000006200 vaporizer Substances 0.000 description 2
- JUGDWSNYRIPJGE-UHFFFAOYSA-N 1-[acetyl(dibutyl)stannyl]ethanone Chemical compound CCCC[Sn](C(C)=O)(C(C)=O)CCCC JUGDWSNYRIPJGE-UHFFFAOYSA-N 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- AYHOQSGNVUZKJA-UHFFFAOYSA-N [B+3].[B+3].[B+3].[B+3].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-] Chemical compound [B+3].[B+3].[B+3].[B+3].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-] AYHOQSGNVUZKJA-UHFFFAOYSA-N 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- PZZYQPZGQPZBDN-UHFFFAOYSA-N aluminium silicate Chemical compound O=[Al]O[Si](=O)O[Al]=O PZZYQPZGQPZBDN-UHFFFAOYSA-N 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 229910000323 aluminium silicate Inorganic materials 0.000 description 1
- 230000003064 anti-oxidating effect Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000008450 motivation Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 150000003385 sodium Chemical class 0.000 description 1
- WROMPOXWARCANT-UHFFFAOYSA-N tfa trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F.OC(=O)C(F)(F)F WROMPOXWARCANT-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
- C03C17/2453—Coating containing SnO2
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/211—SnO2
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/24—Doped oxides
- C03C2217/241—Doped oxides with halides
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
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- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
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Abstract
本发明涉及在玻璃上形成氟掺杂氧化锡涂层的方法，该方法是通过提供一种含有机锡化合物，HF，水和氧气的，均匀的，气化的反应物混合物，并将该反应物混合物输送到该热玻璃带的表面上，在该表面上各种化合物发生反应以形成氟掺杂氧化锡涂层。根据本发明涂敷的氟掺杂氧化锡涂层显示出较低的薄膜电阻，并改进了在玻璃涂层表面上薄膜电阻的均匀性。
Description
发明领域
本发明主要涉及在玻璃上形成氧化锡涂层的方法，更具体地说，本发明涉及用化学蒸气沉积法在热玻璃衬底上制备氟掺杂的氧化锡涂层的方法。
发明背景
通常是通过连续涂敷玻璃衬底的方法来生产有涂层的玻璃制品，同时是在已知的“浮法玻璃工艺”的过程生产。该方法包括在适当封闭的熔化的锡浴上成形玻璃，经过充分地冷却后，将该玻璃转移到与该浴排成一行的移动滚筒上。当玻璃横过该滚筒向前时，先通过退火炉，此后被暴露到周围的大气中，并最终使该玻璃冷却。当该玻璃与熔化的锡浴接触时，为了防止氧化，该过程的浮法生产部分保持在非氧化气氛中。在退火炉中，保持空气的气氛。各种涂层的化学蒸气沉积(CVD)可在该浴或该退火炉，或甚至在它们之间的该过渡区里方便地实现，它借助于通过使热玻璃的表面与含反应物的化学蒸气接触，该反应物经高温热解以形成了该金属氧化物涂层。当然，要求该化学反应物的气化温度低于其热分解温度。存在几种锡的化合物，它们可通过使用CVD技术，经气化在玻璃上制备氧化锡涂层。
通过引入含掺杂剂的氧化锡涂层，可改进玻璃上的氧化锡涂层的所需特性，如低辐射系数，低薄膜电阻，高光透射率，高红外线反射率等等。在已有技术中已使用了几种物质作为掺杂剂，但对氧化锡涂层最有效的是元素氟。氟可以有机氟化物的形式引入沉积反应中，或以单独的含氟化合物与锡化合物反应而引入到沉积反应中。
在玻璃涂层的方法中使用的各种反应物的物理形态通常是液体，固体，气化的液体或固体，分散在载气混合物中的液体或固体，或分散在载气混合物中的气化的液体或固体。化学蒸气沉积方法中通常利用气化的液体或固体，它通常是分散在载气混合物中。
有机和无机锡化合物已用于氟掺杂氧化锡涂层的化学蒸气沉积法中。因此，例如美国专利号4,329,379公开了一种方法，该方法通过使玻璃与四氯化锡、氢氟酸(HF)，空气和水的气化反应物接触，在热玻璃衬底上形成氟掺杂氧化锡涂层。类似地，美国专利号4,387,134提到氟掺杂氧化锡膜的薄膜电阻为1-10欧姆/方，该膜是通过将气化的水，甲醇，HF，四氯化锡和H2/N2气体组合物制备的。
另一方面，用于将掺杂的氧化锡涂层涂敷到玻璃上的其他较好的常规方法包括将有机锡化合物和含氟化合物的混合物气化，然后将这些气化的反应物对准热玻璃衬底的表面。这样的方法已在美国专利4,293,594中公开，该专利还推荐了含氧载气的使用。
另外，在美国专利4,590,096，中公开了使用有机锡化合物，有机氟掺杂物，空气和水蒸汽的混合物形成氟掺杂氧化锡涂层的化学蒸气沉积方法。在该方法中，据说该气流中含足够量的水蒸汽，使得在180℃时该气流的相对湿度约为6％到100％。
美国专利4,325,987，中公开了CVD法，其中在至少含30％氢气的载气中，四氯化锡和水蒸汽的气体混合物被输送到该玻璃的表面上。也可将单独的HF和水蒸汽的气体混合物输送到该玻璃的表面上。尽管较好的锡化合物是四氯化锡，这也是给出实例的唯一的锡化合物，但提到使用Sn(Alk)4这种类型的挥发性锡化合物和二丁基-二乙酰基锡的可能性，其中Alk指的是较低的烷基基团。因缺少怎样使用所提到的有机锡化合物来实施本发明的方法的任何信息，该公开内容未提供任何在这方面最新技术的进展情况。
必须指出，对以上所涉及到的已有技术已作收集并仅依据本发明的目的作了导向性的探讨。这并不意味在本发明的动机之外，对这类种种工艺技术会另行汇集。
希望改进迄今为止的将氟掺杂的氧化锡涂层涂敷到热玻璃衬底表面上的已知方法，并因此提高有涂层的玻璃制品的薄膜电阻的均匀性及低的薄膜电阻。也希望提供一种方法，该方法能将氟掺杂氧化锡涂层涂敷到热玻璃衬底表面上，并且比迄今为止的已知方法的成本更低。
发明概述
本发明涉及用化学蒸气沉积方法将氟掺杂氧化锡涂层涂敷到热玻璃衬底的表面。令人惊奇的是，已经发现在玻璃上的氟掺杂氧化锡涂层的所需性能可通过利用包括以下步骤的方法得到改进：a)提供热玻璃衬底，包括欲沉积氟掺杂氧化锡涂层的表面；b)提供均匀的，被气化的反应物混合物，该混合物含有机锡化合物，氟化氢，氧气和水；以及c)将该气化的反应物混合物输送到该热玻璃衬底的表面上；其中该均匀的，被气化的反应物混合物发生反应，将氟掺杂氧化锡涂层沉积在该热玻璃衬底的表面上。
在优选实施例中，一种钠扩散膜，最好是二氧化硅层在氟掺杂氧化锡沉积前先被涂敷到玻璃衬底的表面上。本发明的方法尤其适用于生产具有氟掺杂氧化锡涂层的玻璃，可用于能量效率高的建筑窗，飞机或汽车窗，以及各种光学的和电子的设备。优选实施方案的详细描述
氟掺杂氧化锡涂层可借助通常已知的技术如化学蒸气沉积法(CVD)被沉积在热玻璃衬底的表面上。根据此方法，反应物被混合以便形成一种均匀的，气化的反应物流，该物流被输送到该热玻璃衬底的表面，其中该气化的反应物流发生反应，将氟掺杂的氧化锡涂层沉积在热玻璃衬底的表面上。在热玻璃表面必定存在的氧化气氛中，有机锡涂层化合物发生热解以生成该氧化锡涂层。
该方法通常是在以浮法玻璃工艺生产玻璃的过程中实施的，并且当该玻璃仍然热时，在浮法金属浴，退火炉或该浴和该退火炉之间的过渡区进行。该玻璃衬底通常的温度约为750°F～1500°F。此温度是浮法玻璃工艺过程的各工序中，玻璃所具有的典型温度。
适合用于本发明的玻璃衬底包括用于制备有涂层玻璃制品的已有技术中已知的任一种常规的玻璃衬底。在制造车辆窗和平板玻璃时所使用的典型的玻璃衬底通常被称为钠钙玻璃。其他合适的玻璃通常为碱-钙玻璃、硼-硅酸盐玻璃，铝-硅酸盐玻璃，硼-铝硅酸盐玻璃，磷酸盐玻璃，熔融石英等，以及它们的组合物。优选的玻璃是钠钙玻璃。
本发明的CVD反应物流包括有机锡涂层化合物、该化合物被气化并输送到向前移动的玻璃带的表面位置或其附近。用于实施本发明的合适的有机锡化合物不限于上面具体列举的那些，还包括二甲基二氯化锡，二乙基二氯化锡，二丁基二醋酸锡，四甲基锡，甲基三氯化锡，三乙基氯化锡，三甲基氯化锡，乙基三氯化锡，丙基三氯化锡，异丙基三氧化锡，仲丁基三氯化锡，叔丁基三氯化锡，苯基三氯化锡，乙酯基乙基三氯化锡，以及诸如此类，以及它们的组合物。这些化合物在CVD技术的工艺中通常是众所周知的，同时在市面上是可买得到的，并作为将锡化合物涂层涂敷到热玻璃上的原始化合物。优选的有机锡化合物是二甲基二氯化锡。为了生成气态有机锡反应物流，将该有机锡化合物，任选的载气，氧化剂，稳定剂，烃类，惰性气体等气化。此处使用的术语气态有机锡反应物流典型的包括气化的有机锡化合物，氧化剂，和惰性载气。
气化的有机锡化合物可用常规的已有技术的任一程序来制备，例如用热的载气流将分散的或流化的有机锡粉末气化或在填料床中将有机锡颗粒气化，或将溶液化的有机锡化合物注入到热的载气流中，或使载气通过液体有机锡化合物鼓泡。这些方法在美国专利3,852,098；2,780,553；4,351,861；4,571,350；3,970,037；4,212,663；和4,261,722中较完全地提出了，在此引入以供参考。用于制备含气化有机锡化合物的反应物流的优选方法是在混合气体存在下，在薄膜蒸发器中使该化合物气化，正如在美国专利5,090,985中所公开的那样，在此也全部引入以供参考。正如上面所指出的，通常含如氦气，氮气或氩气或其混合物的惰性气体的气体流可任选地含有像水或氧气这样的氧化剂。优选载气是氦气和氮气以及其混合物，其中还含有作为氧化剂的氧气。所得到的含气化的有机锡化合物的反应物流通常被加热到约250°F到约450°F，然后被输送到热玻璃衬底表面处的反应区。
气态氟化氢或氢氟酸(此处用的“HF”指的是氟化氢气体或氢氟酸)与气化的有机锡化合物混合。含单独HF的反应物流通常包含HF和载体，优选的是包括水蒸汽。将水加入到含HF的反应物流中可降低涂层玻璃的辐射系数，同时又增加沉积的氟掺杂氧化锡的生长速率。该含HF的反应物流另外还可能含有通常的辅助剂，到如氦气，氮气或氩气以及其混合物，还可含有氧化剂如氧。
将反应物输送到热玻璃衬底上欲沉积涂层的表面上之前，将含HF的反应物流与该有机锡反应物流在某一位置处混合，此位置最好较接近涂敷位置。含HF的反应物流可利用上述讨论的有关有机锡气化的方法之一来气化该化合物而制备或提供HF气体。在输送到热玻璃衬底之前，含HF的气化的反应物流可通过混合两种气流的方法与含气化的有机锡化合物的反应物流合并。另一种方法是，以液态或溶液状态存在的含HF的反应物流可注入到含气化的有机锡化合物的热反应物流中，由此气化含氟的溶液或液体化合物。合并后，含有机锡，HF，水和氧的气化反应物被输送到热玻璃表面，在此处它们相互反应，并将氟掺杂氧化锡涂层沉积在玻璃表面上。
在优选的实施例中，有机锡反应物流是通过在上述的一种蒸发器中气化二甲基二氯化锡和惰性载气如氮气，氦气或其混合物而生成的。然后将所得到的气流与气态氧气混合。同时，在第二蒸发器中将HF和水混合在一起，所得到的气态的HF和水蒸汽的反应物流再与气态的有机锡反应物流混合，以生成均匀的气态反应物流。该均匀的气态反应物流被送到热玻璃衬底的表面上，在那里氟掺杂氧化锡涂层被沉积在热玻璃衬底的表面上。该均匀的气态反应物流可通过任何合适的涂敷装置被送到该玻璃的表面上。在美国专利4,504,526中例举了一种较好的涂敷装置，在此全部引入以供参考。
根据本发明，被输送到热玻璃衬底表面的均匀的气态反应物混合物优选地包括(全部以摩尔百分数计)约10～60％氧气，约2～50％的水和约0.2～2％HF，最优选地包括约30％～50％氧气，约15～35％水，和约0.5～1.5％HF。该均匀的气态反应物的混合物也包含有机锡化合物，所要求的该锡化合物的浓度是随所要求的氧化锡涂层的厚度和该玻璃衬底的线速度而变化。因此，本领域技术人员所希望的是，在气态反应物混合物中所含的有机锡的数量要足以在所要求的衬底线速度下，涂敷所要求厚度的涂层。对典型的工业操作来说，该气态的反应物混合物通常要含约0.01～8％的有机锡。
当根据本发明形成氟掺杂氧化锡涂层时，也注意到最好是在该玻璃衬底和氟掺杂氧化锡涂层之间涂敷一层作为钠扩散膜的材料层。当根据本发明所沉积的氟掺杂氧化锡涂层被涂敷到在上述具有钠扩散膜层的玻璃上时，与直接涂敷到玻璃上相对比，已经发现，该涂层玻璃制品显示出较低的辐射系数，较低的薄膜电阻和较低的混浊度。该钠扩散层优选的是由二氧化硅形成。该二氧化硅层最好是使用常规的CVD技术形成。
在最优选的实施方案中，首先在热玻璃衬底表面沉积氧化锡薄膜，在其上沉积二氧化硅薄膜，使得在该玻璃和接着被沉积的氟掺杂氧化锡之间间形成氧化锡/二氧化硅底基层结构。在这个实施例中，该二氧化硅膜不仅起着钠扩散膜的作用，而且与第一(无掺杂的)氧化锡膜一起，有助于抑制所得到的有涂层的玻璃制品的虹彩。在美国专利4,377,613中公开了这类抗虹彩层的使用，全部引此以供参考。
必须指出，根据本发明为成功地混合和输送气化的反应物的过程条件不是很苛刻的。上述过程条件按实施本发明的常规方法被概括地公开了。然而，往往，所述的过程条件可能不能精确地应用到公开范围内所包括的每一种化合物。对发生这种情况的化合物会容易地被本领域技术人员所识别。在所有的这样的情况下，本方法可通过以本领域技术人员所公知的常规变更，例如通过增加或降低温度条件，通过改变有机锡和HF反应物的混合速率，通过气化工艺条件的例行变更等来成功地实施，或将其他一些常规的过程条件用于本发明的实施。
也要指出，本发明的方法可在已知的衬底上按需要重复，以便形成由一些连续层所组成的涂层，每一层的组成未必相同。很明显，当反应剂的流速给定时，该涂层的厚度与该衬底移动的速度有关。在这些情况下，如果需要，可通过并列使用2个或多个涂敷装置以增加反应的场所。用这种方法，在各层达冷却之前连续的各层进行重叠，结果产生了特别均匀的总涂层。
通过参考描述本发明的具体实施方案，可更容易地理解本发明。当然，该具体实施方案只是为了说明目的，在不违反本发明的实质和范围的情况下，还可以其它方案实施。
对照实例
熔化二甲基二氯化锡，然后使熔化了的二甲基二氯化锡在美国专利5,090,985中所说明的那一类型的薄膜蒸发器中进行气化。作为载气的氦也同时被引入该薄膜蒸发器中。薄膜蒸发器上安装有使温度保持在约350°F的蒸汽夹套。所形成的气态的DMT和氦气混合物离开该薄膜蒸发器并沿主反应物管道被输送。将气态氧气引入到主反应物管道中的该DMT/He气体流中。所形成的气体物流继续沿主反应物管道流动。
同时，将三氟乙酸(TFA)和水加入到温度维持在约400°F的第二薄膜蒸发器中。所得到的该气态TFA和水的混合物离开第二薄膜蒸发器，并通过与主反应物管道相连的加料管加料，该TFA/水的气体混合物与MDT/He/O2气流混合，经完全混合后形成均匀的气态反应物流。最终的气态反应物流由约(所有的百分数均以摩尔％计)44.2％氧气，22.1％水，30.2％氦气，0.97％TFA和2.53％DMT组成，最终气体混合物的总气体流量按制得的涂层玻璃制品的每米宽度计算，每分钟约为384标准升。
当使用美国专利4,504,526中涂敷装置，该气化的反应物流立即输送到玻璃带的表面、该玻璃表面上预先已用常规的CVD技术沉积了氧化锡第一薄膜和二氧化硅第二薄膜。该玻璃带以每分约466时的线速度移动，其温度保持在1100°F～1200°F。该反应物流在热玻璃表面上反应，形成叠加在该二氧化硅和氧化锡膜上的氟掺杂氧化锡涂层。所得到的氟掺杂氧化锡涂层厚度约为3,200。
沿所得到的有涂层玻璃制品宽度上，以每隔2时增量测量该薄膜电阻。所得薄膜电阻每方为13.3到18.0欧姆之间，平均薄膜电阻每方为14.4欧姆。
实例
熔化二甲基二氯化物，然后使熔化了的二甲基二氯化锡在美国专利5,090,985中所说明的那一类型的薄膜蒸发器中进行气化。作为载气的氦也同时被引入该薄膜蒸发器中。薄膜蒸发器上安装有使温度保持在约350°F的蒸汽夹套。所得到的气DMT和氦气的混合物离开该薄膜蒸发器并沿着主反应物管道被输送。将气态氧气引入到主反应物管道中该DMT/He气体流中。所形成的气体物流继续沿着该主反应物管道流动。
同时，将HF水溶液加入到温度保持在约400°F的第二薄膜蒸发器中。并将另加的水引入到第二薄膜蒸发器中。所形成的气态HF和水的混合物离开第二薄膜蒸发器并通过与主反应物管道相连的加料管加料，该HF/水气体混合物与DMT/He/O2气流混合，经完全地混合后，形成均匀的气态反应物流。最终的气态混合物是由约(所有的百分数均以摩尔％计)42.9％氧气，24.6％水，29.3％氦气，0.70％HF，和2.5％DMT组成，最终气体混合物的总气体流量按制得的涂层玻璃制品的每米宽度计算，每分钟约为395标准升。
当使用美国专利4,504,526，中的涂敷装置，该气化的反应物流立即输送到玻璃带的表面，该玻璃带表面上预先已用常规的CVD技术沉积了氧化锡第一薄膜和二氧化硅第二薄膜。该玻璃带以每分约466时的线速度移动，其温度保持在1100°～1200°F的范围内。该反应物流在该热玻璃的表面上反应，形成叠加在二氧化硅和氧化锡膜上的氟掺杂氧化锡涂层。所得到的氟掺杂氧化锡涂层的厚度约为3,200。
沿所得到的有涂层玻璃制品的宽度上，以每隔2时增量测量该薄膜电阻。所得薄膜电阻每方为13.0～15.9欧姆之间，平均薄膜电阻每方为14.0欧姆。
Claims (19)
1.一种化学蒸气沉积方法，用于将氟掺杂氧化锡涂层涂敷到热玻璃衬底的表面上，该方法包括以下步骤：
A)提供一种热玻璃衬底，该衬底包括欲沉积氟掺杂氧化锡涂层的表面；
B)提供一种均匀的，气化的反应物混合物，该混合物含有机锡化合物，氟化氢，氧气和水；以及
C)将气化的反应物混合物输送到热玻璃衬底表面上；
其中该均匀的，气化的反应物混合物发生反应，以将氟掺杂氧化锡涂层沉积在该热玻璃衬底的表面上。
2.根据权利要求1的方法，其中玻璃选自钠-钙玻璃，碱-钙玻璃，硼硅酸盐玻璃，铝硅酸盐玻璃，磷酸盐玻璃，熔融石英玻璃，及其组合。
3.根据权利要求1的方法，其中玻璃是钠-钙玻璃。
4.根据权利要求1的方法，其中该有机锡化合物选自二甲基二氯化锡，二乙基二氯化锡，二丁基二醋酸锡，四甲基锡，甲基三氯化锡，三乙基氯化锡，三甲基氯化锡，乙基三氯化锡，丙基三氯化锡，异丙基三氯化锡，仲丁基三氯化锡，叔丁基三氯化锡，苯基三氯化锡，乙酯基乙基三氯化锡，以及其组合。
5.根据权利要求1的方法，其中有机锡化合物是二甲基二氯化锡。
6.根据权利要求1的方法，其中所提供的玻璃衬底的温度为750°F～1500°F。
7.根据权利要求1的方法，其中均匀的，气化的反应物混合物还包括选自氦气，氮气，氩气和一氧化二氮中的一种或多种化合物。
8.根据权利要求1的方法，还包括在热玻璃衬底的表面上沉积一层起钠扩散膜作用的物质层的步骤，这样该物质就置于上述玻璃衬底表面和氟掺杂氧化锡涂层之间。
9.根据权利要求8的方法，其中在沉积氟掺杂氧化锡涂层前，在热玻璃衬底表面上沉积一层二氧化硅。
10.根据权利要求9的方法，其中该二氧化硅层是通过化学蒸气沉积方法沉积到热玻璃衬底表面上的。
11.根据权利要求9的方法，其中在二氧化硅层沉积前，在热玻璃衬底表面上沉积一层氧化锡。
12.根据权利要求1的方法，其中气体反应物混合物包含0.2～2摩尔％的氟化氢。
13.根据权利要求12的方法，其中气体反应物混合物包含0.5～1.5摩尔％的氟化氢。
14.根据权利要求1的方法，其中气体反应物混合物包含2～50摩尔％的水。
15.根据权利要求14的方法，其中气体反应物混合物包含15～35摩尔％的水。
16.根据权利要求1的方法，其中气体反应物混合物包含10～60摩尔％的氧气。
17.根据权利要求16的方法，其中气体反应物混合物包含30～50摩尔％的氧气。
18.一种化学蒸气沉积方法，用于将氟掺杂氧化锡涂层涂敷到热玻璃衬底的表面上，该方法包括以下步骤：
A)提供一种温度为750°F～1500°F的热玻璃衬底，该衬底包括欲沉积氟掺杂氧化锡涂层的表面；
B)提供一种均匀的，气化的反应物混合物，该混合物含有机锡化合物，0.2～2摩尔％的氟化氢，2～50摩尔％的水，和10～60摩尔％的氧气；以及
C)将气化的反应物混合物输送到热玻璃衬底的表面上；
其中该均匀的，气化的反应物混合物发生反应，以将氟掺杂氧化锡涂层沉积在该热玻璃衬底的表面上。
19.一种化学蒸汽沉积方法，用于将用氟掺杂氧化锡涂层涂敷到热玻璃衬底的表面上，该方法包括以下步骤：
A)提供一种温度为750℃～1500°F的热玻璃衬底，该衬底包括欲沉积氟掺杂氧化锡涂层的表面，该表面涂敷有二氧化硅层；
B)提供一种均匀的，气化的反应物混合物，该混合物含有机锡化合物，0.2～2摩尔％的氟化氢，2～50摩尔％的水，和10～60摩尔％的氧气；以及
C)将气化的反应物混合物输送到热玻璃衬底的表面上；
其中该均匀的，气化的反应物混合物发生反应，以将氟掺杂氧化锡涂层沉积在热玻璃衬底表面上的二氧化硅层上。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/642,921 | 1996-05-06 | ||
| US08/642,921 US5698262A (en) | 1996-05-06 | 1996-05-06 | Method for forming tin oxide coating on glass |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1196760A CN1196760A (zh) | 1998-10-21 |
| CN1122115C true CN1122115C (zh) | 2003-09-24 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN97190763A Expired - Lifetime CN1122115C (zh) | 1996-05-06 | 1997-05-06 | 在玻璃上形成氧化锡涂层的方法 |
Country Status (13)
| Country | Link |
|---|---|
| US (1) | US5698262A (zh) |
| EP (1) | EP0839218B1 (zh) |
| JP (1) | JP4322314B2 (zh) |
| KR (1) | KR100577945B1 (zh) |
| CN (1) | CN1122115C (zh) |
| AT (1) | ATE211779T1 (zh) |
| AU (1) | AU2828197A (zh) |
| BR (1) | BR9702244A (zh) |
| CA (1) | CA2225961A1 (zh) |
| DE (1) | DE69709525T2 (zh) |
| PL (1) | PL185373B1 (zh) |
| RU (1) | RU2194089C2 (zh) |
| WO (1) | WO1997042357A1 (zh) |
Families Citing this family (55)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2738813B1 (fr) * | 1995-09-15 | 1997-10-17 | Saint Gobain Vitrage | Substrat a revetement photo-catalytique |
| US7096692B2 (en) | 1997-03-14 | 2006-08-29 | Ppg Industries Ohio, Inc. | Visible-light-responsive photoactive coating, coated article, and method of making same |
| US6027766A (en) * | 1997-03-14 | 2000-02-22 | Ppg Industries Ohio, Inc. | Photocatalytically-activated self-cleaning article and method of making same |
| US6124026A (en) * | 1997-07-07 | 2000-09-26 | Libbey-Owens-Ford Co. | Anti-reflective, reduced visible light transmitting coated glass article |
| US5935716A (en) * | 1997-07-07 | 1999-08-10 | Libbey-Owens-Ford Co. | Anti-reflective films |
| FR2780054B1 (fr) * | 1998-06-19 | 2000-07-21 | Saint Gobain Vitrage | Procede de depot d'une couche a base d'oxyde metallique sur un substrat verrier, substrat verrier ainsi revetu |
| US6660365B1 (en) | 1998-12-21 | 2003-12-09 | Cardinal Cg Company | Soil-resistant coating for glass surfaces |
| US6312831B1 (en) * | 1999-04-30 | 2001-11-06 | Visteon Global Technologies, Inc. | Highly reflective, durable titanium/tin oxide films |
| US6602606B1 (en) | 1999-05-18 | 2003-08-05 | Nippon Sheet Glass Co., Ltd. | Glass sheet with conductive film, method of manufacturing the same, and photoelectric conversion device using the same |
| JP2001093996A (ja) * | 1999-09-27 | 2001-04-06 | Toshiba Corp | 半導体装置の製造方法 |
| US6111224A (en) * | 1999-12-02 | 2000-08-29 | Hatco Corporation | Food warming oven with transparent heating shelves |
| US6413579B1 (en) * | 2000-01-27 | 2002-07-02 | Libbey-Owens-Ford Co. | Temperature control of CVD method for reduced haze |
| EP1265820B1 (en) | 2000-03-23 | 2005-01-05 | University Of Southampton | Optical waveguides and devices including same |
| US6643442B2 (en) | 2000-03-23 | 2003-11-04 | University Of Southampton | Optical waveguides and devices including same |
| US6605341B2 (en) * | 2000-05-19 | 2003-08-12 | Tdk Corporation | Functional film having specific surface dispersion ratio |
| US6921579B2 (en) * | 2000-09-11 | 2005-07-26 | Cardinal Cg Company | Temporary protective covers |
| EP1324958B1 (en) | 2000-09-11 | 2008-07-23 | Cardinal CG Company | Hydrophilic surfaces carrying temporary protective covers |
| CA2404694C (en) | 2001-02-08 | 2008-08-26 | Cardinal Cg Company | Edge treatments for coated substrates |
| US6902813B2 (en) * | 2001-09-11 | 2005-06-07 | Cardinal Cg Company | Hydrophilic surfaces carrying temporary protective covers |
| US7259085B2 (en) | 2001-12-03 | 2007-08-21 | Nippon Sheet Glass Company, Limited | Method for forming thin film, substrate having thin film formed by the method, and photoelectric conversion device using the substrate |
| US8093490B2 (en) | 2001-12-03 | 2012-01-10 | Nippon Sheet Glass Company, Limited | Method for forming thin film, substrate having transparent electroconductive film and photoelectric conversion device using the substrate |
| US6733889B2 (en) | 2002-05-14 | 2004-05-11 | Pilkington North America, Inc. | Reflective, solar control coated glass article |
| US7993741B2 (en) * | 2002-12-06 | 2011-08-09 | Cardinal Cg Company | Preventing damage with separators |
| US7713632B2 (en) | 2004-07-12 | 2010-05-11 | Cardinal Cg Company | Low-maintenance coatings |
| WO2006080968A2 (en) | 2004-11-15 | 2006-08-03 | Cardinal Cg Company | Methods and equipment for depositing coatings having sequenced structures |
| CN1317740C (zh) * | 2004-12-01 | 2007-05-23 | 四川大学 | 用高温氧化方法制备SnO2过渡层 |
| US8092660B2 (en) | 2004-12-03 | 2012-01-10 | Cardinal Cg Company | Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films |
| US7923114B2 (en) | 2004-12-03 | 2011-04-12 | Cardinal Cg Company | Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films |
| US8197231B2 (en) | 2005-07-13 | 2012-06-12 | Purity Solutions Llc | Diaphragm pump and related methods |
| BRPI0614819A2 (pt) * | 2005-08-30 | 2011-04-19 | Pilkington Group Ltd | artigo revestido, método de formar um artigo revestido, e artigo de vidro revestido |
| US20070134501A1 (en) * | 2005-12-13 | 2007-06-14 | Mcmaster Alan J | Self-cleaning coatings applied to solar thermal devices |
| WO2007124291A2 (en) | 2006-04-19 | 2007-11-01 | Cardinal Cg Company | Opposed functional coatings having comparable single surface reflectances |
| JP2010513175A (ja) * | 2006-06-30 | 2010-04-30 | カーディナル・シージー・カンパニー | カーボンナノチューブグレージング技術 |
| US20080011599A1 (en) | 2006-07-12 | 2008-01-17 | Brabender Dennis M | Sputtering apparatus including novel target mounting and/or control |
| KR101383946B1 (ko) * | 2006-08-29 | 2014-04-10 | 알케마 인코포레이티드 | 산화아연 코팅된 물품의 형성 방법 |
| KR101563197B1 (ko) | 2007-09-14 | 2015-10-26 | 카디날 씨지 컴퍼니 | 관리 용이한 코팅 및 이의 제조방법 |
| GB0803574D0 (en) * | 2008-02-27 | 2008-04-02 | Pilkington Group Ltd | Coated glazing |
| FR2973023B1 (fr) | 2011-03-25 | 2019-08-02 | Saint-Gobain Glass France | Vitrage multiple isolant comprenant deux empilements bas emissifs |
| US8609197B1 (en) | 2011-03-29 | 2013-12-17 | Owens-Brockway Glass Container Inc. | Preparing glass containers for electrostatic coating |
| US9463999B2 (en) * | 2012-01-10 | 2016-10-11 | Ppg Industries Ohio, Inc. | Coated glasses having a low sheet resistance, a smooth surface, and/or a low thermal emissivity |
| US9610392B2 (en) | 2012-06-08 | 2017-04-04 | Fresenius Medical Care Holdings, Inc. | Medical fluid cassettes and related systems and methods |
| US20130334089A1 (en) * | 2012-06-15 | 2013-12-19 | Michael P. Remington, Jr. | Glass Container Insulative Coating |
| WO2014112415A1 (ja) * | 2013-01-16 | 2014-07-24 | 旭硝子株式会社 | 積層膜付きガラス基板の製造方法 |
| KR101933727B1 (ko) * | 2013-08-26 | 2018-12-31 | 연세대학교 산학협력단 | 원자층 증착법으로 산화물 박막의 일부를 할로겐 원소로 도핑할 수 있는 할로겐 도핑 소스, 상기 할로겐 도핑 소스의 제조 방법, 상기 할로겐 원소 소스를 이용하여 원자층 증착법으로 산화물 박막의 일부를 할로겐으로 도핑하는 방법, 및 상기 방법을 이용하여 형성된 할로겐 원소가 도핑된 산화물 박막 |
| CN103915529B (zh) * | 2014-04-16 | 2016-10-26 | 沙嫣 | 微型非晶硅薄膜太阳能电池片的生产方法 |
| CN104264127A (zh) * | 2014-09-28 | 2015-01-07 | 中国建材国际工程集团有限公司 | 光伏电池用透明导电膜的生产方法 |
| CN104294992B (zh) * | 2014-10-17 | 2017-02-01 | 宁波华尔克应用材料有限公司 | 一种节能玻璃砖及其制备方法 |
| CN107074623B (zh) | 2014-10-20 | 2021-05-04 | 皮尔金顿集团有限公司 | 隔绝性窗玻璃单元 |
| KR20230156842A (ko) | 2014-10-23 | 2023-11-14 | 인프리아 코포레이션 | 유기 금속 용액 기반의 고해상도 패터닝 조성물 및 상응하는 방법 |
| JP6805244B2 (ja) * | 2015-10-13 | 2020-12-23 | インプリア・コーポレイションＩｎｐｒｉａ Ｃｏｒｐｏｒａｔｉｏｎ | 有機スズオキシドヒドロキシドのパターン形成組成物、前駆体およびパターン形成 |
| EP3387163B1 (en) | 2015-12-11 | 2020-04-29 | Cardinal CG Company | Method of coating both sides of a substrate |
| EP3541762B1 (en) | 2016-11-17 | 2022-03-02 | Cardinal CG Company | Static-dissipative coating technology |
| WO2021165680A1 (en) | 2020-02-20 | 2021-08-26 | Pilkington Group Limited | Coated glass articles |
| CN112851334A (zh) * | 2021-02-04 | 2021-05-28 | 宁波云川环保科技有限公司 | 一种基于氮化硅的加热体及其制备工艺 |
| US11459656B1 (en) | 2021-09-13 | 2022-10-04 | Gelest, Inc | Method and precursors for producing oxostannate rich films |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4293594A (en) * | 1980-08-22 | 1981-10-06 | Westinghouse Electric Corp. | Method for forming conductive, transparent coating on a substrate |
| US4329379A (en) * | 1978-10-19 | 1982-05-11 | Bfg Glassgroup | Process for forming tin oxide glass coating |
Family Cites Families (122)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US34114A (en) * | 1862-01-07 | Improvement in piano-fortes | ||
| US31708A (en) * | 1861-03-19 | Improved device for coating pins | ||
| US2118795A (en) * | 1931-09-21 | 1938-05-24 | Corning Glass Works | Insulator |
| US2429420A (en) * | 1942-10-05 | 1947-10-21 | Libbey Owens Ford Glass Co | Conductive coating for glass and method of application |
| GB604878A (en) | 1944-12-11 | 1948-07-12 | British Thomson Houston Co Ltd | Improvements in and relating to conductive vitreous articles and their manufacture |
| US2583000A (en) * | 1946-05-14 | 1952-01-22 | Pittsburgh Plate Glass Co | Transparent conducting films |
| US2614944A (en) * | 1947-07-22 | 1952-10-21 | Pittsburgh Plate Glass Co | Method of applying electroconductive films |
| US2556346A (en) * | 1947-09-18 | 1951-06-12 | Stromberg Bror Wilhelm | Level indicator for liquidcontaining vessels |
| US2567331A (en) * | 1949-07-21 | 1951-09-11 | Libbey Owens Ford Glass Co | Method of applying electrically conducting coatings to vitreous bases |
| GB705934A (en) | 1951-05-17 | 1954-03-24 | Pittsburgh Plate Glass Co | Conductive article and production thereof |
| US2617741A (en) * | 1951-12-19 | 1952-11-11 | Pittsburgh Plate Glass Co | Electroconductive article and production thereof |
| DE1082017B (de) * | 1958-03-05 | 1960-05-19 | Pittsburgh Plate Glass Co | Verfahren und Vorrichtung zum Aufbringen hydrolysierbarer Metallverbindungen auf waermebestaendige Koerper, z. B. Glasscheiben |
| US3107177A (en) * | 1960-01-29 | 1963-10-15 | Pittsburgh Plate Glass Co | Method of applying an electroconductive tin oxide film and composition therefor |
| SU142000A1 (ru) | 1961-01-27 | 1961-11-30 | Б.П. Крыжановский | Способ получени полупроводниковых слоев двуокиси олова |
| GB1101731A (en) | 1964-02-27 | 1968-01-31 | Ball Brothers Co Inc | Coating of glass |
| DE1495783A1 (de) * | 1964-03-07 | 1969-04-03 | Hoechst Ag | Verfahren zur Herstellung von Polyaethylenterephthalat |
| US3420693A (en) * | 1964-06-05 | 1969-01-07 | Ball Brothers Co Inc | Glass having dual protective coatings thereon and a method for forming such coatings |
| GB1211006A (en) | 1967-03-28 | 1970-11-04 | Dominion Glass Co Ltd | Protective coating of glass containers |
| US3647531A (en) * | 1967-04-11 | 1972-03-07 | Tokyo Shibaura Electric Co | Method of applying coating of metal oxides upon substrates |
| US3836444A (en) * | 1968-10-01 | 1974-09-17 | Inst Francais Du Petrole | Process for polymerizing conjugated diolefins using organic compounds of the transition metals as catalysts |
| US3644741A (en) * | 1969-05-16 | 1972-02-22 | Energy Conversion Devices Inc | Display screen using variable resistance memory semiconductor |
| CA918297A (en) * | 1969-09-24 | 1973-01-02 | Tanimura Shigeru | Semiconductor device and method of making |
| JPS493816B1 (zh) * | 1969-10-11 | 1974-01-29 | ||
| CA927690A (en) | 1970-07-13 | 1973-06-05 | Ball Corporation | Apparatus and method for treating vitreous surfaces |
| US3677814A (en) * | 1970-10-26 | 1972-07-18 | Ppg Industries Inc | Process for forming electroconductive tin oxide films by pyrolyzation of alkyl and aryl tin fluorides |
| US3781315A (en) * | 1971-07-09 | 1973-12-25 | Prod Res & Chem Corp | Halo alkoxy metal compounds |
| BE788501A (fr) * | 1971-09-17 | 1973-01-02 | Libbey Owens Ford Co | Procede d'application d'enduits d'oxyde d'etain sur des substrats transparents |
| US3775453A (en) * | 1972-03-14 | 1973-11-27 | Schaper | Preparation of hexafluoroisopropoxides of aluminum and group iv elements |
| JPS5128090B2 (zh) * | 1972-03-17 | 1976-08-17 | ||
| GB1419143A (en) * | 1972-04-04 | 1975-12-24 | Omron Tateisi Electronics Co | Semiconductor photoelectric device |
| US4057480A (en) * | 1973-05-25 | 1977-11-08 | Swiss Aluminium Ltd. | Inconsumable electrodes |
| US4093636A (en) * | 1973-06-14 | 1978-06-06 | Rhone - Poulenc Industries | Epoxidation of olefinic compounds |
| US3949146A (en) * | 1973-08-24 | 1976-04-06 | Rca Corporation | Process for depositing transparent electrically conductive tin oxide coatings on a substrate |
| GB1454567A (en) | 1974-03-07 | 1976-11-03 | Ball Corp | Method and apparatus for treating vitreous surfaces |
| GB1520124A (en) * | 1974-09-18 | 1978-08-02 | M & T Chemicals Inc | Process for applying stannic oxide coatings to glass |
| SE393967B (sv) * | 1974-11-29 | 1977-05-31 | Sateko Oy | Forfarande och for utforande av stroleggning mellan lagren i ett virkespaket |
| JPS5170492A (en) * | 1974-12-16 | 1976-06-18 | Kogyo Gijutsuin | Teiteikono sankainjiumudodenmakuno seizoho |
| GB1517341A (en) | 1975-01-02 | 1978-07-12 | Day Specialties | Coating solutions for dielectric materials |
| US4130673A (en) * | 1975-07-02 | 1978-12-19 | M&T Chemicals Inc. | Process of applying tin oxide on glass using butyltin trichloride |
| US4069630A (en) * | 1976-03-31 | 1978-01-24 | Ppg Industries, Inc. | Heat reflecting window |
| GB1524326A (en) * | 1976-04-13 | 1978-09-13 | Bfg Glassgroup | Coating of glass |
| GB1523991A (en) | 1976-04-13 | 1978-09-06 | Bfg Glassgroup | Coating of glass |
| GB1516032A (en) | 1976-04-13 | 1978-06-28 | Bfg Glassgroup | Coating of glass |
| US4146657A (en) * | 1976-11-01 | 1979-03-27 | Gordon Roy G | Method of depositing electrically conductive, infra-red reflective, transparent coatings of stannic oxide |
| US4265974A (en) * | 1976-11-01 | 1981-05-05 | Gordon Roy G | Electrically conductive, infrared reflective, transparent coatings of stannic oxide |
| USRE31708E (en) | 1976-11-01 | 1984-10-16 | Method of depositing electrically conductive, infra-red reflective, transparent coatings of stannic oxide | |
| US4308316A (en) * | 1977-04-04 | 1981-12-29 | Gordon Roy G | Non-iridescent glass structures |
| US4187336A (en) * | 1977-04-04 | 1980-02-05 | Gordon Roy G | Non-iridescent glass structures |
| JPS5437077A (en) * | 1977-08-02 | 1979-03-19 | Agency Of Ind Science & Technol | Chemical evaporation method and apparatus for same |
| US4349425A (en) * | 1977-09-09 | 1982-09-14 | Hitachi, Ltd. | Transparent conductive films and methods of producing same |
| FR2409880B1 (fr) * | 1977-11-29 | 1986-04-25 | Pietsch Helge | Siege suspendu de vehicule |
| CA1134214A (en) | 1978-03-08 | 1982-10-26 | Roy G. Gordon | Deposition method |
| US4206452A (en) * | 1978-04-28 | 1980-06-03 | Fairway Trading, Inc. | Tension cord burglar-alarm |
| JPS54150417A (en) * | 1978-05-19 | 1979-11-26 | Hitachi Ltd | Production of transparent conductive layer |
| US4389238A (en) * | 1978-07-17 | 1983-06-21 | J. T. Baker Chemical Company | Flowable herbicide and pesticide formulation |
| GB2026454B (en) | 1978-07-20 | 1982-07-21 | Bfg Glassgroup | Coating glass with tin oxide |
| US4263335A (en) * | 1978-07-26 | 1981-04-21 | Ppg Industries, Inc. | Airless spray method for depositing electroconductive tin oxide coatings |
| JPS5558363A (en) | 1978-10-20 | 1980-05-01 | Roy Gerald Gordon | Improved tin oxide coat |
| US4235945A (en) * | 1978-12-01 | 1980-11-25 | Ppg Industries, Inc. | High resistivity electroconductive tin oxide films |
| US4254046A (en) * | 1979-02-05 | 1981-03-03 | Ppg Industries, Inc. | Method for making dimethyltin difluoride |
| CH628600A5 (fr) * | 1979-02-14 | 1982-03-15 | Siv Soc Italiana Vetro | Procede pour deposer en continu, sur la surface d'un substrat porte a haute temperature, une couche d'une matiere solide et installation pour la mise en oeuvre de ce procede. |
| US4329699A (en) * | 1979-03-26 | 1982-05-11 | Matsushita Electric Industrial Co., Ltd. | Semiconductor device and method of manufacturing the same |
| US4325987A (en) * | 1979-07-31 | 1982-04-20 | Societa Italiana Vetro-Siv-S.P.A. | Process for the production of an electrically conducting article |
| JPS5627154A (en) * | 1979-08-10 | 1981-03-16 | Canon Inc | Electrophotographic receptor |
| DE3001125A1 (de) * | 1980-01-14 | 1981-07-16 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur herstellung einer fluessigkristallanzeige |
| IT1143302B (it) | 1980-01-31 | 1986-10-22 | Bfg Glassgroup | Procedimento e dispositivo per ricoprire il vetro |
| IT1143300B (it) * | 1980-01-31 | 1986-10-22 | Bfg Glassgroup | Procedimento e dispositivo per ricoprire il vetro |
| GB2068936A (en) | 1980-01-31 | 1981-08-19 | Bfg Glassgroup | Coating hot glass with metals or metal compounds, especially oxides |
| GB2068934B (en) | 1980-01-31 | 1984-04-26 | Bfg Glassgroup | Coating hot glass with metals or metal compounds especially oxides |
| US4419570A (en) * | 1980-03-03 | 1983-12-06 | Societa Italiana Vetro - Siv - S.P.A. | Heating glass pane |
| GB2078213B (en) | 1980-06-19 | 1983-10-26 | Bfg Glassgroup | Forming uniform multiconstituent coatings on glass |
| JPS602650B2 (ja) * | 1980-06-26 | 1985-01-23 | シャープ株式会社 | 液晶セル |
| JPS5720718A (en) * | 1980-07-11 | 1982-02-03 | Toyobo Co Ltd | Polarizing plate with transparent conductive layer |
| DE3029174A1 (de) * | 1980-08-01 | 1982-03-11 | Schering Ag, 1000 Berlin Und 4619 Bergkamen | Monoalkylfluorozinn-verbindungen und ihre herstellung |
| US4325988A (en) * | 1980-08-08 | 1982-04-20 | Ppg Industries, Inc. | Deposition of coatings from fine powder reactants |
| DE3031147A1 (de) * | 1980-08-18 | 1982-03-18 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum herstellen von glas mit einem vorbestimmten brechzahlprofil und alkalifreies glas aus einem oxis eines grundstoffes, das mit einem oder mehreren weiteren stoffen dotiert ist |
| US4329418A (en) * | 1980-11-14 | 1982-05-11 | Lord Corporation | Organometallic semiconductor devices |
| JPS5785866A (en) * | 1980-11-18 | 1982-05-28 | Mitsubishi Metal Corp | Antistatic transparent paint |
| US4336295A (en) * | 1980-12-22 | 1982-06-22 | Eastman Kodak Company | Method of fabricating a transparent metal oxide electrode structure on a solid-state electrooptical device |
| JPS57130303A (en) * | 1981-02-03 | 1982-08-12 | Sharp Kk | Method of producing transparent conductive film |
| FI61983C (fi) * | 1981-02-23 | 1982-10-11 | Lohja Ab Oy | Tunnfilm-elektroluminensstruktur |
| CH640571A5 (fr) * | 1981-03-06 | 1984-01-13 | Battelle Memorial Institute | Procede et dispositif pour deposer sur un substrat une couche de matiere minerale. |
| US4419386A (en) * | 1981-09-14 | 1983-12-06 | Gordon Roy G | Non-iridescent glass structures |
| US4377613A (en) * | 1981-09-14 | 1983-03-22 | Gordon Roy G | Non-iridescent glass structures |
| JPS5865438A (ja) * | 1981-10-15 | 1983-04-19 | Fuji Photo Film Co Ltd | 光導電性組成物およびそれを用いた電子写真感光材料 |
| CH643469A5 (fr) * | 1981-12-22 | 1984-06-15 | Siv Soc Italiana Vetro | Installation pour deposer en continu, sur la surface d'un substrat porte a haute temperature, une couche d'une matiere solide. |
| US4389234A (en) * | 1982-03-18 | 1983-06-21 | M&T Chemicals Inc. | Glass coating hood and method of spray coating glassware |
| US4500264A (en) * | 1982-06-04 | 1985-02-19 | M&T Chemicals Inc. | Air operated diaphragm pump system |
| NO157212C (no) * | 1982-09-21 | 1988-02-10 | Pilkington Brothers Plc | Fremgangsmaate for fremstilling av belegg med lav emisjonsevne. |
| DE3239753C1 (de) * | 1982-10-27 | 1984-03-29 | Dornier System Gmbh, 7990 Friedrichshafen | Farbneutrale,solarselektive Waermereflexionsschicht fuer Glasscheiben und Verfahren zur Herstellung der Schichten |
| US4605565A (en) * | 1982-12-09 | 1986-08-12 | Energy Conversion Devices, Inc. | Method of depositing a highly conductive, highly transmissive film |
| US4500567A (en) * | 1982-12-23 | 1985-02-19 | Nippon Sheet Glass Co., Ltd. | Method for forming tin oxide coating |
| DE3300589A1 (de) * | 1983-01-11 | 1984-07-12 | Schott Glaswerke, 6500 Mainz | Verfahren zur herstellung von indiumoxid-zinnoxid-schichten |
| DE3316548C2 (de) * | 1983-03-25 | 1985-01-17 | Flachglas AG, 8510 Fürth | Verfahren zur Beschichtung eines transparenten Substrates |
| GB2139612B (en) | 1983-05-13 | 1987-03-11 | Glaverbel | Coating a hot vitreous substrate |
| US4530857A (en) * | 1983-05-13 | 1985-07-23 | M&T Chemicals Inc. | Glass container hot end coating formulation and method of use |
| FR2550138B1 (fr) * | 1983-08-04 | 1985-10-11 | Saint Gobain Vitrage | Vitrage a basse emissivite, notamment pour vehicules |
| US4583920A (en) * | 1983-12-28 | 1986-04-22 | M&T Chemicals Inc. | Positive displacement diaphragm pumps employing displacer valves |
| US4731256A (en) * | 1984-04-10 | 1988-03-15 | M&T Chemicals Inc. | Liquid coating composition for producing high quality, high performance fluorine-doped tin oxide coatings |
| US4601917A (en) * | 1985-02-26 | 1986-07-22 | M&T Chemicals Inc. | Liquid coating composition for producing high quality, high performance fluorine-doped tin oxide coatings |
| US4775552A (en) | 1984-04-10 | 1988-10-04 | M&T Chemicals Inc. | Nebulizable coating compositions for producing high quality, high performance fluorine-doped tin oxide coatings |
| US4668268A (en) * | 1984-12-20 | 1987-05-26 | M&T Chemicals Inc. | Coating hood with air flow guide for minimizing deposition of coating compound on finish of containers |
| US4590096A (en) * | 1984-12-28 | 1986-05-20 | M&T Chemicals Inc. | Water vapor, reaction rate and deposition rate control of tin oxide film by CVD on glass |
| IN164438B (zh) | 1984-12-28 | 1989-03-18 | M & T Chemicals Inc | |
| US4743506A (en) * | 1984-12-28 | 1988-05-10 | M&T Chemicals Inc. | Tin oxide coated article |
| US4696837A (en) * | 1985-06-25 | 1987-09-29 | M&T Chemicals Inc. | Chemical vapor deposition method of producing fluorine-doped tin oxide coatings |
| US4547400A (en) * | 1985-02-25 | 1985-10-15 | Ford Motor Company | Method of making infrared reflective glass sheet-I |
| US4548836A (en) * | 1985-02-25 | 1985-10-22 | Ford Motor Company | Method of making an infrared reflective glass sheet-II |
| US4600654A (en) * | 1985-05-14 | 1986-07-15 | M&T Chemicals Inc. | Method of producing transparent, haze-free tin oxide coatings |
| US4737388A (en) * | 1985-05-14 | 1988-04-12 | M&T Chemicals Inc. | Non-iridescent, haze-free infrared reflecting coated glass structures |
| US4575317A (en) | 1985-06-26 | 1986-03-11 | M&T Chemicals Inc. | Constant clearance positive displacement piston pump |
| US4788079A (en) | 1985-10-30 | 1988-11-29 | M&T Chemicals Inc. | Method of making haze-free tin oxide coatings |
| US4726319A (en) * | 1985-10-31 | 1988-02-23 | M&T Chemicals Inc | Apparatus and method for coating optical fibers |
| US5122394A (en) | 1985-12-23 | 1992-06-16 | Atochem North America, Inc. | Apparatus for coating a substrate |
| US4928627A (en) | 1985-12-23 | 1990-05-29 | Atochem North America, Inc. | Apparatus for coating a substrate |
| JPH0651909B2 (ja) * | 1985-12-28 | 1994-07-06 | キヤノン株式会社 | 薄膜多層構造の形成方法 |
| US4731462A (en) * | 1986-07-18 | 1988-03-15 | M&T Chemicals Inc. | Organotin compounds containing fluorine useful for forming fluorine-doped tin oxide coating |
| US4857095A (en) | 1987-08-10 | 1989-08-15 | Ford Motor Company | Method for forming a fluorine-doped tin oxide coating on a glass substrate |
| US4853257A (en) | 1987-09-30 | 1989-08-01 | Ppg Industries, Inc. | Chemical vapor deposition of tin oxide on float glass in the tin bath |
| US4863358A (en) | 1988-05-14 | 1989-09-05 | M&T Chemicals Inc. | Submersible positive displacement piston pump |
| US5102691A (en) | 1989-09-20 | 1992-04-07 | Atochem North America, Inc. | Method of pretreatment for the high-deposition-rate production of fluorine-doped tin-oxide coatings having reduced bulk resistivities and emissivities |
| US5140940A (en) | 1991-01-08 | 1992-08-25 | Atochem North America, Inc. | Apparatus for depositing a metal-oxide coating on glass articles |
-
1996
- 1996-05-06 US US08/642,921 patent/US5698262A/en not_active Expired - Lifetime
-
1997
- 1997-05-06 DE DE69709525T patent/DE69709525T2/de not_active Expired - Lifetime
- 1997-05-06 EP EP97922673A patent/EP0839218B1/en not_active Expired - Lifetime
- 1997-05-06 KR KR1019980700025A patent/KR100577945B1/ko not_active IP Right Cessation
- 1997-05-06 RU RU98102125/02A patent/RU2194089C2/ru active
- 1997-05-06 AU AU28281/97A patent/AU2828197A/en not_active Abandoned
- 1997-05-06 PL PL97324429A patent/PL185373B1/pl not_active IP Right Cessation
- 1997-05-06 BR BR9702244A patent/BR9702244A/pt unknown
- 1997-05-06 AT AT97922673T patent/ATE211779T1/de active
- 1997-05-06 CN CN97190763A patent/CN1122115C/zh not_active Expired - Lifetime
- 1997-05-06 CA CA002225961A patent/CA2225961A1/en not_active Abandoned
- 1997-05-06 JP JP54012997A patent/JP4322314B2/ja not_active Expired - Lifetime
- 1997-05-06 WO PCT/US1997/007597 patent/WO1997042357A1/en active IP Right Grant
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4329379A (en) * | 1978-10-19 | 1982-05-11 | Bfg Glassgroup | Process for forming tin oxide glass coating |
| US4293594A (en) * | 1980-08-22 | 1981-10-06 | Westinghouse Electric Corp. | Method for forming conductive, transparent coating on a substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0839218A4 (zh) | 1998-06-03 |
| KR19990028727A (ko) | 1999-04-15 |
| JP4322314B2 (ja) | 2009-08-26 |
| DE69709525D1 (de) | 2002-02-14 |
| AU2828197A (en) | 1997-11-26 |
| CN1196760A (zh) | 1998-10-21 |
| MX9800254A (es) | 1998-07-31 |
| EP0839218A1 (en) | 1998-05-06 |
| DE69709525T2 (de) | 2002-08-29 |
| EP0839218B1 (en) | 2002-01-09 |
| BR9702244A (pt) | 1999-02-17 |
| JPH11509895A (ja) | 1999-08-31 |
| CA2225961A1 (en) | 1997-11-13 |
| PL185373B1 (pl) | 2003-04-30 |
| PL324429A1 (en) | 1998-05-25 |
| KR100577945B1 (ko) | 2006-08-30 |
| US5698262A (en) | 1997-12-16 |
| WO1997042357A1 (en) | 1997-11-13 |
| RU2194089C2 (ru) | 2002-12-10 |
| ATE211779T1 (de) | 2002-01-15 |
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