CN107785384B - 光电转换装置和照相机 - Google Patents
光电转换装置和照相机 Download PDFInfo
- Publication number
- CN107785384B CN107785384B CN201710720826.9A CN201710720826A CN107785384B CN 107785384 B CN107785384 B CN 107785384B CN 201710720826 A CN201710720826 A CN 201710720826A CN 107785384 B CN107785384 B CN 107785384B
- Authority
- CN
- China
- Prior art keywords
- photoelectric conversion
- microlens array
- conversion device
- refractive index
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000006243 chemical reaction Methods 0.000 title claims abstract description 205
- 239000000758 substrate Substances 0.000 claims abstract description 56
- 230000005540 biological transmission Effects 0.000 claims abstract description 11
- 239000004065 semiconductor Substances 0.000 claims description 24
- 239000000945 filler Substances 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 15
- 229920005989 resin Polymers 0.000 claims description 14
- 239000011347 resin Substances 0.000 claims description 14
- 239000011368 organic material Substances 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 239000004568 cement Substances 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 claims 1
- 238000003466 welding Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 description 134
- 230000002093 peripheral effect Effects 0.000 description 19
- 238000002161 passivation Methods 0.000 description 14
- 238000005304 joining Methods 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 8
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- 239000007767 bonding agent Substances 0.000 description 5
- 239000011229 interlayer Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 238000011049 filling Methods 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 229910010272 inorganic material Inorganic materials 0.000 description 3
- 239000011147 inorganic material Substances 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 238000003491 array Methods 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/10—Cameras or camera modules comprising electronic image sensors; Control thereof for generating image signals from different wavelengths
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
- H10F39/026—Wafer-level processing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
- H10F39/182—Colour image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/805—Coatings
- H10F39/8053—Colour filters
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/806—Optical elements or arrangements associated with the image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/806—Optical elements or arrangements associated with the image sensors
- H10F39/8063—Microlenses
Landscapes
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016165072A JP6818468B2 (ja) | 2016-08-25 | 2016-08-25 | 光電変換装置及びカメラ |
| JP2016-165072 | 2016-08-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107785384A CN107785384A (zh) | 2018-03-09 |
| CN107785384B true CN107785384B (zh) | 2021-11-12 |
Family
ID=61243502
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710720826.9A Active CN107785384B (zh) | 2016-08-25 | 2017-08-22 | 光电转换装置和照相机 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US10497732B2 (enExample) |
| JP (1) | JP6818468B2 (enExample) |
| CN (1) | CN107785384B (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11069729B2 (en) | 2018-05-01 | 2021-07-20 | Canon Kabushiki Kaisha | Photoelectric conversion device, and equipment |
| JP2020031136A (ja) | 2018-08-22 | 2020-02-27 | キヤノン株式会社 | 撮像装置およびカメラ |
| JP7303698B2 (ja) * | 2019-08-08 | 2023-07-05 | キヤノン株式会社 | 半導体装置および機器 |
| JP7562250B2 (ja) * | 2019-12-04 | 2024-10-07 | ソニーセミコンダクタソリューションズ株式会社 | 半導体素子および電子機器 |
| CN211857087U (zh) * | 2020-02-24 | 2020-11-03 | 宁波激智科技股份有限公司 | 一种减干涉准直膜 |
| JP7503399B2 (ja) * | 2020-03-16 | 2024-06-20 | ソニーセミコンダクタソリューションズ株式会社 | 固体撮像装置及びその製造方法、並びに電子機器 |
| US11257858B2 (en) * | 2020-04-28 | 2022-02-22 | Himax Technologies Limited | Method of fabricating a sensor device |
| JP2022150746A (ja) * | 2021-03-26 | 2022-10-07 | ソニーセミコンダクタソリューションズ株式会社 | 半導体チップおよびその製造方法、半導体装置およびその製造方法、並びに電子機器 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1910754A (zh) * | 2004-02-03 | 2007-02-07 | 松下电器产业株式会社 | 固体摄像装置及其制造方法以及照相机 |
Family Cites Families (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2887210B2 (ja) * | 1991-02-12 | 1999-04-26 | 株式会社クラレ | 撮像装置 |
| JPH09261519A (ja) * | 1996-03-22 | 1997-10-03 | Canon Inc | 撮像装置 |
| JP2000164836A (ja) * | 1998-11-25 | 2000-06-16 | Nikon Corp | 固体撮像装置等の半導体装置の製造方法 |
| JP4838501B2 (ja) * | 2004-06-15 | 2011-12-14 | 富士通セミコンダクター株式会社 | 撮像装置及びその製造方法 |
| JP4629473B2 (ja) * | 2005-03-25 | 2011-02-09 | 大日本印刷株式会社 | 固体撮像素子の製造方法 |
| CN1901215A (zh) | 2005-07-20 | 2007-01-24 | 松下电器产业株式会社 | 固体摄像装置及其制造方法 |
| JP4469781B2 (ja) | 2005-07-20 | 2010-05-26 | パナソニック株式会社 | 固体撮像装置及びその製造方法 |
| JP4794283B2 (ja) | 2005-11-18 | 2011-10-19 | パナソニック株式会社 | 固体撮像装置 |
| KR100790225B1 (ko) * | 2005-12-26 | 2008-01-02 | 매그나칩 반도체 유한회사 | 이미지 센서 및 그 제조 방법 |
| JP4110192B1 (ja) | 2007-02-23 | 2008-07-02 | キヤノン株式会社 | 光電変換装置及び光電変換装置を用いた撮像システム |
| JP2009016405A (ja) | 2007-06-30 | 2009-01-22 | Zycube:Kk | 固体撮像装置 |
| JP2009016574A (ja) | 2007-07-04 | 2009-01-22 | Panasonic Corp | 固体撮像装置およびその製造方法 |
| JP2009064839A (ja) | 2007-09-04 | 2009-03-26 | Panasonic Corp | 光学デバイス及びその製造方法 |
| JP2009260269A (ja) | 2008-03-18 | 2009-11-05 | Panasonic Corp | 光学デバイス及びその製造方法 |
| JP2010034313A (ja) | 2008-07-29 | 2010-02-12 | Panasonic Corp | 半導体装置及びそれを用いた電子機器 |
| JP2010040621A (ja) * | 2008-08-01 | 2010-02-18 | Toshiba Corp | 固体撮像デバイス及びその製造方法 |
| JP5185019B2 (ja) | 2008-08-25 | 2013-04-17 | パナソニック株式会社 | 半導体装置及びそれを用いた電子機器 |
| JP2010073819A (ja) | 2008-09-17 | 2010-04-02 | Canon Inc | 光電変換装置及び撮像システム |
| JP5511180B2 (ja) * | 2008-12-19 | 2014-06-04 | キヤノン株式会社 | 固体撮像装置の製造方法及び固体撮像装置 |
| JP2010186870A (ja) * | 2009-02-12 | 2010-08-26 | Toshiba Corp | 半導体装置 |
| JP5434252B2 (ja) * | 2009-05-14 | 2014-03-05 | ソニー株式会社 | 固体撮像装置、および、その製造方法、電子機器 |
| JP2011146633A (ja) * | 2010-01-18 | 2011-07-28 | Sony Corp | 固体撮像素子の製造方法 |
| JP5694670B2 (ja) * | 2010-02-05 | 2015-04-01 | キヤノン株式会社 | 固体撮像装置およびその製造方法 |
| EP2927716A4 (en) * | 2012-11-30 | 2015-12-30 | Fujifilm Corp | HARDENABLE RESIN COMPOSITION AND IMAGE SENSOR PREPARATION METHOD AND PICTOR SENSOR THEREWITH |
| JP6103947B2 (ja) | 2013-01-16 | 2017-03-29 | キヤノン株式会社 | 固体撮像装置及びその製造方法 |
| CN105144385B (zh) * | 2013-04-26 | 2018-06-29 | 奥林巴斯株式会社 | 摄像装置 |
| JP6270335B2 (ja) * | 2013-04-26 | 2018-01-31 | オリンパス株式会社 | 撮像装置 |
| KR102149772B1 (ko) * | 2013-11-14 | 2020-08-31 | 삼성전자주식회사 | 이미지 센서 및 이를 제조하는 방법 |
| JP6299406B2 (ja) | 2013-12-19 | 2018-03-28 | ソニー株式会社 | 半導体装置、半導体装置の製造方法、及び電子機器 |
| JP6300029B2 (ja) * | 2014-01-27 | 2018-03-28 | ソニー株式会社 | 撮像素子、製造装置、製造方法 |
| KR102055840B1 (ko) * | 2014-02-20 | 2019-12-17 | 삼성전자 주식회사 | 이미지 센서 패키지 |
| JP6315262B2 (ja) | 2014-06-12 | 2018-04-25 | ソニー株式会社 | 固体撮像素子、固体撮像素子の製造方法、及び、撮像装置 |
| JP2016115706A (ja) | 2014-12-11 | 2016-06-23 | 株式会社東芝 | 固体撮像装置および固体撮像装置の製造方法 |
-
2016
- 2016-08-25 JP JP2016165072A patent/JP6818468B2/ja active Active
-
2017
- 2017-08-01 US US15/665,561 patent/US10497732B2/en active Active
- 2017-08-22 CN CN201710720826.9A patent/CN107785384B/zh active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1910754A (zh) * | 2004-02-03 | 2007-02-07 | 松下电器产业株式会社 | 固体摄像装置及其制造方法以及照相机 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20180061879A1 (en) | 2018-03-01 |
| US10497732B2 (en) | 2019-12-03 |
| JP2018032792A (ja) | 2018-03-01 |
| JP6818468B2 (ja) | 2021-01-20 |
| CN107785384A (zh) | 2018-03-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN107785384B (zh) | 光电转换装置和照相机 | |
| CN107919371B (zh) | 光电转换装置和系统 | |
| US7064405B2 (en) | Solid state imaging device with inner lens and manufacture thereof | |
| KR101653834B1 (ko) | 반도체 장치 | |
| US10170511B1 (en) | Solid-state imaging devices having a microlens layer with dummy structures | |
| US9177981B2 (en) | Solid-state imaging device having a metallic pad periphery guard ring | |
| CN102136486B (zh) | 半导体封装件 | |
| TWI677995B (zh) | 半導體影像感測器及其形成方法 | |
| JP2011146486A (ja) | 光学デバイスおよびその製造方法ならびに電子機器 | |
| US8232131B2 (en) | Image sensor module and method of manufacturing the same | |
| JP2019160847A (ja) | 固体撮像装置および固体撮像素子 | |
| CN102683359B (zh) | 固体摄像装置、其制造方法、电子设备和半导体装置 | |
| JP2009176949A (ja) | 裏面照射型固体撮像装置及びその製造方法 | |
| CN117641963A (zh) | 包括具有与栅极电极相同材料的着陆结构的图像传感器 | |
| JP2013175540A (ja) | 固体撮像装置および固体撮像装置の製造方法 | |
| CN114566513A (zh) | 图像传感器 | |
| US20220231064A1 (en) | Image sensor with multiple color filters | |
| KR102897588B1 (ko) | 이미지 센서 | |
| US20220231063A1 (en) | Image sensor | |
| JP2013161873A (ja) | 固体撮像装置及びカメラモジュール | |
| WO2015125443A1 (ja) | 受光デバイスおよびその製造方法 | |
| CN118471993A (zh) | 图像传感器及其制造方法 | |
| CN118743238A (zh) | 短波红外线和可见光组合传感器 | |
| JP2010153635A (ja) | 半導体装置及びその製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |