CN106206232B - 基板处理装置 - Google Patents

基板处理装置 Download PDF

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Publication number
CN106206232B
CN106206232B CN201510315762.5A CN201510315762A CN106206232B CN 106206232 B CN106206232 B CN 106206232B CN 201510315762 A CN201510315762 A CN 201510315762A CN 106206232 B CN106206232 B CN 106206232B
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substrate
support
supports
lock chamber
chamber
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CN106206232A (zh
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小野田正敏
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NINSSIN ION EQUIPMENT CO Ltd
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NINSSIN ION EQUIPMENT CO Ltd
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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Health & Medical Sciences (AREA)
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CN201510315762.5A 2014-09-19 2015-06-10 基板处理装置 Active CN106206232B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014-191994 2014-09-19
JP2014191994A JP6086254B2 (ja) 2014-09-19 2014-09-19 基板処理装置

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CN106206232A CN106206232A (zh) 2016-12-07
CN106206232B true CN106206232B (zh) 2017-10-13

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CN201510315762.5A Active CN106206232B (zh) 2014-09-19 2015-06-10 基板处理装置

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JP (1) JP6086254B2 (ja)
KR (1) KR101885124B1 (ja)
CN (1) CN106206232B (ja)
TW (1) TWI582888B (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112239069A (zh) * 2019-07-19 2021-01-19 亚智科技股份有限公司 牙叉式基板运输装置及其方法
JP7163944B2 (ja) * 2020-09-15 2022-11-01 日新イオン機器株式会社 基板保持装置およびイオン注入装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1568379A (zh) * 2001-10-12 2005-01-19 尤纳克西斯巴尔策斯公司 器件的制造方法和超高真空cvd反应器
CN101226878A (zh) * 2007-01-15 2008-07-23 大日本网目版制造株式会社 基板处理装置以及基板处理方法
CN101894779A (zh) * 2003-08-29 2010-11-24 交叉自动控制公司 用于半导体处理的方法和装置
TW201351547A (zh) * 2012-06-15 2013-12-16 Dainippon Screen Mfg 基板翻轉裝置及基板處理裝置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63175326A (ja) * 1987-01-14 1988-07-19 Nissin Electric Co Ltd イオン処理装置
JP3239779B2 (ja) * 1996-10-29 2001-12-17 日新電機株式会社 基板処理装置および基板処理方法
KR19980033262U (ko) * 1996-12-06 1998-09-05 박병재 자동차 프론트사이드멤버 보강구조
JP4083306B2 (ja) * 1998-08-28 2008-04-30 松下電器産業株式会社 プラズマ処理後におけるリンス方法
US8668422B2 (en) * 2004-08-17 2014-03-11 Mattson Technology, Inc. Low cost high throughput processing platform
JP4020124B2 (ja) * 2005-02-25 2007-12-12 日新イオン機器株式会社 イオンビーム照射装置
DE102007052182B4 (de) * 2007-10-31 2009-07-02 Grenzebach Maschinenbau Gmbh Vorrichtung und Verfahren zum Umsetzen stoßempfindlicher Glasplatten in Reinsträumen
JP5423205B2 (ja) * 2008-08-29 2014-02-19 東京エレクトロン株式会社 成膜装置
JP5037551B2 (ja) * 2009-03-24 2012-09-26 東京エレクトロン株式会社 基板交換機構及び基板交換方法
JP4766156B2 (ja) * 2009-06-11 2011-09-07 日新イオン機器株式会社 イオン注入装置
WO2011007753A1 (ja) * 2009-07-14 2011-01-20 キヤノンアネルバ株式会社 基板処理装置
JP5525399B2 (ja) * 2010-09-16 2014-06-18 東京エレクトロン株式会社 搬送装置、基板処理システム及び姿勢制御機構
JP5387622B2 (ja) * 2011-06-17 2014-01-15 株式会社安川電機 搬送ロボット
JP2013069874A (ja) * 2011-09-22 2013-04-18 Tokyo Electron Ltd 基板処理システム、基板搬送方法、プログラム及びコンピュータ記憶媒体
JP6094256B2 (ja) * 2013-02-22 2017-03-15 日新イオン機器株式会社 イオンビーム照射装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1568379A (zh) * 2001-10-12 2005-01-19 尤纳克西斯巴尔策斯公司 器件的制造方法和超高真空cvd反应器
CN101894779A (zh) * 2003-08-29 2010-11-24 交叉自动控制公司 用于半导体处理的方法和装置
CN101226878A (zh) * 2007-01-15 2008-07-23 大日本网目版制造株式会社 基板处理装置以及基板处理方法
TW201351547A (zh) * 2012-06-15 2013-12-16 Dainippon Screen Mfg 基板翻轉裝置及基板處理裝置

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Publication number Publication date
KR20160034178A (ko) 2016-03-29
KR101885124B1 (ko) 2018-08-03
JP2016063166A (ja) 2016-04-25
TW201613022A (en) 2016-04-01
JP6086254B2 (ja) 2017-03-01
TWI582888B (zh) 2017-05-11
CN106206232A (zh) 2016-12-07

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