CN106086787B - Ti-TiN+MoS2/Ti叠层复合涂层刀具及其制备工艺 - Google Patents

Ti-TiN+MoS2/Ti叠层复合涂层刀具及其制备工艺 Download PDF

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CN106086787B
CN106086787B CN201610422788.4A CN201610422788A CN106086787B CN 106086787 B CN106086787 B CN 106086787B CN 201610422788 A CN201610422788 A CN 201610422788A CN 106086787 B CN106086787 B CN 106086787B
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tin
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宋文龙
邓建新
郭宗新
张璇
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GUANGDONG INWIN INDUSTRIAL GROUP Co Ltd
YANGJIANG YINYING KITCHEN PRODUCTS Co Ltd
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Yangjiang Inwin Kitchen Supplies Co ltd
Guangdong Inwin Industrial Group Co ltd
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Abstract

本发明属于机械制造金属切削刀具领域，特别是涉及一种Ti‑TiN+MoS2/Ti叠层复合涂层刀具及其制备工艺。Ti‑TiN+MoS2/Ti叠层复合涂层刀具，刀具基体材料为硬质合金或高速钢，刀具表面为MoS2/Ti润滑涂层，且由基体到涂层表面依次为：Ti过渡层、TiN硬质涂层和MoS2/Ti润滑涂层交替的叠层结构。该Ti‑TiN+MoS2/Ti叠层复合涂层刀具兼顾了TiN硬质涂层、MoS2/Ti润滑涂层和叠层结构的特点，可以保持涂层较高硬度的同时降低涂层的摩擦系数，且叠层结构可使涂层刀具在涂层使用寿命周期中始终保持良好的减摩润滑性，延长润滑涂层的使用周期。

Description

Ti-TiN+MoS2/Ti叠层复合涂层刀具及其制备工艺
技术领域
本发明属于机械制造金属切削刀具领域，特别是涉及一种Ti-TiN+MoS2/Ti叠层复合涂层刀具及其制备工艺。
背景技术
对刀具进行涂层处理是提高刀具性能的重要途径之一。涂层刀具将刀具基体与硬质涂层相结合，使刀具性能大大提高。根据涂层材料的性质，涂层刀具可分为两大类，即：“硬质”涂层刀具和“润滑”涂层刀具。“硬质”涂层刀具其主要优点是硬度高、耐磨性能好，典型的“硬质”涂层材料有TiN、TiCN、TiAlN和类金刚石等。“润滑”涂层刀具追求的目标是低摩擦系数，典型的“润滑”涂层材料为具有低摩擦系数的固体润滑材料(如：MoS2、WS2、TaS2等硫化物)。
目前，硬质涂层刀具技术已经逐渐成熟，应用较为广泛。然而，诸如航空航天工业使用的许多高强度铝合金、钛合金或贵金属材料等不适合用硬质涂层刀具加工，仍主要使用无涂层的高速钢或硬质合金刀具。润滑涂层刀具的开发则可较好地解决此类材料的加工问题。中国专利(专利号ZL 200610068975.3)报道了“自润滑复合软涂层刀具及其制备方法”，它是采用中频磁控+多弧法镀膜方法制备的MoS2/Zr/Ti复合涂层刀具，刀具表面为MoS2层，MoS2层与刀具基体之间具有Ti、MoS2/Zr/Ti和MoS2/Zr过渡层，但是这种润滑涂层硬度较低而导致刀具涂层的耐磨性较差。
中国专利(专利号ZL201310026859.5)报道了“一种基体表面高硬度低磨损的MoS2复合薄膜的制备方法”，通过采用高功率脉冲磁控溅射技术沉积金属Ti打底层、TiN过渡层及 Ti/MoS2复合薄膜制备了Ti-TiN-Ti/MoS2复合薄膜，但是表面的Ti/MoS2涂层磨损后润滑性能将失效，润滑涂层寿命仍有待提高。
中国专利(专利号ZL200910193490.0)报道了“一种自润滑硬质纳米复合多层涂层及其制备方法”，它是在硬质合金或钢铁基体上，采用蒸发反应与溅射反应沉积的TiN-TiCN+MoS2复合涂层或TiN-TiAlN+MoS2复合涂层，MoS2涂层的加入降低了TiCN和TiAlN硬质涂层的硬度，但表层MoS2涂层磨损后涂层刀具摩擦系数将增加。
中国专利TiN+MoS2/Zr组合涂层刀具(专利号ZL 201110081977.7)采用中频磁控溅射与电弧镀复合镀膜方法制备的TiN+MoS2/Zr组合涂层刀具，但该组合涂层在干切削难加工材料时刀具表面的MoS2/Zr涂层磨损后刀具的摩擦磨损特性恶化，刀具前刀面摩擦增加。
层状复合材料是近几年发展起来的材料增强增韧新技术，这种结构是通过模仿贝壳而来，因此又叫仿生叠层复合材料。自然界中贝壳的珍珠层是一种天然的层状结构材料，其断裂韧性却比普通单一均质结构高出3000倍以上。因此，通过模仿生物材料结构形式的层间设计，制备出的叠层复合涂层可以显著提高涂层的韧性、结合强度及减摩耐磨性等综合性能。
发明内容
本发明的目的在于克服目前现有涂层刀具技术的不足，结合多层结构的优点提供一种 Ti-TiN+MoS2/Ti叠层复合涂层刀具及其制备工艺。
本发明是通过以下方式实现的：
Ti-TiN+MoS2/Ti叠层复合涂层刀具，刀具基体材料为硬质合金或高速钢，刀具表面为 MoS2/Ti润滑涂层，且由基体到涂层表面依次为：Ti过渡层、TiN硬质涂层和MoS2/Ti润滑涂层交替的叠层结构。
Ti-TiN+MoS2/Ti叠层复合涂层刀具的制备工艺，沉积方式为使用两个Ti电弧靶，两个 MoS2中频溅射靶，首先采用电弧离子镀沉积30～40nm的Ti过渡层，然后电弧离子镀+中频磁控溅射交替沉积厚度为30～40nm的TiN硬质涂层(电弧离子镀)和厚度为10～20nm的MoS2/Ti润滑涂层(中频磁控溅射)，最后表面为MoS2/Ti润滑涂层。
具体包括以下步骤：
1)前处理：将刀具基体表面抛光，去除表面杂质，然后依次放入酒精和丙酮中，超声清洗，经干燥后迅速放入镀膜机，抽真空至5.0×10-3Pa，加热至300℃，保温30～40min；
2)离子清洗：通Ar气，其压力为1.5Pa，开启偏压电源，电压1000V，占空比0.2，辉光放电清洗15min；降低偏压至700V/0.2，开启离子源离子清洗20min，开启Ti靶的电弧源，偏压500V，靶电流50A，离子轰击Ti靶2min；
3)沉积Ti过渡层：调整Ar气压0.5～0.6Pa，偏压降至250V，沉积温度250℃，Ti靶电流80A，电弧镀Ti过渡层2～3min；
4)沉积TiN硬质涂层：Ar气压0.5Pa，偏压200V，Ti靶的靶电流100A；开启N2，N2气压0.8Pa，沉积温度200～220℃，电弧镀TiN硬质涂层2.5min；
5)沉积MoS2/Ti润滑涂层：关闭N2，Ti靶电流70A，偏压180V，沉积温度220～240℃，开启MoS2靶中频磁控溅射电源，电流1.5A，复合沉积MoS2/Ti润滑涂层2.5min；
6)沉积TiN硬质涂层：开启N2，重复4)；
7)沉积MoS2/Ti润滑涂层：关闭N2，重复5)；
8)重复6)、7)、6)…：交替沉积TiN、MoS2/Ti…TiN涂层共80min；
9)沉积MoS2/Ti润滑涂层：关闭N2，Ti靶电流70A，偏压180V，沉积温度220～240℃，开启MoS2靶中频磁控溅射电源，电流1.5A，复合沉积MoS2/Ti润滑涂层3min；
10)后处理：关闭各电源、离子源及气体源，涂层结束。
与现有技术相比，本发明具有如下技术效果：
本发明采用电弧离子镀与磁控溅射共沉积的复合沉积方法，以提高涂层沉积质量和效率。通过上述工艺制备的Ti-TiN+MoS2/Ti叠层复合涂层刀具，刀具表面为MoS2/Ti润滑涂层，刀具基体与涂层间有Ti过渡层，以减小残余应力，增加涂层与刀具基体间的结合强度。该 Ti-TiN+MoS2/Ti叠层复合涂层刀具兼顾了TiN硬质涂层、MoS2/Ti润滑涂层和叠层结构的特点，可以保持涂层较高硬度的同时降低涂层的摩擦系数，且叠层结构可使涂层刀具在涂层使用寿命周期中始终保持良好的减摩润滑性，延长润滑涂层的使用周期。另外，叠层结构通过不同材料结构和成分组成的层间界面可以消耗受到的外部能量，降低应力集中，减缓涂层的过早剥落和裂纹的扩展。用这种叠层复合涂层刀具进行切削时，可以降低刀具的磨损10-15％，延长刀具的使用寿命20-25％，提高涂层刀具的切削性能。该Ti-TiN+MoS2/Ti叠层复合涂层刀具可应用于各种材料的干切削加工。
附图说明
图1为本发明Ti-TiN+MoS2/Ti叠层复合涂层刀具的涂层结构示意图。
图中：1为刀具基体、2为Ti过渡层、3为TiN硬质涂层、4为MoS2/Ti和TiN交替的叠层涂层、5为MoS2/Ti润滑涂层。
具体实施方式
下面给出本发明的最佳实施例：
实施例1
如图1所示，一种Ti-TiN+MoS2/Ti叠层复合涂层刀具，该刀具为普通的铣刀片，其基体材料为：硬质合金YT15；涂层材料为：TiN和MoS2/Ti；沉积方式为：电弧离子镀与磁控溅射共沉积的复合沉积方法，首先电弧离子镀沉积约30～40nm的Ti过渡层，然后交替沉积厚度约为30～40nm的TiN涂层(电弧离子镀)和厚度约为10～20nm的MoS2/Ti涂层(中频磁控溅射)，最后表面为MoS2/Ti润滑涂层(沉积时使用两个Ti电弧靶；两个MoS2中频溅射靶)，其制备工艺为：
1)前处理：将硬质合金YT15刀具基体表面抛光，去除表面油污、锈迹等杂质，然后依次放入酒精和丙酮中，超声清洗各25min，去除刀具表面油污和其它附着物，电吹风干燥充分后迅速放入镀膜机，抽真空至5.0×10-3Pa，加热至300℃，保温30～40min；
2)离子清洗：通Ar气，其压力为1.5Pa，开启偏压电源，电压1000V，占空比0.2，辉光放电清洗15min；降低偏压至700V/0.2，开启离子源离子清洗20min，开启Ti靶的电弧源，偏压500V，靶电流50A，离子轰击Ti靶2min；
3)沉积Ti过渡层：调整Ar气压0.5～0.6Pa，偏压降至250V，沉积温度250℃，Ti靶电流80A，电弧镀Ti过渡层2～3min；
4)沉积TiN硬质涂层：Ar气压0.5Pa，偏压200V，Ti靶的靶电流100A；开启N2，N2气压0.8Pa，沉积温度200～220℃，电弧镀TiN层2.5min；
5)沉积MoS2/Ti润滑涂层：关闭N2，Ti靶电流70A，偏压180V，沉积温度220～240℃，开启MoS2靶中频磁控溅射电源，电流1.5A，复合沉积MoS2/Ti层2.5min；
6)沉积TiN硬质涂层：开启N2，重复4)；
7)沉积MoS2/Ti润滑涂层：关闭N2，重复5)；
8)重复6)、7)、6)…：交替沉积TiN、MoS2/Ti…TiN涂层共80min；
9)沉积MoS2/Ti润滑涂层：关闭N2，Ti靶电流70A，偏压180V，沉积温度220～240℃，开启MoS2靶中频磁控溅射电源，电流1.5A，复合沉积MoS2/Ti层3min；
10)后处理：关闭各电源、离子源及气体源，涂层结束。
实施例2
如图1所示，一种Ti-TiN+MoS2/Ti叠层复合涂层刀具，该刀具为普通麻花钻，其基体材料为：高速钢W18Cr4V；涂层材料为：TiN和MoS2/Ti；沉积方式为：电弧离子镀与磁控溅射共沉积的复合沉积方法，首先电弧离子镀沉积约30～40nm的Ti过渡层，然后交替沉积厚度约为30～40nm的TiN涂层(电弧离子镀)和厚度约为10～20nm的MoS2/Ti涂层(中频磁控溅射)，最后表面为MoS2/Ti润滑涂层(沉积时使用两个Ti电弧靶；两个MoS2中频溅射靶)，其制备工艺为：
1)前处理：将麻花钻刀具基体表面用1000号砂纸打磨，去除表面油污、锈迹等杂质，然后依次放入酒精和丙酮中，超声清洗各25min，去除刀具表面油污和其它附着物，电吹风干燥充分后迅速放入镀膜机，抽真空至5.0×10-3Pa，加热至300℃，保温30～40min；
2)离子清洗：通Ar气，其压力为1.5Pa，开启偏压电源，电压1000V，占空比0.2，辉光放电清洗15min；降低偏压至700V/0.2，开启离子源离子清洗20min，开启Ti靶的电弧源，偏压500V，靶电流50A，离子轰击Ti靶2min；
3)沉积Ti过渡层：调整Ar气压0.5～0.6Pa，偏压降至250V，沉积温度250℃，Ti靶电流80A，电弧镀Ti过渡层2～3min；
4)沉积TiN硬质涂层：Ar气压0.5Pa，偏压200V，Ti靶的靶电流100A；开启N2，N2气压0.8Pa，沉积温度200～220℃，电弧镀TiN层2.5min；
5)沉积MoS2/Ti润滑涂层：关闭N2，Ti靶电流70A，偏压180V，沉积温度220～240℃，开启MoS2靶中频磁控溅射电源，电流1.5A，复合沉积MoS2/Ti层2.5min；
6)沉积TiN硬质涂层：开启N2，重复4)；
7)沉积MoS2/Ti润滑涂层：关闭N2，重复5)；
8)重复6)、7)、6)…：交替沉积TiN、MoS2/Ti…TiN涂层共80min；
9)沉积MoS2/Ti润滑涂层：关闭N2，Ti靶电流70A，偏压180V，沉积温度220～240℃，开启MoS2靶中频磁控溅射电源，电流1.5A，复合沉积MoS2/Ti层3min；
10)后处理：关闭各电源、离子源及气体源，涂层结束。

Claims (1)

1.一种Ti-TiN+MoS2/Ti叠层复合涂层刀具的制备工艺，刀具基体材料为硬质合金或高速钢，刀具表面为MoS2/Ti润滑涂层，且由基体到涂层表面依次为：Ti过渡层、TiN硬质涂层和MoS2/Ti润滑涂层交替的叠层结构；其特征在于，沉积方式为使用两个Ti电弧靶，两个MoS2中频溅射靶，首先采用电弧离子镀沉积30～40nm的Ti过渡层，然后电弧离子镀+中频磁控溅射交替沉积厚度为30～40nm的TiN硬质涂层和厚度为10～20nm的MoS2/Ti润滑涂层，最后表面为MoS2/Ti润滑涂层；具体包括以下步骤：
1)前处理：将刀具基体表面抛光，去除表面杂质，然后依次放入酒精和丙酮中，超声清洗，经干燥后迅速放入镀膜机，抽真空至5.0×10-3Pa，加热至300℃，保温30～40min；
2)离子清洗：通Ar气，其压力为1.5Pa，开启偏压电源，电压1000V，占空比0.2，辉光放电清洗15min；降低偏压至700V/0.2，开启离子源离子清洗20min，开启Ti靶的电弧源，偏压500V，靶电流50A，离子轰击Ti靶2min；
3)沉积Ti过渡层：调整Ar气压0.5～0.6Pa，偏压降至250V，沉积温度250℃，Ti靶电流80A，电弧镀Ti过渡层2～3min；
4)沉积TiN硬质涂层：Ar气压0.5Pa，偏压200V，Ti靶的靶电流100A；开启N2，N2气压0.8Pa，沉积温度200～220℃，电弧镀TiN硬质涂层2.5min；
5)沉积MoS2/Ti润滑涂层：关闭N2，Ti靶电流70A，偏压180V，沉积温度220～240℃，开启MoS2靶中频磁控溅射电源，电流1.5A，复合沉积MoS2/Ti润滑涂层2.5min；
6)沉积TiN硬质涂层：开启N2，重复4)；
7)沉积MoS2/Ti润滑涂层：关闭N2，重复5)；
8)重复6)、7)、6)···：交替沉积TiN、MoS2/Ti···TiN涂层共80min；
9)沉积MoS2/Ti润滑涂层：关闭N2，Ti靶电流70A，偏压180V，沉积温度220～240℃，开启MoS2靶中频磁控溅射电源，电流1.5A，复合沉积MoS2/Ti润滑涂层3min；
10)后处理：关闭各电源、离子源及气体源，涂层结束。
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