CN107338412A - CrNbC/CrNbCN叠层复合涂层刀具及其制备工艺 - Google Patents

CrNbC/CrNbCN叠层复合涂层刀具及其制备工艺 Download PDF

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CN107338412A
CN107338412A CN201710533153.6A CN201710533153A CN107338412A CN 107338412 A CN107338412 A CN 107338412A CN 201710533153 A CN201710533153 A CN 201710533153A CN 107338412 A CN107338412 A CN 107338412A
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coatings
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magnetron sputtering
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宋文龙
王凤霞
王首军
张璇
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Jining University
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
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Abstract

本发明属于机械制造金属切削刀具领域，特别是涉及一种CrNbC/CrNbCN叠层复合涂层刀具及其制备工艺。本发明采用中频磁控溅射+电弧离子镀的复合镀膜方法，直接采用中频磁控溅射CrNbC复合靶作碳源，且沉积温度控制在300℃以下，可在更为广泛的刀具或工具基体上制备。本发明制备的CrNbC/CrNbCN叠层复合涂层刀具，在刀具基体表面沉积有涂层，所述涂层从内到外依次为：Cr过渡层、CrNbC涂层与CrNbCN涂层交替的叠层复合结构，最外层为CrNbCN涂层，制备的CrNbC/CrNbCN叠层复合涂层刀具综合了CrNbC碳化物涂层、CrNbCN碳氮化合物涂层及叠层结构的优点，具有优良的物理机械性能，可广泛应用于轴承钢、热扎和冷拨工具钢、高速钢、模具钢、表面淬硬钢，渗碳和渗氮硬化铁，以及其它表面硬化的工件材料。

Description

CrNbC/CrNbCN叠层复合涂层刀具及其制备工艺
技术领域
本发明属于机械制造金属切削刀具领域，特别是涉及一种CrNbC/CrNbCN叠层复合涂层刀具及其制备工艺。
背景技术
当代切削加工技术的快速发展对刀具的材料和性能提出了更高的要求，干式、高速切削成为刀具切削发展的方向。在刀具表面沉积硬质薄膜成为改善和提高刀具使用性能的重要途径。TiCN是目前最广泛使用的三元碳氮化合物硬质涂层，TiCN涂层由于兼具TiC的高硬度和TiN的良好韧性，显著提高了其摩擦磨损性能(Jinlong Li,Shihong Zhang,Mingxi Li.Influence of the C2H2 flow rate on gradient TiCN films deposited bymulti-arc ion plating[J].Applied Surface Science,2013(283):134-144.)，已广泛应用于铣削、攻牙、冲压、成型及滚齿的加工，在高速切削时比普通硬质合金刀具的耐磨性高5-8倍。中国专利“汽轮机转子轮槽铣刀表面TiCN多层复合涂层制备工艺”(专利号201510564738.5)利用Ti、氮气(N2)与乙炔气体(C2H2)在450℃沉积温度下合成了TiCN涂层铣刀，解决了26NiCrMov145材料转子加工难题。
TiCN涂层虽然具有高硬度、低摩擦系数的优点，但同时因其热稳定性和红硬性较差，仅适合应用于低速切削或具有良好冷却条件的场合，需要对传统TiCN涂层结构和制备工艺进行改进。目前，多元化是材料改善力学性能、耐蚀性和耐磨性的有效途径，通过制备多元复合涂层，既可提高涂层与基体的结合强度，又兼顾多种单涂层的综合性能，显著提高涂层刀具的性能。
目前TiCN等碳氮化合物主要通过化学气相沉积技术(CVD)等技术制备，即通过TiCl4(或Ti靶)、CH4(或C2H2)以及N2等气体反应生成，沉积温度通常超过400℃，对基体产生不利影响，同时气体碳源容易对涂层设备造成污染，制约了其广泛应用。
层状复合材料是近几年发展起来的材料增强增韧新技术，这种结构是通过模仿贝壳而来，因此又叫仿生叠层复合材料。自然界中贝壳的珍珠层是一种天然的层状结构材料，其断裂韧性却比普通单一均质结构高出3000倍以上。因此，通过模仿生物材料结构形式的层间设计，制备出的叠层复合涂层可以提高目前碳氮化合物涂层的韧性、稳定性及减摩耐磨性等综合性能。
发明内容
针对目前现有碳氮化合物涂层刀具性能及制备方法的不足，结合层状复合材料结构的优点提供一种CrNbC/CrNbCN叠层复合涂层刀具及其制备工艺。
本发明所述的CrNbC/CrNbCN叠层复合涂层刀具，包括刀具基体，在刀具基体表面沉积有涂层，所述涂层从内到外依次为：Cr过渡层、CrNbC涂层与CrNbCN涂层交替的复合叠层结构，最外层为CrNbCN涂层；
其中：刀具基体材料为高速钢、工具钢、模具钢、硬质合金、陶瓷、金刚石、立方氮化硼。
本发明所述的CrNbC/CrNbCN叠层复合涂层刀具的制备工艺，沉积方式为采用中频磁控溅射+电弧离子镀复合镀膜方法，沉积时使用2个中频磁控溅射CrNbC复合靶，2个电弧离子镀Cr靶：首先采用电弧离子镀沉积Cr过渡层，然后采用中频磁控溅射方法交替沉积CrNbC涂层与CrNbCN涂层，最外层为CrNbCN涂层。
所述中频磁控溅射CrNbC复合靶中包含重量分数为65-80wt％的Cr、10-20wt％的Nb和10-15wt％的C，所述中频磁控溅射CrNbC复合靶采用真空热压法制备，具体包括以下步骤：
(1)将重量配比好的粉末纯度均为99.9％的Cr、Nb和C的粉末混匀并装入模具，然后将装有粉末的模具置于真空热压炉；
(2)首先快速升温，并在升温开始施加初始压力10～35MPa，然后慢速升温至800～1200℃，保温，混合粉经热压烧结后成型得样品；
(3)烧结结束后样品随炉冷却降温至80℃以下后出炉得中频磁控溅射CrNbC复合靶。
所述CrNbC/CrNbCN叠层复合涂层刀具的制备工艺，具体包括以下步骤：
(1)对刀具基体表面预处理：首先将刀具基体表面抛光，去除表面油污、锈迹等杂质，然后依次放入酒精和丙酮中，超声清洗各40min，去除刀具表面油污和其它附着物，电吹风干燥充分后迅速放入镀膜机，抽真空至7.0×10-3Pa，加热至270℃，保温50min；
(2)对刀具基体表面离子清洗：通Ar气，调其压力为1.5Pa，开启偏压电源，电压500V，占空比0.3，辉光放电清洗50min；降低偏压至400V，占空比0.2，开启离子源离子清洗45min，开启电弧离子镀Cr靶电源，Cr靶电流65A，偏压300V，占空比0.2，离子轰击2～3min；
(3)采用电弧离子镀在刀具基体表面沉积Cr过渡层：调Ar气压0.7～0.8Pa，偏压降至150V，电弧离子镀Cr靶电流75A，沉积温度170℃，沉积Cr过渡层5～6min；
(4)采用中频磁控溅射在Cr过渡层上沉积CrNbC涂层：关闭电弧离子镀Cr靶电源，Ar气压0.9～1.0Pa，偏压调至160V，沉积温度150℃，开启中频磁控溅射CrNbC复合靶电流35A，沉积CrNbC涂层2～3min；
(5)采用中频磁控溅射在CrNbC涂层上沉积CrNbCN涂层：开启N2，N2气压为1.4Pa，Ar气压0.9～1.0Pa，偏压150V，开启中频磁控溅射CrNbC复合靶电流30A，沉积温度150℃，复合沉积CrNbCN涂层2～3min，沉积完成关闭N2；
(6)采用中频磁控溅射在CrNbCN涂层上沉积CrNbC涂层：调Ar气压0.9～1.0Pa，偏压调至160V，沉积温度150℃，开启中频磁控溅射CrNbC复合靶电流35A，沉积CrNbC涂层2～3min；
(7)重复(5)、(6)、(5)……(6)、(5)，交替沉积CrNbCN涂层、CrNbC涂层、CrNbC涂层……CrNbC涂层、CrNbCN涂层，共沉积80min：
(8)后处理：关闭各靶电源、离子源及气体源，涂层结束。
本发明所述的CrNbC/CrNbCN叠层复合涂层刀具，在刀具基体表面沉积有涂层，所述涂层从内到外依次为：Cr过渡层、CrNbC涂层与CrNbCN涂层交替的叠层复合结构，最外层为CrNbCN涂层。刀具基体上的Cr过渡层主要作用是减缓因涂层成分突变造成的层间应力，提高了涂层与刀具基体间的结合性能，涂层中的Cr元素对涂层起到固溶强化作用，改善涂层的抗氧化性能，Nb元素提高了涂层的硬度、强度和抗压、耐磨、耐蚀性能，涂层中的C元素降低了涂层表面的摩擦系数，使涂层具备优异的减摩润滑及耐摩擦磨损性能。同时该叠层复合结构的层间界面可阻止涂层柱状晶的生长，阻碍裂纹和缺陷的扩展，提高涂层的硬度、韧性和耐冲击性。
本发明与现有技术相比，具有以下有益效果。
本发明采用中频磁控溅射+电弧离子镀的复合镀膜方法，直接采用中频磁控溅射CrNbC复合靶作碳源，且沉积温度控制在300℃以下，可在更为广泛的刀具或工具基体上制备。本发明所制备的CrNbC/CrNbCN叠层复合涂层刀具综合了CrNbC碳化物涂层、CrNbCN碳氮化合物涂层及叠层结构的优点，可提高涂层的硬度和强度，改善涂层的抗氧化性能，降低涂层的摩擦系数，减少切屑瘤的产生，具有很好的抗热变形能力和耐切深处磨损能力，并能防止细微崩碎，保证工件表面加工质量。相比传统TiCN等涂层刀具，所制备的CrNbC/CrNbCN叠层复合涂层刀具可提高切削速度80％以上，降低切削力和切削温度30％以上，提高涂层使用寿命100％以上，可广泛应用于轴承钢、热扎和冷拨工具钢、高速钢、模具钢、表面淬硬钢，渗碳和渗氮硬化铁，以及其它表面硬化的工件材料。
附图说明
图1、本发明的CrNbC/CrNbCN叠层复合涂层刀具的涂层结构示意图。
图中：1、刀具基体 2、Cr过渡层 3、CrNbC涂层 4、CrNbCN涂层 5、CrNbC涂层与CrNbCN涂层交替的复合叠层结构。
具体实施方式
下面给出本发明的二个最佳实施例：
实施例1
本实施例所述的CrNbC/CrNbCN叠层复合涂层刀具，该刀具为普通的镗刀片，其基体材料为：硬质合金P20，在刀具基体表面沉积有涂层，所述涂层从内到外依次为：Cr过渡层、CrNbC涂层与CrNbCN涂层交替的复合叠层结构，最外层为CrNbCN涂层。
本实施例所述的CrNbC/CrNbCN叠层复合涂层刀具的制备工艺，沉积方式为采用中频磁控溅射+电弧离子镀复合镀膜方法，沉积时使用2个中频磁控溅射CrNbC复合靶，2个电弧离子镀Cr靶：首先采用电弧离子镀沉积Cr过渡层，然后采用中频磁控溅射方法交替沉积CrNbC涂层与CrNbCN涂层，最外层为CrNbCN涂层。
所述中频磁控溅射CrNbC复合靶中包含重量分数为65wt％的Cr、20wt％的Nb和15wt％的C。
本实施例所述CrNbC/CrNbCN叠层复合涂层刀具的制备工艺，具体包括以下步骤：
(1)对刀具基体表面预处理：首先将刀具基体表面抛光，去除表面油污、锈迹等杂质，然后依次放入酒精和丙酮中，超声清洗各40min，去除刀具表面油污和其它附着物，电吹风干燥充分后迅速放入镀膜机，抽真空至7.0×10-3Pa，加热至270℃，保温50min；
(2)对刀具基体表面离子清洗：通Ar气，调其压力为1.5Pa，开启偏压电源，电压500V，占空比0.3，辉光放电清洗50min；降低偏压至400V，占空比0.2，开启离子源离子清洗45min，开启电弧离子镀Cr靶电源，Cr靶电流65A，偏压300V，占空比0.2，离子轰击2～3min；
(3)采用电弧离子镀在刀具基体表面沉积Cr过渡层：调Ar气压0.7～0.8Pa，偏压降至150V，电弧离子镀Cr靶电流75A，沉积温度170℃，沉积Cr过渡层5～6min；
(4)采用中频磁控溅射在Cr过渡层上沉积CrNbC涂层：关闭电弧离子镀Cr靶电源，Ar气压0.9～1.0Pa，偏压调至160V，沉积温度150℃，开启中频磁控溅射CrNbC复合靶电流35A，沉积CrNbC涂层2～3min；
(5)采用中频磁控溅射在CrNbC涂层上沉积CrNbCN涂层：开启N2，N2气压为1.4Pa，Ar气压0.9～1.0Pa，偏压150V，开启中频磁控溅射CrNbC复合靶电流30A，沉积温度150℃，复合沉积CrNbCN涂层2～3min，沉积完成关闭N2；
(6)采用中频磁控溅射在CrNbCN涂层上沉积CrNbC涂层：调Ar气压0.9～1.0Pa，偏压调至160V，沉积温度150℃，开启中频磁控溅射CrNbC复合靶电流35A，沉积CrNbC涂层2～3min；
(7)重复(5)、(6)、(5)……(6)、(5)，交替沉积CrNbCN涂层、CrNbC涂层、CrNbC涂层……CrNbC涂层、CrNbCN涂层，共沉积80min：
(1)后处理：关闭各靶电源、离子源及气体源，涂层结束。
实施例2
本实施例所述的CrNbC/CrNbCN叠层复合涂层刀具，该刀具为普通机夹铣刀，其刀具基体材料为：高速钢W18Cr4V，在刀具基体表面沉积有涂层，所述涂层从内到外依次为：Cr过渡层、CrNbC涂层与CrNbCN涂层交替的复合叠层结构，最外层为CrNbCN涂层。
本实施例所述的CrNbC/CrNbCN叠层复合涂层刀具的制备工艺，沉积方式为采用中频磁控溅射+电弧离子镀复合镀膜方法，沉积时使用2个中频磁控溅射CrNbC复合靶，2个电弧离子镀Cr靶：首先采用电弧离子镀沉积Cr过渡层，然后采用中频磁控溅射方法交替沉积CrNbC涂层与CrNbCN涂层，最外层为CrNbCN涂层。
所述中频磁控溅射CrNbC复合靶中包含重量分数为80wt％的Cr、10wt％的Nb和10-wt％的C。
本实施例所述CrNbC/CrNbCN叠层复合涂层刀具的制备工艺，具体包括以下步骤：
(1)对刀具基体表面预处理：首先将刀具基体表面抛光，去除表面油污、锈迹等杂质，然后依次放入酒精和丙酮中，超声清洗各40min，去除刀具表面油污和其它附着物，电吹风干燥充分后迅速放入镀膜机，抽真空至7.0×10-3Pa，加热至270℃，保温50min；
(2)对刀具基体表面离子清洗：通Ar气，调其压力为1.5Pa，开启偏压电源，电压500V，占空比0.3，辉光放电清洗50min；降低偏压至400V，占空比0.2，开启离子源离子清洗45min，开启电弧离子镀Cr靶电源，Cr靶电流65A，偏压300V，占空比0.2，离子轰击2～3min；
(3)采用电弧离子镀在刀具基体表面沉积Cr过渡层：调Ar气压0.7～0.8Pa，偏压降至150V，电弧离子镀Cr靶电流75A，沉积温度170℃，沉积Cr过渡层5～6min；
(4)采用中频磁控溅射在Cr过渡层上沉积CrNbC涂层：关闭电弧离子镀Cr靶电源，Ar气压0.9～1.0Pa，偏压调至160V，沉积温度150℃，开启中频磁控溅射CrNbC复合靶电流35A，沉积CrNbC涂层2～3min；
(5)采用中频磁控溅射在CrNbC涂层上沉积CrNbCN涂层：开启N2，N2气压为1.4Pa，Ar气压0.9～1.0Pa，偏压150V，开启中频磁控溅射CrNbC复合靶电流30A，沉积温度150℃，复合沉积CrNbCN涂层2～3min，沉积完成关闭N2；
(6)采用中频磁控溅射在CrNbCN涂层上沉积CrNbC涂层：调Ar气压0.9～1.0Pa，偏压调至160V，沉积温度150℃，开启中频磁控溅射CrNbC复合靶电流35A，沉积CrNbC涂层2～3min；
(7)重复(5)、(6)、(5)……(6)、(5)，交替沉积CrNbCN涂层、CrNbC涂层、CrNbC涂层……CrNbC涂层、CrNbCN涂层，共沉积80min：
(8)后处理：关闭各靶电源、离子源及气体源，涂层结束。

Claims (4)

1.一种CrNbC/CrNbCN叠层复合涂层刀具，包括刀具基体，其特征在于：在刀具基体表面沉积有涂层，所述涂层从内到外依次为：Cr过渡层、CrNbC涂层与CrNbCN涂层交替的复合叠层结构，最外层为CrNbCN涂层；
其中：刀具基体材料为高速钢、工具钢、模具钢、硬质合金、陶瓷、金刚石、立方氮化硼。
2.一种CrNbC/CrNbCN叠层复合涂层刀具的制备工艺，其特征在于：沉积方式为采用中频磁控溅射+电弧离子镀复合镀膜方法，沉积时使用2个中频磁控溅射CrNbC复合靶，2个电弧离子镀Cr靶：首先采用电弧离子镀沉积Cr过渡层，然后采用中频磁控溅射方法交替沉积CrNbC涂层与CrNbCN涂层，最外层为CrNbCN涂层。
3.根据权利要求2所述的CrNbC/CrNbCN叠层复合涂层刀具的制备工艺，其特征在于：中频磁控溅射CrNbC复合靶中包含重量分数为65-80wt％的Cr、10-20wt％的Nb和10-15wt％的C。
4.根据权利要求2或3所述的CrNbC/CrNbCN叠层复合涂层刀具的制备工艺，其特征在于：具体包括以下步骤：
(1)对刀具基体表面预处理：首先将刀具基体表面抛光，然后依次放入酒精和丙酮中，超声清洗各40min，吹风干燥充分后迅速放入镀膜机，抽真空至7.0×10-3Pa，加热至270℃，保温50min；
(2)对刀具基体表面离子清洗：通Ar气，调其压力为1.5Pa，开启偏压电源，电压500V，占空比0.3，辉光放电清洗50min；降低偏压至400V，占空比0.2，开启离子源离子清洗45min，开启电弧离子镀Cr靶电源，Cr靶电流65A，偏压300V，占空比0.2，离子轰击2～3min；
(3)采用电弧离子镀在刀具基体表面沉积Cr过渡层：调Ar气压0.7～0.8Pa，偏压降至150V，电弧离子镀Cr靶电流75A，沉积温度170℃，沉积Cr过渡层5～6min；
(4)采用中频磁控溅射在Cr过渡层上沉积CrNbC涂层：关闭电弧离子镀Cr靶电源，Ar气压0.9～1.0Pa，偏压调至160V，沉积温度150℃，开启中频磁控溅射CrNbC复合靶电流35A，沉积CrNbC涂层2～3min；
(5)采用中频磁控溅射在CrNbC涂层上沉积CrNbCN涂层：开启N2，N2气压为1.4Pa，Ar气压0.9～1.0Pa，偏压150V，开启中频磁控溅射CrNbC复合靶电流30A，沉积温度150℃，复合沉积CrNbCN涂层2～3min，沉积完成关闭N2；
(6)采用中频磁控溅射在CrNbCN涂层上沉积CrNbC涂层：调Ar气压0.9～1.0Pa，偏压调至160V，沉积温度150℃，开启中频磁控溅射CrNbC复合靶电流35A，沉积CrNbC涂层2～3min；
(7)重复(5)、(6)、(5)……(6)、(5)，交替沉积CrNbCN涂层、CrNbC涂层、CrNbC涂层……CrNbC涂层、CrNbCN涂层，共沉积80min：
(8)后处理：关闭各靶电源、离子源及气体源，涂层结束。
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