CN105861997B - TiCrN/MoS2多元减摩润滑涂层刀具及其制备工艺 - Google Patents
TiCrN/MoS2多元减摩润滑涂层刀具及其制备工艺 Download PDFInfo
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Abstract
本发明属于机械制造金属切削刀具领域，特别是涉及一种TiCrN/MoS2多元减摩润滑涂层刀具及其制备工艺。该刀具基体材料为高速钢、硬质合金、陶瓷、金刚石或立方氮化硼，涂层为多层结构，由基体到涂层表面依次为：Ti过渡层、Ti/Cr过渡层、TiCrN和MoS2的复合涂层。其综合了TiCrN多元硬质涂层和MoS2润滑涂层的优点，既具有较高的硬度，又具有润滑作用，且可以使涂层在整个生命周期里保持良好的润滑性能，显著改善和提高涂层刀具的切削性能。
Description
技术领域
本发明属于机械制造金属切削刀具领域，特别是涉及一种TiCrN/MoS2多元减摩润滑涂层刀具及其制备工艺。
背景技术
根据涂层材料的性质，涂层刀具可分为两大类，即：“高硬度”涂层刀具和“润滑”涂层刀具。“高硬度”涂层刀具其主要优点是硬度高、耐磨性能好，典型的“高硬度”涂层材料有TiN、 TiCN、TiAlN和类金刚石等。“润滑”涂层刀具追求的目标是低摩擦系数，典型的“润滑”涂层材料为具有低摩擦系数的固体润滑材料(如：MoS2、WS2、TaS2等硫化物)。当前刀具涂层的发展趋势是：涂层成分趋于多元化和复合化。复合涂层可综合单涂层的优点，复合多涂层及其相关技术的出现，既可提高涂层与基体的结合强度，又兼顾多种单涂层的综合性能，使涂层刀具的性能显著提高。
中国专利(专利号ZL 2006 1 0068975.3)报道了“自润滑复合软涂层刀具及其制备方法”，它是采用中频磁控+多弧法镀膜方法制备的MoS2/Zr复合涂层刀具，刀具表面为MoS2层，MoS2层与刀具基体之间具有Ti过渡层。该刀具在无切削液冷却、润滑的切削过程中，能够在刀具表面能形成具有润滑作用的润滑膜，从而实现刀具自身的润滑功能，但是这种润滑涂层硬度较低而导致刀具涂层尤其是后刀面涂层的使用寿命不长。文献(ActaMaterials.2011,59(1): 68-74)报道了TiN硬涂层刀具切削加工时的作用机理及使用性能，但是这种硬涂层由于相对较高的摩擦系数，限制了其广泛使用。中国专利TiN+MoS2/Zr组合涂层刀具(专利号ZL 201110081977.7)采用中频磁控溅射与电弧镀复合镀膜方法制备的TiN+MoS2/Zr组合涂层刀具，但该组合涂层在干切削超硬材料时刀具使用寿命仍无法满足实际使用需要。中国专利梯度叠层涂层刀具及其制备方法(专利号201110214393.2)制备的ZrTiN复合涂层刀具有较高的硬度和强度、优异的抗磨损和抗腐蚀性能，但是在切削有色金属材料时其摩擦系数较高，刀具使用寿命有待进一步提高。
发明内容
本发明的目的在于克服上述现有涂层刀具技术的不足，结合多元硬质涂层和润滑涂层的优点，提供一种TiCrN/MoS2多元减摩润滑涂层刀具及其制备工艺。
本发明是通过以下方式实现的：
TiCrN/MoS2多元减摩润滑涂层刀具，刀具基体材料为高速钢、硬质合金、陶瓷、金刚石或立方氮化硼，涂层为多层结构，由基体到涂层表面依次为：Ti过渡层、Ti/Cr过渡层、TiCrN 和MoS2的复合涂层。
所述TiCrN/MoS2多元减摩润滑涂层刀具的制备工艺，其沉积方式为采用电弧镀与磁控溅射复合镀膜方法，包括1个Ti靶电弧靶，1个Cr靶电弧靶，2个MoS2磁控溅射靶：电弧离子镀沉积Ti过渡层和Ti/Cr过渡层，电弧离子镀+磁控溅射沉积TiCrN和MoS2的复合涂层。
具体包括以下步骤：
(1)前处理：将刀具基体表面抛光，去除表面杂质，然后依次放入酒精和丙酮中，超声清洗，经干燥后迅速放入镀膜机，抽真空至7.0～8.0×10-3Pa，加热至300℃，保温30～35min；
(2)离子清洗：通Ar气，其压力为1.5～2.0Pa，开启偏压电源，电压600V，占空比0.2，辉光放电清洗15～20min；降低偏压至400V，开启离子源离子清洗12～15min，开启Ti靶的电弧源，偏压250～380V，靶电流60A，离子轰击Ti靶3～5min；
(3)沉积Ti过渡层：Ar气压0.5～0.6Pa，偏压降至250V，Ti靶电流70A，沉积温度240℃，电弧镀Ti过渡层5～6min；
(4)沉积Ti/Cr过渡层：Ar气压0.5～0.6Pa，偏压250V，Ti靶电流80A，Cr靶电流60A，电弧镀Ti/Cr过渡层10～15min；
(5)沉积TiCrN和MoS2的复合涂层：Ar气压0.5Pa，偏压200～220V，Ti靶的靶电流10A，Cr靶电流80A；开启N2，N2气压为1.0Pa，沉积温度220～250℃；开启MoS2靶磁控溅射电源，电流0.8～1.0A，沉积TiCrN和MoS2的复合涂层100～110min；
(6)后处理：关闭各电源、离子源及气体源，涂层结束。
与现有技术相比，本发明具有如下技术效果：
本发明采用电弧镀与磁控溅射复合镀膜方法制备了TiCrN/MoS2多元复合涂层刀具。基体上的Ti过渡层和Ti/Cr过渡层主要是提高组合涂层与刀具基体间的结合性能，减缓因涂层成分突变造成的层间应力。通过调控TiCrN多元硬质涂层中MoS2的含量，使这种TiCrN/MoS2多元减摩润滑涂层刀具综合了TiCrN多元硬质涂层和MoS2润滑涂层的优点，既具有较高的硬度，又具有润滑作用，且可以使涂层在整个生命周期里保持良好的润滑性能，显著改善和提高涂层刀具的切削性能。用这种多元减摩润滑涂层刀具进行干切削时，可以减小刀具与切屑之间的摩擦，降低切削力和切削温度，比目前的TiN+MoS2/Zr涂层刀具(专利号ZL 201110081977.7)耐磨性提高了25-35％，涂层刀具使用寿命提高了30％以上；比目前的ZrTiN 复合涂层刀具(专利号201110214393.2)表面摩擦系数降低40％以上，减摩耐磨性提高30％以上，涂层刀具使用寿命提高25％以上，且提高了涂层刀具的使用范围，可广泛应用于各种难加工材料的切削加工。
附图说明
图1为本发明的TiCrN/MoS2多元减摩润滑涂层结构示意图。
图中：1为刀具基体、2为Ti过渡层、3为Ti/Cr过渡层、4为TiCrN和MoS2的复合涂层。
具体实施方式
下面给出本发明的最佳实施例：
实施例一
一种TiCrN/MoS2多元减摩润滑涂层刀具，该刀具为普通的铣刀片，其基体材料为：硬质合金YT15。沉积方式为采用电弧镀与中频磁控溅射复合镀膜方法制备的复合涂层，包括1 个Ti靶电弧靶，1个Cr靶电弧靶，2个MoS2磁控溅射靶：电弧离子镀沉积Ti过渡层、Ti/Cr过渡层、TiCrN(电弧离子镀)和MoS2复合涂层(磁控溅射)，其制备工艺为：
(1)前处理：将刀具基体表面抛光，去除表面油污、锈迹等杂质，然后依次放入酒精和丙酮中，超声清洗各30min，去除刀具表面油污和其它附着物，电吹风干燥充分后迅速放入镀膜机，抽真空至7.0～8.0×10-3Pa，加热至300℃，保温30～35min；
(2)离子清洗：通Ar气，其压力为1.5～2.0Pa，开启偏压电源，电压600V，占空比0.2，辉光放电清洗15～20min；降低偏压至400V，开启离子源离子清洗12～15min，开启Ti靶的电弧源，偏压250～380V，靶电流60A，离子轰击Ti靶3～5min；
(3)沉积Ti过渡层：Ar气压0.5～0.6Pa，偏压降至250V，Ti靶电流70A，沉积温度240℃，电弧镀Ti过渡层5～6min；
(4)沉积Ti/Cr过渡层：Ar气压0.5～0.6Pa，偏压250V，Ti靶电流80A，Cr靶电流60A，电弧镀Ti/Cr过渡层10～15min；
(5)沉积TiCrN和MoS2的复合涂层：Ar气压0.5Pa，偏压200～220V，Ti靶的靶电流10A，Cr靶电流80A；开启N2，N2气压为1.0Pa，沉积温度220～250℃；开启MoS2靶磁控溅射电源，电流0.8～1.0A，沉积TiCrN和MoS2的复合涂层100～110min；
(6)后处理：关闭各电源、离子源及气体源，涂层结束。
实施例二
一种TiCrN/MoS2多元减摩润滑涂层刀具，该刀具为普通麻花钻，其刀具基体材料为：高速钢W18Cr4V。沉积方式为采用电弧镀与中频磁控溅射复合镀膜方法制备的复合涂层，包括 1个Ti靶电弧靶，1个Cr靶电弧靶，2个MoS2磁控溅射靶：电弧离子镀沉积Ti过渡层、Ti/Cr 过渡层、TiCrN(电弧离子镀)和MoS2复合涂层(磁控溅射)，其制备工艺为：
(1)前处理：将刀具基体表面抛光，去除表面油污、锈迹等杂质，然后依次放入酒精和丙酮中，超声清洗各30min，去除刀具表面油污和其它附着物，电吹风干燥充分后迅速放入镀膜机，抽真空至7.0～8.0×10-3Pa，加热至300℃，保温30～35min；
(2)离子清洗：通Ar气，其压力为1.5～2.0Pa，开启偏压电源，电压600V，占空比0.2，辉光放电清洗15～20min；降低偏压至400V，开启离子源离子清洗12～15min，开启Ti靶的电弧源，偏压250～380V，靶电流60A，离子轰击Ti靶3～5min；
(3)沉积Ti过渡层：Ar气压0.5～0.6Pa，偏压降至250V，Ti靶电流70A，沉积温度240℃，电弧镀Ti过渡层5～6min；
(4)沉积Ti/Cr过渡层：Ar气压0.5～0.6Pa，偏压250V，Ti靶电流80A，Cr靶电流60A，电弧镀Ti/Cr过渡层10～15min；
(5)沉积TiCrN和MoS2的复合涂层：Ar气压0.5Pa，偏压200～220V，Ti靶的靶电流10A，Cr靶电流80A；开启N2，N2气压为1.0Pa，沉积温度220～250℃；开启MoS2靶磁控溅射电源，电流0.8～1.0A，沉积TiCrN和MoS2的复合涂层100～110min；
(6)后处理：关闭各电源、离子源及气体源，涂层结束。
Claims (1)
1.一种TiCrN/MoS2多元减摩润滑涂层刀具的制备工艺，刀具基体材料为高速钢、硬质合金、陶瓷、金刚石或立方氮化硼，涂层为多层结构，由基体到涂层表面依次为：Ti过渡层、Ti/Cr过渡层、TiCrN和MoS2的复合涂层；其特征在于，沉积方式为采用电弧镀与磁控溅射复合镀膜方法，包括1个Ti靶电弧靶，1个Cr靶电弧靶，2个MoS2磁控溅射靶：电弧离子镀沉积Ti过渡层和Ti/Cr过渡层，电弧离子镀+磁控溅射沉积TiCrN和MoS2的复合涂层，具体包括以下步骤：
(1)前处理：将刀具基体表面抛光，去除表面杂质，然后依次放入酒精和丙酮中，超声清洗，经干燥后迅速放入镀膜机，抽真空至7.0～8.0×10-3Pa，加热至300℃，保温30～35min；
(2)离子清洗：通Ar气，其压力为1.5～2.0Pa，开启偏压电源，电压600V，占空比0.2，辉光放电清洗15～20min；降低偏压至400V，开启离子源离子清洗12～15min，开启Ti靶的电弧源，偏压250～380V，靶电流60A，离子轰击Ti靶3～5min；
(3)沉积Ti过渡层：Ar气压0.5～0.6Pa，偏压降至250V，Ti靶电流70A，沉积温度240℃，电弧镀Ti过渡层5～6min；
(4)沉积Ti/Cr过渡层：Ar气压0.5～0.6Pa，偏压250V，Ti靶电流80A，Cr靶电流60A，电弧镀Ti/Cr过渡层10～15min；
(5)沉积TiCrN和MoS2的复合涂层：Ar气压0.5Pa，偏压200～220V，Ti靶的靶电流10A，Cr靶电流80A；开启N2，N2气压为1.0Pa，沉积温度220～250℃；开启MoS2靶磁控溅射电源，电流0.8～1.0A，沉积TiCrN和MoS2的复合涂层100～110min；
(6)后处理：关闭各电源、离子源及气体源，涂层结束。
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