CN105652601B - 保持装置、光刻设备以及物品制造方法 - Google Patents
保持装置、光刻设备以及物品制造方法 Download PDFInfo
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- CN105652601B CN105652601B CN201510845119.3A CN201510845119A CN105652601B CN 105652601 B CN105652601 B CN 105652601B CN 201510845119 A CN201510845119 A CN 201510845119A CN 105652601 B CN105652601 B CN 105652601B
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 15
- 239000000758 substrate Substances 0.000 claims abstract description 171
- 238000000605 extraction Methods 0.000 claims description 18
- 125000004122 cyclic group Chemical group 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 10
- 230000015572 biosynthetic process Effects 0.000 claims description 6
- 230000009467 reduction Effects 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims description 2
- 239000002861 polymer material Substances 0.000 claims 1
- 230000002093 peripheral effect Effects 0.000 description 58
- 241000252254 Catostomidae Species 0.000 description 19
- 238000005452 bending Methods 0.000 description 18
- 238000001514 detection method Methods 0.000 description 13
- 238000010586 diagram Methods 0.000 description 9
- 238000010276 construction Methods 0.000 description 8
- 238000012937 correction Methods 0.000 description 8
- 230000007246 mechanism Effects 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 6
- 238000007789 sealing Methods 0.000 description 6
- 238000012986 modification Methods 0.000 description 5
- 230000004048 modification Effects 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 230000032258 transport Effects 0.000 description 5
- 238000009434 installation Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 239000004744 fabric Substances 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 210000004262 dental pulp cavity Anatomy 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Environmental & Geological Engineering (AREA)
- Public Health (AREA)
- Epidemiology (AREA)
- Health & Medical Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Jigs For Machine Tools (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014-242525 | 2014-11-28 | ||
| JP2014242525 | 2014-11-28 | ||
| JP2015-210712 | 2015-10-27 | ||
| JP2015210712A JP6732429B2 (ja) | 2014-11-28 | 2015-10-27 | 基板保持装置、リソグラフィ装置、及び物品の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105652601A CN105652601A (zh) | 2016-06-08 |
| CN105652601B true CN105652601B (zh) | 2019-06-14 |
Family
ID=56124840
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510845119.3A Active CN105652601B (zh) | 2014-11-28 | 2015-11-27 | 保持装置、光刻设备以及物品制造方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6732429B2 (enExample) |
| KR (1) | KR102002582B1 (enExample) |
| CN (1) | CN105652601B (enExample) |
| TW (1) | TWI596698B (enExample) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL2017357A (en) * | 2015-09-28 | 2017-09-01 | Asml Netherlands Bv | A Substrate Holder, a Lithographic Apparatus and Method of Manufacturing Devices |
| JP2017211604A (ja) * | 2016-05-27 | 2017-11-30 | 株式会社大日本科研 | 基板吸着保持装置および露光装置 |
| JP6774714B2 (ja) * | 2016-07-25 | 2020-10-28 | 株式会社アドテックエンジニアリング | ワークステージ及び露光装置 |
| JP6894034B2 (ja) * | 2016-07-25 | 2021-06-23 | 株式会社アドテックエンジニアリング | ワーク吸着保持方法、ワークステージ及び露光装置 |
| JP6978840B2 (ja) * | 2017-02-28 | 2021-12-08 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理装置および基板保持装置 |
| JP7007816B2 (ja) * | 2017-06-08 | 2022-01-25 | 株式会社ディスコ | チャックテーブル |
| JP6894772B2 (ja) * | 2017-06-14 | 2021-06-30 | 日本特殊陶業株式会社 | 真空チャック |
| JP7239388B2 (ja) * | 2019-05-09 | 2023-03-14 | 株式会社アドテックエンジニアリング | 直描式露光装置 |
| JP7368263B2 (ja) * | 2020-02-14 | 2023-10-24 | 株式会社Ｓｃｒｅｅｎホールディングス | 基板処理装置および基板処理方法 |
| JP7537926B2 (ja) * | 2020-07-09 | 2024-08-21 | 株式会社ディスコ | ウェーハを吸引保持するチャックテーブル、及びウェーハのハーフカット方法 |
| KR102588171B1 (ko) * | 2020-09-04 | 2023-10-12 | 가부시키가이샤 스크린 홀딩스 | 회전 유지 장치 및 그것을 구비하는 기판 처리 장치 |
| JP6844804B1 (ja) * | 2020-11-25 | 2021-03-17 | 株式会社ブイ・テクノロジー | 露光装置及び露光方法 |
| US20220319903A1 (en) * | 2021-03-31 | 2022-10-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Apparatus and method for substrate handling |
| CN114603200B (zh) * | 2022-05-12 | 2022-10-11 | 四川精诚致远门窗工程有限公司 | 一种门窗铝型材用切割装置 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1077393A2 (en) * | 1999-08-19 | 2001-02-21 | Canon Kabushiki Kaisha | Substrate attracting and holding system for use in exposure apparatus |
| JP2001215716A (ja) * | 2000-02-02 | 2001-08-10 | Orc Mfg Co Ltd | ワークとマスクの分離機構 |
| JP2002217276A (ja) * | 2001-01-17 | 2002-08-02 | Ushio Inc | ステージ装置 |
| CN102608872A (zh) * | 2011-01-21 | 2012-07-25 | 株式会社拓普康 | 吸附台 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03289154A (ja) * | 1990-04-05 | 1991-12-19 | Toshiba Corp | 半導体ウエーハチャック装置 |
| JPH07183366A (ja) * | 1993-12-22 | 1995-07-21 | Hitachi Electron Eng Co Ltd | 大型ガラス基板のエア吸着方法 |
| JP2002009139A (ja) * | 2000-06-20 | 2002-01-11 | Nikon Corp | 静電チャック |
| JP4666473B2 (ja) * | 2005-05-12 | 2011-04-06 | 大日本スクリーン製造株式会社 | 基板熱処理装置 |
| JP4899879B2 (ja) * | 2007-01-17 | 2012-03-21 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法及び記憶媒体 |
| JP2010249706A (ja) * | 2009-04-16 | 2010-11-04 | Murata Mfg Co Ltd | 電子部品移送装置用吸着ヘッド |
| JP5555060B2 (ja) * | 2010-06-07 | 2014-07-23 | ラピスセミコンダクタ株式会社 | 保護テープ剥離方法 |
| US9022392B2 (en) * | 2012-08-31 | 2015-05-05 | United Microelectronics Corporation | Chuck and semiconductor process using the same |
| JP2014195016A (ja) * | 2013-03-29 | 2014-10-09 | Sharp Corp | 半導体検査装置 |
-
2015
- 2015-10-27 JP JP2015210712A patent/JP6732429B2/ja active Active
- 2015-11-25 TW TW104139184A patent/TWI596698B/zh active
- 2015-11-27 KR KR1020150166921A patent/KR102002582B1/ko active Active
- 2015-11-27 CN CN201510845119.3A patent/CN105652601B/zh active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1077393A2 (en) * | 1999-08-19 | 2001-02-21 | Canon Kabushiki Kaisha | Substrate attracting and holding system for use in exposure apparatus |
| JP2001215716A (ja) * | 2000-02-02 | 2001-08-10 | Orc Mfg Co Ltd | ワークとマスクの分離機構 |
| JP2002217276A (ja) * | 2001-01-17 | 2002-08-02 | Ushio Inc | ステージ装置 |
| CN102608872A (zh) * | 2011-01-21 | 2012-07-25 | 株式会社拓普康 | 吸附台 |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI596698B (zh) | 2017-08-21 |
| CN105652601A (zh) | 2016-06-08 |
| JP6732429B2 (ja) | 2020-07-29 |
| KR20160065017A (ko) | 2016-06-08 |
| JP2016111343A (ja) | 2016-06-20 |
| TW201622060A (zh) | 2016-06-16 |
| KR102002582B1 (ko) | 2019-07-22 |
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