CN104106006A - 可光致固化的组合物 - Google Patents

可光致固化的组合物 Download PDF

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Publication number
CN104106006A
CN104106006A CN201380008704.7A CN201380008704A CN104106006A CN 104106006 A CN104106006 A CN 104106006A CN 201380008704 A CN201380008704 A CN 201380008704A CN 104106006 A CN104106006 A CN 104106006A
Authority
CN
China
Prior art keywords
polyether block
siloxane
photoresist
photocurable composition
photocurable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201380008704.7A
Other languages
English (en)
Chinese (zh)
Inventor
裘再明
道格拉斯·C·富尔
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of CN104106006A publication Critical patent/CN104106006A/zh
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/42—Block-or graft-polymers containing polysiloxane sequences
    • C08G77/46—Block-or graft-polymers containing polysiloxane sequences containing polyether sequences
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/10—Block- or graft-copolymers containing polysiloxane sequences
    • C08L83/12—Block- or graft-copolymers containing polysiloxane sequences containing polyether sequences
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31507—Of polycarbonate

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Materials For Photolithography (AREA)
  • Silicon Polymers (AREA)
  • Paints Or Removers (AREA)
CN201380008704.7A 2012-02-10 2013-02-05 可光致固化的组合物 Pending CN104106006A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/370,767 US8703385B2 (en) 2012-02-10 2012-02-10 Photoresist composition
US13/370,767 2012-02-10
PCT/US2013/024737 WO2013119546A1 (en) 2012-02-10 2013-02-05 Photocurable composition

Publications (1)

Publication Number Publication Date
CN104106006A true CN104106006A (zh) 2014-10-15

Family

ID=47750808

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201380008704.7A Pending CN104106006A (zh) 2012-02-10 2013-02-05 可光致固化的组合物

Country Status (7)

Country Link
US (1) US8703385B2 (enExample)
EP (1) EP2812758A1 (enExample)
JP (1) JP6192664B2 (enExample)
KR (1) KR20140129131A (enExample)
CN (1) CN104106006A (enExample)
TW (1) TW201341962A (enExample)
WO (1) WO2013119546A1 (enExample)

Cited By (4)

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Publication number Priority date Publication date Assignee Title
CN107003610A (zh) * 2014-12-10 2017-08-01 互应化学工业株式会社 阻焊剂组合物和经覆盖的印刷线路板
CN108976424A (zh) * 2018-07-24 2018-12-11 广州大学 一种低表面能刷形有机硅分子及其制备和在涂层中的应用
CN114253069A (zh) * 2020-09-24 2022-03-29 信越化学工业株式会社 感光性树脂组成物、图案形成方法、硬化被膜形成方法、层间绝缘膜、和表面保护膜
CN115461032A (zh) * 2020-04-24 2022-12-09 莱雅公司 使用包含至少一种式(I)的烷氧基硅烷、至少一种重均分子量小于或等于1500g/mol的式(II)的非氨基硅酮和至少一种着色剂的组合物处理角蛋白纤维的方法

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TW201314389A (zh) * 2011-09-29 2013-04-01 Wistron Corp 感光性間隙物及液晶顯示器的製作方法與陣列基板
WO2014025716A1 (en) 2012-08-09 2014-02-13 3M Innovative Properties Company Photocurable compositions
KR20150051478A (ko) * 2013-11-04 2015-05-13 삼성디스플레이 주식회사 포토레지스트 조성물 및 이를 이용한 박막 트랜지스터 표시판의 제조 방법
US20170315443A1 (en) * 2014-12-10 2017-11-02 Goo Chemical Co., Ltd. Liquid solder resist composition and covered-printed wiring board
WO2017132237A1 (en) * 2016-01-27 2017-08-03 Momentive Performance Materials Inc. Dirt pick-up resistant silicone coating composition
US11237343B2 (en) * 2018-12-07 2022-02-01 The Board Of Trustees Of The University Of Illinois Volumetric optical integrated circuits
TWI740154B (zh) * 2019-06-05 2021-09-21 鷹克國際股份有限公司 使用液態防焊材料製作電路板防焊層的方法
EP3986957B1 (en) * 2019-06-24 2023-03-22 Dow Silicones Corporation Silicone polyether foam control agent
FR3109528B1 (fr) * 2020-04-24 2022-03-25 Oreal Composition comprenant au moins un alcoxysilane de formule (I), au moins une silicone non aminée de formule (II) ayant une masse moléculaire moyenne en poids inférieure ou égale à 1500 g/mol et au moins un agent colorant
JP7227890B2 (ja) * 2019-12-03 2023-02-22 信越化学工業株式会社 感光性樹脂組成物、感光性樹脂皮膜、感光性ドライフィルム、パターン形成方法及び発光素子

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US5268256A (en) * 1990-08-02 1993-12-07 Ppg Industries, Inc. Photoimageable electrodepositable photoresist composition for producing non-tacky films
CN1106936A (zh) * 1994-01-25 1995-08-16 莫顿国际股份有限公司 具有聚硅氧烷的带水刻胶
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US20100247873A1 (en) * 2009-03-31 2010-09-30 Fujifilm Corporation Ink composition, ink composition for inkjet recording, inkjet recording method, and printed article obtained by inkjet recording method
US20110008733A1 (en) * 2008-03-11 2011-01-13 3M Innovative Properties Company Phototools having a protective layer

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4477529A (en) * 1983-12-29 1984-10-16 General Electric Company Photocurable polyfunctional acrylic coating and decorative articles coated therewith
US5268256A (en) * 1990-08-02 1993-12-07 Ppg Industries, Inc. Photoimageable electrodepositable photoresist composition for producing non-tacky films
CN1106936A (zh) * 1994-01-25 1995-08-16 莫顿国际股份有限公司 具有聚硅氧烷的带水刻胶
US6617365B2 (en) * 1999-12-01 2003-09-09 Goldschmidt Ag Use of silicon-polyether copolymers in the production of high resilience polyurethane foams
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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107003610A (zh) * 2014-12-10 2017-08-01 互应化学工业株式会社 阻焊剂组合物和经覆盖的印刷线路板
CN107003610B (zh) * 2014-12-10 2020-05-19 互应化学工业株式会社 阻焊剂组合物和经覆盖的印刷线路板
CN108976424A (zh) * 2018-07-24 2018-12-11 广州大学 一种低表面能刷形有机硅分子及其制备和在涂层中的应用
CN115461032A (zh) * 2020-04-24 2022-12-09 莱雅公司 使用包含至少一种式(I)的烷氧基硅烷、至少一种重均分子量小于或等于1500g/mol的式(II)的非氨基硅酮和至少一种着色剂的组合物处理角蛋白纤维的方法
CN114253069A (zh) * 2020-09-24 2022-03-29 信越化学工业株式会社 感光性树脂组成物、图案形成方法、硬化被膜形成方法、层间绝缘膜、和表面保护膜
CN114253069B (zh) * 2020-09-24 2025-07-11 信越化学工业株式会社 感光性树脂组成物、图案形成方法、硬化被膜形成方法、层间绝缘膜、和表面保护膜

Also Published As

Publication number Publication date
JP6192664B2 (ja) 2017-09-06
US8703385B2 (en) 2014-04-22
US20130209921A1 (en) 2013-08-15
JP2015513690A (ja) 2015-05-14
EP2812758A1 (en) 2014-12-17
KR20140129131A (ko) 2014-11-06
TW201341962A (zh) 2013-10-16
WO2013119546A1 (en) 2013-08-15

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Application publication date: 20141015

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