CN103137640B - 固态成像设备、照相机和固态成像设备的设计方法 - Google Patents

固态成像设备、照相机和固态成像设备的设计方法 Download PDF

Info

Publication number
CN103137640B
CN103137640B CN201210505763.2A CN201210505763A CN103137640B CN 103137640 B CN103137640 B CN 103137640B CN 201210505763 A CN201210505763 A CN 201210505763A CN 103137640 B CN103137640 B CN 103137640B
Authority
CN
China
Prior art keywords
semiconductor substrate
solid
state imaging
region
contact plug
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201210505763.2A
Other languages
English (en)
Chinese (zh)
Other versions
CN103137640A (zh
Inventor
曾田岳彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN103137640A publication Critical patent/CN103137640A/zh
Application granted granted Critical
Publication of CN103137640B publication Critical patent/CN103137640B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70—SSIS architectures; Circuits associated therewith
    • H04N25/76—Addressed sensors, e.g. MOS or CMOS sensors
    • H04N25/77—Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components
    • H04N25/778—Pixel circuitry, e.g. memories, A/D converters, pixel amplifiers, shared circuits or shared components comprising amplifiers shared between a plurality of pixels, i.e. at least one part of the amplifier must be on the sensor array itself
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10—Integrated devices
    • H10F39/12—Image sensors
    • H10F39/15—Charge-coupled device [CCD] image sensors
    • H10F39/153—Two-dimensional or three-dimensional array CCD image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/10—Integrated devices
    • H10F39/12—Image sensors
    • H10F39/199—Back-illuminated image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/809—Constructional details of image sensors of hybrid image sensors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/811—Interconnections

Landscapes

  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
CN201210505763.2A 2011-12-05 2012-11-30 固态成像设备、照相机和固态成像设备的设计方法 Active CN103137640B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011266274A JP6018376B2 (ja) 2011-12-05 2011-12-05 固体撮像装置およびカメラ
JP2011-266274 2011-12-05

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201610195655.8A Division CN105762162A (zh) 2011-12-05 2012-11-30 固态成像设备、照相机和固态成像设备的设计方法

Publications (2)

Publication Number Publication Date
CN103137640A CN103137640A (zh) 2013-06-05
CN103137640B true CN103137640B (zh) 2016-04-20

Family

ID=48497236

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201210505763.2A Active CN103137640B (zh) 2011-12-05 2012-11-30 固态成像设备、照相机和固态成像设备的设计方法
CN201610195655.8A Pending CN105762162A (zh) 2011-12-05 2012-11-30 固态成像设备、照相机和固态成像设备的设计方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN201610195655.8A Pending CN105762162A (zh) 2011-12-05 2012-11-30 固态成像设备、照相机和固态成像设备的设计方法

Country Status (3)

Country Link
US (2) US9026972B2 (enExample)
JP (1) JP6018376B2 (enExample)
CN (2) CN103137640B (enExample)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2651874B2 (ja) 1989-12-28 1997-09-10 長谷川香料株式会社 果肉入りゼラチンゼリーの製法
US9406711B2 (en) * 2012-06-15 2016-08-02 Taiwan Semiconductor Manufacturing Company, Ltd. Apparatus and method for backside illuminated image sensors
JP6183718B2 (ja) 2012-06-25 2017-08-23 パナソニックIpマネジメント株式会社 固体撮像装置
JP6162999B2 (ja) 2013-04-15 2017-07-12 キヤノン株式会社 固体撮像装置およびカメラ
JP2014225536A (ja) 2013-05-15 2014-12-04 キヤノン株式会社 固体撮像装置及びカメラ
JP6094511B2 (ja) * 2014-02-25 2017-03-15 ソニー株式会社 撮像素子および撮像装置
WO2016009942A1 (ja) * 2014-07-15 2016-01-21 ブリルニクスジャパン株式会社 固体撮像装置、固体撮像装置の製造方法、および電子機器
JP6541361B2 (ja) 2015-02-05 2019-07-10 キヤノン株式会社 固体撮像装置
FR3033220B1 (fr) * 2015-02-27 2017-03-10 Commissariat Energie Atomique Recepteur d'horloge de liaison optique
JP6491519B2 (ja) * 2015-04-02 2019-03-27 キヤノン株式会社 撮像素子及び撮像装置
EP3358827B1 (en) * 2015-09-30 2026-05-20 Nikon Corporation IMAGE CAPTURE ELEMENT AND ELECTRONIC CAMERA
JP6752585B2 (ja) * 2016-02-19 2020-09-09 キヤノン株式会社 撮像装置、撮像システム
JP6738200B2 (ja) 2016-05-26 2020-08-12 キヤノン株式会社 撮像装置
JP7058479B2 (ja) * 2016-10-18 2022-04-22 ソニーセミコンダクタソリューションズ株式会社 光検出器
KR102786020B1 (ko) 2016-10-18 2025-03-26 소니 세미컨덕터 솔루션즈 가부시키가이샤 광검출기
US10431614B2 (en) 2017-02-01 2019-10-01 Semiconductor Components Industries, Llc Edge seals for semiconductor packages
KR102899017B1 (ko) * 2017-10-30 2025-12-12 소니 세미컨덕터 솔루션즈 가부시키가이샤 고체 촬상 소자
JP7353729B2 (ja) * 2018-02-09 2023-10-02 キヤノン株式会社 半導体装置、半導体装置の製造方法
JP7527755B2 (ja) * 2018-02-09 2024-08-05 キヤノン株式会社 光電変換装置および撮像システム
WO2020045278A1 (en) 2018-08-31 2020-03-05 Canon Kabushiki Kaisha Imaging device with motion dependent pixel binning
JP7452962B2 (ja) * 2018-11-16 2024-03-19 ソニーセミコンダクタソリューションズ株式会社 撮像装置
WO2020105713A1 (ja) * 2018-11-21 2020-05-28 ソニーセミコンダクタソリューションズ株式会社 固体撮像素子
JP6775206B2 (ja) * 2019-02-27 2020-10-28 パナソニックIpマネジメント株式会社 撮像装置
JP6957559B2 (ja) 2019-06-24 2021-11-02 キヤノン株式会社 半導体装置および機器
DE112020003133T5 (de) * 2019-06-26 2022-03-10 Sony Semiconductor Solutions Corporation Bildgebungsvorrichtung
JP7551304B2 (ja) * 2020-03-05 2024-09-17 キヤノン株式会社 半導体装置及び機器
US11233088B2 (en) * 2020-06-12 2022-01-25 Omnivision Technologies, Inc. Metal routing in image sensor using hybrid bonding
KR102887278B1 (ko) 2020-12-17 2025-11-17 삼성전자주식회사 이미지 센서

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040263657A1 (en) * 2003-06-27 2004-12-30 Fuji Photo Film Co., Ltd. Solid state image pickup device
US20080224146A1 (en) * 2004-03-30 2008-09-18 Canon Kabushiki Kaisha Semiconductor Apparatus, Solid State Image Pickup Device Using the Same, and Method of Manufacturing Them
JP2009170448A (ja) * 2008-01-10 2009-07-30 Nikon Corp 固体撮像素子

Family Cites Families (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3359258B2 (ja) * 1997-05-30 2002-12-24 キヤノン株式会社 光電変換装置及びそれを用いたイメージセンサ、画像読取装置
JP2001332714A (ja) * 2000-05-22 2001-11-30 Canon Inc 固体撮像装置
JP4363136B2 (ja) * 2003-09-12 2009-11-11 ソニー株式会社 固体撮像素子及びその製造方法
JP4700332B2 (ja) * 2003-12-05 2011-06-15 イビデン株式会社 多層プリント配線板
US20060113460A1 (en) * 2004-11-05 2006-06-01 Tay Hiok N Image sensor with optimized wire routing
JP2007081139A (ja) * 2005-09-14 2007-03-29 Fujifilm Corp Mosイメージセンサ
KR100775058B1 (ko) * 2005-09-29 2007-11-08 삼성전자주식회사 픽셀 및 이를 이용한 이미지 센서, 그리고 상기 이미지센서를 포함하는 이미지 처리 시스템
JP2007103809A (ja) * 2005-10-07 2007-04-19 Oki Electric Ind Co Ltd 半導体装置及び半導体装置の製造方法
JP4859542B2 (ja) * 2006-06-06 2012-01-25 パナソニック株式会社 Mos型固体撮像装置及びmos型固体撮像装置の製造方法
US7755120B2 (en) * 2007-01-22 2010-07-13 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor device
JP2009032953A (ja) * 2007-07-27 2009-02-12 Panasonic Corp 固体撮像装置
US7781716B2 (en) * 2008-03-17 2010-08-24 Eastman Kodak Company Stacked image sensor with shared diffusion regions in respective dropped pixel positions of a pixel array
CN100576541C (zh) * 2008-05-14 2009-12-30 电子科技大学 一种半导体器件及其提供的低压电源的应用
JP5313550B2 (ja) * 2008-05-28 2013-10-09 パナソニック株式会社 固体撮像装置
JP4595002B2 (ja) * 2008-07-09 2010-12-08 株式会社東芝 半導体装置
KR101471492B1 (ko) * 2008-12-15 2014-12-10 삼성전자주식회사 반도체 메모리 장치의 스택 어레이 구조
JP5476745B2 (ja) * 2009-03-05 2014-04-23 ソニー株式会社 固体撮像装置とその製造方法、及び電子機器
JP4835710B2 (ja) * 2009-03-17 2011-12-14 ソニー株式会社 固体撮像装置、固体撮像装置の製造方法、固体撮像装置の駆動方法、及び電子機器
JP2011014773A (ja) * 2009-07-03 2011-01-20 Panasonic Corp 固体撮像装置およびその製造方法
JP5482025B2 (ja) * 2009-08-28 2014-04-23 ソニー株式会社 固体撮像装置とその製造方法、及び電子機器
JP4966351B2 (ja) * 2009-09-24 2012-07-04 株式会社東芝 半導体装置
JP5564874B2 (ja) * 2009-09-25 2014-08-06 ソニー株式会社 固体撮像装置、及び電子機器
KR101648200B1 (ko) * 2009-10-22 2016-08-12 삼성전자주식회사 이미지 센서 및 그 제조 방법
JP5558801B2 (ja) * 2009-12-18 2014-07-23 キヤノン株式会社 固体撮像装置
TWI515885B (zh) * 2009-12-25 2016-01-01 新力股份有限公司 半導體元件及其製造方法,及電子裝置
JP5501379B2 (ja) * 2009-12-26 2014-05-21 キヤノン株式会社 固体撮像装置および撮像システム
US8487357B2 (en) * 2010-03-12 2013-07-16 Unisantis Electronics Singapore Pte Ltd. Solid state imaging device having high sensitivity and high pixel density
JP5538976B2 (ja) * 2010-03-29 2014-07-02 ソニー株式会社 固体撮像素子、撮像装置
JP5539029B2 (ja) 2010-05-28 2014-07-02 キヤノン株式会社 固体撮像装置の製造方法
JP5693060B2 (ja) * 2010-06-30 2015-04-01 キヤノン株式会社 固体撮像装置、及び撮像システム
JP5843475B2 (ja) * 2010-06-30 2016-01-13 キヤノン株式会社 固体撮像装置および固体撮像装置の製造方法
JP2012015400A (ja) * 2010-07-02 2012-01-19 Canon Inc 固体撮像装置
JP5530839B2 (ja) * 2010-07-09 2014-06-25 パナソニック株式会社 固体撮像装置
KR101819057B1 (ko) * 2010-11-15 2018-01-16 삼성전자주식회사 반도체 소자
JP5696513B2 (ja) * 2011-02-08 2015-04-08 ソニー株式会社 固体撮像装置とその製造方法、及び電子機器
JP2013012556A (ja) * 2011-06-28 2013-01-17 Sony Corp 固体撮像装置とその製造方法、および電子機器
JP5878317B2 (ja) * 2011-08-08 2016-03-08 ルネサスエレクトロニクス株式会社 半導体装置及び半導体装置の製造方法
JP6273571B2 (ja) * 2011-11-22 2018-02-07 パナソニックIpマネジメント株式会社 固体撮像装置
US20130140442A1 (en) * 2011-12-02 2013-06-06 Sony Corporation Amplifying circuit and manufacturing method, solid-state imaging element, and electronic device
US9412895B2 (en) * 2012-04-04 2016-08-09 Samsung Sdi Co., Ltd. Method of manufacturing photoelectric device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040263657A1 (en) * 2003-06-27 2004-12-30 Fuji Photo Film Co., Ltd. Solid state image pickup device
US20080224146A1 (en) * 2004-03-30 2008-09-18 Canon Kabushiki Kaisha Semiconductor Apparatus, Solid State Image Pickup Device Using the Same, and Method of Manufacturing Them
JP2009170448A (ja) * 2008-01-10 2009-07-30 Nikon Corp 固体撮像素子

Also Published As

Publication number Publication date
JP2013118345A (ja) 2013-06-13
US9026972B2 (en) 2015-05-05
US9257472B2 (en) 2016-02-09
US20150194457A1 (en) 2015-07-09
JP6018376B2 (ja) 2016-11-02
CN103137640A (zh) 2013-06-05
CN105762162A (zh) 2016-07-13
US20130141617A1 (en) 2013-06-06

Similar Documents

Publication Publication Date Title
US9026972B2 (en) Solid-state imaging device, camera, and design method for solid-state imaging device
US11322535B2 (en) Solid-state imaging device and camera
US7456880B2 (en) Photoelectric conversion element having a plurality of semiconductor regions and including conductive layers provided on each isolation element region
JP5178266B2 (ja) 固体撮像装置
US10892286B2 (en) Imaging device
US7863661B2 (en) Solid-state imaging device and camera having the same
JP5539104B2 (ja) 光電変換装置およびそれを用いた撮像システム
CN103219346B (zh) 图像拾取装置和图像拾取系统
US9094624B2 (en) Solid-state imaging apparatus and camera
CN102316279B (zh) 固体摄像元件
CN112929585B (zh) 图像传感器
JP5538876B2 (ja) 固体撮像装置
CN110729317A (zh) 固态成像装置,制造固态成像装置的方法和电子设备
CN106030804A (zh) 成像装置和电子设备
JP6526159B2 (ja) 固体撮像装置およびカメラ
US7910966B2 (en) Solid state imaging device including a semiconductor substrate on which a plurality of pixel cells have been formed
CN100429780C (zh) 固体摄像装置
JP2008543085A (ja) Cmos能動画素センサの増幅器を共有した画素
JP6257726B2 (ja) 固体撮像装置およびカメラ
JP2019091937A (ja) 撮像装置
JP7511187B2 (ja) 撮像装置
JP7115067B2 (ja) 固体撮像素子及び撮像システム
JP6355401B2 (ja) 固体撮像装置及びカメラ
JP2010135840A (ja) 撮像装置

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant