CN103055692A - 含卤化物颗粒气体的除害方法 - Google Patents

含卤化物颗粒气体的除害方法 Download PDF

Info

Publication number
CN103055692A
CN103055692A CN2012104103690A CN201210410369A CN103055692A CN 103055692 A CN103055692 A CN 103055692A CN 2012104103690 A CN2012104103690 A CN 2012104103690A CN 201210410369 A CN201210410369 A CN 201210410369A CN 103055692 A CN103055692 A CN 103055692A
Authority
CN
China
Prior art keywords
halide
pesticide
evil
gas
sanitation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2012104103690A
Other languages
English (en)
Chinese (zh)
Inventor
宫泽和浩
涩谷和信
坂根诚
富田哲也
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taiyo Nippon Sanso Corp
Original Assignee
Taiyo Nippon Sanso Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiyo Nippon Sanso Corp filed Critical Taiyo Nippon Sanso Corp
Publication of CN103055692A publication Critical patent/CN103055692A/zh
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/0027—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with additional separating or treating functions
    • B01D46/0036—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with additional separating or treating functions by adsorption or absorption
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/81—Solid phase processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
    • B01D2253/10—Inorganic adsorbents
    • B01D2253/112—Metals or metal compounds not provided for in B01D2253/104 or B01D2253/106
    • B01D2253/1126—Metal hydrides

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Treating Waste Gases (AREA)
  • Gas Separation By Absorption (AREA)
  • Separation Of Particles Using Liquids (AREA)
CN2012104103690A 2011-10-24 2012-10-24 含卤化物颗粒气体的除害方法 Pending CN103055692A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011232506A JP2013086088A (ja) 2011-10-24 2011-10-24 ハロゲン化物粒子を含むガスの除害方法
JP2011-232506 2011-10-24

Publications (1)

Publication Number Publication Date
CN103055692A true CN103055692A (zh) 2013-04-24

Family

ID=48098764

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2012104103690A Pending CN103055692A (zh) 2011-10-24 2012-10-24 含卤化物颗粒气体的除害方法

Country Status (4)

Country Link
JP (1) JP2013086088A (ko)
KR (1) KR20130045196A (ko)
CN (1) CN103055692A (ko)
TW (1) TW201321072A (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102035021B1 (ko) * 2013-09-24 2019-10-22 다이요 닛산 가부시키가이샤 유해 가스의 제해 장치

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63291624A (ja) * 1987-05-23 1988-11-29 Showa Denko Kk ガリウム・ヒ素ウェハ−のドライエッチング排ガスの処理方法
JPH03202128A (ja) * 1989-12-28 1991-09-03 Ebara Res Co Ltd Ｎｆ↓３の除害方法
JPH0716583B2 (ja) * 1990-08-10 1995-03-01 セントラル硝子株式会社 フッ化塩素を含む排ガスの乾式処理方法
JP3563758B2 (ja) * 1994-02-09 2004-09-08 住友精化株式会社 塩素含有ガスの処理方法
JP4210395B2 (ja) * 1999-08-10 2009-01-14 住友精化株式会社 ドライエッチング排ガス処理装置
JP3840877B2 (ja) * 2000-05-26 2006-11-01 昭和電工株式会社 ハロゲン系ガスの除害剤、除害方法及びその用途
JP2003326128A (ja) * 2002-05-09 2003-11-18 Ebara Corp ヒ素又はヒ素化合物を含む排ガスの処理方法及び装置
JP2004073974A (ja) * 2002-08-14 2004-03-11 Sud-Chemie Catalysts Inc ハロゲンガス除去剤及びその製造方法
JP4498183B2 (ja) * 2005-03-23 2010-07-07 株式会社東芝 塩化水素ガス吸収材および塩化水素ガスの除去方法
JP2011143329A (ja) * 2010-01-12 2011-07-28 Central Glass Co Ltd 三フッ化塩素含有ガスの除害処理装置

Also Published As

Publication number Publication date
TW201321072A (zh) 2013-06-01
KR20130045196A (ko) 2013-05-03
JP2013086088A (ja) 2013-05-13
TWI561293B (ko) 2016-12-11

Similar Documents

Publication Publication Date Title
US11572533B2 (en) Quaternary alkylammonium hypochlorite solution, method for manufacturing same, and method for cleaning semiconductor wafer
US8043974B2 (en) Semiconductor wet etchant and method of forming interconnection structure using the same
TWI731514B (zh) 鹵素氟化物的去除方法及鹵素氟化物混合氣體中含有之氣體成份之定量分析方法、定量分析裝置
TWI839661B (zh) 釕處理液以及將該釕處理液使用於半導體製造步驟中處理釕之步驟之用途
TWI517235B (zh) 半導體基板洗淨系統以及半導體基板的洗淨方法
TW201604126A (zh) 回收廢硫酸溶液的方法與裝置
CN112831379A (zh) 次氯酸烷基季铵盐溶液、其制造方法和半导体晶圆的处理方法
CN103055692A (zh) 含卤化物颗粒气体的除害方法
TWI810469B (zh) 釕的半導體用處理液及其製造方法
TWI776035B (zh) 多晶矽的洗滌方法、製造方法及洗滌裝置
JP5217819B2 (ja) ハロゲン系ガスの除去剤およびハロゲン系ガスの除去方法
KR20230048015A (ko) 차아브롬산 이온 및 pH 완충제를 함유하는 반도체 웨이퍼의 처리액
JP4037475B2 (ja) ハロゲン系化合物を含有する排ガスの処理方法
JP2010158664A (ja) 三フッ化塩素の除害方法
JP2009184837A (ja) ヨウ素の製造方法
TW202223156A (zh) 抑制於含有釕之液體中產生含有釕之氣體之方法
TW201800751A (zh) 氧化劑濃度之測定方法及測定裝置、以及電子材料洗淨裝置
WO2023106244A1 (ja) 白金族元素資源回収装置、成膜システム、白金族元素資源回収筒、及び白金族元素資源回収方法
JP2019201118A (ja) 半導体基板の評価方法
JP4773313B2 (ja) 塩化第一鉄液の製造方法
JP2018134571A (ja) ヨウ素化合物の除去方法
KR20190128221A (ko) 실리콘 웨이퍼의 금속 오염 분석 방법 및 실리콘 웨이퍼의 제조 방법
JP4745936B2 (ja) 塩化第一鉄液の製造方法
JP4711550B2 (ja) ハロゲンガスの除去方法
CN116529421A (zh) 半导体晶片处理液及其制造方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20130424