CN102651323A - 半导体封装结构的制法 - Google Patents

半导体封装结构的制法 Download PDF

Info

Publication number
CN102651323A
CN102651323A CN2011100624374A CN201110062437A CN102651323A CN 102651323 A CN102651323 A CN 102651323A CN 2011100624374 A CN2011100624374 A CN 2011100624374A CN 201110062437 A CN201110062437 A CN 201110062437A CN 102651323 A CN102651323 A CN 102651323A
Authority
CN
China
Prior art keywords
chip
primer layer
active surface
making
packaging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN2011100624374A
Other languages
English (en)
Other versions
CN102651323B (zh
Inventor
蔡宪聪
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
UTAC Headquarters Pte Ltd
Original Assignee
UTAC Taiwan Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by UTAC Taiwan Corp filed Critical UTAC Taiwan Corp
Publication of CN102651323A publication Critical patent/CN102651323A/zh
Application granted granted Critical
Publication of CN102651323B publication Critical patent/CN102651323B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/563Encapsulation of active face of flip-chip device, e.g. underfilling or underencapsulation of flip-chip, encapsulation preform on chip or mounting substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/568Temporary substrate used as encapsulation process aid
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/27Manufacturing methods
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/91Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L24/80 - H01L24/90
    • H01L24/92Specific sequence of method steps
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68381Details of chemical or physical process used for separating the auxiliary support from a device or wafer
    • H01L2221/68386Separation by peeling
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/16238Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the bump connector connecting to a bonding area protruding from the surface of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/27Manufacturing methods
    • H01L2224/27001Involving a temporary auxiliary member not forming part of the manufacturing apparatus, e.g. removable or sacrificial coating, film or substrate
    • H01L2224/27003Involving a temporary auxiliary member not forming part of the manufacturing apparatus, e.g. removable or sacrificial coating, film or substrate for holding or transferring the layer preform
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/27Manufacturing methods
    • H01L2224/274Manufacturing methods by blanket deposition of the material of the layer connector
    • H01L2224/2743Manufacturing methods by blanket deposition of the material of the layer connector in solid form
    • H01L2224/27436Lamination of a preform, e.g. foil, sheet or layer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/731Location prior to the connecting process
    • H01L2224/73101Location prior to the connecting process on the same surface
    • H01L2224/73103Bump and layer connectors
    • H01L2224/73104Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
    • H01L2224/8119Arrangement of the bump connectors prior to mounting
    • H01L2224/81193Arrangement of the bump connectors prior to mounting wherein the bump connectors are disposed on both the semiconductor or solid-state body and another item or body to be connected to the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
    • H01L2224/819Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector with the bump connector not providing any mechanical bonding
    • H01L2224/81901Pressing the bump connector against the bonding areas by means of another connector
    • H01L2224/81903Pressing the bump connector against the bonding areas by means of another connector by means of a layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/8319Arrangement of the layer connectors prior to mounting
    • H01L2224/83191Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/838Bonding techniques
    • H01L2224/8385Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
    • H01L2224/83855Hardening the adhesive by curing, i.e. thermosetting
    • H01L2224/83862Heat curing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/91Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
    • H01L2224/92Specific sequence of method steps
    • H01L2224/921Connecting a surface with connectors of different types
    • H01L2224/9211Parallel connecting processes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • H01L23/3121Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/10Bump connectors ; Manufacturing methods related thereto
    • H01L24/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L24/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L24/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L24/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/73Means for bonding being of different types provided for in two or more of groups H01L24/10, H01L24/18, H01L24/26, H01L24/34, H01L24/42, H01L24/50, H01L24/63, H01L24/71
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Wire Bonding (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

一种半导体封装结构的制法,包括:提供一具有主动面的芯片及一表面上设有底胶层的基材,其中,该芯片的主动面上具有多个导电凸块;将该芯片的主动面结合于该底胶层上,以令各该导电凸块嵌埋入该底胶层中;移除该基材,以外露该底胶层;以及将该芯片通过该底胶层结合于封装基板上,使该芯片通过该多个导电凸块电性连接该封装基板。本发明通过先在芯片的主动面上结合底胶层,再将该底胶层设于该封装基板上,因而无需进行焊接制程,有效减少材料成本,且可简化制程。

Description

半导体封装结构的制法
技术领域
本发明涉及一种半导体装置的制法,尤其涉及一种半导体封装结构的制法。
背景技术
随着电子产业的蓬勃发展,电子产品亦朝着轻、薄、短、小、高积集度、多功能化方向发展。而为满足封装结构高集成化(Integration)以及微型化(Miniaturization)的封装需求,封装基板除了导入球栅阵列(BGA)的设计,封装形式逐渐由打线式(Wire Bonding)封装进展到覆晶式(Flip Chip,FC)封装,此种封装件能避免打线用的金线占用空间,可有效缩减整体半导体装置的体积并提升电性功能。
图1A至图1C为习知覆晶式封装结构制法的说明图。如图1A所示,提供一表面具有焊垫120的封装基板12。如图2B所示,提供一具有相对的主动面10a及非主动面10b的芯片10,该主动面10a上具有多个导电凸块100。接着,进行焊接制程,将该导电凸块100通过该焊锡凸块11电性连接各该焊垫120,使该芯片10设于该封装基板12上。如图2C所示,形成底胶层(underfill)110于该芯片10的主动面10a与该封装基板12之间,以包覆各该焊锡凸块11,从而完成覆晶制程。
然而,习知覆晶式封装结构的制法中,需先进行焊接制程,再进行填充底胶的制程,不仅因需使用焊锡材料而增加材料成本,且导致制程繁琐。
因此,如何克服上述习知制法的问题,实已成为目前亟欲解决的课题。
发明内容
鉴于上述习知技术的种种缺失,本发明的主要目的在于提供一种半导体封装结构的制法,无需进行焊接制程,并可有效减少材料成本。
本发明的半导体封装结构的制法包括:提供一芯片及一表面上设有底胶层的基材,该芯片具有相对的主动面及非主动面,其中,主动面上具有多个导电凸块;将该芯片的主动面结合于该底胶层上,以令各该导电凸块嵌埋入该底胶层中;移除该基材,以外露该底胶层;以及将该芯片通过该底胶层结合于封装基板上,使该芯片通过该多个导电凸块电性连接该封装基板。
前述的制法中,是通过剥离的方式移除该基材,且为轻易剥除该基材,该基材与该底胶层之间的结合力以小于该芯片主动面与该底胶层之间的结合力为佳。
在另一实施例中,前述的制法中,该基材与该底胶层之间可具有离形层,以通过剥离该离形层而移除该基材。
前述的制法中,由于该底胶层保护该芯片的主动面,且该基材可提供稳定的承载及支撑性,故于移除该基材之前,还可研磨该芯片的非主动面。
此外,该芯片通过该底胶层结合于封装基板上的步骤中,通过热融该底胶层,使该多个导电凸块电性连接该封装基板,再固化该底胶层。当然,也可通过形成封装胶体于该封装基板上,以包覆该芯片。
由上可知,本发明的半导体封装结构的制法,通过先在芯片的主动面上结合底胶层,再使芯片通过该底胶层设于该封装基板上,相较于习知技术,本发明无需进行焊接制程,得以有效减少材料成本,且可简化制程。
附图说明
图1A至图1C为习知覆晶式基板结构的制法的剖视示意图;以及
图2A至图2E为本发明半导体封装结构的制法的剖视示意图,其中,图2B’及图2D’图为图2B及图第2D的另一实施方式。
主要元件符号说明
10、20      芯片
10a、20a    主动面
10b、20b    非主动面
100、200    导电凸块
11        焊锡凸块
110、210  底胶层
12、22    封装基板
120、220  焊垫
21        基材
211       离形层
230       封装胶体。
具体实施方式
以下通过特定的具体实施例说明本发明的实施方式,熟悉本领域的普通技术人员可由本说明书所揭示的内容轻易地了解本发明的其他优点及功效。
须说明者为,本说明书所附图式所绘示的结构、比例、大小等,均仅用以配合说明书所揭示的内容,以供熟悉本领域的技术人员进行了解与阅读,并非用以限定本发明可实施的限定条件,故不具技术上的实质意义,任何结构的修饰、比例关系的改变或大小的调整,在不影响本发明所能产生的功效及所能达成的目的下,均应仍涵盖在本发明所揭示的技术内容的范围内。
请参阅图2A至图2E,其为本发明的半导体封装结构的制法。
如图2A所示,提供一具有相对的主动面20a及非主动面20b的芯片20,该主动面20a上具有多个导电凸块200。
如图2B所示,提供一表面上设有底胶层210的基材21,将该芯片20的主动面20a结合于该底胶层210上,以令各该导电凸块200嵌埋入该底胶层210中。于具体实施上,该底胶层210可为非导电胶膜(NCF,NAMICS CORPORATION),且可于进行研磨制程时保护导电凸块200。于本实施例中,该基材21与该底胶层210之间的结合力小于该主动面20a与该底胶层210之间的结合力。
如图2B’所示,于另一实施方式中,该基材21与该底胶层210之间具有离形层211。
如图2C所示,还可研磨该芯片20的非主动面20b至L-L虚线以降低芯片厚度。
如图D图所示,因该基材21与该底胶层210之间的结合力小于该芯片20的主动面20a与该底胶层210之间的结合力,故可通过剥离的方式移除该基材21,以使该底胶层210附着于该主动面20a上。
如图2D’所示,若以图2B’所示的结构进行移除制程,则可通过剥离该离形层211而移除该基材21。
如图2E所示,将该芯片20通过底胶层210设于一封装基板22上,再经热融该底胶层210,使该多个导电凸块200碰触该封装基板22,以电性连接该封装基板22的焊垫220,再固化该底胶层210,使该底胶层210黏固于该封装基板22上,令该芯片20固定于该封装基板22上。当然,也可通过形成封装胶体230于该封装基板22上,以包覆该芯片20。
本发明的半导体封装结构的制法,通过先在该芯片20的主动面20a上结合该底胶层210,再将该底胶层210设于该封装基板22上,相较于习知技术,本发明不仅无需进行焊接制程并于焊接后形成底胶层,且减少材料成本,以简化制程步骤。
上述实施例用以例示性说明本发明的原理及其功效,而非用于限制本发明。任何熟习本领域的普通技术人员均可在不违背本发明的精神及范畴下,对上述实施例进行修改。因此本发明的权利保护范围,应如权利要求范围所列。

Claims (7)

1.一种半导体封装结构的制法,其特征在于,包括:
提供一具有相对的主动面及非主动面的芯片及一表面上设有底胶层的基材,其中,该主动面上具有多个导电凸块;
将该芯片的主动面结合于该底胶层上,以令各该导电凸块嵌埋入该底胶层中;
移除该基材,以外露该底胶层;以及
将该芯片通过该底胶层结合于封装基板上,使该芯片通过该多个导电凸块电性连接该封装基板。
2.根据权利要求1所述的半导体封装结构的制法,其特征在于,移除该基材的方式是通过剥离的方式。
3.根据权利要求2所述的半导体封装结构的制法,其特征在于,该基材与该底胶层之间的结合力小于该芯片主动面与该底胶层之间的结合力。
4.根据权利要求1所述的半导体封装结构的制法,其特征在于,该基材与该底胶层之间具有离形层,以通过剥离该离形层而移除该基材。
5.根据权利要求1所述的半导体封装结构的制法,其特征在于,还包括于移除该基材之前,研磨该芯片的非主动面。
6.根据权利要求1所述的半导体封装结构的制法,其特征在于,该芯片通过该底胶层结合于封装基板上的步骤中,是通过热融该底胶层,使该多个导电凸块电性连接该封装基板,再固化该底胶层。
7.根据权利要求1所述的半导体封装结构的制法,其特征在于,还包括形成封装胶体于该封装基板上,以包覆该芯片。
CN201110062437.4A 2011-02-25 2011-03-11 半导体封装结构的制法 Expired - Fee Related CN102651323B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
TW100106344 2011-02-25
TW100106344A TWI430376B (zh) 2011-02-25 2011-02-25 The Method of Fabrication of Semiconductor Packaging Structure

Publications (2)

Publication Number Publication Date
CN102651323A true CN102651323A (zh) 2012-08-29
CN102651323B CN102651323B (zh) 2015-09-02

Family

ID=44514475

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201110062437.4A Expired - Fee Related CN102651323B (zh) 2011-02-25 2011-03-11 半导体封装结构的制法

Country Status (6)

Country Link
US (1) US20120220081A1 (zh)
EP (1) EP2498284A2 (zh)
JP (1) JP2012178565A (zh)
KR (1) KR20120098376A (zh)
CN (1) CN102651323B (zh)
TW (1) TWI430376B (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107527554A (zh) * 2017-08-23 2017-12-29 京东方科技集团股份有限公司 柔性显示面板及其制备方法、柔性显示装置
CN108436604A (zh) * 2018-04-23 2018-08-24 宜特(上海)检测技术有限公司 应用于低介电材质覆晶芯片的防脱层研磨方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10410988B2 (en) * 2016-08-09 2019-09-10 Semtech Corporation Single-shot encapsulation

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW455966B (en) * 2000-02-23 2001-09-21 Fujitsu Ltd Method for fixing a semiconductor device having stud bumps to a substrate by an electrically non-conductive adhesive
CN1387244A (zh) * 2001-03-30 2002-12-25 琳得科株式会社 带导电体的粘接板、半导体装置的制造方法及半导体装置
US20030183947A1 (en) * 2002-04-01 2003-10-02 Nec Electronics Corporation Flip-chip type semiconductor device, process for manufacturing such semiconductor device, and process for mounting such semiconductor device
US20090075429A1 (en) * 2005-04-27 2009-03-19 Lintec Corporation Sheet-Like Underfill Material and Semiconductor Device Manufacturing Method

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4180206B2 (ja) * 1999-11-12 2008-11-12 リンテック株式会社 半導体装置の製造方法
JP2002118147A (ja) * 2000-10-11 2002-04-19 Mitsui Chemicals Inc 半導体チップをプリント配線基板に装着する方法及びその方法の実施に用いる装着用シート
JP4776188B2 (ja) * 2004-08-03 2011-09-21 古河電気工業株式会社 半導体装置製造方法およびウエハ加工用テープ
JP5181222B2 (ja) * 2006-06-23 2013-04-10 日立化成株式会社 半導体デバイスの製造方法
JP2008251869A (ja) * 2007-03-30 2008-10-16 Kyocer Slc Technologies Corp 配線基板およびその製造方法
JP5064288B2 (ja) * 2008-04-15 2012-10-31 新光電気工業株式会社 半導体装置の製造方法
JP5569121B2 (ja) * 2009-05-29 2014-08-13 日立化成株式会社 接着剤組成物、回路部材接続用接着剤シート及び半導体装置の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW455966B (en) * 2000-02-23 2001-09-21 Fujitsu Ltd Method for fixing a semiconductor device having stud bumps to a substrate by an electrically non-conductive adhesive
CN1387244A (zh) * 2001-03-30 2002-12-25 琳得科株式会社 带导电体的粘接板、半导体装置的制造方法及半导体装置
US20030183947A1 (en) * 2002-04-01 2003-10-02 Nec Electronics Corporation Flip-chip type semiconductor device, process for manufacturing such semiconductor device, and process for mounting such semiconductor device
US20090075429A1 (en) * 2005-04-27 2009-03-19 Lintec Corporation Sheet-Like Underfill Material and Semiconductor Device Manufacturing Method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107527554A (zh) * 2017-08-23 2017-12-29 京东方科技集团股份有限公司 柔性显示面板及其制备方法、柔性显示装置
US10622330B2 (en) 2017-08-23 2020-04-14 Boe Technology Group Co., Ltd. Flexible display panel and preparation method thereof, flexible display device
CN108436604A (zh) * 2018-04-23 2018-08-24 宜特(上海)检测技术有限公司 应用于低介电材质覆晶芯片的防脱层研磨方法

Also Published As

Publication number Publication date
EP2498284A2 (en) 2012-09-12
US20120220081A1 (en) 2012-08-30
CN102651323B (zh) 2015-09-02
JP2012178565A (ja) 2012-09-13
TWI430376B (zh) 2014-03-11
KR20120098376A (ko) 2012-09-05
TW201236090A (en) 2012-09-01

Similar Documents

Publication Publication Date Title
CN103022021B (zh) 半导体装置及其制造方法
JP4390775B2 (ja) 半導体パッケージの製造方法
KR102107961B1 (ko) 반도체 장치 및 이의 제조 방법
CN102344110B (zh) 微机电系统器件的方形扁平无引脚封装结构及方法
KR101346420B1 (ko) 반도체 패키지 및 그 제조 방법
US20130288430A1 (en) Semiconductor device and method for manufacturing thereof
CN102530824B (zh) 具微机电元件的封装结构及其制法
TWI520285B (zh) 半導體封裝件及其製法
US11756844B2 (en) Semiconductor device with a protection mechanism and associated systems, devices, and methods
KR20140141927A (ko) 접합신뢰성이 우수한 연결단자를 갖는 반도체 장치 및 그의 제조방법
TW201320266A (zh) 半導體封裝件及其製法
CN105355641B (zh) 高像素影像传感芯片的封装结构及封装方法
TW201214639A (en) Chip structure having rewiring circuit layer and fabrication method thereof
CN206022356U (zh) 集成电路封装体与所使用的封装基板
CN102651323B (zh) 半导体封装结构的制法
US20200211978A1 (en) Package device and method of manufacturing the same
CN105914155A (zh) 一种倒装芯片及其封装方法
TWI556383B (zh) 封裝結構及其製法
CN103311211A (zh) 多芯片封装体
CN106206477A (zh) 电子封装结构及电子封装件的制法
TWI604593B (zh) 半導體封裝件及其製法
CN108630626A (zh) 无基板封装结构
CN102751203A (zh) 半导体封装结构及其制作方法
CN108428694A (zh) 一种系统级封装芯片及其封装方法
CN102556938B (zh) 芯片叠层封装结构及其制造方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20170329

Address after: Singapore City

Patentee after: UTAC HEADQUARTERS PTE. LTD.

Address before: Hsinchu City, Taiwan, China

Patentee before: Liance Science and Technology Co., Ltd.

CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20150902

Termination date: 20170311